JPH05290327A - Production of magnetic head - Google Patents
Production of magnetic headInfo
- Publication number
- JPH05290327A JPH05290327A JP8730092A JP8730092A JPH05290327A JP H05290327 A JPH05290327 A JP H05290327A JP 8730092 A JP8730092 A JP 8730092A JP 8730092 A JP8730092 A JP 8730092A JP H05290327 A JPH05290327 A JP H05290327A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- thin film
- magnetic thin
- magnetic head
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、ビデオテープレコーダ
等の磁気記録再生装置において、情報の記録再生等に用
いられる磁気ヘッドの製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a magnetic head used for recording / reproducing information in a magnetic recording / reproducing apparatus such as a video tape recorder.
【０００２】[0002]
【従来の技術】磁気記録技術の高密度化にともなって、
例えばメタルテープ等の高保持力媒体が主流になってき
た現在、磁気ヘッドに使用されるコア材料は高い飽和磁
束密度を有するものが要求されている。2. Description of the Related Art With the increasing density of magnetic recording technology,
For example, as a medium having a high coercive force such as a metal tape has become mainstream, a core material used for a magnetic head is required to have a high saturation magnetic flux density.
【０００３】そこで、現在、ビデオテープレコーダ等に
多く使用されている磁気ヘッドには、図１３（ａ）に示
すように、例えば感光性結晶化ガラス、結晶化ガラスあ
るいは、セラミクス等の非磁性材料あるいは、軟磁性フ
ェライト等の酸化物磁性材料からなる基板１と、基板１
に積層成膜された高飽和磁束密度を有する磁性薄膜部２
と、磁性薄膜部２を覆う低融点ガラス３とを有する一対
のコア片１６・１６からなる磁気ヘッドチップ１０’が
使用されている。Therefore, as shown in FIG. 13 (a), for example, a photosensitive head, a crystallized glass, or a non-magnetic material such as ceramics is used in a magnetic head which is often used in a video tape recorder. Alternatively, the substrate 1 made of an oxide magnetic material such as soft magnetic ferrite, and the substrate 1
Magnetic thin film part 2 having a high saturation magnetic flux density formed by stacking on
And a magnetic head chip 10 'comprising a pair of core pieces 16 and 16 having a low melting point glass 3 covering the magnetic thin film portion 2 is used.
【０００４】また、近年、長時間録画再生等に対応する
ためにトラック幅が狭くなる傾向にある。この狭トラッ
ク化に対応して、上記磁気ヘッドチップ１０’の磁性薄
膜部２の厚さを薄くすると、磁気コアとしての磁気断面
積が減少することにより、磁気抵抗が大きくなる。この
ため、このような磁気ヘッドを使用すれば、記録・再
生、特に再生効率が低下するという問題が生じている。Further, in recent years, the track width tends to be narrowed in order to cope with recording and reproduction for a long time. If the thickness of the magnetic thin film portion 2 of the magnetic head chip 10 'is reduced in response to this narrowing of the track, the magnetic cross-sectional area of the magnetic core is reduced and the magnetic resistance is increased. Therefore, when such a magnetic head is used, there arises a problem that recording / reproducing, particularly reproducing efficiency is lowered.
【０００５】そこで、上記問題点を回避するために、図
１３（ｂ）に示すように、磁気ギャップ１５近傍の磁性
薄膜部２の膜厚を薄くすることにより、狭トラック化に
対応させ、一方、磁気ギャップ１５近傍以外の磁性薄膜
部２の膜厚を厚くして磁気断面積を増やし、磁気抵抗を
低減した上記磁気ヘッドチップ１０’が使用されてい
る。Therefore, in order to avoid the above problem, as shown in FIG. 13B, the thickness of the magnetic thin film portion 2 in the vicinity of the magnetic gap 15 is reduced to cope with a narrow track. The magnetic head chip 10 'is used in which the magnetic thin film portion 2 other than the vicinity of the magnetic gap 15 is thickened to increase the magnetic cross-sectional area and reduce the magnetic resistance.
【０００６】上記磁気ヘッドチップ１０’を構成する一
対のコア片１６・１６は、図１３（ｂ）に示すように、
基板１・１上の磁性薄膜部２・２が磁気ギャップ１５を
有するヘッドコアを形成するように、磁性薄膜部２・２
の断面を対向させて、ギャップ面１３にて接合されてい
る。また、上記磁気ギャップ１５近傍の磁性薄膜部２の
膜厚が薄くなっており、狭トラック化に対応している。
そして、磁気ギャップ１５近傍以外の磁性薄膜部２の膜
厚を厚くすることで、磁気抵抗を低減している。一方、
磁気ギャップ１５と磁気テープ等の磁気記録媒体とを滑
らかに接触するように摺動面１７を所定の面粗度になる
ように研磨仕上げが行われている。As shown in FIG. 13B, the pair of core pieces 16 and 16 constituting the magnetic head chip 10 'are as follows.
The magnetic thin film portion 2.2 is formed so that the magnetic thin film portion 2.2 on the substrate 1.1 forms a head core having the magnetic gap 15.
Are joined at the gap surface 13 with their cross sections facing each other. Further, the film thickness of the magnetic thin film portion 2 in the vicinity of the magnetic gap 15 is thin, which corresponds to the narrow track.
Then, the magnetic resistance is reduced by increasing the thickness of the magnetic thin film portion 2 other than the vicinity of the magnetic gap 15. on the other hand,
The sliding surface 17 is polished and finished to have a predetermined surface roughness so that the magnetic gap 15 and a magnetic recording medium such as a magnetic tape are smoothly brought into contact with each other.
【０００７】上記構成の磁気ヘッドチップ１０’の製造
方法について、本発明の説明図である図１・図２・図５
ないし図９および図１１ないし図１３を参照して以下に
説明する。FIG. 1, FIG. 2, and FIG. 5, which are explanatory views of the present invention, regarding a method of manufacturing the magnetic head chip 10 'having the above-described structure.
9 to 11 and 13 to 13 will be described below.
【０００８】先ず、図２に示すように、例えば結晶化ガ
ラス等からなる略長方体形状の基板１の表面に、所定ピ
ッチ寸法Ａとなる略Ｖ字状の溝５…が平行して形成され
る。この溝５…は、基板１の一端から他端まで直線的に
形成され、一定深さを持つ形状となっている。次に、図
１（ａ）に示すように、上記各溝５…の片側斜面に例え
ば真空蒸着あるいはスパッタリング法等により、所定の
膜厚を有する磁性薄膜部２を形成する。First, as shown in FIG. 2, substantially V-shaped grooves 5 having a predetermined pitch dimension A are formed in parallel on the surface of a substantially rectangular substrate 1 made of crystallized glass or the like. To be done. The grooves 5 are linearly formed from one end to the other end of the substrate 1 and have a shape with a constant depth. Next, as shown in FIG. 1 (a), a magnetic thin film portion 2 having a predetermined film thickness is formed on one side slope of each groove 5 by, for example, vacuum deposition or sputtering.
【０００９】この磁性薄膜部２は、例えばセンダスト
（Ｆｅ−Ａｌ−Ｓｉ）等の高飽和磁束密度を有するもの
からなる軟磁性薄膜２ａとＳｉＯ2 等の非磁性非導体か
らなる層間絶縁膜２ｂとが所定の膜厚で交互に積層状態
となるように形成されている。つまり、上記のようなセ
ンダスト合金や、あるいは非晶質合金を磁気ヘッドコア
材として使用した場合、これら材料自身の比抵抗が７０
〜１２０μΩ・ｃｍと低いために、高周波領域では過電
流による損失が大きくなる。そこで、上記のような積層
構造とすることで、高周波領域での特性の改善を行って
いる。[0009] The magnetic thin film part 2, for example, sendust and (Fe-Al-Si) interlayer insulating film 2b made of nonmagnetic conductor such as soft magnetic thin film 2a and SiO 2 consisting of those having a high saturation magnetic flux density such as Are formed so as to have a predetermined film thickness and are alternately laminated. That is, when the above-mentioned sendust alloy or amorphous alloy is used as the magnetic head core material, the specific resistance of these materials is 70%.
Since it is as low as 120 μΩ · cm, the loss due to overcurrent becomes large in the high frequency region. Therefore, by adopting the above-mentioned laminated structure, the characteristics in the high frequency region are improved.
【００１０】次に、上記磁性薄膜部２は、狭トラック化
に対応させるために、図１１に示すように、片側斜面５
ａの頂点近傍から頂点にいたる磁性薄膜部２の上端部７
を、例えば研削加工やエッチングにより所定膜厚になる
ように加工し（以下、磁性薄膜部２の絞り込み加工と称
する）、磁性薄膜部２からなる磁気ギャップの幅の寸法
をａ’とする。この寸法ａ’は、磁気ヘッドにおけるト
ラック幅に相当するものである。Next, as shown in FIG. 11, the magnetic thin film portion 2 has a slope 5 on one side, as shown in FIG.
The upper end portion 7 of the magnetic thin film portion 2 from the vicinity of the apex to the apex
Is processed to have a predetermined film thickness by, for example, grinding or etching (hereinafter referred to as narrowing down of the magnetic thin film portion 2), and the width of the magnetic gap formed by the magnetic thin film portion 2 is defined as a '. This dimension a'corresponds to the track width of the magnetic head.
【００１１】上記のように、磁性薄膜部２の絞り込み加
工を施した後、図５に示すように、基板１上に低融点ガ
ラス３を十分に充填する。そして、図６に示すように、
この低融点ガラス３が固化した後、溝５…の頂点部分ま
で磁性薄膜部２が露出するように低融点ガラス３を平面
状に研磨し、その表面にＳｉＯ2 等のギャップ材を成膜
し、また、図７に示すように、内部巻線溝１１・外部巻
線溝１２をそれぞれ形成して、片側コアブロック１８と
して作製する。その後、図８に示すように、一対の上記
コアブロック１８・１８を相対する磁性薄膜部２・２同
士が上記ギャップ材により規定される磁気ギャップ１５
を中央に挟んで互いに直線状に連なるように当接させて
加圧固定する。これにより、低融点ガラス３によって一
対のコアブロック１８・１８が溶着接合して、一体化さ
れたコアブロック１９が作製される。上記コアブロック
１９において、図１０に示すように、磁気ギャップ１５
を挟んで所定の寸法Ｂで切断することにより、図１３
（ａ）に示すような磁気ヘッドチップ１０’を得る。After the magnetic thin film portion 2 has been narrowed down as described above, the low melting glass 3 is sufficiently filled on the substrate 1 as shown in FIG. Then, as shown in FIG.
After the low-melting glass 3 is solidified, the low-melting glass 3 is planarly polished so that the magnetic thin film portion 2 is exposed up to the apex of the groove 5, and a gap material such as SiO 2 is formed on the surface thereof. Further, as shown in FIG. 7, the inner winding groove 11 and the outer winding groove 12 are respectively formed to produce the one-sided core block 18. After that, as shown in FIG. 8, the magnetic thin film portions 2 and 2 facing the pair of core blocks 18 and 18 are magnetic gaps 15 defined by the gap material.
Are sandwiched in the center and abutted so as to be linearly connected to each other and fixed under pressure. As a result, the pair of core blocks 18, 18 are welded and joined by the low melting point glass 3 to produce the integrated core block 19. In the core block 19, as shown in FIG.
As shown in FIG.
A magnetic head chip 10 'as shown in (a) is obtained.
【００１２】[0012]
【発明が解決しようとする課題】ところが、上記従来の
磁気ヘッド製造方法において、磁気コアを形成する軟磁
性薄膜２ａを研削加工することにより、磁性薄膜部２の
絞り込み加工が施されるので、図１２に示すように、加
工誤差により磁気ギャップを形成する部分の寸法ａ’に
バラツキが生じる。また、この磁気ギャップを形成する
部分の寸法ａ’は、磁気ヘッドにおけるトラック幅の寸
法に相当するものであり、この寸法ａ’にバラツキが生
じることにより、磁気ヘッドのトラック成形精度に悪影
響を与える。このため、磁気ヘッドにおける記録再生特
性を著しく低下させるという問題が生じている。However, in the above-mentioned conventional magnetic head manufacturing method, the magnetic thin film portion 2 is narrowed down by grinding the soft magnetic thin film 2a forming the magnetic core. As shown in FIG. 12, due to a processing error, the dimension a ′ of the portion forming the magnetic gap varies. Further, the dimension a ′ of the portion forming the magnetic gap corresponds to the dimension of the track width in the magnetic head, and the variation in the dimension a ′ adversely affects the track forming accuracy of the magnetic head. .. Therefore, there is a problem that the recording / reproducing characteristics of the magnetic head are significantly deteriorated.
【００１３】また、積層された磁性薄膜部２の絞り込み
加工を施すとき、成膜時の応力により、積層膜部分の剥
がれや裂けが生じるため、磁気ヘッドの磁気特性を低下
させるという問題が生じている。Further, when the laminated magnetic thin film portion 2 is subjected to the narrowing process, the stress during film formation causes peeling or tearing of the laminated film portion, which causes a problem of deteriorating the magnetic characteristics of the magnetic head. There is.
【００１４】本発明は、上記問題点に鑑みなされたもの
であって、その目的は、磁性薄膜部の絞り込み加工を施
すときのトラック幅に相当する部分の寸法誤差をなく
し、磁気ヘッドの記録再生特性を向上させ、また、磁性
薄膜部の絞り込み加工を施すときの積層膜部分の剥がれ
や裂けを防止し、磁気ヘッドの磁気特性を向上させるよ
うな磁気ヘッド製造方法を提供することにある。The present invention has been made in view of the above problems, and an object thereof is to eliminate a dimensional error in a portion corresponding to a track width when performing a narrowing process of a magnetic thin film portion, and perform recording / reproducing of a magnetic head. It is an object of the present invention to provide a method of manufacturing a magnetic head that improves the characteristics, prevents peeling and tearing of the laminated film portion when the magnetic thin film portion is narrowed, and improves the magnetic characteristics of the magnetic head.
【００１５】[0015]
【課題を解決するための手段】請求項１の磁気ヘッド製
造方法は、基板の表面に略Ｖ字状の複数の溝を形成し、
各溝の片側斜面に沿って軟磁性薄膜と層間絶縁膜とを交
互に積層して磁性薄膜部を設けるとともに、上記磁性薄
膜部の斜面頂点近傍を、研削加工又はエッチングによっ
て所定の膜厚となるように加工し、その後、一対の上記
基板の各々の加工された磁性薄膜部頂部を対向させて、
磁気ギャップを形成して接合し、コアブロックを作製し
た後、ギャップ面を挟んで上記コアブロックを切断する
ことにより得られる磁気ヘッドチップを形成する磁気ヘ
ッド製造方法において、上記磁性薄膜部で、トラック幅
に相当する膜厚となるように軟磁性薄膜と層間絶縁膜と
を交互に積層した後、非磁性非導体薄膜を所定の膜厚に
成膜し、その上に引き続き、軟磁性薄膜と層間絶縁膜を
所定の膜厚となるまで積層成膜することを特徴とするも
のである。According to a first aspect of the present invention, there is provided a method of manufacturing a magnetic head, wherein a plurality of substantially V-shaped grooves are formed on a surface of a substrate,
A magnetic thin film portion is provided by alternately laminating a soft magnetic thin film and an interlayer insulating film along one side slope of each groove, and a predetermined film thickness is obtained by grinding or etching near the apex of the slope of the magnetic thin film portion. And then, facing the processed magnetic thin film portion tops of each of the pair of substrates,
In a magnetic head manufacturing method for forming a magnetic head chip obtained by forming a magnetic gap and joining the core blocks to form a core block, and then cutting the core block with the gap surface sandwiched between the magnetic thin film portion and the track. After alternately stacking the soft magnetic thin film and the interlayer insulating film so as to have a film thickness corresponding to the width, a non-magnetic non-conductive thin film is formed to a predetermined film thickness, and then, the soft magnetic thin film and the interlayer insulating film are continuously formed. The invention is characterized in that the insulating films are laminated and formed to a predetermined film thickness.
【００１６】請求項２の磁気ヘッド製造方法は、請求項
１記載の磁気ヘッド製造方法において、上記磁性薄膜部
で、トラック幅に相当する膜厚となるように軟磁性薄膜
と層間絶縁膜とを交互に積層した後、非磁性金属薄膜を
所定の膜厚に成膜し、その上に引き続き、軟磁性薄膜と
層間絶縁膜を所定の膜厚となるまで積層成膜することを
特徴とするものである。A magnetic head manufacturing method according to a second aspect is the magnetic head manufacturing method according to the first aspect, wherein the soft magnetic thin film and the interlayer insulating film are formed in the magnetic thin film portion so as to have a film thickness corresponding to a track width. After alternately laminating, a nonmagnetic metal thin film is formed to a predetermined film thickness, and then a soft magnetic thin film and an interlayer insulating film are successively laminated and formed to a predetermined film thickness. Is.
【００１７】[0017]
【作用】請求項１の構成によれば、磁性薄膜部がトラッ
ク幅寸法に積層されており、絞り込み加工を施すときの
加工誤差が、磁性薄膜部中間部分に成膜された非磁性非
導体薄膜の膜厚によって吸収できるので、磁性薄膜部の
膜厚の寸法精度が向上する。従って、磁気ヘッドにおけ
るトラック幅寸法に影響を与えることがなくなるので、
磁気テープ上での記録パターンの位置認識も向上し、記
録再生特性が向上する。According to the structure of claim 1, the magnetic thin film portion is laminated in the track width dimension, and a processing error when performing the narrowing processing is caused by the non-magnetic non-conductive thin film formed in the middle portion of the magnetic thin film portion. Since it can be absorbed by the thickness of the magnetic thin film, the dimensional accuracy of the thickness of the magnetic thin film portion is improved. Therefore, since it does not affect the track width dimension in the magnetic head,
The position recognition of the recording pattern on the magnetic tape is also improved, and the recording / reproducing characteristics are improved.
【００１８】請求項２の構成によれば、請求項１の作用
に加えて、磁性薄膜部をトラック幅に相当する寸法に絞
り込み加工を施すとき、非磁性金属薄膜は、軟磁性薄膜
と同様な膨張係数の値を示し、成膜時の応力を緩和する
ことができるので、積層膜の裂けや剥がれを防ぐことが
でき、磁気ヘッドの磁気特性劣化を防ぐことが可能とな
る。According to the structure of claim 2, in addition to the function of claim 1, when the magnetic thin film portion is narrowed down to a dimension corresponding to the track width, the nonmagnetic metal thin film is similar to the soft magnetic thin film. Since the value of the expansion coefficient is shown and the stress at the time of film formation can be relieved, the laminated film can be prevented from tearing or peeling, and deterioration of the magnetic characteristics of the magnetic head can be prevented.
【００１９】[0019]
〔実施例１〕本発明の製造方法の一実施例について図１
ないし図１０に基づいて説明すれば、以下の通りであ
る。[Embodiment 1] FIG. 1 shows an embodiment of the manufacturing method of the present invention.
The following is a description with reference to FIG.
【００２０】本実施例の製造方法を適用した磁気ヘッド
チップ１０について図１０（ａ）を参照しながら説明す
る。磁気ヘッドチップ１０は、例えば感光性結晶化ガラ
ス、結晶化ガラスあるいは、セラミックス等の非磁性材
料あるいは軟磁性フェライト等の酸化物磁性材料からな
る基板１と、基板１に成膜された積層構造の磁性薄膜部
２、磁性薄膜部２を覆う低融点ガラス３とを有する一対
のコア片１６・１６からなる。この一対のコア片１６・
１６は、基板１・１上の磁性薄膜部２・２が磁気ギャッ
プ１５を有するヘッドコアを形成するように、磁性薄膜
部２・２の端面を対向させて、ギャップ面１３にて接合
されている。また、磁気ギャップ１５と磁気テープ等の
磁気記録媒体とを滑らかに接触するように、摺動面１７
を所定の面粗度になるように研磨仕上げが行われてい
る。A magnetic head chip 10 to which the manufacturing method of this embodiment is applied will be described with reference to FIG. The magnetic head chip 10 has a substrate 1 made of, for example, photosensitive crystallized glass, crystallized glass, or a nonmagnetic material such as ceramics or an oxide magnetic material such as soft magnetic ferrite, and a laminated structure formed on the substrate 1. It is composed of a pair of core pieces 16 and 16 having the magnetic thin film portion 2 and the low melting point glass 3 covering the magnetic thin film portion 2. This pair of core pieces 16
16 are joined at the gap surface 13 so that the end faces of the magnetic thin film portions 2 and 2 face each other so that the magnetic thin film portions 2 and 2 on the substrate 1.1 form a head core having the magnetic gap 15. .. In addition, the sliding surface 17 is arranged so that the magnetic gap 15 and the magnetic recording medium such as a magnetic tape are smoothly brought into contact with each other.
Is subjected to polishing finish so as to have a predetermined surface roughness.
【００２１】上記コア片１６において、磁性薄膜部２
は、基板１に形成された略Ｖ字状の溝５の片側斜面に沿
って、例えばセンダスト（Ｆｅ−Ａｌ−Ｓｉ）等の高飽
和磁束密度を有する軟磁性薄膜２ａと、ＳｉＯ2 等の非
磁性非導体からなる層間絶縁膜２ｂとを交互に積層して
構成されている。また、磁性薄膜部２は、図１０（ｂ）
に示すように、トラック幅を狭くするため、磁気ギャッ
プ１５から溝５底面方向にかけて絞りこみがなされてい
る。そして、磁気ヘッドチップ１０には、ヘッドコア１
６・１６に図示しないヘッドコイルを巻回するために、
基板１のギャップ面１３に内部巻線溝１１・１１を形成
し、また、ギャップ面１３と反対側の面に外部巻線溝１
２・１２を形成する。そして、内部巻線溝１１・１１に
より内部巻線穴１４を形成している。また、磁性薄膜部
２は、図１０（ｂ）に示すように、トラック幅を狭くす
るため、磁気ギャップ１５近傍が絞り込み状態となって
いる。In the core piece 16, the magnetic thin film portion 2
Is a soft magnetic thin film 2a having a high saturation magnetic flux density, such as sendust (Fe-Al-Si), and a non-magnetic material such as SiO 2 along one side slope of the substantially V-shaped groove 5 formed on the substrate 1. Interlayer insulating films 2b made of a magnetic non-conductor are alternately laminated. Further, the magnetic thin film portion 2 is shown in FIG.
As shown in FIG. 5, in order to narrow the track width, the magnetic gap 15 is narrowed down toward the bottom surface of the groove 5. The magnetic head chip 10 has a head core 1
In order to wind a head coil (not shown) on 6/16,
The inner winding groove 11 is formed on the gap surface 13 of the substrate 1, and the outer winding groove 1 is formed on the surface opposite to the gap surface 13.
Form 2.12. Then, the inner winding hole 11 is formed by the inner winding groove 11. In the magnetic thin film portion 2, as shown in FIG. 10B, the track width is narrowed, so that the vicinity of the magnetic gap 15 is in a narrowed state.
【００２２】上記構成の磁気ヘッドの製造方法について
図１ないし図１０を参照しながら説明する。A method of manufacturing the magnetic head having the above structure will be described with reference to FIGS.
【００２３】先ず、図２に示すように、非磁性体または
酸化物磁性体からなる基板１の表面に、所定の深さを有
する断面略Ｖ字状の複数の溝５…を、所定のピッチ寸法
Ａで相互に隣接して、基板１の一端から他端まで直線的
に、連続して形成する。続いて、図１（ａ）に示すよう
に、各溝５…の片側斜面５ａ…に、例えば真空蒸着法あ
るいはスパッタリング法等により、例えばセンダスト
（Ｆｅ−Ａｌ−Ｓｉ）等の高飽和磁束密度を有する軟磁
性薄膜２ａを所定膜厚で成膜し、次に、その上に例えば
ＳｉＯ2 等の非磁性非導体からなる層間絶縁膜２ｂを所
定膜厚で成膜する。以下同様に、要求されるトラック幅
に相当する膜厚になるまで交互に軟磁性薄膜２ａと層間
絶縁膜２ｂを成膜する。First, as shown in FIG. 2, a plurality of grooves 5 having a V-shaped cross section and having a predetermined depth are formed on a surface of a substrate 1 made of a non-magnetic material or an oxide magnetic material at a predetermined pitch. Adjacent to each other with the dimension A, the substrate 1 is linearly and continuously formed from one end to the other end. Subsequently, as shown in FIG. 1A, a high saturation magnetic flux density of, for example, sendust (Fe-Al-Si) is applied to the one-side inclined surface 5a of each groove 5 by, for example, a vacuum deposition method or a sputtering method. The soft magnetic thin film 2a which it has is formed into a predetermined film thickness, and then the interlayer insulating film 2b made of a non-magnetic non-conductor such as SiO 2 is formed into a predetermined film thickness. Similarly, the soft magnetic thin film 2a and the interlayer insulating film 2b are alternately formed until the film thickness corresponds to the required track width.
【００２４】さらに、トラック幅に相当する膜厚まで積
層された軟磁性薄膜２ａと層間絶縁膜２ｂから形成され
た薄膜部の上に、例えばＳｉＯ2 等の非磁性非導体薄膜
２ｃを約２μｍになるように成膜する。そして、その上
から磁性薄膜部２が所定の膜厚となるように、さらに軟
磁性薄膜２ａと層間絶縁膜２ｂを積層成膜する。Further, a non-magnetic non-conductor thin film 2c of, for example, SiO 2 is formed to a thickness of about 2 μm on the thin film portion formed of the soft magnetic thin film 2a and the interlayer insulating film 2b which are laminated to a film thickness corresponding to the track width. The film is formed so that Then, a soft magnetic thin film 2a and an interlayer insulating film 2b are further laminated and formed thereon so that the magnetic thin film portion 2 has a predetermined film thickness.
【００２５】次いで、図３に示すように、非磁性非導体
薄膜２ｃより後に積層された部分に対し、例えば研削加
工あるいはエッチングにより絞り込み加工を施す。続い
て、図５に示すように、磁性薄膜部２が形成された各溝
５…に低融点ガラス３を充填する。このとき、低融点ガ
ラス３は、基板１に設けられた溝５…の頂点を覆うよう
に十分に充填される。そして、低融点ガラス３が固化し
た後、図６に示すように、溝５…の頂点まで低融点ガラ
ス３を平面状に研磨する。Then, as shown in FIG. 3, the portion laminated after the non-magnetic non-conductor thin film 2c is subjected to a narrowing process by, for example, grinding or etching. Subsequently, as shown in FIG. 5, the low melting point glass 3 is filled in each of the grooves 5 in which the magnetic thin film portion 2 is formed. At this time, the low melting point glass 3 is sufficiently filled so as to cover the tops of the grooves 5 provided in the substrate 1. Then, after the low-melting glass 3 is solidified, the low-melting glass 3 is planarly polished up to the tops of the grooves 5 ... As shown in FIG.
【００２６】この後、図７に示すように、磁気ヘッドチ
ップ１０には、磁性薄膜部２・２からなるヘッドコア１
６・１６に図示しないヘッドコイルを形成するために、
基板１のギャップ面１３に内部巻線溝１１を形成し、ま
た、ギャップ面１３と反対側の面に外部巻線溝１２を形
成する。さらに、図示しないＳｉＯ2 等の非磁性ギャッ
プ材を真空蒸着法あるいはスパッタリング法等の方法で
所定のギャップとなるようにギャップ面１３に均一に形
成し、これを基板ブロック１８とする。Thereafter, as shown in FIG. 7, the magnetic head chip 10 has a head core 1 composed of magnetic thin film portions 2 and 2.
In order to form a head coil (not shown) on 6/16,
The inner winding groove 11 is formed on the gap surface 13 of the substrate 1, and the outer winding groove 12 is formed on the surface opposite to the gap surface 13. Further, a non-magnetic gap material such as SiO 2 ( not shown) is uniformly formed on the gap surface 13 by a method such as a vacuum deposition method or a sputtering method so as to form a predetermined gap, which is used as a substrate block 18.
【００２７】次いで、図８に示すように、上記構成の二
つの基板ブロック１８・１８のギャップ面１３同士をギ
ャップ材を挟む形で互いに対向するようにし、磁性薄膜
部２・２によって磁気ギャップ１５が形成されるように
位置合わせを行い、加圧固定を行いコアブロック１９を
形成する。さらに、図９に示すコアブロック１９の破線
に沿って所定のピッチ寸法Ｂで切断したものを図１に示
す磁気ヘッドチップ１０とする。Next, as shown in FIG. 8, the gap surfaces 13 of the two substrate blocks 18 and 18 having the above structure are made to face each other with the gap material sandwiched therebetween, and the magnetic gap 15 is formed by the magnetic thin film portions 2.2. The core block 19 is formed by aligning the core block 19 so that the core block 19 is formed. Further, a magnetic head chip 10 shown in FIG. 1 is obtained by cutting the core block 19 shown in FIG. 9 along a broken line at a predetermined pitch dimension B.
【００２８】そして、この磁気ヘッドチップ１０を図示
しないベース板に接着固定した後、内部巻線溝１１と外
部巻線溝１２とを利用して巻線を行いヘッドコイルを形
成し、磁気テープ等の磁気記録媒体ん摺動面１７をテー
プ研磨することにより本実施例の磁気ヘッドが形成され
る。After the magnetic head chip 10 is bonded and fixed to a base plate (not shown), winding is performed using the internal winding groove 11 and the external winding groove 12 to form a head coil, and a magnetic tape or the like is formed. The magnetic head of this embodiment is formed by tape-polishing the sliding surface 17 of the magnetic recording medium.
【００２９】このように上記実施例１の方法によれば、
磁性薄膜部２の絞り込み加工部７における加工の影響
が、図４（ａ）に示すように、非磁性非導体薄膜２ｃに
よって吸収されるので、磁性薄膜部２のトラック幅に相
当する部分の寸法ａの成形精度が向上する。従って、磁
気ヘッドトラック成形精度が向上するので、磁気テープ
上での記録パターンの位置精度が向上し、記録再生特性
が良好となる。As described above, according to the method of the first embodiment,
As shown in FIG. 4A, the influence of the processing in the narrowed-down processing portion 7 of the magnetic thin film portion 2 is absorbed by the non-magnetic non-conductor thin film 2c, so that the dimension of the portion corresponding to the track width of the magnetic thin film portion 2 The molding accuracy of a is improved. Therefore, since the magnetic head track forming accuracy is improved, the positional accuracy of the recording pattern on the magnetic tape is improved, and the recording / reproducing characteristics are improved.
【００３０】〔実施例２〕実施例１の磁気ヘッド製造方
法における磁性薄膜部２を形成する工程において、図１
（ｂ）に示すように、所定のトラック幅に相当するよう
に軟磁性薄膜２ａと層間絶縁膜２ｂを交互に成膜し積層
構造とした後、例えばＣｕ、Ａｌ等の非磁性金属薄膜２
ｄを約２μｍの膜厚となるように成膜する。そして、そ
の上に引き続き軟磁性薄膜２ａと層間絶縁膜２ｂを交互
に成膜し積層構造とする。[Embodiment 2] In the process of forming the magnetic thin film portion 2 in the magnetic head manufacturing method of Embodiment 1, FIG.
As shown in (b), a soft magnetic thin film 2a and an interlayer insulating film 2b are alternately formed so as to correspond to a predetermined track width to form a laminated structure, and then a nonmagnetic metal thin film 2 such as Cu or Al is formed.
The d is formed to have a film thickness of about 2 μm. Then, a soft magnetic thin film 2a and an interlayer insulating film 2b are alternately formed thereon to form a laminated structure.
【００３１】次いで、図４（ｂ）に示すように、非磁性
金属薄膜２ｄより後に積層された部分に対し、例えば研
削加工あるいはエッチングにより絞り込み加工を施す。
以下、実施例１と同様の製造方法にて磁気ヘッドが形成
される。Next, as shown in FIG. 4 (b), the portion laminated after the non-magnetic metal thin film 2d is subjected to a narrowing process by, for example, grinding process or etching.
Hereinafter, the magnetic head is formed by the same manufacturing method as that of the first embodiment.
【００３２】このようにして、上記実施例２の方法によ
れば、磁性薄膜部２の絞り込み加工部７における加工の
影響が、非磁性金属薄膜２ｄによって吸収されるので、
磁性薄膜部２のトラック幅に相当する部分の寸法ａの成
形精度が向上する。従って、磁気ヘッドトラック成形精
度が向上するので、磁気テープ上での記録パターンの位
置精度が向上し、記録再生特性が良好となる。さらに、
非磁性金属薄膜は、軟磁性薄膜と同様な熱膨張係数の値
を示すので、成膜時の応力を緩和することができる。従
って、磁性薄膜部に絞り込み加工を施すときに生じる裂
けや剥がれを防止することができるので、磁気ヘッドの
磁気特性劣化を防止することが可能となる。As described above, according to the method of the second embodiment, the influence of the processing in the narrowing processing portion 7 of the magnetic thin film portion 2 is absorbed by the non-magnetic metal thin film 2d.
The molding accuracy of the dimension a of the portion corresponding to the track width of the magnetic thin film portion 2 is improved. Therefore, since the magnetic head track forming accuracy is improved, the positional accuracy of the recording pattern on the magnetic tape is improved, and the recording / reproducing characteristics are improved. further,
Since the non-magnetic metal thin film exhibits the same coefficient of thermal expansion as that of the soft magnetic thin film, the stress during film formation can be relaxed. Therefore, it is possible to prevent tearing or peeling that occurs when the magnetic thin film portion is subjected to the narrowing process, and it is possible to prevent deterioration of the magnetic characteristics of the magnetic head.
【００３３】[0033]
【発明の効果】請求項１の磁気ヘッド製造方法は、以上
のように、基板の表面に略Ｖ字状の複数の溝を形成し、
各溝の片側斜面に沿って軟磁性薄膜と層間絶縁膜とを交
互に積層して磁性薄膜部を設けるとともに、上記磁性薄
膜部の斜面頂点近傍を、研削加工又はエッチングによっ
て所定の膜厚となるように加工し、その後、一対の上記
基板の各々の加工された磁性薄膜部頂部を対向させて、
磁気ギャップを形成して接合し、コアブロックを作製し
た後、ギャップ面を挟んで上記コアブロックを切断する
ことにより得られる磁気ヘッドチップを形成する磁気ヘ
ッド製造方法において、上記磁性薄膜部で、トラック幅
に相当する膜厚となるように軟磁性薄膜と層間絶縁膜と
を交互に積層した後、非磁性非導体薄膜を所定の膜厚に
成膜し、その上に引き続き、軟磁性薄膜と層間絶縁膜を
所定の膜厚となるまで積層成膜することを特徴とするも
のである。As described above, the magnetic head manufacturing method of the present invention forms a plurality of substantially V-shaped grooves on the surface of the substrate,
A magnetic thin film portion is provided by alternately laminating a soft magnetic thin film and an interlayer insulating film along one side slope of each groove, and a predetermined film thickness is obtained by grinding or etching near the apex of the slope of the magnetic thin film portion. And then, facing the processed magnetic thin film portion tops of each of the pair of substrates,
In a magnetic head manufacturing method for forming a magnetic head chip obtained by forming a magnetic gap and joining the core blocks to form a core block, and then cutting the core block with the gap surface sandwiched between the magnetic thin film portion and the track. After alternately stacking the soft magnetic thin film and the interlayer insulating film so as to have a film thickness corresponding to the width, a non-magnetic non-conductive thin film is formed to a predetermined film thickness, and then, the soft magnetic thin film and the interlayer insulating film are continuously formed. The invention is characterized in that the insulating films are laminated and formed to a predetermined film thickness.
【００３４】これによって、磁性薄膜部の絞り込み加工
の影響が非磁性非導体薄膜によって吸収されるので、ト
ラック幅に相当する磁性薄膜部の厚さの精度が向上し、
磁気ヘッドのトラック成形精度が向上し、磁気テープ上
での記録パターンの位置精度が良くなり記録再生特性も
良好となるという効果を奏する。As a result, the influence of the narrowing processing of the magnetic thin film portion is absorbed by the non-magnetic non-conductive thin film, so that the accuracy of the thickness of the magnetic thin film portion corresponding to the track width is improved,
The track forming accuracy of the magnetic head is improved, the positional accuracy of the recording pattern on the magnetic tape is improved, and the recording / reproducing characteristics are also improved.
【００３５】請求項２の磁気ヘッド製造方法は、以上の
ように、請求項１記載の磁気ヘッド製造方法において、
上記磁性薄膜部で、トラック幅に相当する膜厚となるよ
うに軟磁性薄膜と層間絶縁膜とを交互に積層した後、非
磁性金属薄膜を所定の膜厚に成膜し、その上に引き続
き、軟磁性薄膜と層間絶縁膜を所定の膜厚となるまで積
層成膜することを特徴とするものである。As described above, the method of manufacturing a magnetic head according to claim 2 is the method of manufacturing a magnetic head according to claim 1,
In the magnetic thin film portion, after alternately laminating the soft magnetic thin film and the interlayer insulating film so as to have a film thickness corresponding to the track width, a non-magnetic metal thin film is formed to a predetermined film thickness, and then continuously formed thereon. It is characterized in that a soft magnetic thin film and an interlayer insulating film are laminated to a predetermined film thickness.
【００３６】それゆえ、請求項１の磁気ヘッド製造方法
の効果に加え、非磁性金属薄膜が軟磁性薄膜と同様な熱
膨張係数を示すことにより、磁性薄膜部の絞り込み加工
を施すときの、裂けや剥がれを防止することができるの
で、磁気ヘッドの磁気特性劣化を防止することが可能と
なるという効果を奏する。Therefore, in addition to the effect of the magnetic head manufacturing method according to the first aspect, the nonmagnetic metal thin film exhibits a thermal expansion coefficient similar to that of the soft magnetic thin film, so that the magnetic thin film portion is not cracked when being narrowed down. Since the peeling and the peeling can be prevented, it is possible to prevent the deterioration of the magnetic characteristics of the magnetic head.
【図１】本発明の磁気ヘッド製造方法における磁性薄膜
部を形成する工程を示すものであり、同図（ａ）は積層
構造を有する磁性薄膜部に非磁性非導体薄膜層を成膜す
る工程を示す正面図であり、同図（ｂ）は積層構造を有
する磁性薄膜部に非磁性金属薄膜層を成膜する工程を示
す正面図である。FIG. 1 shows a step of forming a magnetic thin film portion in a magnetic head manufacturing method of the present invention. FIG. 1A shows a step of forming a non-magnetic non-conductor thin film layer on a magnetic thin film portion having a laminated structure. FIG. 4B is a front view showing a step of forming a nonmagnetic metal thin film layer on the magnetic thin film portion having a laminated structure.
【図２】本発明の磁気ヘッド製造方法における製造工程
を示すものであり、Ｖ字状の溝を形成する工程を示す斜
視図である。FIG. 2 is a perspective view showing a manufacturing process in a magnetic head manufacturing method of the invention and showing a process of forming a V-shaped groove.
【図３】図１で形成された磁性薄膜部の絞り込み加工を
施す工程を示す正面図である。FIG. 3 is a front view showing a step of performing a narrowing process on the magnetic thin film portion formed in FIG.
【図４】図３で絞り込みの行われた磁性薄膜部の上端部
を示すものであり、同図（ａ）は非磁性非導体薄膜２ｃ
を成膜したときの要部拡大正面図であり、同図（ｂ）は
非磁性非金属薄膜２ｄを成膜したときの要部拡大正面図
である。FIG. 4 shows an upper end portion of the magnetic thin film portion narrowed down in FIG. 3, and FIG. 4 (a) shows a non-magnetic non-conductor thin film 2c.
FIG. 4B is an enlarged front view of an essential part when a film is formed, and FIG. 7B is an enlarged front view of an essential part when a nonmagnetic nonmetallic thin film 2d is formed.
【図５】図３で絞り込みの行われた磁性薄膜部上に低融
点ガラスを充填する工程を示す正面図である。5 is a front view showing a step of filling a low melting point glass on the magnetic thin film portion narrowed down in FIG. 3. FIG.
【図６】図５で充填された低融点ガラスを平面状に研磨
して、ギャップ面を形成する工程を示す正面図である。FIG. 6 is a front view showing a step of polishing the low melting point glass filled in FIG. 5 into a flat surface to form a gap surface.
【図７】図８の基板の両側面に内部巻線溝と外部巻線溝
とを形成してコアブロックを作製する工程を示す斜視図
である。FIG. 7 is a perspective view showing a step of forming an inner winding groove and an outer winding groove on both side surfaces of the substrate of FIG. 8 to produce a core block.
【図８】図７で形成されたコアブロックを一対合わせて
磁気ヘッドブロックを形成する工程を示す平面図であ
る。8 is a plan view showing a process of forming a magnetic head block by combining a pair of core blocks formed in FIG. 7. FIG.
【図９】図１０で形成された磁気ヘッドブロックの斜視
図である。9 is a perspective view of the magnetic head block formed in FIG.
【図１０】本発明の磁気ヘッド製造方法により、製造さ
れた磁気ヘッドチップを示すものであり、同図（ａ）は
斜視図であり、同図（ｂ）は磁気ヘッドチップの平面図
である。10A and 10B show a magnetic head chip manufactured by the magnetic head manufacturing method of the present invention, FIG. 10A is a perspective view, and FIG. 10B is a plan view of the magnetic head chip. ..
【図１１】従来の磁気ヘッド製造方法における磁性薄膜
部の絞り込み加工を施す工程を示す正面図である。FIG. 11 is a front view showing a step of performing a narrowing process on a magnetic thin film portion in a conventional magnetic head manufacturing method.
【図１２】図１１で絞り込みの行われた磁性薄膜部の上
端部の要部拡大正面図である。12 is an enlarged front view of an essential part of an upper end portion of the magnetic thin film portion which has been narrowed down in FIG. 11. FIG.
【図１３】従来の磁気ヘッド製造方法により、製造され
た磁気ヘッドチップを示すものであり、同図（ａ）は斜
視図であり、同図（ｂ）は上記磁気ヘッドチップの平面
図である。13A and 13B show a magnetic head chip manufactured by a conventional magnetic head manufacturing method. FIG. 13A is a perspective view and FIG. 13B is a plan view of the magnetic head chip. ..
２ 磁性薄膜部 ２ａ 軟磁性薄膜 ２ｂ 層間絶縁膜 ２ｃ 非磁性非導体薄膜 ２ｄ 非磁性金属薄膜 2 magnetic thin film portion 2a soft magnetic thin film 2b interlayer insulating film 2c non-magnetic non-conductor thin film 2d non-magnetic metal thin film
Claims (2)
し、各溝の片側斜面に沿って軟磁性薄膜と層間絶縁膜と
を交互に積層して磁性薄膜部を設けるとともに、上記磁
性薄膜部の斜面頂点近傍を、研削加工又はエッチングに
よって所定の膜厚となるように加工し、その後、一対の
上記基板の各々の加工された磁性薄膜部頂部を対向させ
て、磁気ギャップを形成して接合し、コアブロックを作
製した後、ギャップ面を挟んで上記コアブロックを切断
することにより得られる磁気ヘッドチップを形成する磁
気ヘッド製造方法において、 上記磁性薄膜部で、トラック幅に相当する膜厚となるよ
うに軟磁性薄膜と層間絶縁膜とを交互に積層した後、非
磁性非導体薄膜を所定の膜厚に成膜し、その上に引き続
き、軟磁性薄膜と層間絶縁膜を所定の膜厚となるまで積
層成膜することを特徴とする磁気ヘッド製造方法。1. A plurality of substantially V-shaped grooves are formed on a surface of a substrate, and a soft magnetic thin film and an interlayer insulating film are alternately laminated along one side of each groove to provide a magnetic thin film portion. The vicinity of the apex of the magnetic thin film portion is processed by grinding or etching so as to have a predetermined film thickness, and then the processed magnetic thin film portion tops of the pair of substrates are opposed to each other to form a magnetic gap. A magnetic head manufacturing method for forming a magnetic head chip obtained by forming and joining to form a core block, and then cutting the core block with a gap surface sandwiched between the magnetic thin film portion and the track width. To the desired thickness, the soft magnetic thin film and the interlayer insulating film are alternately laminated, and then the nonmagnetic non-conductive thin film is formed to a predetermined film thickness, and then the soft magnetic thin film and the interlayer insulating film are successively formed. The specified film thickness A method of manufacturing a magnetic head, characterized in that a stacked film is formed until the film is formed.
て、 上記磁性薄膜部で、トラック幅に相当する膜厚となるよ
うに軟磁性薄膜と層間絶縁膜とを交互に積層した後、非
磁性金属薄膜を所定の膜厚に成膜し、その上に引き続
き、軟磁性薄膜と層間絶縁膜を所定の膜厚となるまで積
層成膜することを特徴とする（請求項１記載の）磁気ヘ
ッド製造方法。2. The method of manufacturing a magnetic head according to claim 1, wherein, in the magnetic thin film portion, soft magnetic thin films and interlayer insulating films are alternately laminated so as to have a film thickness corresponding to a track width, and then a non-magnetic film is formed. A magnetic head characterized in that a metal thin film is formed to a predetermined film thickness, and then a soft magnetic thin film and an interlayer insulating film are successively laminated and formed to a predetermined film thickness (claim 1). Production method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8730092A JP2891817B2 (en) | 1992-04-08 | 1992-04-08 | Magnetic head manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8730092A JP2891817B2 (en) | 1992-04-08 | 1992-04-08 | Magnetic head manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05290327A true JPH05290327A (en) | 1993-11-05 |
| JP2891817B2 JP2891817B2 (en) | 1999-05-17 |
Family
ID=13910979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8730092A Expired - Fee Related JP2891817B2 (en) | 1992-04-08 | 1992-04-08 | Magnetic head manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2891817B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19748875C2 (en) * | 1997-04-30 | 2000-10-05 | Fujitsu Ltd | Thin-film magnetic head and method for its production |
-
1992
- 1992-04-08 JP JP8730092A patent/JP2891817B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19748875C2 (en) * | 1997-04-30 | 2000-10-05 | Fujitsu Ltd | Thin-film magnetic head and method for its production |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2891817B2 (en) | 1999-05-17 |
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