JPS5942294B2 - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number
JPS5942294B2
JPS5942294B2 JP50025551A JP2555175A JPS5942294B2 JP S5942294 B2 JPS5942294 B2 JP S5942294B2 JP 50025551 A JP50025551 A JP 50025551A JP 2555175 A JP2555175 A JP 2555175A JP S5942294 B2 JPS5942294 B2 JP S5942294B2
Authority
JP
Japan
Prior art keywords
bleach
dye
exposure
light
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP50025551A
Other languages
English (en)
Japanese (ja)
Other versions
JPS50122936A (US20080094685A1-20080424-C00004.png
Inventor
エム ルイス ジエ−ムズ
ダブリユ ニユ−イヤ− レイモンド
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horizons Research Inc
Original Assignee
Horizons Research Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horizons Research Inc filed Critical Horizons Research Inc
Publication of JPS50122936A publication Critical patent/JPS50122936A/ja
Publication of JPS5942294B2 publication Critical patent/JPS5942294B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Holo Graphy (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP50025551A 1974-03-01 1975-02-28 感光性組成物 Expired JPS5942294B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US447267A US3925077A (en) 1974-03-01 1974-03-01 Photoresist for holography and laser recording with bleachout dyes
US447267 1974-03-01

Publications (2)

Publication Number Publication Date
JPS50122936A JPS50122936A (US20080094685A1-20080424-C00004.png) 1975-09-26
JPS5942294B2 true JPS5942294B2 (ja) 1984-10-13

Family

ID=23775660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50025551A Expired JPS5942294B2 (ja) 1974-03-01 1975-02-28 感光性組成物

Country Status (5)

Country Link
US (1) US3925077A (US20080094685A1-20080424-C00004.png)
JP (1) JPS5942294B2 (US20080094685A1-20080424-C00004.png)
CA (1) CA1060251A (US20080094685A1-20080424-C00004.png)
DE (1) DE2509019C2 (US20080094685A1-20080424-C00004.png)
GB (1) GB1508911A (US20080094685A1-20080424-C00004.png)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3967963A (en) * 1974-04-22 1976-07-06 Hughes Aircraft Company Bleached holographic material and process for the fabrication thereof using halogens
DE2558812A1 (de) * 1975-12-27 1977-07-07 Hoechst Ag Lichtempfindliche kopiermassen und darin enthaltene photoinitiatoren
JPS5315152A (en) * 1976-07-27 1978-02-10 Canon Inc Hologram
JPS5315153A (en) * 1976-07-27 1978-02-10 Canon Inc Hologram
US4374189A (en) * 1979-12-17 1983-02-15 The United States Of America As Represented By The Secretary Of The Navy Process of making a holographic optical article
US4278753A (en) * 1980-02-25 1981-07-14 Horizons Research Incorporated Plasma developable photoresist composition with polyvinyl formal binder
US4348471A (en) * 1981-06-15 1982-09-07 Polychrome Corporation Positive acting composition yielding pre-development high visibility image after radiation exposure comprising acid free novolak, diazo oxide and acid sensitive dyestuff
JPH0611586B2 (ja) * 1982-03-31 1994-02-16 株式会社リコー 光記録用媒体
IE56081B1 (en) * 1982-11-01 1991-04-10 Microsi Inc A method of producing images of enhanced contrast in photoresists
US5108874A (en) * 1982-11-01 1992-04-28 Microsi, Inc. Composite useful in photolithography
US4509817A (en) * 1983-08-01 1985-04-09 Ncr Corporation Method for correcting volume-phase-gelatin holograms Bragg's angle deviation
JPS6076735A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 光硬化樹脂組成物
US4578344A (en) * 1984-12-20 1986-03-25 General Electric Company Photolithographic method using a two-layer photoresist and photobleachable film
US4698286A (en) * 1985-06-03 1987-10-06 Hercules Incorporated Plasma developable photoresist compositions containing perylene coumarin photosensitizer
CA1315591C (en) * 1986-02-20 1993-04-06 Takeshi Ishitsuka Visible ray-recording hologram material
BR8900132A (pt) * 1988-01-15 1989-09-12 Du Pont Processo para a formacao de um halograma de reflexao;processo para a formacao e a intensificacao de um halograma de reflexao em um meio de registro fotopolimerizavel substancialmente solido;e projecao de um feixe do objeto com a mesma radiacao actinica coerente aproximadamente na direcao oposta a do feixe de referencia
US4942112A (en) * 1988-01-15 1990-07-17 E. I. Du Pont De Nemours And Company Photopolymerizable compositions and elements for refractive index imaging
US4917977A (en) * 1988-12-23 1990-04-17 E. I. Du Pont De Nemours And Company Visible sensitizers for photopolymerizable compositions
JP2661317B2 (ja) * 1990-03-27 1997-10-08 松下電器産業株式会社 パターン形成方法
US5206110A (en) * 1991-02-04 1993-04-27 Ocg Microelectronic Materials, Inc. Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye
US5250392A (en) * 1991-02-04 1993-10-05 Ocg Microelectronic Materials, Inc. Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye
US5219703A (en) * 1992-02-10 1993-06-15 Eastman Kodak Company Laser-induced thermal dye transfer with bleachable near-infrared absorbing sensitizers
FR2690255A1 (fr) * 1992-04-17 1993-10-22 Digipress Sa Composition photosensible, notamment pour application au stockage d'informations ou à la réalisation d'éléments optiques holographiques.
US5364740A (en) * 1992-12-30 1994-11-15 Minnesota Mining And Manufacturing Company Bleaching of dyes in photosensitive systems
US6103331A (en) * 1997-09-26 2000-08-15 Fuji Electric Co., Ltd. Optical recording medium comprising organic dye thin film
US6268457B1 (en) 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
CA2374944A1 (en) 1999-06-10 2000-12-21 Nigel Hacker Spin-on-glass anti-reflective coatings for photolithography
AU2002227106A1 (en) 2001-11-15 2003-06-10 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
CN102365584B (zh) 2009-01-29 2014-07-30 迪吉福来克斯有限公司 用于在光聚合物表面上产生光掩模的工艺
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
JP2012083409A (ja) * 2010-10-07 2012-04-26 Tdk Corp カラーホログラム画像記録用フォトポリマー媒体及びカラーホログラム画像記録方法
EP2450893A1 (de) * 2010-11-08 2012-05-09 Bayer MaterialScience AG Photopolymer-Formulierung zur Herstellung holographischer Medien mit hoch vernetzten Matrixpolymeren
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
EP3194502A4 (en) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
CN116790134A (zh) * 2023-06-21 2023-09-22 复旦大学 一种近红外小分子染料及其制备方法和应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2875047A (en) * 1955-01-19 1959-02-24 Oster Gerald Photopolymerization with the formation of coherent plastic masses
US3000833A (en) * 1959-01-26 1961-09-19 American Cyanamid Co Color salts of fluoren-9-ols as infrared absorbers
US3102027A (en) * 1960-08-19 1963-08-27 Horizons Inc Direct positive dye bleach process and merocyanine composition therefor
DE1572137B1 (de) * 1965-06-03 1970-09-24 Du Pont Fotopolymerisierbares Aufzeichnungsmaterial
US3495987A (en) * 1965-09-03 1970-02-17 Du Pont Photopolymerizable products
US3620748A (en) * 1966-01-07 1971-11-16 Horizons Research Inc N-vinyl amine/halogen liberating composition sensitized with 9-vinyl carbazoles or polyacenes, or transannular peroxides of polyacenes
BE755251A (fr) * 1969-08-25 1971-02-25 Du Pont Enregistrement holographique dans des couches photopoly- merisables
US3667946A (en) * 1970-09-23 1972-06-06 Holotron Corp Surface treatment of photopolymer film used for recording holograms
US3712817A (en) * 1971-03-01 1973-01-23 Horizons Inc Dry working photosensitive compositions comprising organic halogen compounds,ethylene compounds and carbinol compounds
US3769023A (en) * 1971-05-07 1973-10-30 Horizons Inc Light sensitive reproduction and electron beam sensitive material
CA994152A (en) * 1972-02-09 1976-08-03 James M. Lewis Photoresist and method of making same

Also Published As

Publication number Publication date
DE2509019C2 (de) 1986-03-27
GB1508911A (en) 1978-04-26
US3925077A (en) 1975-12-09
JPS50122936A (US20080094685A1-20080424-C00004.png) 1975-09-26
CA1060251A (en) 1979-08-14
DE2509019A1 (de) 1975-09-04

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