JPS60119722A - 半導体露光装置用ウエハパタ−ン検出方法及びその装置 - Google Patents

半導体露光装置用ウエハパタ−ン検出方法及びその装置

Info

Publication number
JPS60119722A
JPS60119722A JP58225357A JP22535783A JPS60119722A JP S60119722 A JPS60119722 A JP S60119722A JP 58225357 A JP58225357 A JP 58225357A JP 22535783 A JP22535783 A JP 22535783A JP S60119722 A JPS60119722 A JP S60119722A
Authority
JP
Japan
Prior art keywords
scattered light
wafer
intensity
turn
detection signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58225357A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0430736B2 (enrdf_load_stackoverflow
Inventor
Toshihiko Nakada
中田　敏彦
Yoshisada Oshida
良忠 押田
Mitsuyoshi Koizumi
小泉　光義
Masataka Shiba
正孝 芝
Yukio Uto
幸雄 宇都
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58225357A priority Critical patent/JPS60119722A/ja
Publication of JPS60119722A publication Critical patent/JPS60119722A/ja
Publication of JPH0430736B2 publication Critical patent/JPH0430736B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58225357A 1983-12-01 1983-12-01 半導体露光装置用ウエハパタ−ン検出方法及びその装置 Granted JPS60119722A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58225357A JPS60119722A (ja) 1983-12-01 1983-12-01 半導体露光装置用ウエハパタ−ン検出方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58225357A JPS60119722A (ja) 1983-12-01 1983-12-01 半導体露光装置用ウエハパタ−ン検出方法及びその装置

Publications (2)

Publication Number Publication Date
JPS60119722A true JPS60119722A (ja) 1985-06-27
JPH0430736B2 JPH0430736B2 (enrdf_load_stackoverflow) 1992-05-22

Family

ID=16828071

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58225357A Granted JPS60119722A (ja) 1983-12-01 1983-12-01 半導体露光装置用ウエハパタ−ン検出方法及びその装置

Country Status (1)

Country Link
JP (1) JPS60119722A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62190724A (ja) * 1986-02-17 1987-08-20 Tokyo Electron Ltd 位置合せ方法
JPS6362251A (ja) * 1986-09-02 1988-03-18 Nikon Corp アライメント装置
WO2003094212A1 (fr) * 2002-05-01 2003-11-13 Sony Corporation Systeme d'alignement, procede d'alignement et procede de production pour dispositif semi-conducteur

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62190724A (ja) * 1986-02-17 1987-08-20 Tokyo Electron Ltd 位置合せ方法
JPS6362251A (ja) * 1986-09-02 1988-03-18 Nikon Corp アライメント装置
WO2003094212A1 (fr) * 2002-05-01 2003-11-13 Sony Corporation Systeme d'alignement, procede d'alignement et procede de production pour dispositif semi-conducteur

Also Published As

Publication number Publication date
JPH0430736B2 (enrdf_load_stackoverflow) 1992-05-22

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