JPS596526A - Treatment apparatus of semiconductor substrate - Google Patents

Treatment apparatus of semiconductor substrate

Info

Publication number
JPS596526A
JPS596526A JP11542382A JP11542382A JPS596526A JP S596526 A JPS596526 A JP S596526A JP 11542382 A JP11542382 A JP 11542382A JP 11542382 A JP11542382 A JP 11542382A JP S596526 A JPS596526 A JP S596526A
Authority
JP
Japan
Prior art keywords
wafer
identification mark
identification
reading
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11542382A
Other languages
Japanese (ja)
Inventor
Kazutaka Narita
成田 一孝
Kenzo Masuda
増田 健三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11542382A priority Critical patent/JPS596526A/en
Publication of JPS596526A publication Critical patent/JPS596526A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To enable automatic treatment of a substrate by conducting a necessary treatment to a wafer or a pellet on the basis of the results of the automatically read identification marks on the wafer or the pellet. CONSTITUTION:A wafer 1 with a required identification mark 2 on is fed to a pre-determined position, and set on a position where automatic reading of the identification mark 2 by a reader 3 on the basis of an orientation flat 1a is possible. In this state, each probe 4 of the reader 3 contacts with each identification mark 2, reads automatically the data from each identification mark 2, such as the name of the model of a product and mask version on the basis of a binary digit, and identifies the content. According to the result of the reading and the identification what to operate next is decided, and the reader 3 selects a treatment apparatus 5 and commands the treatment apparatus 5 to conduct a required manufacture or process or inspection to the wafer 1. The treatment apparatus 5 conducts the required treatment to the wafer 1 according to the command from the reader 3, and after that the wafer 1 is sent to a next step.

Description

【発明の詳細な説明】 本発明は半導体基板の処理装置、特に自動処理化を可能
にする半導体基板の処理装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor substrate processing apparatus, and particularly to a semiconductor substrate processing apparatus that enables automatic processing.

従来、半導体製品の製造過程においてウェハまたはペレ
ットの如き半導体基板に所要の製造加工あるいは検査等
の処理を施こす場合、処理対象である半導体基板の型式
名、マスクバージョン等を識別標識(識別データ)とし
て付し、その識別標識に基づいて各半導体基板に所要の
処理を施こすのが便利である。このことは多品種化の傾
向に伴なってますます重要となりつつある。
Conventionally, in the manufacturing process of semiconductor products, when a semiconductor substrate such as a wafer or pellet is subjected to necessary manufacturing processing or inspection, an identification mark (identification data) is used to identify the model name, mask version, etc. of the semiconductor substrate to be processed. It is convenient to label each semiconductor substrate as an identification mark and perform necessary processing on each semiconductor substrate based on the identification mark. This is becoming more and more important with the trend of diversification.

ところが、従来は型式名等をマスクで入れている場合も
提案されているが、実際にその識別標識の読取り1判別
を行なう場合、作業者が肉眼で見て判断している。その
ため、従来方式では何ら処理の自動化に寄与していない
However, in the past, it has been proposed to mask the model name, etc., but when the identification mark is actually read and discriminated, the operator has to look at it with the naked eye. Therefore, the conventional method does not contribute to the automation of processing in any way.

したがって、本発明の目的は、前記課題に鑑み、半導体
基板の識別データ等の読取り1判別および処理を自動的
に能耶良く行なうことのできる半導体基板の処理装置を
提供することにある。
SUMMARY OF THE INVENTION Therefore, in view of the above-mentioned problems, an object of the present invention is to provide a semiconductor substrate processing apparatus that can automatically and effectively perform reading, discrimination, and processing of identification data, etc. of a semiconductor substrate.

この目的を達成するため、本発明による半導体基板の処
理装置は、ウエノ1またはペレットの上に付された識別
標識を自動的に読み取り、その読取り結果に基づいてウ
ェハまたはペレットに対して所要の処理を施こすもので
あり、半導体基板の自動処理化を可能にするものである
To achieve this objective, the semiconductor substrate processing apparatus according to the present invention automatically reads the identification mark attached to the wafer 1 or the pellet, and performs the necessary processing on the wafer or pellet based on the reading result. This enables automated processing of semiconductor substrates.

以下、本発明を図面に示す実施例にしたがって詳細に説
明する。
Hereinafter, the present invention will be explained in detail according to embodiments shown in the drawings.

第1図は本発明に用いられる識別標識(R別データ)付
きのウェハの平面図、第2図は本発明による半導体基板
の処理装置の一実施例を示す概略的説明図である。
FIG. 1 is a plan view of a wafer with an identification mark (R-specific data) used in the present invention, and FIG. 2 is a schematic explanatory diagram showing an embodiment of a semiconductor substrate processing apparatus according to the present invention.

第1図のウェハにおいては、ウェハlの所定個所上にそ
のウェハ1の型式名、マスクバづへン等の識別標識(識
別データ)2が付されている。
In the wafer shown in FIG. 1, identification marks (identification data) 2 such as the model name of the wafer 1 and a mask badge are attached to predetermined locations on the wafer 1.

この識別標識2は様々な型式のものを用いることができ
るが、第1図の例では自動読取りおよび判別等を容易か
つ円滑にするため各識別標識を二進数で表示するように
なっており、如何なるマスクを用いてウェハ1のどのよ
うな層1位置に書き込んでもよい。
Various types of identification marks 2 can be used, but in the example shown in Fig. 1, each identification mark is displayed in binary numbers to facilitate automatic reading and discrimination. Any layer 1 location on the wafer 1 may be written using any mask.

このような識別標識付きウェハの自動処理を行なうため
の本発明の処理装置は第2図に示すように、ウェハ1上
の識別標識2の各々を#識別標識と接触して自動的に読
み取りかつ判別するための探針4を複数本布する読取り
装置3を備えている。
As shown in FIG. 2, the processing apparatus of the present invention for automatically processing wafers with identification marks as shown in FIG. It is equipped with a reading device 3 that has a plurality of probes 4 for discrimination.

この読取り装置3は処理装置!t5に接続されている、
処理装置5は半導体製造加工装置または検査装置のいず
れか任意のものであることができ、前記読取り装置3に
よる読堆り結果に基づいてウェハlに対して所要の処理
を施こす。
This reading device 3 is a processing device! connected to t5,
The processing device 5 can be any semiconductor manufacturing processing device or inspection device, and performs necessary processing on the wafer 1 based on the reading result by the reading device 3.

また、前記読取り装置3は、処理工程を表わすデータ等
の所要データを記憶するための記憶装置6に接続され、
この記憶装置6は必要であれば前記処理装置5とのデー
タの授受等も可能である。
Further, the reading device 3 is connected to a storage device 6 for storing necessary data such as data representing processing steps,
This storage device 6 can also exchange data with the processing device 5, if necessary.

次K、本実施例の作用につき説明する。Next, the operation of this embodiment will be explained.

所要の識別標識2を付されたウェハlは図示しない供給
手段により所定位置まで供給され、かったとえは該ウェ
ハ1のオリエンテーシ短ン7ラッ)1aを基準にして読
取り装置3による識別標識2の自動読取りが可能な位置
にセットされる。
The wafer 1 with the required identification mark 2 attached thereto is fed to a predetermined position by a supply means (not shown), and the identification mark 2 is read by the reader 3 based on the orientation of the wafer 1 (7) 1a. Set in a position where automatic reading is possible.

その状態で、読取り装置3の各探針4がウェハ1の各識
別標識2に接触させられ、それぞれの識別標識2からそ
のデータ、たとえば製品型式名。
In this state, each probe 4 of the reading device 3 is brought into contact with each identification mark 2 on the wafer 1, and the data, such as the product model name, is read from each identification mark 2.

マスクバージ曹ン等を2進数に基づいて自動的に読み取
り、その内容を判別する。
It automatically reads the mask barge, etc. based on binary numbers and determines its contents.

この読取り、判別結果傾基づいてそのウェハ1に対して
次に施こすべき作業が決定され、読堆り装置3はその作
業を行う処理装置5を選び出してその処理装置5に対し
所要の製造加工または検査をウェハttc施こすよう指
令する。また、読取り装置3はウェハIK関する処理工
程等を表わす必要なデータを記憶装置6に記憶させる。
Based on the reading and discrimination results, the next operation to be performed on the wafer 1 is determined, and the reading and stacking device 3 selects the processing device 5 that will perform that task and performs the required manufacturing process on the processing device 5. Alternatively, a command is given to perform an inspection on the wafer ttc. Further, the reading device 3 causes the storage device 6 to store necessary data representing processing steps related to the wafer IK.

処理装置5は読取り装置3からの前記指令釦基づいて所
要の処理をウェハIK対して行なう。その処理を終えた
ウェハlは次工程に送られる。
The processing device 5 performs necessary processing on the wafer IK based on the command button from the reading device 3. The wafer l that has been processed is sent to the next process.

したがって、本実施例忙よれば、ウェハ1上の識別標識
2の読取り1判別およびその結果に基づく処理等をすべ
て自動的に能率良く行なうことができ、個々の処理また
は全体的な処理を自動化することが可能である。
Therefore, according to this embodiment, reading 1 discrimination of the identification mark 2 on the wafer 1 and processing based on the result can all be performed automatically and efficiently, and individual processing or overall processing can be automated. Is possible.

第3図は本発明を適用できる識別標@(識別デーI’)
付#ヘレットの拡大平面図である。この例では、必要な
識別標識(識別データ)2aは個々のベレット7にすべ
てマスクで書き込まれている。
Figure 3 shows an identification mark @ (identification data I') to which the present invention can be applied.
It is an enlarged plan view of #heret. In this example, all necessary identification marks (identification data) 2a are written on each pellet 7 using a mask.

この場合忙も、ベレット7上の識別標112 aのデー
タ内容は読取り装置3により容易に自動的忙読み取り2
判別され、その結果に基づいてベレット7に対して次に
施こすべき処理が決定され、それに合った処理装置5が
選ばれる。
In this case, the data content of the identification mark 112a on the bellet 7 can be easily and automatically read by the reading device 3 even when busy.
Based on the determination result, the next treatment to be performed on the pellet 7 is determined, and the appropriate treatment device 5 is selected.

なお、前記実施例では、読取り装置3の読取り部に識別
標識2aと接触してそのデータ内容を読み取る探針4を
用いているが、探針の代りにレーザー光等を用いた光学
的読取り手段を使用すること等も可能である。
In the above embodiment, a probe 4 is used in the reading section of the reading device 3 to contact the identification mark 2a and read the data content, but an optical reading means using laser light or the like may be used instead of the probe. It is also possible to use

以上説明したよう忙、本発明によれば、半導体基板の各
種識別データ等の読取り0判別およびそれに基づく各種
の処理を自動的に能率良く行なうことができる。
As described above, according to the present invention, it is possible to automatically and efficiently perform reading/zero determination of various types of identification data, etc. of a semiconductor substrate, and various processes based thereon.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に用いられる識別標識付きのウェハの平
面図、 第2図は本発明による半導体基板の処理装置の一実施例
な示す概略的説明図、 第3図は本発明に用いられる識別標識付きのベレットの
拡大平面図である。 1・・・ウェハ、2.2a・・・識別標識(識別データ
)、3・・・読取り装置、4・・・探針、5・・・処理
装置、6・・・記憶装置、7・・・ベレット。 第  1 1 第  2 図 第  3 図 −10“
FIG. 1 is a plan view of a wafer with an identification mark used in the present invention, FIG. 2 is a schematic explanatory diagram showing an embodiment of a semiconductor substrate processing apparatus according to the present invention, and FIG. 3 is a plan view of a wafer with an identification mark used in the present invention. FIG. 3 is an enlarged plan view of a bellet with an identification mark. DESCRIPTION OF SYMBOLS 1... Wafer, 2.2a... Identification mark (identification data), 3... Reading device, 4... Probe, 5... Processing device, 6... Storage device, 7...・Berrett. Figure 1 1 Figure 2 Figure 3 Figure-10

Claims (1)

【特許請求の範囲】 1、ウェハまたはペレットの上に付された識別標識を自
動的に読み取る読取り装置と、この読取り装置による読
取り結果に基づいてウェハまたはペレットに対して所要
の処理を施こす処理装置とを備えてなることを特徴とす
る半導体基板の処理装置。 2、識別標識が二進数で表示されていることを特徴とす
る特許請求の範囲第1項記載の半導体基板の処理装置。
[Scope of Claims] 1. A reading device that automatically reads an identification mark attached to a wafer or pellet, and a process that performs required processing on the wafer or pellet based on the reading result by this reading device. 1. A semiconductor substrate processing apparatus comprising: 2. The semiconductor substrate processing apparatus according to claim 1, wherein the identification mark is displayed in binary numbers.
JP11542382A 1982-07-05 1982-07-05 Treatment apparatus of semiconductor substrate Pending JPS596526A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11542382A JPS596526A (en) 1982-07-05 1982-07-05 Treatment apparatus of semiconductor substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11542382A JPS596526A (en) 1982-07-05 1982-07-05 Treatment apparatus of semiconductor substrate

Publications (1)

Publication Number Publication Date
JPS596526A true JPS596526A (en) 1984-01-13

Family

ID=14662197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11542382A Pending JPS596526A (en) 1982-07-05 1982-07-05 Treatment apparatus of semiconductor substrate

Country Status (1)

Country Link
JP (1) JPS596526A (en)

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