JPS60104248A - 化学銅めつき液中のキレ−ト剤濃度測定法 - Google Patents

化学銅めつき液中のキレ−ト剤濃度測定法

Info

Publication number
JPS60104248A
JPS60104248A JP59137118A JP13711884A JPS60104248A JP S60104248 A JPS60104248 A JP S60104248A JP 59137118 A JP59137118 A JP 59137118A JP 13711884 A JP13711884 A JP 13711884A JP S60104248 A JPS60104248 A JP S60104248A
Authority
JP
Japan
Prior art keywords
concentration
chelating agent
copper
plating solution
chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59137118A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6143660B2 (enrdf_load_stackoverflow
Inventor
Hitoshi Oka
岡　齊
Kenji Nakamura
健二 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59137118A priority Critical patent/JPS60104248A/ja
Publication of JPS60104248A publication Critical patent/JPS60104248A/ja
Publication of JPS6143660B2 publication Critical patent/JPS6143660B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N31/00—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods
    • G01N31/16—Investigating or analysing non-biological materials by the use of the chemical methods specified in the subgroup; Apparatus specially adapted for such methods using titration
    • G01N31/162—Determining the equivalent point by means of a discontinuity
    • G01N31/164—Determining the equivalent point by means of a discontinuity by electrical or electrochemical means

Landscapes

  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Molecular Biology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemically Coating (AREA)
JP59137118A 1984-07-04 1984-07-04 化学銅めつき液中のキレ−ト剤濃度測定法 Granted JPS60104248A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59137118A JPS60104248A (ja) 1984-07-04 1984-07-04 化学銅めつき液中のキレ−ト剤濃度測定法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59137118A JPS60104248A (ja) 1984-07-04 1984-07-04 化学銅めつき液中のキレ−ト剤濃度測定法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP6333777A Division JPS53149389A (en) 1977-06-01 1977-06-01 Measurement method of copper ions and chelating agent concentration in chemical copper plating solution

Publications (2)

Publication Number Publication Date
JPS60104248A true JPS60104248A (ja) 1985-06-08
JPS6143660B2 JPS6143660B2 (enrdf_load_stackoverflow) 1986-09-29

Family

ID=15191243

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59137118A Granted JPS60104248A (ja) 1984-07-04 1984-07-04 化学銅めつき液中のキレ−ト剤濃度測定法

Country Status (1)

Country Link
JP (1) JPS60104248A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007517186A (ja) * 2003-06-13 2007-06-28 シャーリット，ユージン 無電解めっき浴における錯化剤濃度の測定
US8118988B2 (en) * 2008-01-31 2012-02-21 Eci Technology, Inc. Analysis of copper ion and complexing agent in copper plating baths
JP2017122650A (ja) * 2016-01-07 2017-07-13 株式会社ニイタカ キレート剤の定量方法
CN107202831A (zh) * 2017-06-05 2017-09-26 深圳市华星光电技术有限公司 一种铜酸刻蚀液中铜离子浓度的测定方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101924107B1 (ko) * 2017-04-07 2018-11-30 금호타이어 주식회사 반 공기입 타이어

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007517186A (ja) * 2003-06-13 2007-06-28 シャーリット，ユージン 無電解めっき浴における錯化剤濃度の測定
EP1634069B1 (en) * 2003-06-13 2008-11-19 Eugene Shalyt Measurement of complexing agent concentration in an electroless plating bath
US8118988B2 (en) * 2008-01-31 2012-02-21 Eci Technology, Inc. Analysis of copper ion and complexing agent in copper plating baths
JP2017122650A (ja) * 2016-01-07 2017-07-13 株式会社ニイタカ キレート剤の定量方法
CN107202831A (zh) * 2017-06-05 2017-09-26 深圳市华星光电技术有限公司 一种铜酸刻蚀液中铜离子浓度的测定方法

Also Published As

Publication number Publication date
JPS6143660B2 (enrdf_load_stackoverflow) 1986-09-29

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