JPS60104840U - photo mask - Google Patents

photo mask

Info

Publication number
JPS60104840U
JPS60104840U JP1983198368U JP19836883U JPS60104840U JP S60104840 U JPS60104840 U JP S60104840U JP 1983198368 U JP1983198368 U JP 1983198368U JP 19836883 U JP19836883 U JP 19836883U JP S60104840 U JPS60104840 U JP S60104840U
Authority
JP
Japan
Prior art keywords
photo mask
reticle
thin film
high transmittance
utility
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1983198368U
Other languages
Japanese (ja)
Inventor
宏 橋本
有井 勝之
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP1983198368U priority Critical patent/JPS60104840U/en
Publication of JPS60104840U publication Critical patent/JPS60104840U/en
Pending legal-status Critical Current

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  • Surface Treatment Of Optical Elements (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、従来のレチクルを用いた縮小投影露光装置の
光学系の模式的概略構成図、第2図は本考案の一実施例
のレチクルの模式的断面図、第3図は該レチクルを用い
た縮小投影露光装置の光学系の模式的概略構成図である
。 図において、11はレチクル、12はガラス基板、13
はクロム薄膜よりなる所望パターン、14はレチクル1
1の両面に設けられた所望膜厚の   。 高い透過率を有する膜を示す。
FIG. 1 is a schematic diagram of the optical system of a reduction projection exposure apparatus using a conventional reticle, FIG. 2 is a schematic cross-sectional view of a reticle according to an embodiment of the present invention, and FIG. 3 is a diagram illustrating the reticle. FIG. 2 is a schematic diagram of the optical system of the reduction projection exposure apparatus used. In the figure, 11 is a reticle, 12 is a glass substrate, and 13 is a reticle.
14 is a desired pattern made of a chromium thin film, and 14 is a reticle 1.
1 with a desired film thickness on both sides. Indicates a membrane with high transmittance.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 遮光パターンが形成された透明基板面の高い透過率を*
本る膜が設けられていることを特徴とするフォトマスク
High transmittance of transparent substrate surface with light-shielding pattern formed*
A photomask characterized by being provided with a thin film.
JP1983198368U 1983-12-22 1983-12-22 photo mask Pending JPS60104840U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1983198368U JPS60104840U (en) 1983-12-22 1983-12-22 photo mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1983198368U JPS60104840U (en) 1983-12-22 1983-12-22 photo mask

Publications (1)

Publication Number Publication Date
JPS60104840U true JPS60104840U (en) 1985-07-17

Family

ID=30757299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1983198368U Pending JPS60104840U (en) 1983-12-22 1983-12-22 photo mask

Country Status (1)

Country Link
JP (1) JPS60104840U (en)

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