JPS59980A - Thermoelectric element - Google Patents

Thermoelectric element

Info

Publication number
JPS59980A
JPS59980A JP57110241A JP11024182A JPS59980A JP S59980 A JPS59980 A JP S59980A JP 57110241 A JP57110241 A JP 57110241A JP 11024182 A JP11024182 A JP 11024182A JP S59980 A JPS59980 A JP S59980A
Authority
JP
Japan
Prior art keywords
thermoelectric element
type semiconductor
electrode extraction
junction
electrode leading
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57110241A
Other languages
Japanese (ja)
Inventor
Takashi Nakajima
隆 中島
Makoto Suzuki
誠 鈴木
Mitsuteru Sugano
菅野 光輝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP57110241A priority Critical patent/JPS59980A/en
Publication of JPS59980A publication Critical patent/JPS59980A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
    • H10N10/01Manufacture or treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:To facilitate the effective electric connection and the machining work of an electrode leading surface of a thermoelectric element which is integrated like a P-N junction by forming roughed surface by sandblasting on the electrode leading surface. CONSTITUTION:A thermoelectric element 1 is integrated by bonding P type semiconductor 2 of sintered iron silicide and an N type semiconductor 3 to one end to form a P-N junction 4. An electrode leading surface 5 is machined by a sand blasting method which sprays polishing abrasive 6 by air. As a consequence, the surface 5 becomes roughened surface, from which an oxidized film produced in the thermoelectric element manufacturing steps is removed.

Description

【発明の詳細な説明】 本発明は、鉄珪化物等のP型半導体とN型半導体とを接
合一体化した熱電素子に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thermoelectric element in which a P-type semiconductor such as iron silicide and an N-type semiconductor are bonded and integrated.

本出願Δより先に鉄珪化物等の焼結体の熱電半導体を用
いた熱電素子が提案されているが、この場合その熱電素
子に対するリード線の接続が問題となっていた。すなわ
ち、鉄珪化物焼結体を半導体とするために成形、焼結後
に大気中で7エール処理を行うが、このため熱電素子を
構成する焼結体表面に酸化膜が生成しており、絶縁性を
持っているからである。従って、電極取出に際し、この
酸化膜を除去しないと電気導通がとれない。このため、
従来は、熱電素子の電極取出面にペルトゲライングや研
削盤で切削研摩を施していたが、これでは作業性が悪く
、しかも焼結体に応力を加えることになるため切削研摩
工程で破損させてしまうおそれがあった。
A thermoelectric element using a sintered thermoelectric semiconductor such as iron silicide has been proposed prior to the present application Δ, but in this case, connection of lead wires to the thermoelectric element has been a problem. In other words, in order to make the iron silicide sintered body into a semiconductor, it is subjected to a 7-Ale treatment in the air after being formed and sintered, but as a result, an oxide film is formed on the surface of the sintered body that constitutes the thermoelectric element, and the insulation This is because they have a sexual nature. Therefore, when taking out the electrode, electrical continuity cannot be established unless this oxide film is removed. For this reason,
Conventionally, the electrode extraction surface of a thermoelectric element was subjected to pelt gelling or cutting and polishing using a grinding machine, but this method was difficult to work with and added stress to the sintered body, which caused damage during the cutting and polishing process. There was a risk that the

本発明は、上記の欠点を除去し、P型半導体及びN型半
導体の電極取出面をサンドブラストによる梨地面に形成
することにより、電気接続を確実かつ容易に実行でき、
しかも電極取出面の加工作業が容易な熱電素子を提供し
ようとするものである。
The present invention eliminates the above-mentioned drawbacks and forms the electrode extraction surfaces of the P-type semiconductor and N-type semiconductor on a satin surface by sandblasting, thereby making it possible to perform electrical connection reliably and easily.
Furthermore, the present invention aims to provide a thermoelectric element whose electrode extraction surface is easy to work with.

以下、本発明の熱電素子の実施例を図面に従って説明す
る。
Embodiments of the thermoelectric element of the present invention will be described below with reference to the drawings.

第1図に示すように、熱電素子1は、鉄珪化物焼結体の
P型半導体2及びN型半導体3を、一端部にPN接合4
が形成される如く接合一体化した構造である。この場合
、P型及びN型半導体装置3の脚部端面を夫々電極取出
面5とするのが一般的であり、該電極取出面5には研摩
粉(砂)6をエアーにより吹付けるサンドブラスト法に
よる加工が施される。この結果、第2図に示される電極
取出面5は熱電素子製造工程で生じた酸化膜が除去され
た梨地面となる。
As shown in FIG. 1, the thermoelectric element 1 includes a P-type semiconductor 2 and an N-type semiconductor 3 made of iron silicide sintered bodies, and a PN junction 4 at one end.
It is a structure in which the two parts are joined together to form a single piece. In this case, it is common to use the end faces of the legs of the P-type and N-type semiconductor devices 3 as the electrode extraction surfaces 5, respectively, and use a sandblasting method in which abrasive powder (sand) 6 is sprayed with air onto the electrode extraction surfaces 5. Processing is performed by. As a result, the electrode extraction surface 5 shown in FIG. 2 becomes a satin surface from which the oxide film produced during the thermoelectric element manufacturing process has been removed.

第3図は熱電素子1の梨地面となった電極取出面5に超
音波はんだ付けによってリード線10を接続する工程を
示す。この場合、はんだごて11は超音波振動をしなが
らはんだ(lけを行うものであり、超音波の作用により
電極取出面5の皮膜を破壊して良好なはんだ付けを行う
ことができる。
FIG. 3 shows the process of connecting the lead wire 10 to the electrode extraction surface 5, which is a matte surface, of the thermoelectric element 1 by ultrasonic soldering. In this case, the soldering iron 11 performs soldering while vibrating ultrasonically, and the action of the ultrasonic wave destroys the film on the electrode extraction surface 5, allowing good soldering to be performed.

上記実施例の構成によれば、次のような効果を上げるこ
とがで鰺る。
According to the configuration of the above embodiment, the following effects can be achieved.

(1)熱電素子1の電極取出面5をサンドブラストによ
り磨鰺、梨地面としているので、従来のグラインダや研
削盤の場合の如く応力による破損が生じる恐れがなく、
作業性も良好である。
(1) Since the electrode extraction surface 5 of the thermoelectric element 1 is sandblasted to a polished, pear-finished surface, there is no risk of damage due to stress as in the case of conventional grinders and grinding machines.
Workability is also good.

(2)サンドブラスト加工は、P型半導体2の脚部とN
型半導体3の脚部との高さが不均一であっても支障なく
実行で軽る。
(2) Sandblasting is performed on the legs of the P-type semiconductor 2 and the N
Even if the height of the mold semiconductor 3 with respect to the leg part is uneven, it can be easily carried out without any problem.

(3)サンドブラストの際の研摩粉(砂)6の粒度を適
当に選べば、超音波はんだfりけに適した表面粗さを得
ることができる。
(3) By appropriately selecting the particle size of the abrasive powder (sand) 6 during sandblasting, a surface roughness suitable for ultrasonic soldering can be obtained.

第4図は本発明の他の実施例を示す。この場合、P型及
びN型半導体2.3の脚部端面のみならず該脚部端面に
接する数關幅の脚部側面部分を夫々電極取出面5Aとす
る。従って、該電極取出面5Aの脚部端面及び該脚部端
面に接する脚部側面にも数町6幅で研摩粉(砂)をエア
ーにより吹イー1けるサンドブラスト法による加工が施
される。このと外、加工を施さない部分はマスクで覆っ
ておく。この第4図の場合には、梨地面が脚部側面にも
形成されるため、リード線を接続する際にはんだが脚部
側面にもまわり込み、取(;1強度を大きくする、二と
ができる。
FIG. 4 shows another embodiment of the invention. In this case, not only the end surfaces of the legs of the P-type and N-type semiconductors 2.3 but also the side surfaces of the legs several inches wide in contact with the end surfaces of the legs are respectively used as electrode extraction surfaces 5A. Therefore, the end face of the leg of the electrode extraction surface 5A and the side face of the leg in contact with the end face of the leg are also processed by a sandblasting method in which abrasive powder (sand) is blown with air in several widths. This and other parts that will not be processed are covered with a mask. In the case of Fig. 4, since the matte surface is also formed on the side of the leg, when connecting the lead wire, the solder wraps around the side of the leg as well. Can be done.

なお、熱電素子の形状は適宜変更可能であり、電極取出
面もP型及びN型半導体の脚部端面の代りに脚部側面と
してもよい。
Note that the shape of the thermoelectric element can be changed as appropriate, and the electrode extraction surface may also be a side surface of the leg instead of the end surface of the leg of the P-type and N-type semiconductor.

以上説明したように、本発明によれば、P型半導体及び
N型半導体の電極取出面をサンドブラストによる梨地面
に形成することにより、電気接続を確実かつ容易に実行
でき、なおかつ電極取出面の加工の作業性が良好な熱電
素子を得ることができる。
As explained above, according to the present invention, by forming the electrode extraction surfaces of the P-type semiconductor and the N-type semiconductor on a matte surface by sandblasting, electrical connection can be reliably and easily performed, and the electrode extraction surfaces can be processed. A thermoelectric element with good workability can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る熱電素子の実施例であってサンド
ブラストにより電極取出面を梨地面とする工程を示す概
略説明図、第2図は電極取出面を示す斜視図、第3図は
電極取出面にリード線を超音波はんだ付けする工程を示
す断面図、第4図は本発明の他の実施例を示す斜視図で
ある。 1・・・熱電素子、2・・・P型半導体、3・・・N型
半導体、4・・・PN接合、5・・・電極取出面、10
・・・リード線。 特許出願人 東京電気化学工業株式会社 代理人 弁理士 村 井  隆 FsA 2,3 379−
FIG. 1 is an embodiment of the thermoelectric element according to the present invention, and is a schematic explanatory diagram showing the process of making the electrode extraction surface a satin surface by sandblasting, FIG. 2 is a perspective view showing the electrode extraction surface, and FIG. 3 is an electrode extraction surface. FIG. 4 is a cross-sectional view showing the process of ultrasonically soldering the lead wire to the extraction surface, and FIG. 4 is a perspective view showing another embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Thermoelectric element, 2... P-type semiconductor, 3... N-type semiconductor, 4... PN junction, 5... Electrode extraction surface, 10
···Lead. Patent applicant Tokyo Denki Kagaku Kogyo Co., Ltd. Representative Patent attorney Takashi Murai FsA 2,3 379-

Claims (2)

【特許請求の範囲】[Claims] (1)P型半導体及びN型半導体を、PN接合が形成さ
れる如く接合一体化した熱電素子であって、該熱電素子
の電極取出面をサンドブラストによる梨地面としたこと
を特徴とする熱電素子。
(1) A thermoelectric element in which a P-type semiconductor and an N-type semiconductor are integrated so that a PN junction is formed, and the electrode extraction surface of the thermoelectric element is made into a satin finish by sandblasting. .
(2)前記梨地面には超音波はんだイ」けによってリー
ド線が接続されている特許請求の範囲第1項記載の熱電
素子。
(2) The thermoelectric element according to claim 1, wherein a lead wire is connected to the matte surface by ultrasonic soldering.
JP57110241A 1982-06-26 1982-06-26 Thermoelectric element Pending JPS59980A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57110241A JPS59980A (en) 1982-06-26 1982-06-26 Thermoelectric element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57110241A JPS59980A (en) 1982-06-26 1982-06-26 Thermoelectric element

Publications (1)

Publication Number Publication Date
JPS59980A true JPS59980A (en) 1984-01-06

Family

ID=14530680

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57110241A Pending JPS59980A (en) 1982-06-26 1982-06-26 Thermoelectric element

Country Status (1)

Country Link
JP (1) JPS59980A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT410492B (en) * 2000-05-02 2003-05-26 Span Gerhard Dipl Ing Dr THERMOELECTRIC ELEMENT WITH AT LEAST ONE N LAYER AND AT LEAST ONE P LAYER
WO2016050588A1 (en) * 2014-09-30 2016-04-07 Mahle International Gmbh Thermoelectric device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT410492B (en) * 2000-05-02 2003-05-26 Span Gerhard Dipl Ing Dr THERMOELECTRIC ELEMENT WITH AT LEAST ONE N LAYER AND AT LEAST ONE P LAYER
US6762484B2 (en) 2000-05-02 2004-07-13 Gerhard Span Thermoelectric element
WO2016050588A1 (en) * 2014-09-30 2016-04-07 Mahle International Gmbh Thermoelectric device

Similar Documents

Publication Publication Date Title
WO2002015247A3 (en) Method and apparatus for processing a semiconductor wafer using novel final polishing method
KR102541126B1 (en) Electrostatic attachment chuck, method for manufacturing the same, and semiconductor device manufacturing method
JP2001345294A5 (en)
JPS59980A (en) Thermoelectric element
JPH06104153A (en) Manufacture of semiconductor integrated circuit
JPS61256621A (en) Production of bound-type semiconductor substrate
US3611554A (en) Methods of manufacture of semiconductor elements and elements manufactured thereby
CN100452309C (en) Method of manufacturing semiconductor wafer and method of manufacturing semiconductor device
JP3377024B2 (en) Method and apparatus for grinding semiconductor wafer
JPH02248055A (en) Wire bonding device
JPH0272638A (en) Manufacture of semiconductor device
JP2000263545A (en) Method for cutting silicon ingot
KR100289403B1 (en) Semiconductor package manufacturing method
JPS591125A (en) Method for manufacturing turbine blade
JPH0811344B2 (en) Conductive vacuum chuck
JPH1012802A (en) Lead frame and semiconductor device using the same
JPH0526744Y2 (en)
JPS60224268A (en) Power semiconductor element
JPS63152135A (en) Manufacture of semiconductor device
JPS5831542A (en) Manufacture of electric power element
JPS60157257A (en) Processing method of end surface inclination for semiconductor element
JPS6220340A (en) Supersonic bonding tool
JP3098194B2 (en) Method for manufacturing silicon semiconductor diode chip in which fully open PN junction is passivated with glass
US3996659A (en) Bonding method for semiconductor device manufacture
JPS6065555A (en) Manufacture of resin-seal semiconductor device