JPS60109074A - Magnetic head slider and its manufacture - Google Patents
Magnetic head slider and its manufactureInfo
- Publication number
- JPS60109074A JPS60109074A JP21730983A JP21730983A JPS60109074A JP S60109074 A JPS60109074 A JP S60109074A JP 21730983 A JP21730983 A JP 21730983A JP 21730983 A JP21730983 A JP 21730983A JP S60109074 A JPS60109074 A JP S60109074A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic head
- pores
- slider
- lubricant
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000000314 lubricant Substances 0.000 claims abstract description 22
- 239000011148 porous material Substances 0.000 claims abstract description 22
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 5
- 239000011737 fluorine Substances 0.000 claims abstract description 5
- 239000002245 particle Substances 0.000 claims description 22
- 238000005530 etching Methods 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 238000010884 ion-beam technique Methods 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 230000005260 alpha ray Effects 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 8
- -1 fluorosilicone Substances 0.000 abstract description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract description 4
- 239000003921 oil Substances 0.000 abstract description 3
- 239000010687 lubricating oil Substances 0.000 abstract description 2
- 238000005461 lubrication Methods 0.000 abstract description 2
- 229910000859 α-Fe Inorganic materials 0.000 description 6
- 239000011162 core material Substances 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- 229920000570 polyether Polymers 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- ZTSDOGSKTICNPQ-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,13,13,14,14,15,15,16,16,17,17,18,18,18-pentatriacontafluorooctadecanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZTSDOGSKTICNPQ-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910018605 Ni—Zn Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/10—Structure or manufacture of housings or shields for heads
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/50—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges
- G11B23/505—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges of disk carriers
- G11B23/507—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges of disk carriers combined with means for reducing influence of physical parameters, e.g. temperature change, moisture
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
- G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
Abstract
Description
【発明の詳細な説明】
本発明は磁気ディスク装置又は磁気ドラム装置等の磁気
記憶装置に用いられる磁気ヘットスライダーおよびその
製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic head slider used in a magnetic storage device such as a magnetic disk device or a magnetic drum device, and a method for manufacturing the same.
高密度磁気ディスク装置の高密度化をはかる為には磁気
へ、ドと磁気ディスクとの間隔（以下スペーシングと呼
ぶ）を小さくする必要がある。近年、スペーシングを小
さくする方法として、浮揚面積の小さい磁気ヘッドを使
用した接触始動・停止（以下Ｃ８Ｓと呼ぶ）型の磁気テ
ィスフ装置が用いられており、そこで使用される磁気ヘ
ノトスライターの母材料はＮｉ−Ｚｎフェライト又は詣
−Ｚｎフェライト又はＡｆｆ１２（Ｊ、−１’ ｉ Ｃ
など高硬度材料が用いられており、多数回のＣ８Ｓの繰
り返しによって磁気ディスクに傷をつけ、記憶データの
損失を招くことがしばしば生じる。In order to increase the density of a high-density magnetic disk device, it is necessary to reduce the distance between the magnetic disk and the magnetic disk (hereinafter referred to as spacing). In recent years, as a method to reduce spacing, a contact start/stop (hereinafter referred to as C8S) type magnetic tisf device using a magnetic head with a small floating area has been used, and the mother of the magnetic henotos lighters used there. The material is Ni-Zn ferrite or Zn-Zn ferrite or Aff12(J, -1' i C
High hardness materials are used, and repeating C8S many times often damages the magnetic disk, resulting in loss of stored data.
本発明の目的は、上記欠点を除去し７％磁気ディスクと
の組合せにおいて機械的に十分安定した磁気へ、トスラ
イダーおよびその製造方法を提供することにある。An object of the present invention is to eliminate the above-mentioned drawbacks and to provide a magnetically stable slider and a method for manufacturing the same that are mechanically sufficiently stable in combination with a 7% magnetic disk.
本発明による磁気ヘッドスライダ−はスライダー−中に
微細な孔を有し、該細孔中に潤滑剤を含むことを特徴と
している。The magnetic head slider according to the present invention is characterized in that it has fine pores in the slider and contains a lubricant in the pores.
次に図面を参照して本発明の詳細な説明する。Next, the present invention will be described in detail with reference to the drawings.
第１図は本発明の磁気ヘッドスライダ−の製造工程を示
す磁気へッドスラ、イダー母材からスライダー６の形状
に切り出し、摺動面８に粒子線７を照射する。その後化
学エツチングにより粒子線の当った部分を選択曲にエツ
チングし、細孔を作る。FIG. 1 shows the manufacturing process of a magnetic head slider according to the present invention. A magnetic head slider is cut into the shape of a slider 6 from a base material, and a sliding surface 8 is irradiated with a particle beam 7. Then, by chemical etching, the areas hit by the particle beam are etched into the selected song, creating pores.
十分な洗浄、乾燥の後、細孔中に潤滑剤を含浸させる。After sufficient cleaning and drying, lubricant is impregnated into the pores.
第２図は上記製造工程により作られた磁気ヘッドスライ
ダ−の断面図及び磁気記憶体の関係を示す。磁気ヘッド
スライダ−２は細孔４が開けられており、細孔中及びス
ライダ表面に潤滑剤３が存在し、磁気記憶体ｌとの相対
運動に際し、潤滑剤切れのない良好な潤滑特性を有する
。５はヘッドの記録再生用のエレメントである。FIG. 2 shows a sectional view of the magnetic head slider manufactured by the above manufacturing process and the relationship between the magnetic storage bodies. The magnetic head slider 2 has pores 4, and a lubricant 3 exists in the pores and on the slider surface, and has good lubrication properties without running out of the lubricant during relative movement with the magnetic storage element 1. . 5 is a recording/reproducing element of the head.
細孔４は孔径０．０５〜５μｍにわたり、磁気ヘッドス
ライダ−の磁気ディスクとの摺動面に形成され、とくに
線面にほぼ垂直方向に形成される構造が望ましく、該細
孔中に含まれる潤滑剤は種々の潤滑油あるい・は潤滑グ
リースあるいは固体潤滑剤である。The pores 4 have a diameter of 0.05 to 5 μm and are formed on the sliding surface of the magnetic head slider against the magnetic disk, and are preferably formed in a direction substantially perpendicular to the linear surface, and are contained in the pores. The lubricant may be various lubricating oils or lubricating greases or solid lubricants.
すなわち、シリコーンオイル、パーフロロアルキルポリ
エーテル、ふっ素オイル、フロロシリコーン、ポリテト
ラフロロエチレンテロマー、脂肪族炭化水素、ふっ素化
脂肪族炭化水素、ポリテトラフロロエチレン等を用いる
ことが出来る。特にふっ素を含む潤滑剤は表面エネルギ
ーが小さいため容易に細孔の中に入り込み、また必要な
時に外に出てきて磁気ヘッドと磁気ディスクの潤滑作用
を示す。That is, silicone oil, perfluoroalkyl polyether, fluorine oil, fluorosilicone, polytetrafluoroethylene telomer, aliphatic hydrocarbon, fluorinated aliphatic hydrocarbon, polytetrafluoroethylene, etc. can be used. In particular, fluorine-containing lubricants have low surface energy, so they easily enter the pores and come out when necessary, lubricating the magnetic head and magnetic disk.
また本発明による磁気へラドコアの製造方法はＭｎ −
Ｚｎフェライト、ＮＩ Ｚｎフェライト、Ｍ２す。Furthermore, the method for manufacturing a magnetic helad core according to the present invention is based on Mn −
Zn ferrite, NI Zn ferrite, M2.
−Ｔｉｅなどの磁気ヘッドスライダーに粒子線を照射し
たのち、エツチング液中に浸漬して化学エツチングによ
り粒子線の通過個所を溶解し、０．０５〜０．５μｍ
程度の微細な穴をあけ、該スライダーを潤滑剤中に浸漬
して該細孔中に潤滑剤を含ませることを特徴としている
。- After irradiating a magnetic head slider such as Tie with a particle beam, it is immersed in an etching solution and the area where the particle beam passes is dissolved by chemical etching.
The slider is immersed in a lubricant so that the lubricant is contained in the pores.
ここで用いられる粒子線はα線１重粒子線、イオン線、
中性子線などの粒子ビームである。The particle beams used here are α-ray single particle beam, ion beam,
It is a particle beam such as a neutron beam.
イオン線は例えば１″’Ｘｅ 、 Ａｒ 、 Ｋｒ 、
Ｒｎ などの重イオンを用いることが出来る。Ion beams include, for example, 1''Xe, Ar, Kr,
Heavy ions such as Rn can be used.
粒子線のエネルギーは１粒子当り１００ ＫｅＶ〜１０
Ｍｅｖカ用いられ、粒子密度はｌ ｃｍ”当り１０６〜
１０′３程度である。The energy of the particle beam is 100 KeV to 10 per particle.
Mev was used, and the particle density was 106 to 1 cm”.
It is about 10'3.
以下実施例により本発明の詳細な説明する。The present invention will be explained in detail below with reference to Examples.
実施例１
スライダー母材としてＭｎ −Ｚｎフェライトを用意し
、該母材から切出したスライダーに１ＱＱＫｅＶの中性
子線を照射線密度１０’個／ｅｒｒ！で照射した後、゛
エツチング液として希塩酸中に該スライダーを浸漬し、
０．２μ７７′Ｚ 程度の細孔を有するヘッドスライダ
−を作製し、十分洗浄、乾燥した後パーフロロアルキル
ポリエーテル油中に浸漬して、該ポリエーテルを細孔中
に十分含浸させたのち、該ヘッドコアを支持バネに取り
付けて磁気ヘッドを作った。Example 1 Mn-Zn ferrite was prepared as a slider base material, and a slider cut from the base material was irradiated with a 1QQKeV neutron beam at a radiation density of 10'/err! After irradiating the slider with dilute hydrochloric acid as an etching solution,
A head slider having pores of about 0.2μ77'Z was prepared, thoroughly washed and dried, and then immersed in perfluoroalkyl polyether oil to sufficiently impregnate the pores with the polyether. A magnetic head was made by attaching the head core to a support spring.
実施例２
実施例１と同様にして、但しスライダー母材としてＮＩ
Ｚｎフェライトを用いて磁気ヘッドを作った。Example 2 Same as Example 1, except that NI was used as the slider base material.
A magnetic head was made using Zn ferrite.
実施例３
実施例１と同様にして、但しスライダー母材としてｌ’
−１３２０３−Ｔ ｉ Ｃを用い、さらにエツチング液
としてＨＮＯ３とＨＦの混合液を用いて１庭気ヘツドを
作った。Example 3 Same as Example 1, except that l' was used as the slider base material.
A chemical head was prepared using -13203-T i C and a mixed solution of HNO3 and HF as an etching solution.
実施例４
実施例３（！：同様にして、但しエツチング液としてＫ
ＯＨ融液を用い−Ｃｆ磁気ヘッドを作った。Example 4 Example 3 (!: Same as above, except that K was used as the etching solution.
A -Cf magnetic head was made using an OH melt.
実施例５
実施例３と同様にして、但し粒子線としてα線を用いて
（磁気ヘッドを作った。エネルギーはＩＭｅＶ。Example 5 A magnetic head was made in the same manner as in Example 3, except that alpha rays were used as the particle beam (the energy was IMeV).
照射線密度は１０１１個／ｃＩｒＬ２である。The irradiation density was 1011 particles/cIrL2.
実施例６
実施例３と同様にして、但し粒子線としてエネルギー１
０ＭｅＶ、照射線密度１０６個／ＣｒＩＬ２の重粒子線
を用いて磁気ヘッドを作った。Example 6 Same as Example 3, except that the particle beam had an energy of 1
A magnetic head was fabricated using a heavy particle beam of 0 MeV and irradiation density of 106 particles/CrIL2.
実施例７
実施例３と同様１こして、但し潤滑剤としてポリテトラ
フロロエチレンテロマーのＭ液（３００９Ｃ）中に細孔
を有するコア材を浸漬して該潤滑剤を含浸さぜ磁気ヘッ
ドを作った。Example 7 A magnetic head was made in the same manner as in Example 3, except that a core material having pores was immersed in liquid M (3009C) of polytetrafluoroethylene telomer as a lubricant to impregnate it with the lubricant. Ta.
実施例８
実施例７と同様にして、但し粒子線としてエネルギー１
．４． ＭｅＶ 、照射線密度３ＸＩＯ’個／ｃｆＩＬ
２のＸｅイオンを用いて磁気ヘッドを作った。Example 8 Same as Example 7, except that the energy of the particle beam was 1.
．． 4. MeV, radiation density 3XIO'/cfIL
A magnetic head was made using Xe ions of No. 2.
実施例９
実施例３と同様にして、但し粒子線としてエネルギー７
２０Ｋｅｖ、照射線密度３Ｘ１０”個／ｃｍ’のＡｒイ
オンを用いて磁気ヘッドを作った。Example 9 Same as Example 3, except that the particle beam had an energy of 7
A magnetic head was made using Ar ions of 20 Kev and irradiation density of 3 x 10''pieces/cm'.
実施例１０
実施例３と同様にして、但し粒子線としてエネルギー７
２０１（ｅＶ 、照射細密ｖ７ ＸＩＯ”個／ｃｍ２ｃ
７） Ｋｒイオンを用いて磁気ヘッドを作った。Example 10 Same as Example 3, except that the particle beam had an energy of 7
201 (eV, irradiation precision v7 XIO” pieces/cm2c
7) A magnetic head was made using Kr ions.
実施例１１
実施例３と同様にして、但し潤滑剤としてパーフロロオ
クタデカン酸の融液中に、ｔｌｌ孔を有するコアを浸漬
し、該潤滑剤を含浸させて磁気ヘッドを作った。Example 11 A magnetic head was fabricated in the same manner as in Example 3, except that a core having TLL holes was immersed in a melt of perfluorooctadecanoic acid as a lubricant and impregnated with the lubricant.
以上、実施例１〜１１の磁気ヘッドをＣｏを主体とする
金ｔＵｉＢ性薄膜（Ｃｏ−Ｃｒ 、 Ｃｏ −Ｎｉ −
Ｐ 。As described above, the magnetic heads of Examples 1 to 11 were manufactured using gold-tUiB thin films mainly composed of Co (Co-Cr, Co-Ni-
P.
Ｃｏ−ＰＬ等）が被覆された磁気ディスクに接触、摺動
ぎせＣ８Ｓ試験を行なった吉どろ、細孔のないすなわち
潤ｍ剤を含まない磁気ヘッドは数回から数１０回のＣｓ
Ｓ繰り返しｔこおいて磁気ディスク表面即ちＣｏを主体
とする金属磁性薄膜表面に傷が生じたが、実施例１〜１
１の磁気ヘッドとのｌｌ−１１合せｔこおいては１，０
００回のＣＳ Ｓ繰り返しにおいても磁気ティスフ表面
に傷は生じなかった。A magnetic head without pores, that is, without a lubricant, can be subjected to a C8S test by contacting and sliding C8S on a magnetic disk coated with Co-PL, etc.).
After repeating S, scratches occurred on the magnetic disk surface, that is, the surface of the metal magnetic thin film mainly made of Co, but Examples 1 to 1
In this case, 1,0
Even after repeating CSS 00 times, no scratches occurred on the surface of the magnetic tissue.
なお、情（弔を読み町きするための素子がヘッドコア後
部に付いているが、エツチングの際、素子をレジス］・
により保ぬ（７た為、素子へのエツチングの影響はなか
った。In addition, an element for reading the condolence is attached to the rear of the head core, but when etching, remove the element from the register.
Therefore, there was no effect of etching on the element.
以上、本発明の磁気ヘッドを用いた磁気ディスク装置を
まイ菖幀性を非常に旨めることができる。なお１本発明
の磁気ヘッドは磁気ディスク装置のみでなく、磁気テー
プ装置にも使用出来ることば明らかである。As described above, the performance of a magnetic disk device using the magnetic head of the present invention can be greatly improved. It is clear that the magnetic head of the present invention can be used not only for magnetic disk drives but also for magnetic tape drives.
第１図は不発明の実施例の磁気へラドスライダの製造方
法を説明する図、
第２図は本発明の実ｂ（（４例の磁気へ、トスライダー
及び磁気記憶体の断面図。FIG. 1 is a diagram illustrating a method of manufacturing a magnetic slider according to an embodiment of the present invention, and FIG. 2 is a cross-sectional view of a magnetic slider and a magnetic storage body according to four embodiments of the present invention.
Claims (5)
細孔中に潤滑剤を含有させたことを特徴とする磁気ヘッ
ドスライダ−６(1) A magnetic head slider 6 characterized in that the sliding surface of the magnetic head slider has pores and a lubricant is contained in the pores.
囲第１項記載の磁気ヘッドスライター。(2) The magnetic head slighter according to claim 1, wherein the lubricant is a lubricant containing fluorine.
たのら、エツチングζこより微細な孔を形成し、該細孔
に潤滑剤を含ませることを特徴吉する磁気ヘッドスライ
ターの製造方法。(3) Manufacture of a magnetic head slider characterized by irradiating the sliding surface of a magnetic/rad slider with a particle beam, forming finer pores through etching, and impregnating the pores with a lubricant. Method.
載の（Ｉ８気ヘッドスライダ−の製造方法。(4) A method for manufacturing an I8 head slider according to claim 3, wherein the particle beam is a neutron beam.
である時♂「請求の範囲第３項記載の磁気ヘノトスライ
ターの製造方法。(5) When the particle beam is an α-ray, a heavy particle beam, or an ion beam: ♂ ``The method for manufacturing a magnetic henototh lighter according to claim 3.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58217309A JPH0752566B2 (en) | 1983-11-18 | 1983-11-18 | Method of manufacturing magnetic head slider |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58217309A JPH0752566B2 (en) | 1983-11-18 | 1983-11-18 | Method of manufacturing magnetic head slider |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60109074A true JPS60109074A (en) | 1985-06-14 |
| JPH0752566B2 JPH0752566B2 (en) | 1995-06-05 |
Family
ID=16702129
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58217309A Expired - Lifetime JPH0752566B2 (en) | 1983-11-18 | 1983-11-18 | Method of manufacturing magnetic head slider |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0752566B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6329023B2 (en) | 1997-05-30 | 2001-12-11 | Hitachi, Ltd. | Process for producing a magnetic head slider |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55139625A (en) * | 1979-04-16 | 1980-10-31 | Fujitsu Ltd | Ferrite head for magnetic disk |
| JPS5647956A (en) * | 1979-08-08 | 1981-04-30 | Hitachi Ltd | Magnetic head |
| JPS56130924A (en) * | 1980-03-17 | 1981-10-14 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
| JPS59177930A (en) * | 1983-03-29 | 1984-10-08 | Oki Electric Ind Co Ltd | Pattern formation of semiconductor device |
-
1983
- 1983-11-18 JP JP58217309A patent/JPH0752566B2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55139625A (en) * | 1979-04-16 | 1980-10-31 | Fujitsu Ltd | Ferrite head for magnetic disk |
| JPS5647956A (en) * | 1979-08-08 | 1981-04-30 | Hitachi Ltd | Magnetic head |
| JPS56130924A (en) * | 1980-03-17 | 1981-10-14 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
| JPS59177930A (en) * | 1983-03-29 | 1984-10-08 | Oki Electric Ind Co Ltd | Pattern formation of semiconductor device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6329023B2 (en) | 1997-05-30 | 2001-12-11 | Hitachi, Ltd. | Process for producing a magnetic head slider |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0752566B2 (en) | 1995-06-05 |
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