JPS60116125A - 成膜方法 - Google Patents
成膜方法Info
- Publication number
- JPS60116125A JPS60116125A JP58223312A JP22331283A JPS60116125A JP S60116125 A JPS60116125 A JP S60116125A JP 58223312 A JP58223312 A JP 58223312A JP 22331283 A JP22331283 A JP 22331283A JP S60116125 A JPS60116125 A JP S60116125A
- Authority
- JP
- Japan
- Prior art keywords
- conductive substrate
- substrate
- electrode
- plasma
- film forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P14/24—
-
- H10P14/3411—
Landscapes
- Photovoltaic Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58223312A JPS60116125A (ja) | 1983-11-29 | 1983-11-29 | 成膜方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58223312A JPS60116125A (ja) | 1983-11-29 | 1983-11-29 | 成膜方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60116125A true JPS60116125A (ja) | 1985-06-22 |
| JPH0523050B2 JPH0523050B2 (enExample) | 1993-03-31 |
Family
ID=16796172
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58223312A Granted JPS60116125A (ja) | 1983-11-29 | 1983-11-29 | 成膜方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60116125A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4919077A (en) * | 1986-12-27 | 1990-04-24 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor producing apparatus |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56130466A (en) * | 1980-03-17 | 1981-10-13 | Canon Inc | Film forming method |
| JPS58158929A (ja) * | 1982-03-17 | 1983-09-21 | Kokusai Electric Co Ltd | プラズマ発生装置 |
| JPS58163434A (ja) * | 1982-03-25 | 1983-09-28 | Semiconductor Energy Lab Co Ltd | プラズマ気相反応方法 |
-
1983
- 1983-11-29 JP JP58223312A patent/JPS60116125A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56130466A (en) * | 1980-03-17 | 1981-10-13 | Canon Inc | Film forming method |
| JPS58158929A (ja) * | 1982-03-17 | 1983-09-21 | Kokusai Electric Co Ltd | プラズマ発生装置 |
| JPS58163434A (ja) * | 1982-03-25 | 1983-09-28 | Semiconductor Energy Lab Co Ltd | プラズマ気相反応方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4919077A (en) * | 1986-12-27 | 1990-04-24 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor producing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0523050B2 (enExample) | 1993-03-31 |
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