JPS5954632A - Preparation of quartz glass powder - Google Patents

Preparation of quartz glass powder

Info

Publication number
JPS5954632A
JPS5954632A JP16443682A JP16443682A JPS5954632A JP S5954632 A JPS5954632 A JP S5954632A JP 16443682 A JP16443682 A JP 16443682A JP 16443682 A JP16443682 A JP 16443682A JP S5954632 A JPS5954632 A JP S5954632A
Authority
JP
Japan
Prior art keywords
water
acid
silicate
quartz glass
glass powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16443682A
Other languages
Japanese (ja)
Inventor
Akihiro Chuma
中馬 明博
Akio Yanagisawa
柳沢 明男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP16443682A priority Critical patent/JPS5954632A/en
Publication of JPS5954632A publication Critical patent/JPS5954632A/en
Pending legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/10Forming beads
    • C03B19/1005Forming solid beads
    • C03B19/106Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C03B19/1065Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)

Abstract

PURPOSE:To prepare high-purity quartz glass powder inexpensively, by adding a silicate such as alkali metal silicate, etc. to a mineral acid at a specific pH, precipitating water-containing silicic acid, cleaning, drying and calcining the precipitate. CONSTITUTION:In a raw material powder for preparing a crucible to pull up single crystal of semiconductor, a silicate of an alkali metal or alkaline earth metal is added to a mineral acid at <=1.5pH, to precipitate water-containing silicic acid. Water-glass is advantageously used as the silicate, nitric acid is effective as the mineral acid, the lower limit of its pH is about 0.5, and practically, its concentration is properly about 1-4 normal. The precipitated water- containing silicate is cleaned, dried, and calcined at about 1,100-1,300 deg.C for about 30min-2hr, to give quartz glass powder.

Description

【発明の詳細な説明】 本発明は資源的に制限の少ない累原料を用い。[Detailed description of the invention] The present invention uses cumulative raw materials with few resource limitations.

半導体単結晶引上げ用ルツボの製造用原料粉末並□びに
半導体大規模集48回路の封止剤用充填物として必要な
高純1建の石英ガラス粉末の製造法に関するものである
The present invention relates to a raw material powder for producing crucibles for pulling semiconductor single crystals, and a method for producing high-purity quartz glass powder necessary as a filler for a sealant in a large-scale semiconductor assembly with 48 circuits.

従来石英ガラス粉末はブラジル原石に代表される良質の
天然石英(水晶)をボール、ミル等妃よって粉砕して製
造されていたが、近年天然石英、の押庄と枯渇化団向に
基づく資源的制約に加え、て、上記の、使用目的の場合
にはさらに純度の、間、題が顕、在化してきた。
Traditionally, quartz glass powder was produced by crushing high-quality natural quartz (crystal), such as Brazilian raw stone, in a ball, mill, etc., but in recent years, due to the increasing demand and depletion of natural quartz, resource In addition to the constraints mentioned above, issues regarding purity have become more apparent when it comes to the intended use.

天然石英には良質:とはいえ、各種の重金属、不純物が
、含まれており、、半導体単結晶引上げ用ルツボとして
は上記M金属不純物の浸透により1.生成竺結晶の電子
物理的特性を低ドさせ、超LSI(大規模集積回路ンの
封止剤用充填物として微鎗ウラ、ン不純物から放射され
るアルファ、(α)線がデバイ子ノ作勲誤差(″/7ト
エラー)を引き起こすのηある。
Although natural quartz is of good quality, it contains various heavy metals and impurities, and it is difficult to use as a crucible for pulling semiconductor single crystals due to the penetration of the M metal impurities. By lowering the electronic physical properties of the produced crystals, alpha (α) rays emitted from impurities can be used as fillers for encapsulants in ultra-LSI (large-scale integrated circuits). It is η that causes the error (″/7 error).

このため、ウラン含有量の低い、高純度粉末が要望さ、
れ、特に超LSI用封止剤の充填物としてはウランレベ
ルが1ppb以下の高軸度品が必要とされてい、慢すな
わち、資源的問題の少な【ぐ、原料を用い、しかも純度
Ωきやめて高い石英ガラス粉末を安価に提供しつる製造
方法がつよく要望されている。
For this reason, high purity powder with low uranium content is required.
In particular, as a filler for VLSI encapsulant, a high axiality product with a uranium level of 1 ppb or less is required. There is a strong need for a method of manufacturing vines that provides high quality quartz glass powder at low cost.

本発明者等はかかる客蜆状’3にバックとし、天然に比
較的v1:富に存在する珪石を出発原料とす°る□。
The inventors of the present invention use silica stone, which is relatively abundant in nature, as a starting material, based on such a method.

中1閾体であって門、!忙より梢換が、痒′易り、・、
あ、す、・ 、。
It is a middle 1st threshold body and a gate! I'm more itchy to change the leaves than I am busy...
tomorrow,· ,.

いわゆるゾルグル法による石英ガラス素ノ一体ア′画造
に・利用されているI+□酸工身デル1ζfi目し、そ
の □加、水分解直り生成りグルを経由して高純1にの
′1゜石英ガラス粉末を製造する方法を提案したが、原
料の珪酸エステルは’a格が高(、従ってνμ品コスト
が尚<ケるので、¥l+!;111iな原料の超択及び
それよ、。
The so-called sol-glu method is used to make quartz glass elements, which are used for painting.゜We proposed a method for manufacturing quartz glass powder, but the silicate ester as a raw material has a high rating (and therefore the cost of the νμ product is still high, so the selection of raw materials that is ¥1+!; 111i and that, .

りの製造法が求められ刃する。    。A new manufacturing method is required.    .

従来から安++lIiな工呆用イリカ源としては水ガラ
ス(畦淑ナトvウムの水癖液)があり、とれを鉱酸で中
和し、生成す占行水:珪酸全洗浄、乾燥して、乾燥剤矛
)るいは吸着剤用dシリ□カゲルが製造されCいる。こ
のシリカゲルの粉末を高温で一割戊¥れば、シリカ金主
体とするガラス粉末(高珪酸ガラス)がt”4られるが
、このシリカゲルにはナトリウムを始めとして各種の不
純物力楡昆人しており、半導体単結晶の引上げ用l:I
t堝材としては不向きであり、さらに該シリカゲルには
原料の1石に由来するアルファ線放射源のウランが数拾
ppb程度含ま□ れ−ノ鉱峻による洗浄だけでは十分
に除去できず5、、半、、、4田本坐−集遺回路、特に
ウランレベル1 ppb以下を必要とする超LSI用封
II:、剤の充填物として■、林r−効率のクラQ”M
’M技術の9が前提と、な゛る。
Traditionally, a cheap source of Irika for construction tools is water glass (Ane-shu nato vum's water habit liquid), which is produced by neutralizing it with mineral acid. , desiccant, or adsorbent d-silicon gels are manufactured. If 10% of this silica gel powder is heated at high temperature, glass powder (high silicate glass) consisting mainly of silica gold will be produced, but this silica gel contains various impurities including sodium. l:I for pulling semiconductor single crystals
The silica gel is not suitable as a filler material, and furthermore, the silica gel contains about a few ppb of uranium, which is an alpha-ray emitter derived from one of the raw materials, and cannot be sufficiently removed by cleaning with an iron ore. , Half, , 4 Tamotoza - Integrated circuits, especially for ultra-LSI seals that require uranium levels of 1 ppb or less: , As a filler for agents■, Hayashi r - Efficiency class Q"M
'9 of M technology is the premise.

本発明者らは水ガラスを製溝とする安価、なシリ、力の
製造ルートについて、ナト:リウム、ウラン等□ の、何害不純物を除去して高純r′ibニジリカゲル粉
末1 とし1.これを高温焼成して高純度の石英ガラス粉末を
製造する靴しh方法を開光すべ(、試M研究金重ねた結
果、水ガラスと鉱酸の反応を、特定範囲の水素イオン濃
1yの条件でイテえば、固液分離極の良好な含氷珪iの
沈−物が生成し、1−分に洗d後、乾燥すればナトワウ
:1ムばもとよ□す、除去の困離な微誉iう〜も♀分に
一減イヒした・リカが傳られることを見出し1本発りJ
に到達した。すなわち本発明の決旨とするところは、ア
ルカリ倹属乃至アルカリ土類金属の珪酸塩と鉱酸の反応
全水素イオン濃度1.5以下の条件で行ない、含水珪+
、W k 沈澱させ、咳よ水珪酸の沈澱物を洗浄、乾燥
、焼成することを特徴とする石英ガラス粉末の製造法。
The present inventors have developed a method for producing high-purity r'ib silica gel powder 1 by removing harmful impurities such as sodium, uranium, etc., using water glass as a groove. A method of manufacturing high-purity quartz glass powder by firing it at high temperatures was developed.As a result of repeated research, the reaction between water glass and mineral acid was carried out under conditions of a specific range of hydrogen ion concentration. If this is done, a good ice-containing silicon precipitate will be formed in the solid-liquid separation electrode, and if it is washed for 1 minute and then dried, it will become 1 mm thick and will be difficult to remove. I'm so happy that I've lost a lot of weight in ♀ minutes.I found out that Rika is going to be revealed and I posted one J.
reached. That is, the gist of the present invention is that the reaction between an alkali or alkaline earth metal silicate and a mineral acid is carried out under conditions where the total hydrogen ion concentration is 1.5 or less, and the hydrated silica+
, W k A method for producing silica glass powder, which comprises precipitating, washing, drying, and firing the precipitate of silicic acid.

にあるう 本発明で使用される原料としては上記の水ガラス以外に
珪酸カリ、珪r讃カルシウム等のアルカリ金属、アルカ
リ土類金属の珪酸]4でも同様の結果が得られるが、工
業的には多量に□生産されでいる水ガラス6利用が有刊
であり1時に粘性bt比較的低く珪酸分の比較的高い2
号、3号か使用しやす鴎 また、鉱酸としては、一般にシリカゲルの製プ1に汎用
されている塩酸ンあるいは硝酸でもウラン除去の効果が
あり、用途によっては有効であるが、特に超LSIの封
止剤用充填物のようにウラン含有1’ppb以下を要す
る1合□には硝酸が有効である。
In addition to the above-mentioned water glass, the raw materials used in the present invention include alkali metals such as potassium silicate and calcium silicate, and alkaline earth metal silicates [4], but similar results can be obtained industrially. □Water glass 6 is produced in large quantities and is available for use. 1) The viscosity BT is relatively low and the silicic acid content is relatively high 2.
In addition, as mineral acids, hydrochloric acid or nitric acid, which is generally used in the production of silica gel, has the effect of removing uranium, and is effective depending on the application, but it is especially effective for ultra-LSI Nitric acid is effective for 1□ which requires a uranium content of 1'ppb or less, such as a filler for a sealant.

これら、う1酸の酸濃度とCては、含永株酸の生成反応
中p H’ 1.5以乍を保持すればよぐ、I繰に限定
はなAが、炭)蓼な場合にはハシド□リング並びに装置
の耐食等の問題があり、一方、稀゛薄にすぎる場合には
該珪酸塩中のアルカリ金属乃至アルカリ土類金属との当
量比から必然的に多酸の液量を使用することになり、装
置容量を過大にするため、不利であって、実際上l現定
以上4規定以下の濃度が適当であるり また、本姑明は従来のシリカゲル製造法と関連があるの
で、その点について略述するみ従来のシリカゲル製・造
成は次の方法をとっているi・□ (1)  シリカ収率を維持しつつ鉱酸の使用縦を極力
低減しかつり語水処理(中オロ)のj=を担を庸減する
ため、水ガラスに鉱酸全中和点まで加える。
These acid concentrations of elic acid and C are not limited as long as the pH is maintained at 1.5 or more during the reaction for producing a long-term acid. However, if the silicate is too dilute, the amount of polyacid will inevitably decrease due to the equivalence ratio with the alkali metal or alkaline earth metal in the silicate. This is disadvantageous because it increases the capacity of the equipment, and in practice, a concentration of 1 to 4N is appropriate. Therefore, I will briefly explain this point. Conventional silica gel manufacturing and creation uses the following method. (1) While maintaining the silica yield, the use of mineral acids is reduced as much as possible, and water treatment is also possible. In order to reduce the amount of j= (medium oro), add mineral acid to the water glass up to the point of total neutralization.

(2)いわゆる沈a(粉末状)ではな(、ゲル塊と・す
るため・、水ガラ、ス中に鉱rtt・加えて・ゆき、ゾ
ルを経由してゲルとし、生成ゲルを適当な大きさに切り
崩して乾燥後あるいrま乾燥前に洗浄する。
(2) Instead of so-called precipitate (powder), add ore to the water glass to form a gel mass, turn it into a gel via the sol, and divide the resulting gel into an appropriate size. Cut into pieces and wash after drying or before drying.

しかしながら、いずれの方法も水ガラス中に含まれるウ
ランの共沈を招くのである。
However, both methods lead to co-precipitation of uranium contained in water glass.

これに対し、本発明では鉱酸中に水ガラスを注入するこ
とにより、低pHで含水硅酸全生成させること忙なり、
沈澱状(粉末状)でかつウラン混入の極めて少・ないシ
リカ金主体「恰ること全骨子としてバる。
On the other hand, in the present invention, water glass is injected into mineral acid to completely generate hydrous silicic acid at low pH.
Precipitated (powdered) silica gold with very little uranium contamination.

なお、沈降性(湿式)シリカ粉の製法として。In addition, as a manufacturing method for precipitated (wet) silica powder.

水ガラスにカルシ□ウムJ:M”k加剣て2 絖i圭#
撰カルシウムiA:、澱を生成させ、母液金分14Lξ
これに鉱酸ヶ作用させカフ9.つ、、:溶晶し、′含炭
4酸沈澱′ 金1捗る方晶も、bるが□、未発明のよ□
うに多う〜除去を目的とし老カルシウムj容IBのpr
(t1m定己だflJはないJ 次に、未発明を病J或する6エ(2)についぞ詳述す机 ′(1)  陰水珪112のit減学生成工程:、)エ
イゆ、は反応母液心、(ヶ1.5 Ja ’!’ It
Ci差、9゜つつ、アルカIJ ’Q属乃″至アル分り
””i 証金属の硅1貸噸と鉱峻金反応さ姦て含水珪酸
の沈澱全「成させ、1′1 具体的なlしqとして1票とえ一゛3)児系のン+F1
’e’fr攪拌しつつ、核硝酸に2号水ガラス全注入し
て行□き、含水珪酸を生成させるの”71’ h ”6
 ”Q(□、反応母液のI)Hがン5を越ムい14点で
jlJl”’7J’Cガラスの注入を停止して、次工程
に移る。あるいぼ、珪酸分ルシウムの粉末を反応後の母
液□の9口が1.5を′越えなし計算量の′24′定哨
酸中t’ixJ”□□え□!加温じ5つつ攪拌して該珪
虐カルシウムより□ガル□シウ弘を溶出させ。
Calcium in water glass □ Um J: M”k Kakente 2 Kei #
Selected calcium iA:, produces lees, mother liquor gold content 14Lξ
Apply mineral acid to this and cuff 9. One: There is also a square crystal which is molten and has 'carbohydrate-containing acid precipitate', but it has not yet been invented.
There are many sea urchins ~ pr of old calcium j volume IB for the purpose of removal
(There is no flJ, it's t1m.) Next, I will explain in detail about the uninvented disease and 6e (2). is the reaction mother liquor core, (1.5 Ja '!' It
The Ci difference is 9 degrees, and the Alka IJ 'Q group to Al difference is 1'1. 1 vote for 1 and 3) child type +F1
'e'fr While stirring, pour all of the No. 2 water glass into the nuclear nitric acid to generate hydrated silicic acid ``71'' h ''6
``Q(□, I)H of the reaction mother liquor exceeds 5 and 14 points, stop the injection of the glass, and move on to the next step. After reacting the powder of lucium silicate, 9 mouths of the mother liquor □ was added to the calculated amount of 24' regular acid without exceeding 1.5 t'ixJ''□□E□! Stir 5 times while heating. Then, □gal□shiuhiro was eluted from the siliceous calcium.

オ水珪酸を生)Mさせ本等の方法もあ□机:□□−こ”
t”r侯友宮水珪酸め屍澱□生成反応)」、5會越ンる
旨pH門域で行□な1らた場合には、t−bi或する會
永4酸中あウラン縦力値まり、洗浄VC上り壽千の除去
はできるものの十分な低減効果は□得られ′ないが□、
母液のpHの低下□と共に生成する含水□珪酸中のウラ
ン量は低ドし、pH1,5以下ではゲラン含有(壮i”
ppbレベル以下にもきるので本光明釦お□ける含水珪
酸の沈澱生成反応はp H1,5’JV、−Fでイー亭
なうこ□と力を必dである。   − このような゛反応中の′p′HIC−よる生Ji’A”
誉永珪′酸中のウラン含有量の変動をもたらす原因は明
らかでない示、・iH領領域は含水珪酸−の□ウランの
吸着のみなら′子!生成し′また含水珪酸沈澱□のネッ
トワーク中に共記によつぞウラン□がmみ込まれ、固定
化さKて酸洗全もってしても除去できなくカるが。
There is also a method of making silicic acid M and books etc. □Desk: □□-ko”
t"r Houyou Palace water silicate sludge □ production reaction)", if it is carried out in the pH range that exceeds 5, then the uranium vertical Although it is possible to remove the power level and the cleaning VC rise, a sufficient reduction effect cannot be obtained.
As the pH of the mother liquor decreases, the amount of uranium in the hydrous silicic acid produced decreases, and at pH 1.5 or lower, it contains gellan.
Since the concentration can be reduced to below the ppb level, the precipitate-forming reaction of hydrated silicic acid, which is carried out by Honko Meikan, must be carried out at pH 1, 5'JV, -F. - During such a reaction, 'p'HIC-induced Ji'A'
The cause of the fluctuation in the uranium content in Honei silicic acid is not clear. If the iH region is only the adsorption of □ uranium in hydrous silicic acid, then the iH region will be the result! In addition, uranium □ is incorporated into the network of the hydrous silicic acid precipitate □, which becomes immobilized and cannot be removed even by pickling.

pHの低下と□共に硝−根によ乞dランア―乍力が増し
て、ウランが溶液中に溶存する率が高まり、特KpHが
1.5以下の強酸性下でば含水珪酸の沈澱中ぺの′混入
がp、pbレベル以下に低下することに帰因する・もの
と推定され□る。鋼層以外の鉱酸。
As the pH decreases, the strength of the nitric acid increases, increasing the rate at which uranium is dissolved in the solution, and especially under strong acidity with a K pH of 1.5 or less, hydrated silicic acid is precipitated. It is presumed that this is due to the fact that the amount of pen's contamination falls below the p and pb levels. Mineral acids other than the steel layer.

たとえば硫を俊、塩駿等もpHの低減に基づ(効果はあ
るが、これら□の場陰にはつ・ランの溶解が硝酸より劣
るため、生成含水・珪′峻咽へのフランの混入率が増す
ものと考えられるロ   ・  ・なお、禮含水珪酸生
成反応時のpHの下限については、特に限定されないが
、過度に低い場合にrIi強酸性反応残液として廃液処
′埋の・負担が増すので好ましくなく、田、′5程度I
K ’tl:、めておくことが望ましbI、′   ・
・        ・生成した含水珪酸は沈降後、大部
分の上澄液を廃水処理システムに流し去るか、またはP
4’fc行lてって大部分の反応母液と分離し1次の洗
浄工程にイ多す。
For example, sulfur, salt, etc. are also effective based on pH reduction (although they are effective, they are inferior to nitric acid in dissolving nitrates and sulfur, so furan's effect on the water content and diaphragm produced) It is thought that the contamination rate will increase.2.The lower limit of the pH during the reaction to produce hydrated silicic acid is not particularly limited, but if it is too low, the burden of disposing of the waste liquid as rIi strongly acidic reaction residual liquid may increase. This is not desirable as it increases the
K'tl:, It is desirable to keep bI,' ・
・ ・After the generated hydrated silicic acid settles, most of the supernatant liquid is discharged to a wastewater treatment system, or P
The 4'fc line is separated from most of the reaction mother liquor and added to the first washing step.

(2)洗浄工程 この工程では大部分の該反応母液から分離した禮含水1
圭酸沈澱*は付着、残留する該反応母液を除いて純度を
保つため妃洸浄する。この洗浄釦は□、純度維持のため
脱イオン水乃至は蒸貿、水を用する・ が・、、・洗(
p操作の初期には、咳含水律酸沈澱物に付看、残留・・
する母液中に合波れるクラン等の不用物がpuの上昇i
c痒なh核訝水珪酸に吸着することがあるため―・pH
1,5以ドの酸でリンス後、水洗全十分にイJ′なうこ
とが′望ましvl、、   ”’:洗浄の程度は製品の
、、使用目的によるが、洗浄処理後の孜の電・気伝導度
で管理することができる。
(2) Washing step In this step, most of the water-containing water separated from the reaction mother liquor
The phosphoric acid precipitate* is purified to remove the adhering and remaining reaction mother liquor and to maintain purity. This cleaning button uses deionized water or distilled water to maintain purity.
At the beginning of p operation, the cough water-containing acid precipitate should be attended to and the remaining...
Unwanted materials such as clans that combine in the mother liquor cause an increase in pu.
It is itchy because it may be adsorbed to hydrosilicic acid - pH
After rinsing with an acid of 1.5 or higher, it is desirable to thoroughly rinse with water.The degree of cleaning depends on the intended use of the product, but the It can be managed by electrical and electrical conductivity.

洗浄した該含水珪酸I/i濾過等により固l夜分離、し
て次の乾燥工程に移す。
The washed hydrated silicic acid is separated by I/I filtration or the like, and then transferred to the next drying step.

(3)乾燥工種   ・     ・   。(3) Drying type.

・この工程では洗浄後の核含水珪酸TI′i乾燥して。- In this step, the core hydrated silicic acid TI'i is dried after washing.

めわゆるシリカゲルとする。乾燥後、沈澱粒子間の凝集
が・起こり、塊状となることがあるが、押し潰す等の簡
単・な操作で、はぐすことができる。
It is called meso-yuru silica gel. After drying, agglomeration may occur between the precipitated particles, forming a lump, but this can be removed by simple operations such as crushing.

・(4)・“完成工程 この上慢では乾燥により1→られた粉末状シリカゲルは
焼成により、緻密7よガラス伏粒子粉末とする。焼成i
度は該シリ・カグル状、勿末の製造itj!’歴にもよ
るが、1100°C以夫を要す今。但し、130fノ0
0以上の温IWでは粒子間?ンy夕IJ ンf がg生
L、再粉砕等の面倒な操作を礫する、よ:うになるため
・(4)・“Completion process In this step, the powdered silica gel that has been dried to form a 1→1 state is made into a dense 7-glass powder by firing.
The degree is that Shiri Kaguru-like, it's the manufacturing of the end! 'It depends on the history, but now it takes more than 1100°C. However, 130f no 0
Between particles at a temperature IW of 0 or more? In order to avoid troublesome operations such as grinding and re-grinding, it becomes like this.

粒子間”′接触し′”心う′χ、分散、塔・、紬!°児
或を、行なうか、あるいンよ13oo7c未滴の温度で
燭、成することが望ましい。/:C:M、焼成時間、は
早産に依存するが、1100°C以上13oo0c、の
軸回では30分乃至11 2時間橿度である。
``Contact'' between particles, dispersion, tower, Tsumugi! It is advisable to burn the candle at a temperature of 13°C or less. /:C:M, the firing time depends on the premature birth, but the firing time is 30 minutes to 112 hours at an axis temperature of 1100°C or higher and 1300°C.

仄忙1本祐明を実施例に、よつCさらに長体的に説明す
るが1本発明はその要旨を+1:’Aえl、Cい限り以
下の4/la例によって1餞定されるものでは1よい・
処流量1 ジメチルペンテン製ビーカー(,2−Qlj’ KL 
)に3規定硝酸(試薬特級)1eを人、れ、テフロンコ
ートしたインペラー型開!、攪拌俸:で撹拌しつつ、こ
り、に3号水ガラス400y−をゆっくりと注入し、沈
殿物全碍だ、母i夜のpHは0.6とl”1つ、ていた
The present invention will be explained in more detail by taking the example of the present invention as an example, but the gist of the present invention is determined by the following 4/la example. It's 1st best.
Processing amount 1 Dimethylpentene beaker (,2-Qlj' KL
), add 3N nitric acid (special grade reagent) 1e, and open the Teflon-coated impeller mold! While stirring, 400 ml of No. 3 water glass was slowly poured into the mixture, and the precipitate was completely removed.The pH at night was 0.6 and 1 liter.

上澄液を除いた後、e過して大部分の母液を切り。After removing the supernatant, remove most of the mother liquor through e-filtering.

次いで7i−ケーキをもとのビーカーに戻、シ、さらに
0.1規定の(+iJ1.5形、、を/ILIえてリパ
ルプして上11t J夜lJを除ぎ、このパルプに、孝
留水1eを加えて攪拌後、上澄液を除くデカンチージョ
ンj* +□e金2回繰返した後、槙貿水のみによる同
)ボのfカンデージョン燥1′r全7回繰返して、〃」
議した。
Next, return the 7i-cake to the original beaker, add 0.1N (+iJ1.5 form, , /ILI), repulp the cake, remove the upper 11tJ, add water to this pulp. After adding 1e and stirring, remove the supernatant liquid and repeat the decantation j* + □e gold twice, then dry the same) with only Makibo water 1'r and repeat 7 times in total. 〃”
We discussed it.

、、1キトられ、た?ノ4過□ケーキ乍に水30 OJ
W金注入してから水切り全行Iよい、0オープン中12
0.。Cで1昼夜乾禮してシリカゲル粉末約120y−
金得た0このシリカゲル材木を不透明石英ガラス製のボ
ーHC入れ、 1′txtd’中1100°Cで2時間
焼成を行ない、1039−の焼成粉末を得たi この′焼成粉末のさ比重は2.195.sin、含有量
は99.94以上であり、X線回折図9ま結晶tn有の
ピークを示さないことから1石英ガラス粉末とt’jつ
−Cいることがf4J明した。収率は95優に相尚する
。分析の結果、ナトリウム朦0.8ppmmウラン11
1ppb以下であり1発光分光分析では珪累以外の不純
物は検出されず、島純1(品であった。
,, 1 kite, was it? 4 hours □ 30 OJ of water with the cake
W After injecting gold, drain all lines I good, 0 open 12
0. . Dry at C for one day and night to obtain approximately 120y of silica gel powder.
This silica gel lumber was placed in an opaque quartz glass bow HC and fired for 2 hours at 1100°C in 1'txtd' to obtain a fired powder of 1039. The specific gravity of this fired powder was 2. .195. The sin content was 99.94 or more, and the X-ray diffraction diagram 9 did not show a peak with crystals tn, so it was clear that 1 quartz glass powder and t'j 2 -C were present. The yield is better than 95%. As a result of the analysis, sodium content was 0.8ppmm, and uranium-11
It was 1 ppb or less, and no impurities other than silica were detected by emission spectroscopic analysis, and it was Shima Pure 1 (quality).

比較のために、上り己3規足硝1れ3.号水ガラスの混
合峨のpHが4になるまで、核3号水ガラスを注入した
以外Fi実砲例1と全く同僚の操作を行なって焼成物1
059−を得た・。この焼成物のウラン含有量は52p
pbであって含水硅酸生成のpHの上祥により、ウラン
、の混入が′4増し、目(瑣値を大幅に上チわり不適当
であ番ごとが判明した。
For comparison, 3. Fired product 1 was prepared using the same procedure as in Example 1 of Fi actual gun except that the nuclear No. 3 water glass was injected until the pH of the No. 3 water glass mixture reached 4.
I got 059-. The uranium content of this fired product is 52p
Due to the pH of PB and the production of hydrated silicic acid, the contamination of uranium increased by 4'4, which was found to be inappropriate and unsuitable.

、繕榴例2,3,4,5 テフロンコ−カー(2,e容赦)にoc表にボす谷峡?
そノしぞfL 1.6入れ、テフロンコートしたイノペ
ラ型回転傷拌棒で攪拌しつつ、同じく画表に示す谷珪峻
塩の水浴液をゆ・つぐり、と注入し“Cjrテき。
, Patching cases 2, 3, 4, 5 Teflon coker (2, e pardon) to the OC table?
Add Sonoshizo fL 1.6, stir with a Teflon-coated inopeller-type rotating stirring rod, and pour in the water bath solution of Tani silica salt shown in the table.

(昆台液のpH/J″−画表に4<シたイ直に、催した
とぎ、該1醒」゛バ水浴液の注入を止め、生成した沈澱
物勿前記の’−11−411i例1と全く同様に処理し
て(1)だ石英ガラス粉末のナトリウム及びウラン含有
域ばそノ1.ぞjtl ppm以ド及びpI)b台以F
となり、特に&鷹として硝1112を用いた場合にはウ
ラン址はl ppb以下となって、十分目的ra成しう
ろことが1明したう寿られた石英ガラス粉末の収率は9
2〜96俤の範囲で、hす、実施例1と同様に、いずれ
も高収率であった。
(The pH of Kuntai liquid / J'' - 4 < 4 on the chart. Immediately after the water was raised, the injection of the water bath liquid was stopped, and the precipitate formed was of course the above-mentioned '-11-411i. The treatment was carried out in exactly the same manner as in Example 1 (1).
In particular, when Nitsu 1112 is used as the material, the uranium content will be less than 1 ppb, and the yield of quartz glass powder will be 9.
As in Example 1, all yields were high in the range of 2 to 96 hours.

実施例6.7及び比較例   。Examples 6.7 and comparative examples.

+70ンビーカ−(213)lC2規定on +、t 
1.2−e金入れ、5I!1Ir11′5・pI6では
これに三珪1波マグネシウム(Mg之813.06・5
H,o ) ?!−170?、対応する比べ例では13
0y−、実施例7ではIE畦酸カルシウム(Ca8i0
.−’l、2H70相当) k2001/−、対応する
比咬例では160ftそれぞれ加え、テフロンコートの
インペラー型攪拌憧で攪拌しつつ、JIllN度60°
Cで6時間加熱イ次、生成した沈誼物を実施例1の場せ
と同様に処理して乾燥シリカゲル粉末を得た。
+70 n beaker (213) lC2 regulation on +, t
1.2-e Money purse, 5I! For 1Ir11'5/pI6, this is followed by Sankei 1 wave magnesium (Mg no 813.06/5
H,o)? ! -170? , 13 in the corresponding comparative example
0y-, and in Example 7, IE calcium silane (Ca8i0
.. -'l, equivalent to 2H70) k2001/-, 160ft for the corresponding ratio bite example, and while stirring with a Teflon-coated impeller-type stirring device, JIllN degree 60°
After heating at C for 6 hours, the resulting precipitate was treated in the same manner as in Example 1 to obtain a dry silica gel powder.

この乾燥シリカゲル粉末を/に:IA/泄索炎中忙フ1
0し”C1++た・石残ガラス紛木中のナトリウム及び
ウラン含有域はド表に併記の億りであり、これら不純物
Haま十分に歌いfJ品が得らfLることか判明した。
Add this dry silica gel powder to: IA/Excretorrhea 1
It was found that the sodium and uranium content range in the stone residue glass powder was as shown in the table, and that these impurities were sufficient to obtain a fJ product.

Claims (3)

【特許請求の範囲】[Claims] (1)アルカリ金属乃至アルカリ土類金属の珪酸塩と鉱
酸の反応を水累イオン濃度1.5以下の条件で行ない、
含水珪A2を沈殿させ、該含水珪酸の沈澱物を洗浄、屹
燥、ノ循成することを特徴とする石英ニガラス粉末の装
造、法。   □
(1) A reaction between an alkali metal or alkaline earth metal silicate and a mineral acid is carried out under conditions where the water ion concentration is 1.5 or less,
A method for preparing quartz glass powder, which comprises precipitating hydrated silica A2, washing, drying, and circulating the hydrated silicic acid precipitate. □
(2)前記アルカリ金属の珪酸塩は水ガラスである・特
許請求の範囲(1)圧11ピ域の製造法。
(2) The alkali metal silicate is water glass.Claims (1) A manufacturing method in the pressure range of 11 pi.
(3)  前記鉱酸は硝酸である特許請求の範囲+1)
に記載の製造法。
(3) Claim that the mineral acid is nitric acid +1)
The manufacturing method described in.
JP16443682A 1982-09-21 1982-09-21 Preparation of quartz glass powder Pending JPS5954632A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16443682A JPS5954632A (en) 1982-09-21 1982-09-21 Preparation of quartz glass powder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16443682A JPS5954632A (en) 1982-09-21 1982-09-21 Preparation of quartz glass powder

Publications (1)

Publication Number Publication Date
JPS5954632A true JPS5954632A (en) 1984-03-29

Family

ID=15793124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16443682A Pending JPS5954632A (en) 1982-09-21 1982-09-21 Preparation of quartz glass powder

Country Status (1)

Country Link
JP (1) JPS5954632A (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60180911A (en) * 1984-02-27 1985-09-14 Nippon Chem Ind Co Ltd:The High-purity silica and its manufacture
JPS60191016A (en) * 1984-03-12 1985-09-28 Nippon Chem Ind Co Ltd:The High-purity silica and its manufacture
JPS6117416A (en) * 1984-07-03 1986-01-25 Nippon Chem Ind Co Ltd:The High-purity silica and its preparation
JPS6140811A (en) * 1984-07-31 1986-02-27 Nippon Chem Ind Co Ltd:The Hydrated silica for melting and manufacture of melted silica by using it
JPS6148422A (en) * 1984-08-17 1986-03-10 Nippon Chem Ind Co Ltd:The High purity silica and its preparation
JPS6148421A (en) * 1984-08-17 1986-03-10 Nippon Chem Ind Co Ltd:The Silica with high purity and its preparation
JPS61178414A (en) * 1985-01-31 1986-08-11 Nippon Chem Ind Co Ltd:The High-purity silica and production thereof
JPS6212609A (en) * 1985-07-11 1987-01-21 Nippon Chem Ind Co Ltd:The Modified fused spherical silica and production thereof
JPS6212608A (en) * 1985-07-11 1987-01-21 Nippon Chem Ind Co Ltd:The Silica of high purity and production thereof
JPS6283313A (en) * 1985-10-08 1987-04-16 Kawatetsu Kogyo Kk Method for highly purifying silica
US4683128A (en) * 1985-06-27 1987-07-28 Nitto Chemical Industry Co., Ltd. Process for manufacturing high purity silica
JPH01270530A (en) * 1988-04-21 1989-10-27 Nitto Chem Ind Co Ltd Production of formed glass body
JPH01275438A (en) * 1988-04-25 1989-11-06 Nitto Chem Ind Co Ltd Production of formed glass
US7140201B2 (en) 1999-12-28 2006-11-28 M. Watanabe & Co., Ltd. Method for producing silica particles

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60180911A (en) * 1984-02-27 1985-09-14 Nippon Chem Ind Co Ltd:The High-purity silica and its manufacture
JPH0121091B2 (en) * 1984-02-27 1989-04-19 Nippon Chemical Ind
JPS60191016A (en) * 1984-03-12 1985-09-28 Nippon Chem Ind Co Ltd:The High-purity silica and its manufacture
JPH05339B2 (en) * 1984-03-12 1993-01-05 Nippon Chemical Ind
JPH0121093B2 (en) * 1984-07-03 1989-04-19 Nippon Chemical Ind
JPS6117416A (en) * 1984-07-03 1986-01-25 Nippon Chem Ind Co Ltd:The High-purity silica and its preparation
JPS6140811A (en) * 1984-07-31 1986-02-27 Nippon Chem Ind Co Ltd:The Hydrated silica for melting and manufacture of melted silica by using it
JPH0127003B2 (en) * 1984-07-31 1989-05-26 Nippon Chemical Ind
JPS6148421A (en) * 1984-08-17 1986-03-10 Nippon Chem Ind Co Ltd:The Silica with high purity and its preparation
JPH0121092B2 (en) * 1984-08-17 1989-04-19 Nippon Chemical Ind
JPS6148422A (en) * 1984-08-17 1986-03-10 Nippon Chem Ind Co Ltd:The High purity silica and its preparation
JPH0124729B2 (en) * 1984-08-17 1989-05-12 Nippon Chemical Ind
JPS61178414A (en) * 1985-01-31 1986-08-11 Nippon Chem Ind Co Ltd:The High-purity silica and production thereof
JPH055766B2 (en) * 1985-01-31 1993-01-25 Nippon Chemical Ind
US4683128A (en) * 1985-06-27 1987-07-28 Nitto Chemical Industry Co., Ltd. Process for manufacturing high purity silica
JPS6212608A (en) * 1985-07-11 1987-01-21 Nippon Chem Ind Co Ltd:The Silica of high purity and production thereof
JPH022804B2 (en) * 1985-07-11 1990-01-19 Nippon Chemical Ind
JPS6212609A (en) * 1985-07-11 1987-01-21 Nippon Chem Ind Co Ltd:The Modified fused spherical silica and production thereof
JPS6283313A (en) * 1985-10-08 1987-04-16 Kawatetsu Kogyo Kk Method for highly purifying silica
JPH0643246B2 (en) * 1985-10-08 1994-06-08 川鉄鉱業株式会社 Silica purification method
JPH01270530A (en) * 1988-04-21 1989-10-27 Nitto Chem Ind Co Ltd Production of formed glass body
JPH01275438A (en) * 1988-04-25 1989-11-06 Nitto Chem Ind Co Ltd Production of formed glass
US7140201B2 (en) 1999-12-28 2006-11-28 M. Watanabe & Co., Ltd. Method for producing silica particles

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