JPS5943549B2 - エッチング用処理液のｐｈ制御装置 - Google Patents
エッチング用処理液のｐｈ制御装置Info
- Publication number
- JPS5943549B2 JPS5943549B2 JP52092268A JP9226877A JPS5943549B2 JP S5943549 B2 JPS5943549 B2 JP S5943549B2 JP 52092268 A JP52092268 A JP 52092268A JP 9226877 A JP9226877 A JP 9226877A JP S5943549 B2 JPS5943549 B2 JP S5943549B2
- Authority
- JP
- Japan
- Prior art keywords
- probe
- liquid
- timer
- solution
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000012545 processing Methods 0.000 title claims description 26
- 238000005530 etching Methods 0.000 title claims description 7
- 239000000523 sample Substances 0.000 claims description 40
- 239000007788 liquid Substances 0.000 claims description 32
- 239000012141 concentrate Substances 0.000 claims description 13
- 238000012544 monitoring process Methods 0.000 claims description 7
- 238000007599 discharging Methods 0.000 claims 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 10
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 238000012806 monitoring device Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 235000019795 sodium metasilicate Nutrition 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 241000272525 Anas platyrhynchos Species 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- ZTXONRUJVYXVTJ-UHFFFAOYSA-N chromium copper Chemical compound [Cr][Cu][Cr] ZTXONRUJVYXVTJ-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007687 exposure technique Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 230000001012 protector Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D21/00—Control of chemical or physico-chemical variables, e.g. pH value
- G05D21/02—Control of chemical or physico-chemical variables, e.g. pH value characterised by the use of electric means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
- G03D3/00—Liquid processing apparatus involving immersion; Washing apparatus involving immersion
- G03D3/02—Details of liquid circulation
- G03D3/06—Liquid supply; Liquid circulation outside tanks
- G03D3/065—Liquid supply; Liquid circulation outside tanks replenishment or recovery apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/2496—Self-proportioning or correlating systems
- Y10T137/2499—Mixture condition maintaining or sensing
- Y10T137/2509—By optical or chemical property
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Control Of Non-Electrical Variables (AREA)
- ing And Chemical Polishing (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/719,777 US4013039A (en) | 1976-09-02 | 1976-09-02 | Wet processing PH control |
| US000000719777 | 1976-09-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5334640A JPS5334640A (en) | 1978-03-31 |
| JPS5943549B2 true JPS5943549B2 (ja) | 1984-10-23 |
Family
ID=24891318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52092268A Expired JPS5943549B2 (ja) | 1976-09-02 | 1977-08-02 | エッチング用処理液のｐｈ制御装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4013039A (index.php) |
| JP (1) | JPS5943549B2 (index.php) |
| CA (1) | CA1087711A (index.php) |
| DE (1) | DE2738981C2 (index.php) |
| FR (1) | FR2363828A1 (index.php) |
| GB (1) | GB1530055A (index.php) |
| IT (1) | IT1114118B (index.php) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50121798A (index.php) * | 1974-03-14 | 1975-09-23 | ||
| JPS5561003A (en) * | 1978-10-31 | 1980-05-08 | Seiko Epson Corp | Manufacture of intermetallic compound magnet |
| JPS55162049A (en) * | 1979-06-05 | 1980-12-17 | Olympus Optical Co Ltd | Specimen coating device |
| JPS5633934A (en) * | 1979-08-29 | 1981-04-04 | Matsushita Electric Ind Co Ltd | Production of resin magnet |
| DE3301635A1 (de) * | 1983-01-19 | 1984-07-26 | Siemens AG, 1000 Berlin und 8000 München | Herstellung von leitfaehigen kunststoffen |
| JPS6048884B2 (ja) * | 1984-05-07 | 1985-10-30 | セイコーエプソン株式会社 | 金属間化合物磁石の製造方法 |
| FI80729C (fi) * | 1988-04-07 | 1990-07-10 | Vesa Hakulinen | Foerfarande och anordning foer dosering av tvaettmedel. |
| EP0552511A1 (en) * | 1992-01-20 | 1993-07-28 | Agfa-Gevaert N.V. | Method for controlling the PH of an ascorbic acid type developer |
| US5876359A (en) * | 1994-11-14 | 1999-03-02 | Bock; Malcolm G. | Sequential compression device controller |
| US6298577B1 (en) | 1999-07-19 | 2001-10-09 | Concept Cleaning Systems, Inc. | Device for enhancing removal of liquid from fabric |
| US6266892B1 (en) | 1999-07-19 | 2001-07-31 | Concept Cleaning Systems, Inc. | Device for enhancing removal of liquid from fabric |
| US7185516B2 (en) * | 2002-05-31 | 2007-03-06 | Owens Corning Fiberglas Technology, Inc. | Washwater neutralization system for glass forming line |
| US20080184520A1 (en) * | 2006-09-14 | 2008-08-07 | Wolfe Kevin A | Self-propelled extraction systems and methods |
| US8510902B2 (en) | 2007-12-03 | 2013-08-20 | Dri-Eaz Products, Inc. | Air induction hard surface cleaning tool with an internal baffle |
| USD684737S1 (en) | 2011-08-31 | 2013-06-18 | Dri-Eaz Products, Inc. | Extractor housing |
| US9195238B2 (en) | 2012-06-15 | 2015-11-24 | Sapphire Scientific, Inc. | Waste water vessels with multiple valved chambers, and associated systems and methods |
| US9351622B2 (en) | 2012-09-04 | 2016-05-31 | Sapphire Scientific Inc. | Fluid extracting device with shaped head and associated systems and methods of use and manufacture |
| USD701661S1 (en) | 2012-09-04 | 2014-03-25 | Dri-Eaz Products, Inc. | Extractor port housing |
| US10060641B2 (en) | 2015-02-25 | 2018-08-28 | Dri-Eaz Products, Inc. | Systems and methods for drying roofs |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3368525A (en) * | 1965-10-04 | 1968-02-13 | American Photocopy Equip Co | Liquid developer system for photocopy machine |
| US3452710A (en) * | 1967-06-06 | 1969-07-01 | Baker & Gubbins Co | Liquid applicator system |
| GB1245102A (en) * | 1968-02-15 | 1971-09-08 | Norma Craik Harper | Automatic control of chemical concentration |
| US3554212A (en) * | 1968-06-19 | 1971-01-12 | Ritter Pfaudler Corp | Chemical feed controller |
| US3677222A (en) * | 1969-02-24 | 1972-07-18 | Canon Kk | Device for automatically regulating the concentration of developing solution |
-
1976
- 1976-09-02 US US05/719,777 patent/US4013039A/en not_active Expired - Lifetime
-
1977
- 1977-07-18 GB GB30078/77A patent/GB1530055A/en not_active Expired
- 1977-07-21 FR FR7723000A patent/FR2363828A1/fr active Granted
- 1977-08-02 JP JP52092268A patent/JPS5943549B2/ja not_active Expired
- 1977-08-26 IT IT26984/77A patent/IT1114118B/it active
- 1977-08-30 DE DE2738981A patent/DE2738981C2/de not_active Expired
- 1977-08-30 CA CA285,780A patent/CA1087711A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2738981C2 (de) | 1983-12-22 |
| GB1530055A (en) | 1978-10-25 |
| FR2363828A1 (fr) | 1978-03-31 |
| JPS5334640A (en) | 1978-03-31 |
| CA1087711A (en) | 1980-10-14 |
| IT1114118B (it) | 1986-01-27 |
| FR2363828B1 (index.php) | 1980-01-04 |
| US4013039A (en) | 1977-03-22 |
| DE2738981A1 (de) | 1978-03-09 |
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