JPS60116767A - 分子線蒸着装置 - Google Patents

分子線蒸着装置

Info

Publication number
JPS60116767A
JPS60116767A JP59240637A JP24063784A JPS60116767A JP S60116767 A JPS60116767 A JP S60116767A JP 59240637 A JP59240637 A JP 59240637A JP 24063784 A JP24063784 A JP 24063784A JP S60116767 A JPS60116767 A JP S60116767A
Authority
JP
Japan
Prior art keywords
vapor deposition
rod
molecular beam
deposition source
vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59240637A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0238559B2 (enExample
Inventor
Keisuke Kobayashi
啓介 小林
Yasuhiro Shiraki
靖寛 白木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59240637A priority Critical patent/JPS60116767A/ja
Publication of JPS60116767A publication Critical patent/JPS60116767A/ja
Publication of JPH0238559B2 publication Critical patent/JPH0238559B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP59240637A 1984-11-16 1984-11-16 分子線蒸着装置 Granted JPS60116767A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59240637A JPS60116767A (ja) 1984-11-16 1984-11-16 分子線蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59240637A JPS60116767A (ja) 1984-11-16 1984-11-16 分子線蒸着装置

Publications (2)

Publication Number Publication Date
JPS60116767A true JPS60116767A (ja) 1985-06-24
JPH0238559B2 JPH0238559B2 (enExample) 1990-08-30

Family

ID=17062458

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59240637A Granted JPS60116767A (ja) 1984-11-16 1984-11-16 分子線蒸着装置

Country Status (1)

Country Link
JP (1) JPS60116767A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007128898A (ja) * 2002-07-19 2007-05-24 Lg Electron Inc 有機電界発光膜蒸着用蒸着源

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007128898A (ja) * 2002-07-19 2007-05-24 Lg Electron Inc 有機電界発光膜蒸着用蒸着源

Also Published As

Publication number Publication date
JPH0238559B2 (enExample) 1990-08-30

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