JP2567221B2 - Thin film magnetic head and method of manufacturing the same - Google Patents

Thin film magnetic head and method of manufacturing the same

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Publication number
JP2567221B2
JP2567221B2 JP61071026A JP7102686A JP2567221B2 JP 2567221 B2 JP2567221 B2 JP 2567221B2 JP 61071026 A JP61071026 A JP 61071026A JP 7102686 A JP7102686 A JP 7102686A JP 2567221 B2 JP2567221 B2 JP 2567221B2
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JP
Japan
Prior art keywords
film
magnetic
tip
substrate
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61071026A
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Japanese (ja)
Other versions
JPS62229512A (en
Inventor
隆 川辺
真一 原
勝也 光岡
雅信 華園
真治 成重
修 平井
Original Assignee
株式会社日立製作所
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Priority to JP61071026A priority Critical patent/JP2567221B2/en
Publication of JPS62229512A publication Critical patent/JPS62229512A/en
Application granted granted Critical
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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/313Disposition of layers

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、磁気記録装置用の薄膜磁気ヘツド及びその
製造方法に係り、特に高精度な磁気コア形状を形成させ
るための薄膜磁気ヘツド及びその製造方法に関する。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film magnetic head for a magnetic recording device and a manufacturing method thereof, and particularly to a thin film magnetic head for forming a highly accurate magnetic core shape and the same. It relates to a manufacturing method.
〔従来の技術〕[Conventional technology]
第2図は、従来の薄膜磁気ヘツドの磁気コア部の一例
を示した断面図である。第2図において符号21は基板、
22は下部磁性膜、23は上部磁性膜、24は先端部、25はギ
ヤツプ材、26は導体コイル、27は有機樹脂膜を意味す
る。基板21の上には下部磁性膜となるパーマロイ膜22が
形成されており、後から形成される上部磁性膜としての
パーマロイ膜23と共に磁気回路を構成している。先端部
24においてはアルミナ膜を用いたギヤツプ材25を2枚の
パーマロイ膜22、23間に介在して磁気ギヤツプを形成
し、このギヤツプを用いて記録媒体である例えば磁気デ
イスクに書き込み、また磁気デイスクからの読み出しを
行う。媒体が磁気テープになつても原理は同様である。
パーマロイ膜22、23の間には導体コイル26が磁気回路と
交差するように設けてありこの導体コイルはパーマロイ
膜22及び23と有機樹脂膜27により絶縁されている。この
有機樹脂膜27はパーマロイ膜22、23間の漏れ磁束を小さ
くするため、約10μm以上の厚さを必要とする。
FIG. 2 is a sectional view showing an example of a magnetic core portion of a conventional thin film magnetic head. In FIG. 2, reference numeral 21 is a substrate,
22 is a lower magnetic film, 23 is an upper magnetic film, 24 is a tip portion, 25 is a gear material, 26 is a conductor coil, and 27 is an organic resin film. A permalloy film 22 serving as a lower magnetic film is formed on the substrate 21, and constitutes a magnetic circuit together with a permalloy film 23 serving as an upper magnetic film formed later. Tip
In 24, a magnetic tape 25 is formed by interposing a gear material 25 made of an alumina film between the two permalloy films 22 and 23, and the magnetic material is written on the recording medium, for example, a magnetic disk by using the gear material. Read out. The principle is the same even when the medium is a magnetic tape.
A conductor coil 26 is provided between the permalloy films 22 and 23 so as to intersect the magnetic circuit, and the conductor coil is insulated by the permalloy films 22 and 23 and the organic resin film 27. The organic resin film 27 needs to have a thickness of about 10 μm or more in order to reduce the leakage magnetic flux between the permalloy films 22 and 23.
さて、パーマロイ膜23のパターニング方法には、感光
性樹脂膜をマスクにしてエツチングする方法、選択めつ
き法により感光性樹脂膜の無い部分にパーマロイを堆積
する方法などが考えられるが、これらいずれの方法を選
択しても、約10μm以上の段差が存在する所で感光性樹
脂膜をパターニングする必要がある。一方、薄膜磁気ヘ
ツドでは、このパーマロイ膜23の先端部24に対し、1μ
m以下のパターン精度が要求される。
Now, as a patterning method of the permalloy film 23, a method of etching with a photosensitive resin film as a mask, a method of depositing permalloy on a portion without a photosensitive resin film by a selective plating method, and the like are considered. Even if the method is selected, it is necessary to pattern the photosensitive resin film in the place where there is a step of about 10 μm or more. On the other hand, in the thin film magnetic head, 1 μm is applied to the tip portion 24 of the permalloy film 23.
A pattern accuracy of m or less is required.
第3図は、例えば特開昭60-37130号公報に述べられて
いるように、上述のような段差を有する面上において、
感光性樹脂膜をパターニングするプロセスを模式的に表
した工程図である。第3図において、符号31は基板、33
はパーマロイ膜、34は段差下部、37は有機樹脂膜、38は
感光性樹脂膜、39はホトマスクを意味する。第3図
(a)は基板31の上に有機樹脂膜37のパターンを形成し
その上にパーマロイ膜33を堆積したものの断面図であ
る。この上に感光性樹脂膜38を塗布し乾燥すると第3図
(b)に示す断面形状となる。次に密着型マスクアライ
ナを用いて露光する場合、有機樹脂膜37のパターンの中
央では感光性樹脂膜38はホトマスク39と密着するが、他
の部分では感光性樹脂膜38はホトマスク39から離れた状
態で露光される。露光に用いる光は平行光に近付けてあ
るが密着できない時はピントが合わない状態と同じにな
り、光の分布がブロードになる。投影型マスクアライナ
を用いた場合においても、ホトレジスト膜表面に凹凸が
あるので全面にピントが合わない状態になる。このた
め、第3図(c)に示すように、露光・現像後得られる
感光性樹脂膜38のパターンにおいては、有機樹脂膜37の
段差下部34の部分で、樹脂膜寸法がホトマスク寸法に対
して変化してしまい、かつばらつきが大きくなる。した
がつて、第3図(d)に示すように、パーマロイ膜33を
パターニングした後も、その先端部34の寸法ばらつきが
大きくなつてしまい高精度な磁性膜先端部形状が得られ
なかつた。
FIG. 3 shows, for example, as described in JP-A-60-37130, on a surface having the above-mentioned step,
It is a flowchart showing a process of patterning a photosensitive resin film typically. In FIG. 3, reference numeral 31 is a substrate, 33
Is a permalloy film, 34 is a step lower part, 37 is an organic resin film, 38 is a photosensitive resin film, and 39 is a photomask. FIG. 3A is a cross-sectional view of a pattern of an organic resin film 37 formed on a substrate 31 and a permalloy film 33 deposited thereon. When the photosensitive resin film 38 is applied and dried on this, the cross-sectional shape shown in FIG. 3B is obtained. Next, when exposure is performed using a contact mask aligner, the photosensitive resin film 38 adheres to the photomask 39 in the center of the pattern of the organic resin film 37, but the photosensitive resin film 38 separates from the photomask 39 in other portions. It is exposed in the state. The light used for exposure is close to parallel light, but when the light cannot be brought into close contact, it is in the same state as when it is out of focus, and the light distribution becomes broad. Even when the projection type mask aligner is used, the entire surface is out of focus because the surface of the photoresist film is uneven. Therefore, as shown in FIG. 3 (c), in the pattern of the photosensitive resin film 38 obtained after exposure and development, the resin film size is smaller than the photomask size in the lower part 34 of the step of the organic resin film 37. Change, and the variation becomes large. Therefore, as shown in FIG. 3 (d), even after the permalloy film 33 was patterned, the dimensional variation of the tip portion 34 became large, and a highly accurate shape of the tip portion of the magnetic film could not be obtained.
このため、例えば特願昭58-197695号明細書に見られ
るように、感光性樹脂膜38を厚く塗布して表面を平坦化
した後、全面露光して所定膜厚まで感光性樹脂をエツチ
ングし、ホトマスクとの密着を良くする方法が提案され
た。
Therefore, for example, as shown in Japanese Patent Application No. 58-197695, a photosensitive resin film 38 is applied thickly to flatten the surface, and then the entire surface is exposed to etch the photosensitive resin to a predetermined film thickness. , A method of improving the close contact with the photomask has been proposed.
〔発明が解決しようとする問題点〕[Problems to be solved by the invention]
しかしながら、露光によるエツチング膜厚の制御が困
難であり、かつパターニング時の感光性樹脂膜厚が厚く
寸法精度が悪くなりやすいため、実際にはほとんど適用
されなかつた。
However, since it is difficult to control the etching film thickness by exposure, and the photosensitive resin film thickness during patterning is large and the dimensional accuracy tends to be poor, it has hardly been applied in practice.
本発明の目的は、薄膜磁気ヘツドの磁性膜先端部を、
高精度にパターニングするための薄膜磁気ヘツド及びそ
の製造方法を提供することにある。
An object of the present invention is to provide a magnetic film tip portion of a thin film magnetic head,
It is an object of the present invention to provide a thin film magnetic head for highly accurate patterning and a method for manufacturing the same.
〔問題点を解決するための手段〕[Means for solving problems]
本発明を概説すれば、本発明の第1の発明は薄膜磁気
ヘツドに関する発明であつて、基板上に下部磁性膜、磁
気ギヤツプ膜、上部磁性膜を順に積層して成る薄膜磁気
ヘツドにおいて、基板若しくは基板上の下地膜に形成さ
れた段差に対して、該段差の直上に下部磁性膜及び上部
磁性膜の磁気デイスクと対向する先端部を有し、かつ該
段差の下部に、下部磁性膜の該先端部以外の部分を有す
ることを特徴とする。
Briefly describing the present invention, the first invention of the present invention relates to a thin film magnetic head, and in a thin film magnetic head formed by sequentially laminating a lower magnetic film, a magnetic gap film and an upper magnetic film on a substrate, Alternatively, with respect to the step formed on the underlying film on the substrate, a tip portion facing the magnetic disk of the lower magnetic film and the upper magnetic film is provided directly above the step, and the lower magnetic film is formed below the step. It is characterized by having a portion other than the tip portion.
そして、本発明の第2の発明は薄膜磁気ヘツドの製造
方法に関する発明であつて、基板上に下部磁性膜、磁気
ギヤツプ膜、上部磁性膜を順に積層する薄膜磁気ヘツド
の製造方法において、基板若しくは基板上の下地膜に段
差を形成する工程、該段差上に下部磁性膜を成膜する工
程、該下部磁性膜のうち磁気デイスクと対向する先端部
を該段差の直上に配し、かつ該下部磁性膜の該先端部以
外の部分を該段差の下部に配するように該下部磁性膜パ
ターンを形成する工程、その上に磁気ギヤツプ膜を形成
する工程、その上に上部磁性膜を成膜する工程、及び上
部磁性膜のうち少なくとも磁気デイスクと対向する先端
部を該段差の直上に配するように該上部磁性膜パターン
を形成する工程を含むことを特徴とする。
A second invention of the present invention relates to a method for manufacturing a thin film magnetic head, which is a method for manufacturing a thin film magnetic head in which a lower magnetic film, a magnetic gap film and an upper magnetic film are sequentially laminated on a substrate, A step of forming a step on the base film on the substrate, a step of forming a lower magnetic film on the step, a tip portion of the lower magnetic film facing the magnetic disk is arranged immediately above the step, and A step of forming the lower magnetic film pattern so that a portion of the magnetic film other than the tip portion is located under the step, a step of forming a magnetic gap film on the lower magnetic film pattern, and an upper magnetic film formed thereon And a step of forming the upper magnetic film pattern so that at least a tip portion of the upper magnetic film facing the magnetic disk is disposed immediately above the step.
本発明は、感光性樹脂膜を最も高精度にパターニング
するための方法の1つは、密着型マスクアライナを用い
て、ホトマスクと薄い感光性樹脂膜が良く密着している
状態で露光を行う方法であることに着目してなされたも
のである。本発明の特徴は、最も寸法精度が要求される
磁性膜先端部をパターニングする時点でホトマスクと薄
い感光性樹脂膜を密着させるために、あらかじめ磁性膜
先端部の基板若しくは下地膜に段差を形成しておき、し
かる後に段差上部において磁性膜先端部を形成する点に
ある。
One of the methods for patterning a photosensitive resin film with the highest accuracy according to the present invention is to perform exposure using a contact type mask aligner while the photomask and the thin photosensitive resin film are in good contact with each other. It was made paying attention to that. The feature of the present invention is that a step is formed in advance on the substrate or the underlayer film of the magnetic film tip in order to bring the photomask and the thin photosensitive resin film into close contact at the time of patterning the magnetic film tip, which requires the most dimensional accuracy. The point is that the tip of the magnetic film is formed at the upper part of the step.
段差をつける方法としては、基板上に下地膜を形成し
た後不要部分をエツチング除去する方法や、あらかじめ
基板をエツチング又は機械加工して基板自体に凹凸をつ
けておく方法などがある。
As a method for forming the step, there are a method of forming an underlying film on the substrate and then etching away unnecessary portions, and a method of etching or machining the substrate in advance to make the substrate itself uneven.
また段差は、磁性膜先端部のみに形成しても良いが、
素子形成プロセスの適否によつては他の部分を含めた段
差を形成しても良く、例えば先端部を除く磁性膜部分を
基板上の凹部に埋込むことによつて、当初の目的を達し
ても良い。
Although the step may be formed only at the tip of the magnetic film,
Depending on the suitability of the element formation process, steps including other parts may be formed. For example, by embedding the magnetic film part excluding the tip part in the concave part on the substrate, the original purpose is achieved. Is also good.
段差材料としては、所定の形状が得られるものであれ
ば特に限定されないが、薄膜磁気ヘツドを構成する基
板、絶縁膜、保護膜等の材料を用いることが望ましい。
The step material is not particularly limited as long as a predetermined shape can be obtained, but it is preferable to use materials such as a substrate, an insulating film, and a protective film that form the thin film magnetic head.
記録密度を増大させるためには、書き込みビツト長を
短くしなければならない。このためには磁気デイスク、
磁気テープ等の記録媒体の保磁力を大きくする必要があ
るが、この媒体に対して磁気ヘツドで書き込むために
は、ヘツド先端の磁気ギヤツプから漏れ出す書き込み磁
界をできるだけ大きくする必要がある。
In order to increase the recording density, the write bit length must be shortened. For this, a magnetic disk,
It is necessary to increase the coercive force of a recording medium such as a magnetic tape, but in order to write on this medium with a magnetic head, it is necessary to maximize the write magnetic field leaking from the magnetic gear at the tip of the head.
第6−1−1図に従来の薄膜磁気ヘツドの断面図を、
第6−1−2図に媒体対向面から見た正面図を示す。ま
た、第6−2−1図に本発明の薄膜磁気ヘツドの断面図
を、第6−2−2図に媒体対向面から見た正面図を示
す。各図において符号61は保護膜、62は下部磁性膜、63
は上部磁性膜、68は上部磁性膜傾斜部、69は下部磁性膜
傾斜部を意味する。
Fig. 6-1-1 shows a cross-sectional view of a conventional thin film magnetic head.
FIG. 6-1-2 shows a front view seen from the medium facing surface. Further, FIG. 6-2-1 shows a cross-sectional view of the thin film magnetic head of the present invention, and FIG. 6-2-2 shows a front view seen from the medium facing surface. In each figure, reference numeral 61 is a protective film, 62 is a lower magnetic film, and 63
Is an upper magnetic film, 68 is an upper magnetic film inclined portion, and 69 is a lower magnetic film inclined portion.
各正面図に示すように、下部磁性膜62の断面積は、書
き込みトラツク幅(Tw)を決める上部磁性膜63の断面積
より大きい。このため、従来の磁気ヘツドでは、第6−
1−1図の上部磁性膜傾斜部68の断面積によつて書き込
み磁界の大きさが制限されていた。しかし、本発明によ
れば、書き込み磁界の大きさを制限する下部磁性膜傾斜
部69の断面積を照射に比べて大きくできるため、磁性膜
部分の磁束飽和が防がれ、書き込み磁界を大きくでき
る。
As shown in the respective front views, the cross-sectional area of the lower magnetic film 62 is larger than the cross-sectional area of the upper magnetic film 63 that determines the write track width (Tw). Therefore, in the conventional magnetic head, the sixth-
The magnitude of the write magnetic field was limited by the cross-sectional area of the upper magnetic film inclined portion 68 in FIG. However, according to the present invention, since the cross-sectional area of the lower magnetic film inclined portion 69 that limits the magnitude of the write magnetic field can be made larger than that of the irradiation, magnetic flux saturation in the magnetic film portion can be prevented and the write magnetic field can be increased. .
第7図は、磁気ヘツドの導体コイルに流す書き込み電
流(mA o−p、横軸)と磁気ギヤツプから漏れ出す書き
込み磁界の大きさ(kA/m、縦軸)との関係を示すグラフ
である。グラフ中の実線は従来品、点線は本発明品を示
す。なお、スペーシングは0.3μmである。本発明の適
用により、書き込み磁界を大きくすることができ、高密
度記録に敵した薄膜磁気ヘツドが実現できる。
FIG. 7 is a graph showing the relationship between the write current (mA o-p, horizontal axis) flowing through the conductor coil of the magnetic head and the magnitude of the write magnetic field leaking from the magnetic gear (kA / m, vertical axis). . The solid line in the graph represents the conventional product, and the dotted line represents the product of the present invention. The spacing is 0.3 μm. By applying the present invention, the write magnetic field can be increased and a thin film magnetic head suitable for high density recording can be realized.
〔実施例〕〔Example〕
以下、本発明を実施例により更に具体的に説明する
が、本発明はこれら実施例に限定されない。
Hereinafter, the present invention will be described more specifically with reference to Examples, but the present invention is not limited to these Examples.
実施例1 本発明の一実施例を第1図により説明する。すなわ
ち、第1図は本発明の一実施例としてのプロセスを示す
工程図である。第1図において、11は基板、12は下部磁
性膜、13は上部磁性膜、14は磁性膜先端部、15はギヤツ
プ材、16は導体コイル、17は有機絶縁膜、18は下地段差
を意味する。セラミツク基板11上に、第1図(a)に示
すように厚さ10μmのAl23膜18を形成した後、ウエツ
トエツチングにより所定のパターンを形成し、第1図
(b)に示す断面構造を得た。次に、下部磁性膜12とし
てのパーマロイ膜を成膜し、エツチングによつて磁気コ
ア形状を形成して、第1図(c)に示す断面構造を得
た。エツチングマスクとなる感光性樹脂膜パターンを形
成する工程では、精密な寸法精度が要求される磁性膜先
端部14は下地段差18の上部にあるため、感光性樹脂膜を
薄く形成でき、かつ露光時にはホトマスクと感光性樹脂
膜表面が良く密着して、高精度なパターニングができ
た。また、先端部以外のパーマロイ膜12は下地段差18の
下部にありパターニング精度は悪くなるが、この部分の
要求寸法精度は比較的ゆるやかであり問題は無かつた。
Embodiment 1 An embodiment of the present invention will be described with reference to FIG. That is, FIG. 1 is a process diagram showing a process as one embodiment of the present invention. In FIG. 1, 11 is the substrate, 12 is the lower magnetic film, 13 is the upper magnetic film, 14 is the tip of the magnetic film, 15 is the gap material, 16 is the conductor coil, 17 is the organic insulating film, and 18 is the underlying step. To do. As shown in FIG. 1 (a), an Al 2 O 3 film 18 having a thickness of 10 μm is formed on the ceramic substrate 11, and then a predetermined pattern is formed by wet etching, as shown in FIG. 1 (b). The cross-sectional structure was obtained. Next, a permalloy film was formed as the lower magnetic film 12, and a magnetic core shape was formed by etching to obtain a cross-sectional structure shown in FIG. 1 (c). In the step of forming the photosensitive resin film pattern that will be the etching mask, the magnetic film tip portion 14, which requires precise dimensional accuracy, is above the base step 18, so that the photosensitive resin film can be formed thinly and at the time of exposure. The photomask and the surface of the photosensitive resin film were in close contact with each other, and highly precise patterning was possible. Further, the permalloy film 12 other than the tip portion is below the underlying step 18, and the patterning accuracy is poor, but the required dimensional accuracy of this portion is relatively gentle, and there was no problem.
次に、第1図(d)に示すように、ギヤツプ材15、導
体コイル16及び有機樹脂膜17を形成した。有機樹脂膜17
の表面は、下地段差18の上部に形成されたギヤツプ材15
の表面と同一平面若しくはわずかに低くなるように形成
した。次いで、上部磁性膜13となるパーマロイ膜を成膜
し、エツチングによつて磁気コア形状を形成して、第1
図(e)に示す断面構造を持つ薄膜磁気ヘツドを得た。
エツチングマスクとなる感光性樹脂膜パターンを形成す
る工程では、樹脂膜塗布面がほぼ平面となつているた
め、感光性樹脂膜を薄く形成でき、かつ露光時にホトマ
スクと感光性樹脂膜表面が良く密着して高精度なパター
ニングができた。
Next, as shown in FIG. 1D, a gear material 15, a conductor coil 16 and an organic resin film 17 were formed. Organic resin film 17
The surface of the
Was formed so as to be flush with or slightly lower than the surface of. Then, a permalloy film to be the upper magnetic film 13 is formed, and a magnetic core shape is formed by etching.
A thin film magnetic head having a sectional structure shown in FIG.
In the process of forming the photosensitive resin film pattern that will be the etching mask, the resin film application surface is almost flat, so the photosensitive resin film can be thinly formed and the photomask and the photosensitive resin film surface are in good contact during exposure. As a result, highly precise patterning was achieved.
直径76mmの基板に素子を形成した場合の、磁性膜先端
部14の寸法の基板面内分布を第4図に示す。第4−1図
は従来の方法、すなわち段差下部において磁性膜先端部
14をパターニングした場合の結果を表しており、第4−
2図は本発明の方法、すなわち段差上部において磁性膜
先端部14をパターニングした場合の結果を表している。
本発明の方法により、寸法ばらつきが低減でき、かつホ
トマスク寸法に近い寸法値が得られることがわかつた。
FIG. 4 shows the in-plane distribution of the dimensions of the magnetic film tip portion 14 when the element is formed on the substrate having a diameter of 76 mm. Figure 4-1 shows the conventional method, that is, the tip of the magnetic film below the step.
14 shows the result when 14 is patterned,
FIG. 2 shows the result of the method of the present invention, that is, the patterning of the magnetic film tip portion 14 on the step.
It has been found that the method of the present invention can reduce the dimensional variation and obtain a dimension value close to the photomask dimension.
参考例1 本発明の参考例を第5図により説明する。すなわち第
5図は本発明の参考例としてのプロセスを示す工程図で
ある。第5図において符号51はセラミツク基板、52は下
部磁性膜、53は上部磁性膜、54は磁性膜先端部、55はギ
ヤツプ材、56は導体コイル、57は有機樹脂膜、58は溝、
59は有機樹脂膜先端部を意味する。セラミツク基板51上
に、第5図(a)に示すように深さ10μmの溝58を形成
した後、下部磁性膜52としてのパーマロイ膜パターンを
形成し、第5図(b)に示す構造を得た。精密な寸法精
度が要求される磁性膜先端部54は溝58の上部にあるた
め、感光性樹脂膜を薄く形成でき、かつ露光時にはホト
マスクと感光性樹脂膜表面が良く密着して、高精度はパ
ターニングができた。
Reference Example 1 A reference example of the present invention will be described with reference to FIG. That is, FIG. 5 is a process diagram showing a process as a reference example of the present invention. In FIG. 5, reference numeral 51 is a ceramic substrate, 52 is a lower magnetic film, 53 is an upper magnetic film, 54 is a tip of the magnetic film, 55 is a gear material, 56 is a conductor coil, 57 is an organic resin film, 58 is a groove,
59 means the tip of the organic resin film. After forming a groove 58 having a depth of 10 μm on the ceramic substrate 51 as shown in FIG. 5 (a), a permalloy film pattern as the lower magnetic film 52 is formed to obtain the structure shown in FIG. 5 (b). Obtained. Since the magnetic film tip portion 54, which requires precise dimensional accuracy, is located above the groove 58, the photosensitive resin film can be thinly formed, and at the time of exposure, the photomask and the surface of the photosensitive resin film are in close contact with each other, resulting in high accuracy. The patterning was completed.
次に、第5図(c)に示すように、ギヤツプ材55、導
体コイル56及び有機樹脂膜57を形成した。有機樹脂膜57
の表面は、基板51の上部に形成されたギヤツプ材55の表
面と同一平面若しくはわずかに低くなるように形成し
た。次いで、上部磁性膜53としてのパーマロイパターン
を形成して、第5図(d)に示す断面構造を持つ薄膜磁
気ヘツドを得た。パーマロイ53の上部はほぼ平面になつ
ているため感光性樹脂膜を薄く形成でき、かつ露光時に
ホトマスクと感光性樹脂膜表面が良く密着して高精度な
パターニングができた。
Next, as shown in FIG. 5C, a gear material 55, a conductor coil 56, and an organic resin film 57 were formed. Organic resin film 57
The surface of was formed so as to be flush with or slightly lower than the surface of the gear material 55 formed on the substrate 51. Then, a permalloy pattern was formed as the upper magnetic film 53 to obtain a thin film magnetic head having a sectional structure shown in FIG. Since the upper part of Permalloy 53 is almost flat, the photosensitive resin film can be formed thinly, and the photomask and the surface of the photosensitive resin film are in close contact with each other at the time of exposure, and highly precise patterning can be performed.
また、薄膜磁気ヘツドにおいては、磁気特性上の要求
から有機樹脂膜先端部59を所定の傾斜角度で精度良く形
成しなければならないが、本実施例においては、基板上
の溝58を加工・形成する際に傾斜角を所定の値にする事
は容易であり、高精度な傾斜面を持つ有機樹脂膜が形成
できるという利点も得られた。
Further, in the thin film magnetic head, the organic resin film front end portion 59 must be accurately formed at a predetermined inclination angle due to the requirement of magnetic characteristics, but in the present embodiment, the groove 58 on the substrate is processed / formed. In doing so, it is easy to set the inclination angle to a predetermined value, and there is an advantage that an organic resin film having a highly accurate inclined surface can be formed.
〔発明の効果〕〔The invention's effect〕
本発明によれば、ホトマスクと膜厚の薄い感光性樹脂
表面が良く密着した状態でパターニングできるので、高
精度な磁性膜形状を持つ薄膜磁気ヘツドを形成すること
ができる。
According to the present invention, since patterning can be performed in a state where the photomask and the thin photosensitive resin surface are in close contact with each other, a thin film magnetic head having a highly accurate magnetic film shape can be formed.
また、本発明によれば磁性膜部分の磁束飽和が防が
れ、書き込み磁界を大きくでき、高密度記録に敵した薄
膜磁気ヘツドが実現できる。
Further, according to the present invention, saturation of magnetic flux in the magnetic film portion can be prevented, the write magnetic field can be increased, and a thin film magnetic head suitable for high density recording can be realized.
【図面の簡単な説明】[Brief description of drawings]
第1図は本発明の1実施例としてのプロセスを示す工程
図、第2図は従来の薄膜磁気ヘツドの構造を説明するた
めの断面図、第3図は従来の薄膜磁気ヘツドの製造プロ
セスを示す工程図、第4−1図は従来方法、第4−2図
は本発明方法の各効果を表すグラフ、第5図は本発明の
参考例としてのプロセスを示す工程図、第6−1−1図
は従来の薄膜磁気ヘツドの断面図、第6−1−2図はそ
の媒体対向面から見た正面図、第6−2−1図は本発明
の薄膜磁気ヘツドの断面図を第6−2−2図はその媒体
対向面から見た正面図、第7図は磁気ヘツドの導体コイ
ルに流す書き込み電流と磁気ギヤツプから漏れ出す書き
込み磁界の大きさとの関係を示すグラフである。 11及び51:基板、12、52及び62:下部磁性膜、13、53及び
63:上部磁性膜、14及び54:磁性膜先端部、15及び55:ギ
ヤツプ材、16及び56:導体コイル、17:有機絶縁膜、18:
下地段差、57:有機樹脂膜、61:保護膜
FIG. 1 is a process diagram showing a process as one embodiment of the present invention, FIG. 2 is a sectional view for explaining the structure of a conventional thin film magnetic head, and FIG. 3 is a manufacturing process of a conventional thin film magnetic head. 4-1 is a process diagram showing the conventional method, FIG. 4-2 is a graph showing each effect of the method of the present invention, FIG. 5 is a process diagram showing a process as a reference example of the present invention, 1 is a sectional view of a conventional thin film magnetic head, FIG. 6-1-2 is a front view seen from the medium facing surface, and FIG. 6-2-1 is a sectional view of the thin film magnetic head of the present invention. FIG. 6-2-2 is a front view seen from the medium facing surface, and FIG. 7 is a graph showing the relationship between the write current flowing through the conductor coil of the magnetic head and the magnitude of the write magnetic field leaking from the magnetic gear. 11 and 51: substrate, 12, 52 and 62: lower magnetic film, 13, 53 and
63: upper magnetic film, 14 and 54: tip of magnetic film, 15 and 55: gear material, 16 and 56: conductor coil, 17: organic insulating film, 18:
Base step, 57: Organic resin film, 61: Protective film
───────────────────────────────────────────────────── フロントページの続き (72)発明者 華園 雅信 日立市久慈町4026番地 株式会社日立製 作所日立研究所内 (72)発明者 成重 真治 日立市久慈町4026番地 株式会社日立製 作所日立研究所内 (72)発明者 平井 修 小田原市国府津2880番地 株式会社日立 製作所小田原工場内 (56)参考文献 特開 昭57−113411(JP,A) 特開 昭60−113312(JP,A) 特開 昭55−93519(JP,A) 特開 昭61−153816(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Masanobu Kazono 4026 Kujimachi, Hitachi, Ltd. Hitachi Ltd., Hitachi Research Laboratory (72) Shinji Narushige 4026 Kujicho, Hitachi Hitachi, Ltd. Hitachi, Ltd. In-lab (72) Inventor Osamu Hirai 2880 Kozu, Odawara City Odawara factory, Hitachi, Ltd. (56) Reference JP 57-113411 (JP, A) JP 60-113312 (JP, A) JP 55-93519 (JP, A) JP-A 61-153816 (JP, A)

Claims (3)

    (57)【特許請求の範囲】(57) [Claims]
  1. 【請求項1】基板上に下部磁性膜、磁気ギヤツプ膜、上
    部磁性膜を順に積層して成る薄膜磁気ヘツドにおいて、
    基板若しくは基板上の下地膜に形成された段差に対し
    て、該段差の直上に下部磁性膜及び上部磁性膜の磁気デ
    イスクと対向する先端部を有し、かつ該段差の下部に、
    下部磁性膜の該先端部以外の部分を有することを特徴と
    する薄膜磁気ヘツド。
    1. A thin film magnetic head comprising a substrate, a lower magnetic film, a magnetic gap film, and an upper magnetic film, which are laminated in this order.
    With respect to the step formed on the substrate or the base film on the substrate, there is a tip portion facing the magnetic disk of the lower magnetic film and the upper magnetic film immediately above the step, and below the step,
    A thin-film magnetic head having a portion of the lower magnetic film other than the tip portion.
  2. 【請求項2】基板上に下部磁性膜、磁気ギヤツプ膜、上
    部磁性膜を順に積層する薄膜磁気ヘツドの製造方法にお
    いて、基板若しくは基板上の下地膜に段差を形成する工
    程、該段差上に下部磁性膜を成膜する工程、該下部磁性
    膜のうち磁気デイスクと対向する先端部を該段差の直上
    に配し、かつ該下部磁性膜の先端部以外の部分を該段差
    の下部に配するように該下部磁性膜パターンを形成する
    工程、その上に磁気ギヤツプ膜を形成する工程、その上
    に上部磁性膜を成膜する工程、及び上部磁性膜のうち少
    なくとも磁気デイスクと対向する先端部を該段差の直上
    に配するように該上部磁性膜パターンを形成する工程を
    含むことを特徴とする薄膜磁気ヘツドの製造方法。
    2. A method of manufacturing a thin film magnetic head in which a lower magnetic film, a magnetic gap film, and an upper magnetic film are sequentially laminated on a substrate, a step of forming a step on a substrate or a base film on the substrate, and a lower step on the step. A step of forming a magnetic film, so that a tip of the lower magnetic film facing the magnetic disk is arranged directly above the step, and a portion other than the tip of the lower magnetic film is arranged below the step. A step of forming the lower magnetic film pattern, a step of forming a magnetic gap film on the lower magnetic film pattern, a step of forming an upper magnetic film on the lower magnetic film pattern, and a tip portion of at least the upper magnetic film facing the magnetic disk. A method of manufacturing a thin film magnetic head, comprising a step of forming the upper magnetic film pattern so as to be arranged directly above a step.
  3. 【請求項3】該下部磁性膜パターン及び該上部磁性膜パ
    ターンの形成工程が、該段差の上部に感光性樹脂パター
    ンを形成し、該パターンを用いてエツチング若しくはめ
    つきを行うものである特許請求の範囲第2項記載の薄膜
    磁気ヘツドの製造方法。
    3. The step of forming the lower magnetic film pattern and the upper magnetic film pattern forms a photosensitive resin pattern on the step and performs etching or plating using the pattern. 2. A method of manufacturing a thin film magnetic head according to claim 2.
JP61071026A 1986-03-31 1986-03-31 Thin film magnetic head and method of manufacturing the same Expired - Lifetime JP2567221B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61071026A JP2567221B2 (en) 1986-03-31 1986-03-31 Thin film magnetic head and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61071026A JP2567221B2 (en) 1986-03-31 1986-03-31 Thin film magnetic head and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPS62229512A JPS62229512A (en) 1987-10-08
JP2567221B2 true JP2567221B2 (en) 1996-12-25

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Country Link
JP (1) JP2567221B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04111211A (en) * 1990-08-31 1992-04-13 Nec Ibaraki Ltd Thin-film magnetic head
JP2740586B2 (en) * 1991-08-12 1998-04-15 アルプス電気株式会社 Thin film magnetic head
JP2931523B2 (en) * 1994-06-24 1999-08-09 ティーディーケイ株式会社 Method for manufacturing thin-film magnetic head

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57113411A (en) * 1980-12-30 1982-07-14 Comput Basic Mach Technol Res Assoc Thin-film head

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