JPS5968147A - シヤドウマスクの製造方法 - Google Patents
シヤドウマスクの製造方法Info
- Publication number
- JPS5968147A JPS5968147A JP17630782A JP17630782A JPS5968147A JP S5968147 A JPS5968147 A JP S5968147A JP 17630782 A JP17630782 A JP 17630782A JP 17630782 A JP17630782 A JP 17630782A JP S5968147 A JPS5968147 A JP S5968147A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- hole
- shadow mask
- liquid
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 238000005530 etching Methods 0.000 claims abstract description 61
- 238000000034 method Methods 0.000 claims abstract description 16
- 238000001035 drying Methods 0.000 claims abstract description 14
- 239000007788 liquid Substances 0.000 claims abstract description 13
- 238000010894 electron beam technology Methods 0.000 claims abstract description 8
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 17
- 229920002120 photoresistant polymer Polymers 0.000 claims description 16
- 238000005406 washing Methods 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- -1 polyethylene Polymers 0.000 abstract 2
- 239000004698 Polyethylene Substances 0.000 abstract 1
- 239000004743 Polypropylene Substances 0.000 abstract 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 abstract 1
- 229920000573 polyethylene Polymers 0.000 abstract 1
- 229920001155 polypropylene Polymers 0.000 abstract 1
- 239000007921 spray Substances 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- JOSWYUNQBRPBDN-UHFFFAOYSA-P ammonium dichromate Chemical compound [NH4+].[NH4+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O JOSWYUNQBRPBDN-UHFFFAOYSA-P 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 1
- 235000021240 caseins Nutrition 0.000 description 1
- 239000011280 coal tar Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- KOWWOODYPWDWOJ-LVBPXUMQSA-N elatine Chemical compound C([C@]12CN(C3[C@@]45OCO[C@]44[C@H]6[C@@H](OC)[C@@H]([C@H](C4)OC)C[C@H]6[C@@]3([C@@H]1[C@@H]5OC)[C@@H](OC)CC2)CC)OC(=O)C1=CC=CC=C1N1C(=O)CC(C)C1=O KOWWOODYPWDWOJ-LVBPXUMQSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
- H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17630782A JPS5968147A (ja) | 1982-10-08 | 1982-10-08 | シヤドウマスクの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17630782A JPS5968147A (ja) | 1982-10-08 | 1982-10-08 | シヤドウマスクの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5968147A true JPS5968147A (ja) | 1984-04-18 |
JPH0430132B2 JPH0430132B2 (enrdf_load_stackoverflow) | 1992-05-20 |
Family
ID=16011292
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17630782A Granted JPS5968147A (ja) | 1982-10-08 | 1982-10-08 | シヤドウマスクの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5968147A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6160889A (ja) * | 1984-08-30 | 1986-03-28 | Toshiba Corp | シヤドウマスクの製造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4978478A (enrdf_load_stackoverflow) * | 1972-11-30 | 1974-07-29 | ||
JPS5726346A (en) * | 1980-07-22 | 1982-02-12 | Kubota Ltd | Hot water feeder |
JPS57141645A (en) * | 1981-02-25 | 1982-09-02 | Canon Inc | Manufacture of image retaining member |
-
1982
- 1982-10-08 JP JP17630782A patent/JPS5968147A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4978478A (enrdf_load_stackoverflow) * | 1972-11-30 | 1974-07-29 | ||
JPS5726346A (en) * | 1980-07-22 | 1982-02-12 | Kubota Ltd | Hot water feeder |
JPS57141645A (en) * | 1981-02-25 | 1982-09-02 | Canon Inc | Manufacture of image retaining member |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6160889A (ja) * | 1984-08-30 | 1986-03-28 | Toshiba Corp | シヤドウマスクの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0430132B2 (enrdf_load_stackoverflow) | 1992-05-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4755257A (en) | Method of processing thin metal sheets by photoetching | |
DE1597756A1 (de) | Maske zum Herstellen einer Maskierung durch Belichten und Herstellungsverfahren | |
JPS6070185A (ja) | シヤドウマスクの製造方法 | |
JPS6259293B2 (enrdf_load_stackoverflow) | ||
US5593802A (en) | Method of forming a spacer for use in a liquid crystal panel | |
US20010041456A1 (en) | Semiconductor device production method | |
JPS5968147A (ja) | シヤドウマスクの製造方法 | |
US4447519A (en) | Solid photoresist and method of making photoresist | |
US3676128A (en) | Complex film for obtaining silk screen stencils | |
US4588676A (en) | Photoexposing a photoresist-coated sheet in a vacuum printing frame | |
JPS6070186A (ja) | シヤドウマスクの製造方法 | |
EP0052806A2 (en) | Dot-enlargement process for photopolymer litho masks | |
JPH0430134B2 (enrdf_load_stackoverflow) | ||
JPS5981839A (ja) | シヤドウマスクの製造方法 | |
JPS59141228A (ja) | 微細パタ−ン形成方法 | |
JPH0429174B2 (enrdf_load_stackoverflow) | ||
JPS57136646A (en) | Positive type photoresist developing method | |
JP2617923B2 (ja) | パターン形成方法 | |
JPS60130828A (ja) | レジストパタ−ンの形成方法 | |
JPS5969753A (ja) | 耐触性感光膜 | |
JPH0430133B2 (enrdf_load_stackoverflow) | ||
JP2972490B2 (ja) | 水溶性フォトレジストの硬膜処理方法 | |
JPS591662A (ja) | 金属板のエツチング方法 | |
JPH0685070B2 (ja) | レジストパターンの現像方法 | |
JPH01296251A (ja) | メタルマスクの製造方法 |