JPS5943570A - 薄膜配線 - Google Patents

薄膜配線

Info

Publication number
JPS5943570A
JPS5943570A JP57153896A JP15389682A JPS5943570A JP S5943570 A JPS5943570 A JP S5943570A JP 57153896 A JP57153896 A JP 57153896A JP 15389682 A JP15389682 A JP 15389682A JP S5943570 A JPS5943570 A JP S5943570A
Authority
JP
Japan
Prior art keywords
copper
alloy
chromium
zirconium
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57153896A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0425715B2 (OSRAM
Inventor
Kenji Hinode
憲治 日野出
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57153896A priority Critical patent/JPS5943570A/ja
Publication of JPS5943570A publication Critical patent/JPS5943570A/ja
Publication of JPH0425715B2 publication Critical patent/JPH0425715B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/62—Electrodes ohmically coupled to a semiconductor

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Conductive Materials (AREA)
JP57153896A 1982-09-06 1982-09-06 薄膜配線 Granted JPS5943570A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57153896A JPS5943570A (ja) 1982-09-06 1982-09-06 薄膜配線

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57153896A JPS5943570A (ja) 1982-09-06 1982-09-06 薄膜配線

Publications (2)

Publication Number Publication Date
JPS5943570A true JPS5943570A (ja) 1984-03-10
JPH0425715B2 JPH0425715B2 (OSRAM) 1992-05-01

Family

ID=15572474

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57153896A Granted JPS5943570A (ja) 1982-09-06 1982-09-06 薄膜配線

Country Status (1)

Country Link
JP (1) JPS5943570A (OSRAM)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01248538A (ja) * 1988-03-30 1989-10-04 Hitachi Ltd 半導体装置
JPH0262035A (ja) * 1988-08-29 1990-03-01 Nippon Telegr & Teleph Corp <Ntt> 半導体装置
US5243222A (en) * 1991-04-05 1993-09-07 International Business Machines Corporation Copper alloy metallurgies for VLSI interconnection structures
US7755192B2 (en) 2008-03-25 2010-07-13 Tohoku University Copper interconnection structure, barrier layer including carbon and hydrogen

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01248538A (ja) * 1988-03-30 1989-10-04 Hitachi Ltd 半導体装置
JPH0262035A (ja) * 1988-08-29 1990-03-01 Nippon Telegr & Teleph Corp <Ntt> 半導体装置
US5243222A (en) * 1991-04-05 1993-09-07 International Business Machines Corporation Copper alloy metallurgies for VLSI interconnection structures
US7755192B2 (en) 2008-03-25 2010-07-13 Tohoku University Copper interconnection structure, barrier layer including carbon and hydrogen
US8163649B2 (en) 2008-03-25 2012-04-24 Advanced Interconnect Materials, Llc Copper interconnection structure, semiconductor device, and method for forming copper interconnection structure

Also Published As

Publication number Publication date
JPH0425715B2 (OSRAM) 1992-05-01

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