JPS5975422A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPS5975422A
JPS5975422A JP18601082A JP18601082A JPS5975422A JP S5975422 A JPS5975422 A JP S5975422A JP 18601082 A JP18601082 A JP 18601082A JP 18601082 A JP18601082 A JP 18601082A JP S5975422 A JPS5975422 A JP S5975422A
Authority
JP
Japan
Prior art keywords
magnetic
magnetic layer
thin film
layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18601082A
Other languages
Japanese (ja)
Inventor
Masamichi Yamada
雅通 山田
Isao Oshima
大島 勲
Masakatsu Saito
斉藤 正勝
Yoshitsugu Miura
義從 三浦
Katsuyuki Tanaka
克之 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP18601082A priority Critical patent/JPS5975422A/en
Publication of JPS5975422A publication Critical patent/JPS5975422A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/3116Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks

Abstract

PURPOSE:To obtain a track width having high accuracy by forming at least the 1st magnetic layer of the 1st and the 2nd magnetic layers of a thin film, providing a groove in a substrate in such a way as to regulate the track width on the top surface of said thin film and forming a magnetic film in the groove. CONSTITUTION:A resist or mask 11 is provided on a substrate 1 apart by a prescribed size l3 therefrom and a groove 12 is formed on the substrate 1 by etching, whereafter the 1st magnetic layer 13 is laminated in the groove 12. After the layer 13 is flattened flush with the substrate 1, an insulation layer 3 is formed and the 2nd magnetic layer 10 is formed on the layer 13. Otherwise, the magnetic layer is formed on the substrate 1 and thereafter a mask for regulating a track width l2 is provided thereon and the magnetic layer is etched to form a lower magnetic layer 8 of a trapezoidal shape, then a nonmagnetic layer 9 of SiO2 or the like is formed on the substrate and is lapped flush with the magnetic layer. The 2nd magnetic layer 10 is provided after the formation of the layer 3. The easy formation of the track width having high accuracy in thus made possible.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は薄膜磁気ヘッドに係り、特に高精度のトラック
幅とするのに好適な構造の薄膜磁気ヘッドに関するもの
である。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a thin film magnetic head, and particularly to a thin film magnetic head having a structure suitable for achieving highly accurate track width.

近年の磁気記録の課題は、いかに記録密度を向上するか
である。それにともない磁気ヘッドの高精度の狭トラツ
ク化をはかる必要かある。
A recent challenge in magnetic recording is how to improve recording density. Accordingly, there is a need to develop a magnetic head with a narrow track with high precision.

特に記録媒体として高保磁力の金属粉テープを想定した
場合、磁性薄膜を用いた薄膜磁気ヘッドでは、記録能力
を向上させろため、磁性薄膜の厚さを比較的厚くする必
要がある。しかし、厚い磁性薄膜を用いて高精度の狭ト
ラツク化をはかることは、従来の構造の薄膜磁気ヘッド
では困難である。以下第1図〜第4図を用いて従来技術
について説明する。
In particular, when a metal powder tape with high coercive force is assumed as a recording medium, in a thin-film magnetic head using a magnetic thin film, the thickness of the magnetic thin film must be made relatively thick in order to improve recording performance. However, it is difficult to narrow the track with high accuracy using a thick magnetic thin film with a thin film magnetic head having a conventional structure. The prior art will be explained below using FIGS. 1 to 4.

〔従来技術〕[Prior art]

第1図は薄膜磁気ヘッドの断面図、第2図は従来の薄膜
磁気ヘッドの記録媒体摺動面の構造図、第6図、第4図
は第2図の製造工程説明図である。第1図、第2図にお
いて、1はフェライトまたはガラスよりなる基板、2は
第1の磁性層、3は磁気ギャップとなるSt Otまた
は鳩03よりなる絶縁層、4はコイルを形成する導電体
5は5int、 AP、20sあるいはポリイミド系樹
脂よりなる絶縁体、6は第1の磁性層2と磁気回路を作
っている第2の磁性層である。第1.第2の磁性層2,
6は、Fe−Ni合金系、Fe−5t、−AH合金系あ
るいは非晶質合金等で形成しである。
FIG. 1 is a sectional view of a thin film magnetic head, FIG. 2 is a structural diagram of a recording medium sliding surface of a conventional thin film magnetic head, and FIGS. 6 and 4 are illustrations of the manufacturing process of FIG. 2. In FIGS. 1 and 2, 1 is a substrate made of ferrite or glass, 2 is a first magnetic layer, 3 is an insulating layer made of St Ot or pigeon 03 which becomes a magnetic gap, and 4 is a conductor forming a coil. 5 is an insulator made of 5 int, AP, 20S or polyimide resin; 6 is a second magnetic layer forming a magnetic circuit with the first magnetic layer 2; 1st. second magnetic layer 2,
6 is made of Fe--Ni alloy, Fe-5t, -AH alloy, or amorphous alloy.

この磁気ヘッドのトラック幅は、第2図にl。The track width of this magnetic head is shown in FIG.

で示した寸法となる。トラック幅!、とするには第6図
に示すように、基板1土に第1の磁性層2、絶縁層6、
第2の磁性層6を形成した後、その上にレジスト7をマ
スク寸法l、の長さになるように塗布する。その後、第
4図に示すように、第2の磁性層6をドライあるいはつ
、]、 y )エツチングしてトラック幅l、を確保す
る。この場合、第2の磁性層6にテーパ角θがつき、第
2の磁性層6の膜厚をhとすれば、トラック幅11は、 t、=12+2h可θ   ・・・・・・・・・・・・
・・・・・・il+となる。
The dimensions are shown in . Track width! , as shown in FIG. 6, a first magnetic layer 2, an insulating layer 6,
After forming the second magnetic layer 6, a resist 7 is applied thereon to have a length of mask dimension l. Thereafter, as shown in FIG. 4, the second magnetic layer 6 is dry or etched to ensure a track width l. In this case, if the second magnetic layer 6 has a taper angle θ and the thickness of the second magnetic layer 6 is h, then the track width 11 is t,=12+2h possible θ...・・・・・・
...It becomes il+.

上記したように、このような構成の薄膜磁気ヘッドにお
いては、トラック幅l、は、マスク寸法G+第2の磁性
層6の膜厚りおよびエツチングのテーパ角θの関係とな
る。ところで、マスクの寸法12はかなりの精度が得ら
れるが、第2の磁性層6の膜厚りおよびエツチングのテ
ーパ角θの正確な制御は困難であり、特に、エツチング
のテーパ角θは、雰囲気温度、エツチングレート、およ
びエツチングの方法(ドライかソエットか)などによっ
てばらつく。また、上記したように、第2の磁性層6の
膜厚りは、記録効率の向上をはかるためには厚くしなけ
ればならず、そのため、テーパ角θのばらつきによるト
ラック幅!、のばらつきが大きくなり、トラック幅!、
の高精度を実現するのが困難であるという間順がある。
As described above, in a thin film magnetic head having such a structure, the track width l has the relationship of the mask dimension G+the film thickness of the second magnetic layer 6 and the etching taper angle θ. Incidentally, although the dimension 12 of the mask can be determined with considerable precision, it is difficult to accurately control the film thickness of the second magnetic layer 6 and the etching taper angle θ. It varies depending on the temperature, etching rate, and etching method (dry or soet). Furthermore, as mentioned above, the film thickness of the second magnetic layer 6 must be increased in order to improve recording efficiency, and therefore the track width is reduced due to variations in the taper angle θ. , the variation in track width increases! ,
There is a problem in that it is difficult to achieve high accuracy.

〔発明の目的〕[Purpose of the invention]

本発明は上記に鑑みてなされたもので、その目的とする
ところは、高精度のトラック幅とすることかできる薄膜
磁気ヘッドを提供することにある。
The present invention has been made in view of the above, and an object of the present invention is to provide a thin film magnetic head that can provide a highly accurate track width.

〔発明の概要〕[Summary of the invention]

本発明の特徴は、第1.第2の磁性層のうち少なくとも
第1の磁性層を磁性薄膜で形成し、この磁性薄膜の上面
においてトラック幅を規制する構成とした点にある。
The features of the present invention are as follows. The present invention is characterized in that at least the first magnetic layer of the second magnetic layer is formed of a magnetic thin film, and the track width is regulated on the upper surface of the magnetic thin film.

〔発明の実施例〕[Embodiments of the invention]

以下本発明を第5図、第6図に示した実施例および第7
図〜第9図を用いて詳細に説明する。
Embodiments of the present invention shown in FIGS. 5 and 6 and 7.
This will be explained in detail with reference to FIGS.

第5図は本発明の薄膜磁気ヘッドの一実施例を示す記録
媒体摺動面の構造図である。第5図において、1は非磁
性部拐よりなる基板、8は基板1上に形成した磁性薄膜
よりなる第1の磁性層で、第1の磁性層8は、従来例の
第2の磁性層乙のエツチングと同様の手法によりエツチ
ングし、マスクの寸法12をトラック幅l、に等しくし
て、高精度のトラック幅を確保しである。
FIG. 5 is a structural diagram of a recording medium sliding surface showing an embodiment of the thin film magnetic head of the present invention. In FIG. 5, 1 is a substrate made of a non-magnetic material, 8 is a first magnetic layer made of a magnetic thin film formed on the substrate 1, and the first magnetic layer 8 is the second magnetic layer of the conventional example. Etching was carried out using the same method as in the etching method B, and the dimension 12 of the mask was made equal to the track width l to ensure a highly accurate track width.

9は第1の磁性層8をエツチングした後、基板1上に積
層したSin、あるいはM、03等よりなる非磁性層で
、非磁性層9はラッピング等の手法により第1の磁性層
8の上面と同じになるように平坦化しである。この平坦
化は、ラッピング等の手法以外にリフトオフ法を用いる
ようにしてもよい。3は第1の磁性層8および非磁性層
9の上面に所定の膜厚になるように積層した磁気ギャッ
プとなる絶縁層(非1iyX性)10は絶縁体6上に所
定の膜厚となるように積層形成した第2の磁性層である
。ただし、この薄膜磁気ヘッドの断面図は、第1図と同
様になっていることはいうまでもない。
9 is a non-magnetic layer made of Sin, M, 03, etc. that is laminated on the substrate 1 after etching the first magnetic layer 8; It is flattened so that it is the same as the top surface. For this flattening, a lift-off method may be used in addition to techniques such as wrapping. 3 is an insulating layer (non-1iyX) laminated on the upper surface of the first magnetic layer 8 and non-magnetic layer 9 to a predetermined thickness to form a magnetic gap. This is the second magnetic layer laminated in this manner. However, it goes without saying that the cross-sectional view of this thin film magnetic head is similar to that in FIG.

上記した本発明の実施例によれば、第1の磁性層8を磁
性薄膜で形成し、かつ、この第1の磁性層8をエツチン
グすることによりトラック幅!1を確保するようにしで
あるので、トラック幅!、の精度はマスクの寸法精度の
みで決まり、従来のようにテーパ角θや膜厚りに依存し
ないので、高精度のトラック幅とすることができる。
According to the embodiment of the present invention described above, the first magnetic layer 8 is formed of a magnetic thin film, and the track width is increased by etching the first magnetic layer 8. 1, so the track width! The accuracy of , is determined only by the dimensional accuracy of the mask, and does not depend on the taper angle θ or the film thickness as in the conventional case, so it is possible to achieve a highly accurate track width.

第6図は本発明の他の実施例を示す第5図に相当する図
である。また、第7図〜第9図は第6図の薄膜磁気ヘッ
ドを製造するときの工程の説明図である。まず、第7図
に示すように、平坦な基板1上にレジストあるいはマス
ク11を所定の寸法l、を開げて形成し、次に、第8図
に示すように、ドライあるいはウェットエツチングによ
り基板1をエツチングして溝12を形成する。
FIG. 6 is a diagram corresponding to FIG. 5 showing another embodiment of the present invention. Further, FIGS. 7 to 9 are explanatory diagrams of steps for manufacturing the thin film magnetic head shown in FIG. 6. First, as shown in FIG. 7, a resist or mask 11 is formed on a flat substrate 1 by opening a predetermined dimension l, and then, as shown in FIG. 8, the substrate is etched by dry or wet etching. 1 to form grooves 12.

その後、第9図に示すように、溝12内に第1の磁性層
16を積層して形成し、ラッピング等の手法により、基
板1の上面と同じように平坦化する。次に、第6図に示
しであるように、基板1および第1の磁性層16の上面
に磁気ギャップとなる絶縁層(非磁性)6および第2の
磁性層10を順次積層しである。なお、この場合、基板
1とし7て感光性の結晶質ガラスを用い、感光した部分
と感光させない部分のエッチシー1・の差により第8図
に示す溝12を形成するようにしてもよ〜)。
Thereafter, as shown in FIG. 9, a first magnetic layer 16 is stacked and formed within the groove 12, and is planarized in the same manner as the upper surface of the substrate 1 by a technique such as lapping. Next, as shown in FIG. 6, an insulating layer (non-magnetic) 6 and a second magnetic layer 10, which serve as a magnetic gap, are sequentially laminated on the upper surfaces of the substrate 1 and the first magnetic layer 16. In this case, the substrate 1 may be made of photosensitive crystalline glass 7, and the grooves 12 shown in FIG. 8 may be formed by the difference in etch seam 1 between the exposed and non-exposed areas. .

この場合、トラック幅は、第6図に示すように!、とな
り、この/3の精度はマスク寸法精度のみによって決ま
るから、第5図の場合と同様、トラック幅の高精度化を
達成することかできる。
In this case, the track width is as shown in Figure 6! , and since this accuracy of /3 is determined only by the mask dimensional accuracy, high accuracy of the track width can be achieved as in the case of FIG. 5.

なお、第5図、第6図に示した実施例においては、第2
の磁性層10として磁性薄膜を採用しているが、第2の
磁性層10は必ずしも薄膜である必要はなく、第1の磁
性層8または1′!Iの上面の寸法以上の幅を有するバ
ルク形状の磁性体としてもよく、それによって効果が変
わることはない。
In addition, in the embodiment shown in FIGS. 5 and 6, the second
A magnetic thin film is adopted as the magnetic layer 10 of the first magnetic layer 8 or 1'!, but the second magnetic layer 10 does not necessarily have to be a thin film. A bulk-shaped magnetic material having a width equal to or larger than the upper surface of I may be used, and the effect will not change thereby.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、高精度のトラッ
ク幅の薄膜磁気ヘッドか得られるという効果かある。
As described above, according to the present invention, a thin film magnetic head with a highly accurate track width can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は薄膜磁気ヘッドの断面図、第2図は従来の薄膜
磁気ヘッドの記録媒体摺動面の構造図、第6図、第4図
は第2図の製造工程の説明図、第5図は本発明の薄膜磁
気ヘッドの一実施例を示す記録媒体摺動面の構造図、第
6図は本発明の他の実施例な示j第5図に相当する構造
図、第7図〜第9図は第6図の製造工程の説明図である
。 1・・・・・・・・・・・・基板 3・・・・・・・・・・絶縁層 4・・・・・・・・・・・・導電体 8 、13 、、、・・・第1の磁性層9・・・・・・
・・・・・・非磁性層 10・・・・・・・・・第2の磁性層 12・・・・・・・・・溝 第1図 糖2図 噺3図 つ η4図 囁S図 絶6図
Fig. 1 is a cross-sectional view of a thin film magnetic head, Fig. 2 is a structural diagram of a recording medium sliding surface of a conventional thin film magnetic head, Figs. 6 and 4 are explanatory diagrams of the manufacturing process of Fig. 2, and Fig. 5 The figure is a structural diagram of a recording medium sliding surface showing one embodiment of the thin film magnetic head of the present invention, FIG. 6 is a structural diagram corresponding to FIG. 5 showing another embodiment of the present invention, and FIGS. FIG. 9 is an explanatory diagram of the manufacturing process of FIG. 6. 1......Substrate 3...Insulating layer 4...Conductor 8, 13,...・First magnetic layer 9...
...Nonmagnetic layer 10...Second magnetic layer 12...Groove Figure 1 Sugar Figure 2 Story 3 Figure η4 Figure Whisper S Figure Absolute 6 pictures

Claims (1)

【特許請求の範囲】 1、 基板上に第1の磁性層、磁気ギャップとなる絶縁
層、コイルとなる導電体および前記第1の磁性層と磁気
回路を作る第2の磁性層をそれぞれ所定形状に順次積層
してなる薄膜磁気ヘッドにおいて、少なくとも前記第1
の磁性層を磁性薄膜で形成し、該磁性薄膜の上面におい
てトラック幅を規制する構成としたことを特徴とする薄
膜磁気ヘッド。 2、 前記第2の磁性層は前記第1の磁性層の上面の寸
法より広い幅を有するバルク状の磁性体よりなる特許請
求の範囲第1項記載の薄膜磁気ヘッド。 3 前記基板が感光性の結晶質ガラスよりなり前記第1
の磁性層を積層する溝を形成しである特許請求の範囲第
1項または第2項記載の薄膜磁気ヘッド。
[Claims] 1. A first magnetic layer, an insulating layer forming a magnetic gap, a conductor forming a coil, and a second magnetic layer forming a magnetic circuit with the first magnetic layer are each formed into predetermined shapes on a substrate. In the thin film magnetic head formed by sequentially laminating at least the first
1. A thin film magnetic head characterized in that the magnetic layer is formed of a magnetic thin film, and the track width is regulated on the upper surface of the magnetic thin film. 2. The thin film magnetic head according to claim 1, wherein the second magnetic layer is made of a bulk magnetic material having a width wider than the upper surface of the first magnetic layer. 3. The substrate is made of photosensitive crystalline glass, and the first substrate is made of photosensitive crystalline glass.
3. A thin film magnetic head according to claim 1, wherein a groove is formed in which a magnetic layer is laminated.
JP18601082A 1982-10-25 1982-10-25 Thin film magnetic head Pending JPS5975422A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18601082A JPS5975422A (en) 1982-10-25 1982-10-25 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18601082A JPS5975422A (en) 1982-10-25 1982-10-25 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS5975422A true JPS5975422A (en) 1984-04-28

Family

ID=16180790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18601082A Pending JPS5975422A (en) 1982-10-25 1982-10-25 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS5975422A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0163998A2 (en) * 1984-06-06 1985-12-11 Hitachi, Ltd. Multi-track magnetic thin film heads and a method of producing the same
JPS61255514A (en) * 1985-05-08 1986-11-13 Hitachi Ltd Thin film magnetic head
JPS61284816A (en) * 1985-06-12 1986-12-15 Hitachi Ltd Thin film magnetic head
JPS6292218A (en) * 1985-10-18 1987-04-27 Fujitsu Ltd Thin film magnetic head

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49106310A (en) * 1973-02-09 1974-10-08
JPS5029021A (en) * 1973-07-18 1975-03-24
JPS50104625A (en) * 1974-01-21 1975-08-18
JPS5274325A (en) * 1975-12-17 1977-06-22 Matsushita Electric Ind Co Ltd Multiple element magnetic head

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49106310A (en) * 1973-02-09 1974-10-08
JPS5029021A (en) * 1973-07-18 1975-03-24
JPS50104625A (en) * 1974-01-21 1975-08-18
JPS5274325A (en) * 1975-12-17 1977-06-22 Matsushita Electric Ind Co Ltd Multiple element magnetic head

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0163998A2 (en) * 1984-06-06 1985-12-11 Hitachi, Ltd. Multi-track magnetic thin film heads and a method of producing the same
JPS61255514A (en) * 1985-05-08 1986-11-13 Hitachi Ltd Thin film magnetic head
JPS61284816A (en) * 1985-06-12 1986-12-15 Hitachi Ltd Thin film magnetic head
JPS6292218A (en) * 1985-10-18 1987-04-27 Fujitsu Ltd Thin film magnetic head

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