JPS60120824U - plasma processing equipment - Google Patents
plasma processing equipmentInfo
- Publication number
- JPS60120824U JPS60120824U JP756184U JP756184U JPS60120824U JP S60120824 U JPS60120824 U JP S60120824U JP 756184 U JP756184 U JP 756184U JP 756184 U JP756184 U JP 756184U JP S60120824 U JPS60120824 U JP S60120824U
- Authority
- JP
- Japan
- Prior art keywords
- plasma processing
- processing equipment
- control valve
- flow rate
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は本考案のプラズマ処理装置の代表的１態様を示
す図である。
図中１は真空容器、２，２′は電極、３はフィルム、４
は真空排気装置、５は排気流量調節弁、６は台板、７は
真空吸引管、８は拡散ポンプ、９はロータリーポンプ、
１０はガス供給管、１１及び１２はガス流量計、１３は
反応ガスボンベ、１４は不活性ガスボンベ、１５はイン
ピーダンスマツチングトランス、１６はガス噴出管であ
る。FIG. 1 is a diagram showing a typical embodiment of the plasma processing apparatus of the present invention. In the figure, 1 is a vacuum container, 2 and 2' are electrodes, 3 is a film, and 4
is a vacuum exhaust device, 5 is an exhaust flow rate control valve, 6 is a base plate, 7 is a vacuum suction pipe, 8 is a diffusion pump, 9 is a rotary pump,
10 is a gas supply pipe, 11 and 12 are gas flowmeters, 13 is a reaction gas cylinder, 14 is an inert gas cylinder, 15 is an impedance matching transformer, and 16 is a gas ejection pipe.
Claims (2)
続する真空排気装置の間に排気流量調節弁を設けた構成
を特徴上するプラズマ処理装置。(1) A plasma processing apparatus characterized by a configuration in which an exhaust flow rate control valve is provided between a vacuum vessel containing a plasma generator and a vacuum exhaust apparatus connected to the vacuum vessel.
新案登録請求の範囲第１項記載のプラズマ処理装置。(2) The plasma processing apparatus according to claim 1, wherein the exhaust flow rate control valve is a pressure control valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP756184U JPS60120824U (en) | 1984-01-25 | 1984-01-25 | plasma processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP756184U JPS60120824U (en) | 1984-01-25 | 1984-01-25 | plasma processing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60120824U true JPS60120824U (en) | 1985-08-15 |
Family
ID=30486022
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP756184U Pending JPS60120824U (en) | 1984-01-25 | 1984-01-25 | plasma processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60120824U (en) |
-
1984
- 1984-01-25 JP JP756184U patent/JPS60120824U/en active Pending
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