JPS60116780A - 高硬度窒化ホウ素膜の製造方法 - Google Patents

高硬度窒化ホウ素膜の製造方法

Info

Publication number
JPS60116780A
JPS60116780A JP22498583A JP22498583A JPS60116780A JP S60116780 A JPS60116780 A JP S60116780A JP 22498583 A JP22498583 A JP 22498583A JP 22498583 A JP22498583 A JP 22498583A JP S60116780 A JPS60116780 A JP S60116780A
Authority
JP
Japan
Prior art keywords
boron nitride
cbn
containing gas
film
reaction chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22498583A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0524991B2 (enrdf_load_stackoverflow
Inventor
Koichi Yamaguchi
浩一 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP22498583A priority Critical patent/JPS60116780A/ja
Publication of JPS60116780A publication Critical patent/JPS60116780A/ja
Publication of JPH0524991B2 publication Critical patent/JPH0524991B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/342—Boron nitride

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP22498583A 1983-11-28 1983-11-28 高硬度窒化ホウ素膜の製造方法 Granted JPS60116780A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22498583A JPS60116780A (ja) 1983-11-28 1983-11-28 高硬度窒化ホウ素膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22498583A JPS60116780A (ja) 1983-11-28 1983-11-28 高硬度窒化ホウ素膜の製造方法

Publications (2)

Publication Number Publication Date
JPS60116780A true JPS60116780A (ja) 1985-06-24
JPH0524991B2 JPH0524991B2 (enrdf_load_stackoverflow) 1993-04-09

Family

ID=16822287

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22498583A Granted JPS60116780A (ja) 1983-11-28 1983-11-28 高硬度窒化ホウ素膜の製造方法

Country Status (1)

Country Link
JP (1) JPS60116780A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61174378A (ja) * 1985-01-28 1986-08-06 Toshiba Tungaloy Co Ltd 硬質窒化ホウ素被覆材料の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56155535A (en) * 1980-05-02 1981-12-01 Nippon Telegr & Teleph Corp <Ntt> Film forming device utilizing plasma
JPS57133636A (en) * 1981-02-13 1982-08-18 Nippon Telegr & Teleph Corp <Ntt> Film forming device utilizing plasma at low temperature

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56155535A (en) * 1980-05-02 1981-12-01 Nippon Telegr & Teleph Corp <Ntt> Film forming device utilizing plasma
JPS57133636A (en) * 1981-02-13 1982-08-18 Nippon Telegr & Teleph Corp <Ntt> Film forming device utilizing plasma at low temperature

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61174378A (ja) * 1985-01-28 1986-08-06 Toshiba Tungaloy Co Ltd 硬質窒化ホウ素被覆材料の製造方法

Also Published As

Publication number Publication date
JPH0524991B2 (enrdf_load_stackoverflow) 1993-04-09

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