JPS60113631U - 電子ビーム露光装置 - Google Patents
電子ビーム露光装置Info
- Publication number
- JPS60113631U JPS60113631U JP18423384U JP18423384U JPS60113631U JP S60113631 U JPS60113631 U JP S60113631U JP 18423384 U JP18423384 U JP 18423384U JP 18423384 U JP18423384 U JP 18423384U JP S60113631 U JPS60113631 U JP S60113631U
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- resist layer
- chamber
- exposure
- exposure chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18423384U JPS60113631U (ja) | 1984-12-06 | 1984-12-06 | 電子ビーム露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18423384U JPS60113631U (ja) | 1984-12-06 | 1984-12-06 | 電子ビーム露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60113631U true JPS60113631U (ja) | 1985-08-01 |
| JPS6242533Y2 JPS6242533Y2 (https=) | 1987-10-31 |
Family
ID=30741718
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18423384U Granted JPS60113631U (ja) | 1984-12-06 | 1984-12-06 | 電子ビーム露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60113631U (https=) |
-
1984
- 1984-12-06 JP JP18423384U patent/JPS60113631U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6242533Y2 (https=) | 1987-10-31 |
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