JPS60125640U

JPS60125640U - photo mask

Info

Publication number: JPS60125640U
Application number: JP1984012031U
Authority: JP
Inventors: 加賀谷　健一
Original assignee: ホ−ヤ株式会社
Priority date: 1984-01-31
Filing date: 1984-01-31
Publication date: 1985-08-24

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Brief explanation of the drawing]

第１図は従来のフォトマスクブランクを示す断面図、第
２図は従来のフォトマスクの製造工程を示す断面図、第
３図は従来のフォトマスクを示す斜視図、第４図及び第
５図はそれぞれ本考案の素となるフォトマスクブランク
及び本考案のフォトマスクを示す断面図、並びに第６図
は本考案によるフォトマスクのパターン欠落密度と度数
分布の関係を示す図である。１・・・・・・石英ガラス基板、１５・・・・・・炭素
を含有すルクロム膜パターン、１６・・・・・・クロム
膜パターン、１７・・・・・・フォトマスク。補正　昭５９．６．１８考案の名称を次のように補正する。 ■考案の名称　　フォトマスク実用新案登録請求の範囲、図面の簡単な説明を次のよう
に補正する。Ｏ実用新案登録請求の範囲透明基板上に２層以上被着した遮光性膜を選択的にパタ
ーン化したフォトマスクにおいて、前記透明基板は石英
ガラス基板であり、かつ第１層は、膜厚５０〜３００八
であって、炭素を含むクロム膜であることを特徴とする
フォトマスク。図面の簡単な説明第１図は従来のフォトマスクブランクを示す新劇面図、第２図は従来のフォトマスクの製造工程を示す断
面図、第３図は従来のフォトマスクを示す斜視図ミ第４
図及び第５図はそれぞれ本考案の素となるフォトマスク
ブランク及び本考案のフォトマスクを示す断面図、並び
に第６図は本考案にょ゛るフォトマスクのパターン欠落
密度と度数分布の関係を示す図である。１・・・・・・石英ガラス基板、１５・・・・・・炭素
を含有すルクロム膜パターン、１６・・川・クロム膜パ
ターン、１７・・・・・・フォトマスク。Fig. 1 is a sectional view showing a conventional photomask blank, Fig. 2 is a sectional view showing the manufacturing process of a conventional photomask, Fig. 3 is a perspective view showing a conventional photomask, and Figs. 4 and 5. 6 are cross-sectional views showing a photomask blank, which is the basis of the present invention, and a photomask of the present invention, respectively, and FIG. 6 is a diagram showing the relationship between pattern loss density and frequency distribution of the photomask according to the present invention. DESCRIPTION OF SYMBOLS 1... Quartz glass substrate, 15... Carbon-containing chromium film pattern, 16... Chrome film pattern, 17... Photomask. Amendment June 18, 1982 The name of the invention is amended as follows. ■Name of the invention The scope of the claims for photomask utility model registration and the brief description of the drawings are amended as follows. O Utility Model Registration Claims A photomask in which two or more light-shielding films deposited on a transparent substrate are selectively patterned, wherein the transparent substrate is a quartz glass substrate, and the first layer has a film thickness of 50 mm. ~3008, and is a chromium film containing carbon. Brief Description of the Drawings Figure 1 is a front view showing a conventional photomask blank, Figure 2 is a sectional view showing the manufacturing process of a conventional photomask, and Figure 3 is a perspective view showing a conventional photomask. 4
5 and 5 are cross-sectional views showing a photomask blank and a photomask according to the present invention, respectively, and FIG. 6 shows the relationship between pattern loss density and frequency distribution of the photomask according to the present invention. It is a diagram. 1... Quartz glass substrate, 15... Carbon-containing chromium film pattern, 16... River chromium film pattern, 17... Photomask.

Claims

[Scope of utility model registration request]

A photomask in which two or more light-shielding films deposited on a transparent substrate are selectively patterned, wherein the transparent substrate is a quartz glass substrate, and the first layer has a film thickness of 50 to 300 mm, A photomask characterized by being a chromium film containing carbon.