JPS60124934A - 薄膜蒸着方法 - Google Patents
薄膜蒸着方法Info
- Publication number
- JPS60124934A JPS60124934A JP23558583A JP23558583A JPS60124934A JP S60124934 A JPS60124934 A JP S60124934A JP 23558583 A JP23558583 A JP 23558583A JP 23558583 A JP23558583 A JP 23558583A JP S60124934 A JPS60124934 A JP S60124934A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- cluster
- cluster ion
- guns
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 17
- 238000000034 method Methods 0.000 title claims description 9
- 238000007740 vapor deposition Methods 0.000 title abstract description 5
- 150000002500 ions Chemical class 0.000 claims abstract description 38
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 238000007736 thin film deposition technique Methods 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 5
- 230000005684 electric field Effects 0.000 claims description 2
- 238000000427 thin-film deposition Methods 0.000 claims description 2
- 238000010884 ion-beam technique Methods 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 abstract description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 239000010408 film Substances 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 238000000605 extraction Methods 0.000 description 5
- 230000007935 neutral effect Effects 0.000 description 5
- 230000008021 deposition Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007737 ion beam deposition Methods 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23558583A JPS60124934A (ja) | 1983-12-12 | 1983-12-12 | 薄膜蒸着方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23558583A JPS60124934A (ja) | 1983-12-12 | 1983-12-12 | 薄膜蒸着方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60124934A true JPS60124934A (ja) | 1985-07-04 |
| JPH053132B2 JPH053132B2 (enrdf_load_stackoverflow) | 1993-01-14 |
Family
ID=16988174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23558583A Granted JPS60124934A (ja) | 1983-12-12 | 1983-12-12 | 薄膜蒸着方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60124934A (enrdf_load_stackoverflow) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52149275A (en) * | 1976-06-07 | 1977-12-12 | Tsuneo Nishida | Casing parts for golden colored portable articles |
-
1983
- 1983-12-12 JP JP23558583A patent/JPS60124934A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52149275A (en) * | 1976-06-07 | 1977-12-12 | Tsuneo Nishida | Casing parts for golden colored portable articles |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH053132B2 (enrdf_load_stackoverflow) | 1993-01-14 |
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