JPS5944825A - 電子ビ−ム露光装置 - Google Patents

電子ビ−ム露光装置

Info

Publication number
JPS5944825A
JPS5944825A JP15551182A JP15551182A JPS5944825A JP S5944825 A JPS5944825 A JP S5944825A JP 15551182 A JP15551182 A JP 15551182A JP 15551182 A JP15551182 A JP 15551182A JP S5944825 A JPS5944825 A JP S5944825A
Authority
JP
Japan
Prior art keywords
electron beam
speed
exposure
sample stage
deflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15551182A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6244404B2 (enExample
Inventor
Mineo Goto
後藤　峰夫
Ryoichi Yoshikawa
良一 吉川
Sadao Sasaki
佐々木　貞夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP15551182A priority Critical patent/JPS5944825A/ja
Publication of JPS5944825A publication Critical patent/JPS5944825A/ja
Publication of JPS6244404B2 publication Critical patent/JPS6244404B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP15551182A 1982-09-07 1982-09-07 電子ビ−ム露光装置 Granted JPS5944825A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15551182A JPS5944825A (ja) 1982-09-07 1982-09-07 電子ビ−ム露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15551182A JPS5944825A (ja) 1982-09-07 1982-09-07 電子ビ−ム露光装置

Publications (2)

Publication Number Publication Date
JPS5944825A true JPS5944825A (ja) 1984-03-13
JPS6244404B2 JPS6244404B2 (enExample) 1987-09-21

Family

ID=15607644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15551182A Granted JPS5944825A (ja) 1982-09-07 1982-09-07 電子ビ−ム露光装置

Country Status (1)

Country Link
JP (1) JPS5944825A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61257046A (ja) * 1985-05-10 1986-11-14 Fujitsu Ltd 回線制御方式
JPS62122214A (ja) * 1985-11-22 1987-06-03 Toshiba Mach Co Ltd 電子ビーム描画装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61257046A (ja) * 1985-05-10 1986-11-14 Fujitsu Ltd 回線制御方式
JPS62122214A (ja) * 1985-11-22 1987-06-03 Toshiba Mach Co Ltd 電子ビーム描画装置

Also Published As

Publication number Publication date
JPS6244404B2 (enExample) 1987-09-21

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