JPS5999715A - 真空中試料加熱装置 - Google Patents

真空中試料加熱装置

Info

Publication number
JPS5999715A
JPS5999715A JP20770782A JP20770782A JPS5999715A JP S5999715 A JPS5999715 A JP S5999715A JP 20770782 A JP20770782 A JP 20770782A JP 20770782 A JP20770782 A JP 20770782A JP S5999715 A JPS5999715 A JP S5999715A
Authority
JP
Japan
Prior art keywords
sapphire
heat
heating
plate
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20770782A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0443410B2 (enrdf_load_stackoverflow
Inventor
Yuichi Mikata
見方　裕一
Tomoyasu Inoue
井上　知泰
Masaharu Watanabe
正晴 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP20770782A priority Critical patent/JPS5999715A/ja
Publication of JPS5999715A publication Critical patent/JPS5999715A/ja
Publication of JPH0443410B2 publication Critical patent/JPH0443410B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/0242—Crystalline insulating materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP20770782A 1982-11-29 1982-11-29 真空中試料加熱装置 Granted JPS5999715A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20770782A JPS5999715A (ja) 1982-11-29 1982-11-29 真空中試料加熱装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20770782A JPS5999715A (ja) 1982-11-29 1982-11-29 真空中試料加熱装置

Publications (2)

Publication Number Publication Date
JPS5999715A true JPS5999715A (ja) 1984-06-08
JPH0443410B2 JPH0443410B2 (enrdf_load_stackoverflow) 1992-07-16

Family

ID=16544228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20770782A Granted JPS5999715A (ja) 1982-11-29 1982-11-29 真空中試料加熱装置

Country Status (1)

Country Link
JP (1) JPS5999715A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02110917A (ja) * 1988-06-15 1990-04-24 Teru Kyushu Kk 熱処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02110917A (ja) * 1988-06-15 1990-04-24 Teru Kyushu Kk 熱処理装置

Also Published As

Publication number Publication date
JPH0443410B2 (enrdf_load_stackoverflow) 1992-07-16

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