JPS60103345A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物

Info

Publication number
JPS60103345A
JPS60103345A JP21226083A JP21226083A JPS60103345A JP S60103345 A JPS60103345 A JP S60103345A JP 21226083 A JP21226083 A JP 21226083A JP 21226083 A JP21226083 A JP 21226083A JP S60103345 A JPS60103345 A JP S60103345A
Authority
JP
Japan
Prior art keywords
compound
photosensitive resin
resin composition
epoxy
ethyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21226083A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0332780B2 (cg-RX-API-DMAC7.html
Inventor
Kunio Yanagisawa
柳沢　邦夫
Yasuhiko Araki
泰彦 荒木
Hajime Shiyouhi
初 松扉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP21226083A priority Critical patent/JPS60103345A/ja
Publication of JPS60103345A publication Critical patent/JPS60103345A/ja
Publication of JPH0332780B2 publication Critical patent/JPH0332780B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP21226083A 1983-11-10 1983-11-10 感光性樹脂組成物 Granted JPS60103345A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21226083A JPS60103345A (ja) 1983-11-10 1983-11-10 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21226083A JPS60103345A (ja) 1983-11-10 1983-11-10 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS60103345A true JPS60103345A (ja) 1985-06-07
JPH0332780B2 JPH0332780B2 (cg-RX-API-DMAC7.html) 1991-05-14

Family

ID=16619627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21226083A Granted JPS60103345A (ja) 1983-11-10 1983-11-10 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS60103345A (cg-RX-API-DMAC7.html)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS509035A (cg-RX-API-DMAC7.html) * 1973-05-31 1975-01-30
JPS5243092A (en) * 1975-10-01 1977-04-04 Hitachi Ltd Nuclear reactor
JPS5550050A (en) * 1978-10-07 1980-04-11 Daikin Ind Ltd Blend composition for coclosslinking of new fluoroelastomer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS509035A (cg-RX-API-DMAC7.html) * 1973-05-31 1975-01-30
JPS5243092A (en) * 1975-10-01 1977-04-04 Hitachi Ltd Nuclear reactor
JPS5550050A (en) * 1978-10-07 1980-04-11 Daikin Ind Ltd Blend composition for coclosslinking of new fluoroelastomer

Also Published As

Publication number Publication date
JPH0332780B2 (cg-RX-API-DMAC7.html) 1991-05-14

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