JPS595972Y2 - プラズマエツチング装置 - Google Patents

プラズマエツチング装置

Info

Publication number
JPS595972Y2
JPS595972Y2 JP1978137866U JP13786678U JPS595972Y2 JP S595972 Y2 JPS595972 Y2 JP S595972Y2 JP 1978137866 U JP1978137866 U JP 1978137866U JP 13786678 U JP13786678 U JP 13786678U JP S595972 Y2 JPS595972 Y2 JP S595972Y2
Authority
JP
Japan
Prior art keywords
etching
electrode
gas
semiconductor substrate
reaction tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1978137866U
Other languages
English (en)
Japanese (ja)
Other versions
JPS54101978U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
昭次 間所
弘之 武藤
裕夫 溝上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP1978137866U priority Critical patent/JPS595972Y2/ja
Publication of JPS54101978U publication Critical patent/JPS54101978U/ja
Application granted granted Critical
Publication of JPS595972Y2 publication Critical patent/JPS595972Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP1978137866U 1978-10-09 1978-10-09 プラズマエツチング装置 Expired JPS595972Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1978137866U JPS595972Y2 (ja) 1978-10-09 1978-10-09 プラズマエツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1978137866U JPS595972Y2 (ja) 1978-10-09 1978-10-09 プラズマエツチング装置

Publications (2)

Publication Number Publication Date
JPS54101978U JPS54101978U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1979-07-18
JPS595972Y2 true JPS595972Y2 (ja) 1984-02-23

Family

ID=29110476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1978137866U Expired JPS595972Y2 (ja) 1978-10-09 1978-10-09 プラズマエツチング装置

Country Status (1)

Country Link
JP (1) JPS595972Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3661747A (en) * 1969-08-11 1972-05-09 Bell Telephone Labor Inc Method for etching thin film materials by direct cathodic back sputtering
JPS48103433A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1972-04-17 1973-12-25
JPS4957775A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1972-10-02 1974-06-05

Also Published As

Publication number Publication date
JPS54101978U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1979-07-18

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