JPS60125844A - Galss mask - Google Patents

Galss mask

Info

Publication number
JPS60125844A
JPS60125844A JP58234523A JP23452383A JPS60125844A JP S60125844 A JPS60125844 A JP S60125844A JP 58234523 A JP58234523 A JP 58234523A JP 23452383 A JP23452383 A JP 23452383A JP S60125844 A JPS60125844 A JP S60125844A
Authority
JP
Japan
Prior art keywords
light
mask
glass
glass mask
electric field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58234523A
Other languages
Japanese (ja)
Inventor
Takashi Ariga
有賀 隆
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58234523A priority Critical patent/JPS60125844A/en
Publication of JPS60125844A publication Critical patent/JPS60125844A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To enable only one mask to acquire the functions 2 masks by attaching polarizing films on both sides of a glass mask, and allowing it to serve as the first glass mask in the case of no light interception through electric field control, and so serve as the second mask in the reverse case. CONSTITUTION:The glass plate to both faces of which polarizing films 12, 13 are attached and which is capable of controlling transmission of lights A, B through these faces by application of an electric field is used for a base plate 11, and one of the films 12, 13 is patterned and the parts except the patterned parts to be subjected to the light transmission control by application of the electric field are eliminated, and other patterned films 2, 15 are attached to the patterned film side of the films 12, 13. The application of the electric field in such a structure permits the mask 11 to serve as the first glass mask in the case of no light interception, and to serve as the second glass mask in the reverse case, thus permitting the desired functions of the 2 glass mask to be acquired practicably with one glass mask, and registering of the glass mask to be made easy by reduction of the number of the glass mask.

Description

【発明の詳細な説明】 fa+ 発明の技術分野 本発明は、ホトリソグラフィ技術に使用されるガラスマ
スクの構成に関す。
DETAILED DESCRIPTION OF THE INVENTION fa+ TECHNICAL FIELD OF THE INVENTION The present invention relates to the construction of a glass mask used in photolithography techniques.

(bl −、技術の背景 ホトリソグラフィ技術は、絶縁物、半導体、金属などの
基板または薄膜に所望のパターンを得るために、不必要
部分を光学的および化学的方法などにより取り除く技術
で、半導体装置の主体をなす半導体チップの製造などに
おいて使用される重要な技術である。
(bl -, Background of the Technology Photolithography technology is a technology that removes unnecessary parts using optical and chemical methods in order to obtain a desired pattern on a substrate or thin film made of insulators, semiconductors, metals, etc.). This is an important technology used in the manufacture of semiconductor chips, which are the main component of semiconductors.

本発明に係るガラスマスクは、前記不必要部分の除去工
程に際して必要部分の除去を防止するため、該必要部分
の表面にホトレジストの前記パターンを露光現像により
形成するのに使用し、ガラス板に該パターンをなす遮光
膜を被着したものである。
The glass mask according to the present invention is used to form the pattern of photoresist on the surface of the necessary portion by exposure and development in order to prevent the removal of the necessary portion during the step of removing the unnecessary portion, and the glass mask is used to form the pattern of photoresist on the surface of the necessary portion by exposure and development. It is coated with a patterned light-shielding film.

(C1従来技術と問題点 第1図は従来のガラスマスクの一実施例における遮光状
況を示した断面図で、1は基板、2は遮光膜、Aは入射
光、Bは透過光をそれぞれ示す。
(C1 Prior Art and Problems Figure 1 is a cross-sectional view showing the light shielding situation in an example of a conventional glass mask. 1 is the substrate, 2 is the light shielding film, A is the incident light, and B is the transmitted light. .

図示のガラスマスクにおいては、透明なガラス板でなる
基板1の下面にパターンを形成した遮光性の遮光膜2が
被着されていて、上側から全面に入射した入射光Aは遮
光膜2領域が遮光されて、透過光Bは遮光膜2以外の領
域のみとなる。
In the illustrated glass mask, a patterned light-shielding film 2 is adhered to the lower surface of a substrate 1 made of a transparent glass plate, and incident light A that enters the entire surface from the upper side is transmitted to the light-shielding film 2 area. The light is blocked, and the transmitted light B is transmitted only to the area other than the light blocking film 2.

一方、ゲートアレー品種に代表されるように半導体チッ
プの種類数が増えるに伴い、前記ガラスマスクの種類数
が増えるが、多数のガラスマスクの中には遮光膜2のパ
ターン相互間に部分追加の関係にある、即ち、第一のガ
ラスマスクの遮光膜パターンに一部遮光股パターンを追
加することにより、第二のガラスマスクの遮光膜パター
ンとなるものが少なくない。
On the other hand, as the number of types of semiconductor chips increases, as typified by gate array types, the number of types of glass masks increases. In other words, by adding a partial light-shielding crotch pattern to the light-shielding film pattern of the first glass mask, the light-shielding film pattern of the second glass mask is often obtained.

また、同一半導体チノブに複数のガラスマスクを使用す
る場合が多いが、この場合マスク合わせには一般に高度
の技術を必要とし、該複数の中には前記第一と第二のガ
ラスマスクを含む場合がある。
Furthermore, in many cases, multiple glass masks are used for the same semiconductor chinobu, but in this case, a high level of skill is generally required to match the masks, and in some cases, the first and second glass masks are included in the multiple masks. There is.

従って、第一のガラスマスクと第二のガラスマスクが共
通になるならば、ガラスマスクの数の増加を抑制出来、
マスク合わせも容易になって望ましいところである。
Therefore, if the first glass mask and the second glass mask are common, the increase in the number of glass masks can be suppressed,
This is desirable because mask alignment becomes easier.

+dl 発明の目的 本発明の目的は上記従来の要望に鑑み、第一のガラスマ
スクの遮光膜パターンに一部遮光膜パターンを追加する
ことにより、第二のガラスマスクの遮光膜パターンとな
る関係にある二つのガラスマスクの機能を、一つのガラ
スマスクで実現する構成を提供するにある。
+dl Purpose of the Invention In view of the above-mentioned conventional demands, the purpose of the present invention is to add a part of the light-shielding film pattern to the light-shielding film pattern of the first glass mask, thereby creating a relationship that will become the light-shielding film pattern of the second glass mask. The purpose is to provide a configuration that realizes the functions of two glass masks with one glass mask.

tel 発明の構成 上記目的は、表裏のそれぞれの面に偏向膜が被着され、
電界の付与制御により咳面を1通する光の遮光有無を制
御出来るガラス板を基板とし、前記偏向膜の何れか一方
がパターンニングされて前記電界の付与制御により遮光
制御する領域以外が除去されており、且つ、該パターン
ニングされた偏向膜のある側に別のパターンニングされ
た遮光膜が被着されていることを特徴とするガラスマス
クによって達成される。
tel Structure of the Invention The above object is to provide a deflection film coated on each of the front and back surfaces,
A glass plate is used as a substrate that can control whether or not to block light passing through the cough surface by controlling the application of an electric field, and either one of the deflection films is patterned to remove areas other than the area to be controlled to block light by controlling the application of the electric field. This is achieved by a glass mask characterized in that the patterned deflection film is coated with another patterned light shielding film on the side where the patterned deflection film is located.

前記電界制御による遮光無しの場合第一のガラスマスク
になり、該遮光膜りの場合第二のガラスマスクになるの
で、所望の二つのガラスマスクの機能を一つのガラスマ
スクで実現することが可能になる。
When there is no light shielding due to the electric field control, it becomes the first glass mask, and when the light shielding film is used, it becomes the second glass mask, so it is possible to realize the desired functions of two glass masks with one glass mask. become.

(fl 発明の実施例 以下本発明の実施例を図により説明する。企図を通じ同
一符号は同一対象物を示す。
(fl Embodiments of the Invention The embodiments of the invention will now be described with reference to the drawings. The same reference numerals indicate the same objects throughout the invention.

第2図は光変調器用ガラスによる光変調器の一実施例の
断面図、第3図は本発明の構成によるガラスマスクの一
実施例における遮光状況を示した断面図(at (bl
で、11は基板、12.13は偏向膜、14は電極、1
5は遮光膜、16はスイッチをそれぞれ示す。
FIG. 2 is a cross-sectional view of an embodiment of an optical modulator using glass for optical modulators, and FIG.
11 is a substrate, 12.13 is a deflection film, 14 is an electrode, 1
Reference numeral 5 indicates a light-shielding film, and reference numeral 16 indicates a switch.

第2図図示の光変調器は、ニオブ酸ナトリウムを含む透
明結晶化ガラス板でなる基板11の表裏のそれぞれの面
に偏向膜12.13が被着してあり、電極14に電圧を
印加することにより該面に対して平行方向(図示横方向
)の電界を付与するようになっている。そして、該電圧
を変化することにより該電界の強さを変化させ、入射先
人に対して透過光Bを変化させるもので、例えば、該電
圧を大きくすれば該電票が大きくなって透過光Bは弱く
なり、透過光Bを本発明に係るガラスマスクの遮光で必
要とする程度に弱くすることが可能である。
The optical modulator shown in FIG. 2 has deflection films 12 and 13 adhered to each of the front and back surfaces of a substrate 11 made of a transparent crystallized glass plate containing sodium niobate, and a voltage is applied to an electrode 14. As a result, an electric field is applied in a direction parallel to the surface (horizontal direction in the figure). By changing the voltage, the strength of the electric field is changed, and the transmitted light B is changed with respect to the incident person.For example, if the voltage is increased, the electric bill becomes larger and the transmitted light B becomes weaker, and it is possible to make the transmitted light B weaker to the extent necessary for the light shielding of the glass mask according to the present invention.

本発明は、この光変調器用ガラスによる光変調器の作動
を利用したものである。
The present invention utilizes the operation of an optical modulator using this optical modulator glass.

第3図図示のガラスマスクは、第2図図示の光変調器の
偏向膜13をパターンニングし、前述の第一のガラスマ
スクと第二のガラスマスクとの間で追加される遮光膜パ
ターンの領域以外を除去して遮光膜15を形成し、更に
、通常の遮光膜材料で第一のガラスマスクの遮光膜パタ
ーンを形成する遮光膜2を被着しである。
The glass mask shown in FIG. 3 is obtained by patterning the deflection film 13 of the optical modulator shown in FIG. A light-shielding film 15 is formed by removing the other regions, and a light-shielding film 2 that forms the light-shielding film pattern of the first glass mask is further applied using a normal light-shielding film material.

このガラスマスクを使用するに当たって、第2図の説明
で述べたガラスマスクの遮光として充分な電圧を電極1
4に印加するのを、例えばスイッチ16で制御するよう
にすれば、スイッチ16が断の場合は前記電界の付与が
ないので、図(a)図示のように入射光Aに対して遮光
膜15領域は透光性を示して、遮光膜2のみが遮光膜パ
ターンを形成し第一のガラスマスクとして機能する。そ
して、スイッチ16が接続の場合は該電界が付与される
ので、図(b1図示のように遮光膜15領域は遮光性を
示して、遮光11i2および15が遮光膜パターンを形
成して第二のガラスマスクとして機能する。
When using this glass mask, apply a sufficient voltage to the electrodes to shield the glass mask from light as described in the explanation of Figure 2.
If the application of the electric field to the light shielding film 15 is controlled by, for example, the switch 16, the electric field is not applied when the switch 16 is turned off. The region exhibits light-transmitting properties, and only the light-shielding film 2 forms a light-shielding film pattern and functions as a first glass mask. Then, when the switch 16 is connected, the electric field is applied, so that the light shielding film 15 area exhibits light shielding properties as shown in Figure (b1), and the light shielding films 11i2 and 15 form a light shielding film pattern and the second Functions as a glass mask.

従って、所望の二つのガラスマスクの機能を一つのガラ
スマスクで実現することが可能になる。
Therefore, it becomes possible to realize the desired functions of two glass masks with one glass mask.

(gl 発明の効果 以上に説明したように、本発明による構成によれば、第
一のガラスマスクの遮光膜パターンに一部遮光膜パター
ンを追加することにより、第二のガラスマスクの遮光膜
パターンとなる関係にある二つのガラスマスクの機能を
、一つのガラスマスクで実現する構成を提供することが
出来て、ガラスマスクの数の増加抑制と、マスク合わせ
の容易化を可能にさせる効果がある。
(gl Effects of the Invention As explained above, according to the configuration of the present invention, by adding a part of the light-shielding film pattern to the light-shielding film pattern of the first glass mask, the light-shielding film pattern of the second glass mask It is possible to provide a configuration in which the functions of two glass masks that have the following relationship are realized with one glass mask, which has the effect of suppressing the increase in the number of glass masks and making it possible to easily match the masks. .

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のガラスマスクの一実施例における遮光状
況を示した断面図、第2図は光変調器用ガラスによる光
変調器の一実施例の断面図、第3図は本発明の構成によ
るガラスマスクの一実施例における遮光状況を示した断
面図(al (blである。 図面において、1.11は基板、2.15は遮光膜、1
2.13は偏向膜、14は電極、16はスイッチ、Aは
入射光、Bは透過光をそれぞれ示す。 革31m
FIG. 1 is a cross-sectional view showing a light shielding situation in an example of a conventional glass mask, FIG. 2 is a cross-sectional view of an example of a light modulator using glass for optical modulators, and FIG. 3 is a cross-sectional view showing the structure of the present invention. A cross-sectional view (al (bl) showing a light shielding situation in an example of a glass mask. In the drawing, 1.11 is a substrate, 2.15 is a light shielding film, 1
2.13 is a deflection film, 14 is an electrode, 16 is a switch, A is incident light, and B is transmitted light. leather 31m

Claims (1)

【特許請求の範囲】[Claims] 表裏のそれぞれの面に偏向膜が被着され、電界の付与制
御により該面を貫通する光の遮光有無を制御出来るガラ
ス板を基板とし、前記偏向膜の何れか一方がパターンニ
ングされて前記電界の付与制御により遮光制御する領域
以外が除去されており、且つ、該パターンニングされた
偏向膜のある側に別のパターンニングされた遮光膜が被
着されていることを特徴とするガラスマスク。
A glass plate is used as a substrate, on which a polarizing film is adhered to each of the front and back surfaces, and whether or not light passing through the surface is blocked can be controlled by controlling the application of an electric field. What is claimed is: 1. A glass mask characterized in that areas other than areas to be light-shielded are removed by application control, and another patterned light-shielding film is adhered to the side where the patterned deflection film is located.
JP58234523A 1983-12-13 1983-12-13 Galss mask Pending JPS60125844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58234523A JPS60125844A (en) 1983-12-13 1983-12-13 Galss mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58234523A JPS60125844A (en) 1983-12-13 1983-12-13 Galss mask

Publications (1)

Publication Number Publication Date
JPS60125844A true JPS60125844A (en) 1985-07-05

Family

ID=16972357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58234523A Pending JPS60125844A (en) 1983-12-13 1983-12-13 Galss mask

Country Status (1)

Country Link
JP (1) JPS60125844A (en)

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