JPS60127646A - 真空装置の試料交換装置 - Google Patents

真空装置の試料交換装置

Info

Publication number
JPS60127646A
JPS60127646A JP58235776A JP23577683A JPS60127646A JP S60127646 A JPS60127646 A JP S60127646A JP 58235776 A JP58235776 A JP 58235776A JP 23577683 A JP23577683 A JP 23577683A JP S60127646 A JPS60127646 A JP S60127646A
Authority
JP
Japan
Prior art keywords
sample
yoke
bearing
thrust
sample holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58235776A
Other languages
English (en)
Japanese (ja)
Other versions
JPS64781B2 (enExample
Inventor
Makoto Tamai
玉井　誠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
NTT Inc
Original Assignee
Jeol Ltd
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, Nippon Telegraph and Telephone Corp filed Critical Jeol Ltd
Priority to JP58235776A priority Critical patent/JPS60127646A/ja
Publication of JPS60127646A publication Critical patent/JPS60127646A/ja
Publication of JPS64781B2 publication Critical patent/JPS64781B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58235776A 1983-12-14 1983-12-14 真空装置の試料交換装置 Granted JPS60127646A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58235776A JPS60127646A (ja) 1983-12-14 1983-12-14 真空装置の試料交換装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58235776A JPS60127646A (ja) 1983-12-14 1983-12-14 真空装置の試料交換装置

Publications (2)

Publication Number Publication Date
JPS60127646A true JPS60127646A (ja) 1985-07-08
JPS64781B2 JPS64781B2 (enExample) 1989-01-09

Family

ID=16991068

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58235776A Granted JPS60127646A (ja) 1983-12-14 1983-12-14 真空装置の試料交換装置

Country Status (1)

Country Link
JP (1) JPS60127646A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008010718A3 (en) * 2006-07-21 2008-04-10 Univ Delft Tech Method for sample preparation for cryoelectron microscopy (cem), microreactor and loading platform
JP2012028009A (ja) * 2010-07-20 2012-02-09 Hitachi High-Technologies Corp 荷電粒子応用装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008010718A3 (en) * 2006-07-21 2008-04-10 Univ Delft Tech Method for sample preparation for cryoelectron microscopy (cem), microreactor and loading platform
JP2012028009A (ja) * 2010-07-20 2012-02-09 Hitachi High-Technologies Corp 荷電粒子応用装置

Also Published As

Publication number Publication date
JPS64781B2 (enExample) 1989-01-09

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