JPS60102739A - ステップアンドリピート露光装置 - Google Patents

ステップアンドリピート露光装置

Info

Publication number
JPS60102739A
JPS60102739A JP58209941A JP20994183A JPS60102739A JP S60102739 A JPS60102739 A JP S60102739A JP 58209941 A JP58209941 A JP 58209941A JP 20994183 A JP20994183 A JP 20994183A JP S60102739 A JPS60102739 A JP S60102739A
Authority
JP
Japan
Prior art keywords
alignment
shot
mark
wafer
marks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58209941A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6349370B2 (enExample
Inventor
Naoki Ayada
綾田　直樹
Tadashi Konuki
小貫　忠
Masao Kosugi
小杉　雅夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58209941A priority Critical patent/JPS60102739A/ja
Priority to GB08418927A priority patent/GB2146427B/en
Priority to DE19843428225 priority patent/DE3428225A1/de
Publication of JPS60102739A publication Critical patent/JPS60102739A/ja
Priority to US07/008,134 priority patent/US4719357A/en
Publication of JPS6349370B2 publication Critical patent/JPS6349370B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7069—Alignment mark illumination, e.g. darkfield, dual focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58209941A 1983-08-01 1983-11-10 ステップアンドリピート露光装置 Granted JPS60102739A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58209941A JPS60102739A (ja) 1983-11-10 1983-11-10 ステップアンドリピート露光装置
GB08418927A GB2146427B (en) 1983-08-01 1984-07-25 Semiconductor manufacture
DE19843428225 DE3428225A1 (de) 1983-08-01 1984-07-31 Geraet zur herstellung von halbleiterschaltungen
US07/008,134 US4719357A (en) 1983-08-01 1987-01-22 Semiconductor circuit manufacturing apparatus having selectively operable detectors for effecting automatic alignment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58209941A JPS60102739A (ja) 1983-11-10 1983-11-10 ステップアンドリピート露光装置

Publications (2)

Publication Number Publication Date
JPS60102739A true JPS60102739A (ja) 1985-06-06
JPS6349370B2 JPS6349370B2 (enExample) 1988-10-04

Family

ID=16581194

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58209941A Granted JPS60102739A (ja) 1983-08-01 1983-11-10 ステップアンドリピート露光装置

Country Status (1)

Country Link
JP (1) JPS60102739A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190334A (ja) * 1987-02-02 1988-08-05 Canon Inc 投影露光方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53132271A (en) * 1977-04-20 1978-11-17 Thomson Csf Thin semiconductor plate* method of positioning pattern projected to said plate in projector* and projector
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53132271A (en) * 1977-04-20 1978-11-17 Thomson Csf Thin semiconductor plate* method of positioning pattern projected to said plate in projector* and projector
JPS5541739A (en) * 1978-09-20 1980-03-24 Hitachi Ltd Micro-projection type mask alignment device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190334A (ja) * 1987-02-02 1988-08-05 Canon Inc 投影露光方法

Also Published As

Publication number Publication date
JPS6349370B2 (enExample) 1988-10-04

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