JPS61255518A - Production of magnetic head - Google Patents
Production of magnetic headInfo
- Publication number
- JPS61255518A JPS61255518A JP9867485A JP9867485A JPS61255518A JP S61255518 A JPS61255518 A JP S61255518A JP 9867485 A JP9867485 A JP 9867485A JP 9867485 A JP9867485 A JP 9867485A JP S61255518 A JPS61255518 A JP S61255518A
- Authority
- JP
- Japan
- Prior art keywords
- coil
- magnetic
- insulating layer
- layer
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、VTR1磁気デイスクなどの磁気記録の記録
再生のために使用する磁気ヘッドの製造方法に係わる。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a magnetic head used for recording and reproducing magnetic recording such as a VTR1 magnetic disk.
本発明は、薄膜磁気ヘッドの製造方法において、該コイ
ル形成後、コイルのスペースに感光性非磁性絶縁層を形
成し、平担化しさらに上記コイル及び感光性非磁性絶縁
層の上に非磁性絶縁層な形成せしめ、その上層に上部磁
極を形成したことを特徴とする磁気ヘッドに係わり、非
磁性絶縁層の平担化をはかりついては上部磁極の凹凸が
なくなり磁気性能の劣化を防いだ薄膜磁気ヘッドの製造
方法である。The present invention provides a method for manufacturing a thin film magnetic head in which, after forming the coil, a photosensitive nonmagnetic insulating layer is formed in the space of the coil, flattened, and then a nonmagnetic insulating layer is formed on the coil and the photosensitive nonmagnetic insulating layer. This thin-film magnetic head is characterized by having a top magnetic layer formed on top of the top magnetic layer, and by flattening the nonmagnetic insulating layer, the unevenness of the top magnetic pole is eliminated and deterioration in magnetic performance is prevented. This is a manufacturing method.
薄膜磁気ヘッドの断面構造を第2図に示す。 FIG. 2 shows the cross-sectional structure of the thin film magnetic head.
基板1上に形成した下部磁極2、該下部磁極2上にあっ
て上部磁極5にはさまれた磁気ギヤラグ層4及び非磁性
絶縁層5及び導体コイル6より構成されている。It consists of a lower magnetic pole 2 formed on a substrate 1, a magnetic gear lug layer 4 located on the lower magnetic pole 2 and sandwiched between an upper magnetic pole 5, a nonmagnetic insulating layer 5, and a conductor coil 6.
さて、薄膜磁気ヘッドは下部磁極2、上部磁極6の磁気
的特性は重要な因子であり、特に高層波帯域で、使用さ
れる場合、高周波透磁率は高いことが望まれる。したが
って下部磁極2は充分に研摩された基板上に形成される
。その表面荒さは500A以下の表面仕上げが望まれる
。しかしながら、上部磁極3は、下部磁極上に形成され
るが、その間には、磁気ギャツプ層4及び非磁性絶縁層
5さらに導体であるコイル6がはさまれている。Now, the magnetic properties of the lower magnetic pole 2 and the upper magnetic pole 6 are important factors in the thin film magnetic head, and especially when used in a high frequency band, high frequency magnetic permeability is desired. The lower magnetic pole 2 is therefore formed on a well-polished substrate. A surface roughness of 500A or less is desired. However, although the upper magnetic pole 3 is formed on the lower magnetic pole, a magnetic gap layer 4, a nonmagnetic insulating layer 5, and a conductor coil 6 are sandwiched therebetween.
したがって上部磁極3は、結果的に非磁性絶縁層5上に
形成されることになる。第4図(b)に示す如くコイル
6を形成後、非磁性絶縁層な所定の範囲に塗布し露光現
像するが、コイル間のスペース部分が凹み、コイル上は
凸となり結果的に非磁性絶縁層は凹凸になった状態とな
る。その上に上部磁極3が形成されるためおのずと該上
部磁極3は凹凸のついた状態となるっ
〔発明が解決しようとする問題点及び目的〕したがって
、従来技術においては上部磁極5は前述の如く凹凸が激
しいため、磁気特性が劣化し特に高周波透磁率が低くな
る。その結果、磁気ヘッドの性能が落ち、SN比が悪く
なりまた再生出力も低くなる。Therefore, the upper magnetic pole 3 is ultimately formed on the nonmagnetic insulating layer 5. As shown in FIG. 4(b), after forming the coil 6, a non-magnetic insulating layer is coated on a predetermined area and exposed and developed, but the space between the coils becomes depressed and the top of the coil becomes convex, resulting in non-magnetic insulation. The layer becomes uneven. Since the upper magnetic pole 3 is formed thereon, the upper magnetic pole 3 naturally becomes uneven. [Problems and objects to be solved by the invention] Therefore, in the prior art, the upper magnetic pole 5 is formed as described above. Because of the severe unevenness, the magnetic properties deteriorate, especially the high-frequency magnetic permeability becomes low. As a result, the performance of the magnetic head deteriorates, the signal-to-noise ratio deteriorates, and the reproduction output also decreases.
そこで、本発明はかかる欠点を改善するものであり、そ
の目的とするところは上部磁極下の非磁性絶縁層を平担
化し上部磁極の凹凸をなくし、磁気特性の良好な上部磁
極を形成せしめるところにある。Therefore, the present invention aims to improve such drawbacks, and its purpose is to flatten the non-magnetic insulating layer under the upper magnetic pole, eliminate unevenness of the upper magnetic pole, and form an upper magnetic pole with good magnetic properties. It is in.
本発明は、軟磁性材料からなる上部および下部磁極の間
に複数層の非磁性絶縁、を−及び導体材料・からなるコ
イルをはさんでなる薄膜磁気ヘッドの製造方法において
、該コイル形成後所定の領域に感光性非磁性絶縁層を塗
布しコイル間のスペースにのみ感光性非磁性絶縁層を形
成せしめその上層に上部磁極を形成せしめたことを特徴
とする。The present invention relates to a method for manufacturing a thin film magnetic head comprising a plurality of layers of non-magnetic insulation between upper and lower magnetic poles made of a soft magnetic material and a coil made of a conductive material. It is characterized in that a photosensitive nonmagnetic insulating layer is applied to the area, the photosensitive nonmagnetic insulating layer is formed only in the space between the coils, and an upper magnetic pole is formed on the top layer.
本発明によれば、非磁性絶縁層を平担化することが可能
となり、該上層に形成される上部電極も平担化され、凹
凸による磁気特性の劣化を防ぐことが可能となり上部磁
極となる軟磁性材料の本来有する磁気特性をひき出すこ
とが出来SN比の低下、再生出力の低下を生じさせない
。According to the present invention, it is possible to flatten the non-magnetic insulating layer, and the upper electrode formed on the upper layer is also flattened, making it possible to prevent deterioration of magnetic properties due to unevenness and forming an upper magnetic pole. The inherent magnetic properties of the soft magnetic material can be brought out without causing a decrease in the S/N ratio or reproduction output.
以下、本発明を実施例により詳細に説明する。 Hereinafter, the present invention will be explained in detail with reference to Examples.
実施例1
第1図は1本発明により完成された薄膜磁気ヘッド完成
断面図を示す。第2図は、従来法による薄膜磁気ヘッド
完成断面図である。第3図は、本発明によるコイル完成
後の工程図を示し744図は従来法によるコイル完成後
の工程図を示す。Embodiment 1 FIG. 1 shows a sectional view of a completed thin film magnetic head completed according to the present invention. FIG. 2 is a sectional view of a completed thin film magnetic head according to the conventional method. FIG. 3 shows a process diagram after the coil is completed according to the present invention, and FIG. 744 shows a process diagram after the coil is completed according to the conventional method.
まず、第3図(、)に示す如く選択デポジションあるい
は選択エツチング、リフトオフ法により導電コイル6が
形成される。この材質はコイル形成プロセスあるいは電
気抵抗等を考慮して選ばれるが本発明者らは、Cuを用
いた。First, the conductive coil 6 is formed by selective deposition, selective etching, or a lift-off method, as shown in FIG. 3(,). This material is selected in consideration of the coil forming process, electrical resistance, etc., and the present inventors used Cu.
次に、第5図(b)に示す如く、コイルスペースにのみ
、非磁性絶縁層が形成される。その方法として、感光性
非磁性絶縁材すなわちフォトレジストを全面に塗布する
。次に所定のブレベーキングを行ない非磁性絶縁層5′
を露光し、コイルスペース間にのみ残る様に現像する。Next, as shown in FIG. 5(b), a nonmagnetic insulating layer is formed only in the coil space. As a method, a photosensitive nonmagnetic insulating material, ie, a photoresist, is applied to the entire surface. Next, a predetermined break baking is performed to form the nonmagnetic insulating layer 5'.
is exposed and developed so that it remains only between the coil spaces.
その結果pps図(b)に示す如くコイルとほぼ同等の
高すで非磁性絶縁層5′が形成されることになる。本発
明者らは、ポジ型フォトレジストを用いた。現像後、1
30CX1時間でポストベーキングを実施し、次に24
0CX1時間でハードベークを実施した。As a result, as shown in the pps diagram (b), the nonmagnetic insulating layer 5' is formed at approximately the same height as the coil. The inventors used a positive photoresist. After development, 1
Post-baking was carried out at 30C for 1 hour, then at 24C
Hard baking was performed at 0CX for 1 hour.
次に、再び感光性非磁性絶縁層を塗布し、ブレベーキン
グを実施し、必要な範囲で非磁性絶縁層を露光現像した
。その後、上述と同様にボストベーキング、バードベー
キングを行なった。第3図(c)に示す如く、非磁性絶
縁I−6は平担化される。Next, a photosensitive nonmagnetic insulating layer was applied again, and break baking was performed, and the nonmagnetic insulating layer was exposed and developed to the required extent. Thereafter, bost baking and bird baking were performed in the same manner as described above. As shown in FIG. 3(c), the non-magnetic insulation I-6 is flattened.
次に、上部磁極5を形成する。Next, the upper magnetic pole 5 is formed.
上部磁極3は、平担化された非磁性絶縁層6の上に形成
されるため、当然上部磁極3は凹凸のない層となる。Since the upper magnetic pole 3 is formed on the flattened nonmagnetic insulating layer 6, the upper magnetic pole 3 naturally becomes a layer with no unevenness.
実施例2
実施例1にどいて、非磁性絶縁層6′をコイルスペース
間に形成後、さらに感光性非磁性絶縁4を形成し念が、
S10.あるいはA2,0.等の無機材料を用いること
も可能である。つまり、コイルスペースに、感光性非磁
性絶縁層が形成され平担化されているため、その上の非
磁性絶縁層材質はSin。Example 2 Following Example 1, after forming the non-magnetic insulating layer 6' between the coil spaces, a photosensitive non-magnetic insulating layer 4 was further formed.
S10. Or A2,0. It is also possible to use inorganic materials such as. In other words, since a photosensitive nonmagnetic insulating layer is formed and flattened in the coil space, the material of the nonmagnetic insulating layer thereon is Sin.
を用いることも可能である。このlI”910.あるい
はA @ ! 03は全面スパッタされるため、メタル
マスク法あるいはリフトオフ法を用いても良い。本発明
者らはSIO,を全面スパッタし、リフトオフ法により
810.の必要な範囲にパターニングした。It is also possible to use Since this lI"910. or A@!03 is sputtered on the entire surface, a metal mask method or a lift-off method may be used. The present inventors sputtered SIO on the entire surface, and by the lift-off method, the necessary range of 810. patterned.
その結果、実施例1と同様平担化した嘆を得た。As a result, similar to Example 1, a flattened layer was obtained.
本発明によれば、コイルスペースに完全に感光性非磁性
絶縁層を形成するため、その五に非磁性絶縁層を形成し
ても平担化され、さらに上部磁極も凹凸のない平担化さ
れた形状に形成されるため凹凸による磁気特性の劣化が
なくなり、SN比の良好な、再生出力の良好な薄膜磁気
ヘッドを提供するものである。According to the present invention, since a photosensitive non-magnetic insulating layer is completely formed in the coil space, even if a non-magnetic insulating layer is formed in the coil space, it is flattened, and the upper magnetic pole is also flattened without any unevenness. Since the magnetic head is formed in a similar shape, there is no deterioration of magnetic properties due to unevenness, and a thin film magnetic head with a good signal-to-noise ratio and good reproduction output is provided.
第1図は本発明による薄膜磁気ヘッドの完成断面図、第
2図は従来法による薄膜磁気ヘッド完成断面図、第3図
(&)〜(d)は本発明の薄膜磁気ヘッドの製造工程図
、第4+9(a)〜(c)は従来法によるla気ヘッド
の製造工程図である。
1、 基板
2 下部磁極
五 上部磁極
4、 ギャップ層
& 導1コイル
& 非磁性絶縁層
6: 感光性非磁性絶縁層。
以上
箋1図
瞥21!1FIG. 1 is a completed sectional view of a thin film magnetic head according to the present invention, FIG. 2 is a completed sectional view of a thin film magnetic head according to a conventional method, and FIGS. 3 (&) to (d) are manufacturing process diagrams of a thin film magnetic head of the present invention. , No. 4+9 (a) to (c) are manufacturing process diagrams of a la air head by a conventional method. 1. Substrate 2 Lower magnetic pole 5 Upper magnetic pole 4 Gap layer & Conductor 1 coil & Non-magnetic insulating layer 6: Photosensitive non-magnetic insulating layer. Above note 1 picture 21! 1
Claims (1)
非磁性絶縁層及び導体材料からなるコイルをはさんでな
る薄膜磁気ヘッドの製造方法において、該コイル形成後
所定の領域に感光性非磁性絶縁層を塗布しコイル間のス
ペースにのみ感光性非磁性絶縁層が残る様に露光現像し
、しかる後にさらに非磁性絶縁層を形成せしめその上層
に上部磁極を形成せしめたことを特徴とする薄膜磁気ヘ
ッドの製造方法。In a method for manufacturing a thin film magnetic head in which a coil made of a plurality of nonmagnetic insulating layers and a conductive material is sandwiched between upper and lower magnetic poles made of a soft magnetic material, a photosensitive nonmagnetic material is applied to a predetermined region after forming the coil. A thin film characterized by applying an insulating layer, exposing and developing it so that a photosensitive non-magnetic insulating layer remains only in the spaces between the coils, then further forming a non-magnetic insulating layer, and forming an upper magnetic pole on top of the non-magnetic insulating layer. A method of manufacturing a magnetic head.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9867485A JPS61255518A (en) | 1985-05-09 | 1985-05-09 | Production of magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9867485A JPS61255518A (en) | 1985-05-09 | 1985-05-09 | Production of magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61255518A true JPS61255518A (en) | 1986-11-13 |
Family
ID=14226059
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9867485A Pending JPS61255518A (en) | 1985-05-09 | 1985-05-09 | Production of magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61255518A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63257909A (en) * | 1987-04-15 | 1988-10-25 | Hitachi Ltd | Thin film magnetic head and its production |
-
1985
- 1985-05-09 JP JP9867485A patent/JPS61255518A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63257909A (en) * | 1987-04-15 | 1988-10-25 | Hitachi Ltd | Thin film magnetic head and its production |
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