JPS5936218B2 - Method for improving linearity of dual surface lateral photodetector for position determination - Google Patents

Method for improving linearity of dual surface lateral photodetector for position determination

Info

Publication number
JPS5936218B2
JPS5936218B2 JP51014341A JP1434176A JPS5936218B2 JP S5936218 B2 JPS5936218 B2 JP S5936218B2 JP 51014341 A JP51014341 A JP 51014341A JP 1434176 A JP1434176 A JP 1434176A JP S5936218 B2 JPS5936218 B2 JP S5936218B2
Authority
JP
Japan
Prior art keywords
electrodes
photodetector
linearity
square
doped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51014341A
Other languages
Japanese (ja)
Other versions
JPS51107180A (en
Inventor
ペール・イエーラン・ペーテルシヨン
ラーシユ・エーリツク・リンドホルム
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SERUKOMU AB
Original Assignee
SERUKOMU AB
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Filing date
Publication date
Application filed by SERUKOMU AB filed Critical SERUKOMU AB
Publication of JPS51107180A publication Critical patent/JPS51107180A/ja
Publication of JPS5936218B2 publication Critical patent/JPS5936218B2/en
Expired legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/102Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
    • H01L31/103Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/02016Circuit arrangements of general character for the devices
    • H01L31/02019Circuit arrangements of general character for the devices for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02024Position sensitive and lateral effect photodetectors; Quadrant photodiodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Light Receiving Elements (AREA)
  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Optical Transform (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)

Description

【発明の詳細な説明】 本発明は、検出器の検出面における光線の入射点の位置
検出に電気信号を使用する光検出器における直線性の改
良方法に関するものであつて、前記光検出器は、半導体
板、この半導体板の一側をそれぞれ被覆する2つの抵抗
層、この2つの抵抗層を分離するp−n接合、および各
抵抗層に設けた一対の電極とからなり、上記二対の電極
は各対が正方形の2個の対辺を画成するように位置し、
上記の正方形が互に反対側かつ平行に位置する上記抵抗
層の二箇所の部分を画成する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for improving linearity in a photodetector that uses an electric signal to detect the position of a point of incidence of a light beam on a detection surface of the detector, wherein the photodetector , a semiconductor board, two resistance layers each covering one side of this semiconductor board, a p-n junction separating these two resistance layers, and a pair of electrodes provided on each resistance layer. the electrodes are positioned such that each pair defines two opposite sides of a square;
The squares define two portions of the resistive layer located opposite and parallel to each other.

先に概略説明した種類のラテラル光検出器は、静置また
は運動する2次元および3次元中の物体の位置に関し非
接触解析するのに使用され、前記位置測定の対象物体に
光源を配置し、2個またはそれ以上の光検出器にて同時
に光源を検出して空間的および時間的に物体の位置と運
動を決定するのに使用される。
Lateral photodetectors of the type outlined above are used for non-contact analysis of the position of stationary or moving objects in two and three dimensions, by locating a light source on the object to be located; Two or more photodetectors are used to simultaneously detect a light source and determine the position and motion of an object in space and time.

ここに、ラテラルと称するのは光束により検出器に発生
するインパルスを2つの成分に分割し、夫々を検出器表
面に沿つて横に(ラテラル)伝達して電極に伝える故に
名付けられるものである。しかし従来のラテラル光検出
器は、出力信号と位置に関する座標との間の関係が、特
に電極によつて画成される検出面の端部近傍で非直線的
になる欠点を有している。このため直線性が厳格に要求
される場合は、端部効果の少い検出面の中心に関して対
称的に配置した検出面の僅少な部分に限定して使用しな
ければならないという不便があつた。例えば、電極を特
殊な幾何学的形状とすることにより、一層詳細には、相
対する側の電極を越えかつこれに交差して電極の端部を
延在させることにより、ある程度はいわゆる周縁部の影
響をなくすことはできるが、この方法により実際的な効
果を挙げるには、電極を長くつくる必要があり、その結
果検出器は検出器の有効表面に比べ不適当に大きくなる
きらいがある。さらに、p−n接合の面積および半導体
板の円周が増加して、p−n接合および周縁部を流れる
漏洩電流の望ましくない増加をきたし、その結果として
ノイズが増加し、かつより多くの材料を必要とすること
は勿論である。それ故、本発明の目的は、先に述べた従
来のラテラル光検出器の欠点を除去し、検出器の直線性
を改良する方法を提供するにある。
The term lateral is used here because the impulse generated on the detector by the light beam is divided into two components, each of which is transmitted laterally along the detector surface to the electrode. However, conventional lateral photodetectors have the disadvantage that the relationship between the output signal and the positional coordinates is non-linear, especially near the edges of the detection surface defined by the electrodes. For this reason, when linearity is strictly required, there is an inconvenience that the sensor must be used only in a small portion of the detection surface arranged symmetrically with respect to the center of the detection surface where the edge effect is small. For example, by giving the electrodes a special geometry, and more particularly by extending the ends of the electrodes beyond and across the opposite electrodes, to some extent the so-called periphery Although this effect can be eliminated, for this method to have any practical effect, it is necessary to make the electrodes long, which tends to make the detector unduly large compared to the effective surface of the detector. Additionally, the area of the p-n junction and the circumference of the semiconductor board increase, resulting in an undesirable increase in leakage current through the p-n junction and the periphery, resulting in increased noise and the need for more material. Of course, this is necessary. It is therefore an object of the present invention to provide a method that eliminates the above-mentioned drawbacks of conventional lateral photodetectors and improves the linearity of the detector.

この目的を達成するため、本発明に係る二重面ラテラル
光検出器の直線性改良方法は、2対の電極からの電気信
号を用いて光検出器の検出面上の人射点の位置を検出す
るものであり、かつ半導体板基層を形成してこの基層の
各々の反対面を覆う2つのドーピングした抵抗層を加え
、この2つのドーピングした抵抗層の間にp−n接合を
配置し、更に2対の電極を設け、この2対の電極の各対
をドーピングした抵抗層の各々の上に設定し、前記電極
対を平行六面体の境界を画成するように付形しかつ配置
し、前記干行六面体は前記ドーピングした各々の抵抗層
の夫々の部分を囲繞し、かつそれにより1対の電極は抵
抗層表面上にある平行六面体の正方形の対向する側にあ
り、他の1対の電極は他の抵抗層の表面上にある平行六
面体の正方形の対向する側にあり、かくして2対の電極
は光検出器の表面中にて互いに直角であるよう構成する
ことからなる改良された直線性を有する半導体型の二重
面ラテラル光検出器を製造する方法にお 一いて、前記
電極を囲繞しかつ抵抗層の表面上にある平行六面体の正
方形を囲繞するところの前記ドーピングした抵抗層の全
部分と前記p−n接合部とを除去することによつて平行
六面体の前記正方形内に配置したドーピングした抵抗層
とp−n接合との部分を電気的に絶縁することを特徴と
する。
To achieve this objective, the method for improving the linearity of a dual-surface lateral photodetector according to the present invention uses electrical signals from two pairs of electrodes to determine the position of the human irradiation point on the detection surface of the photodetector. and forming a semiconductor substrate substrate layer, adding two doped resistive layers covering opposite sides of each of the substrate layers, and disposing a p-n junction between the two doped resistive layers; further providing two pairs of electrodes, each pair of the two pairs of electrodes being set on each of the doped resistive layers, said pairs of electrodes being shaped and arranged to define boundaries of a parallelepiped; The parallelepiped surrounds a respective portion of each of the doped resistive layers, and such that one pair of electrodes are on opposite sides of the parallelepiped square on the resistive layer surface and the other pair of electrodes are on opposite sides of the parallelepiped square on the resistive layer surface. The electrodes are on opposite sides of the parallelepiped square on the surface of the other resistive layer, and thus the two pairs of electrodes are arranged at right angles to each other in the surface of the photodetector. A method for manufacturing a double-sided semiconductor-type lateral photodetector having a conductive structure, wherein the doped resistive layer surrounds the electrode and surrounds a parallelepiped square on a surface of the resistive layer. The pn junction is electrically insulated from the doped resistive layer disposed within the square of the parallelepiped by removing the entire portion and the pn junction.

本発明の好適かつ簡単な実施例は、区画をエツチングに
より行ない、各エツチングされた区域を、電極および前
記電極により画成した面に隣接する正方形のパターンに
実質的に延在させることを特徴とするものである。「次
に、本発明に係る二重面ラテラル光検出器の直線性改良
方法にpき、添付図面を参照しながら以下詳細に説明す
る。
A preferred and simple embodiment of the invention is characterized in that the division is effected by etching, each etched area extending substantially in a square pattern adjacent to an electrode and the plane defined by said electrode. It is something to do. ``Next, the method for improving the linearity of a double-sided lateral photodetector according to the present invention will be described in detail below with reference to the accompanying drawings.

」を加入します。第1図および第2図に示すとおり、本
発明に係る検出器は、不純物混合シリコン、いわゆるウ
エフア一からなる半導体板1を有する。
” will be added. As shown in FIGS. 1 and 2, the detector according to the invention has a semiconductor plate 1 made of impurity-mixed silicon, a so-called wafer.

特殊な製作法および脆いウエフア一の困難な作業性のた
め、この種の半導体板は殆ど例外なく円盤状に作られる
。半導体板1の各側面には、それぞれ抵抗層2および3
が配列されている。抵抗値は、使用法にも依るが、通常
値は10〜200Ω−mである。抵抗層はドーピングに
より製造され、一つの層2に関しては、この層と半導体
板本体との間の゛遷移点”にp−n接合1?が存在する
。各抵抗層2,3は、それぞれ.←対の長形でかつ平行
な電極4,5および6,?が配設されている。半導体板
の厚さを無視して考えれば、対をなす電極の位置を画成
して、一対の電極の対向する側を、一つの正方形の2つ
の対向する辺に沿つて延在させ、さらに他の一対の電極
の対向する側を上記正方形の他の2つの対向する辺に沿
つて延在させ、この正方形が理想的な有効検出面8を囲
繞するようにする。電極4,5および6,?を、それぞ
れ一つの減算器(図示せず)に接続する。光線9が検出
面8の点10に入射した場合、光線のエネルギーにより
p−n接合を通じて光電流が流れる。p−n接合はそれ
ぞれ電極4,5および6,1を経由して逆方向にバイア
スされているため、抵抗層2,3、電極対4,5および
6,7のそれぞれ、および外部の電子装置(図示せず)
よりなる回路のみが閉成される。光線9が入射した検出
面8上の位置により、異つた電極に異つた電流が流れ、
これにより検出器のX座標軸およびY座標軸上に入射位
置10の比較的直線的な指示が得られる。この種の検出
器に通常生ずる前述の非直線的な端部効果を除去するた
め、先に説明した正方形により画成した表面内に位置す
る各抵抗層2および3の区域11,12を、本発明によ
り、前記正方形の外側に位置する前記抵抗層の区域13
,14から区画し、この区画を行うために各抵抗層2,
3上にエツチング区域15および16を設ける。
Due to the special manufacturing method and the difficult working nature of the fragile wafer, semiconductor boards of this type are almost exclusively made in the form of a disk. On each side of the semiconductor board 1, there are resistive layers 2 and 3, respectively.
are arranged. Although the resistance value depends on the method of use, the usual value is 10 to 200 Ω-m. The resistive layers are produced by doping, and for one layer 2 there is a p-n junction 1? at the "transition point" between this layer and the semiconductor body. Each resistive layer 2, 3 has a . ← Pairs of elongated and parallel electrodes 4, 5 and 6, ? The opposing sides of the electrodes extend along two opposing sides of one square, and the opposing sides of another pair of electrodes extend along the other two opposing sides of the square. , such that this square surrounds the ideal effective detection surface 8. Electrodes 4, 5 and 6,? are each connected to one subtractor (not shown). 10, the energy of the beam causes a photocurrent to flow through the p-n junction.Since the p-n junctions are biased in opposite directions via electrodes 4, 5 and 6, 1, respectively, the resistance layer 2 , 3, each of the electrode pairs 4, 5 and 6, 7, and an external electronic device (not shown)
Only the circuit consisting of is closed. Depending on the position on the detection surface 8 where the light beam 9 is incident, different currents flow through different electrodes.
This provides a relatively linear indication of the entrance position 10 on the X and Y coordinate axes of the detector. In order to eliminate the aforementioned non-linear edge effects that normally occur in detectors of this type, the areas 11, 12 of each resistive layer 2 and 3 located within the surface defined by the squares described above are According to the invention, an area 13 of the resistive layer located outside the square
, 14, and to perform this partitioning each resistive layer 2,
Etching areas 15 and 16 are provided on 3.

p−n接合1?に隣接する部分の抵抗層2に、エツチン
グ区域がp−n接合面を越える程度に充分深くエツチン
グを施す。先に説明した正方形により画成した理想的な
検出面8の外側に位置する抵抗層2,3の区域13,1
4を流れる電流を防止することにより、改良された直線
性が得られる。好ましくは、いわゆるメサ型により行わ
れた各エツチング区域15,16は、閉鎖環状をなして
一対の相対する電極の端部と電極の外側との間を囲繞し
、しかも電極とは完全に接触していない方が好ましい。
電極4,5および6,1に囲れた検出面8は、エツチン
グにより、抵抗層の残余の部分13,14から絶縁され
ているため、検出面8の電界像は、この種の従来技術に
よる検出器に比べ著しく改良された直線性が得られ、検
出器の出力信号と検出面上における入射光9の入射位置
10との関係は、極めて良好な直線性を示す結果が得ら
れる。さらに、p−n接合を通過して流れる漏洩電流の
区域が減少し、その結果、検出器を流れる全漏洩電流が
減少する。検出器の周縁部における端部効果はこの方法
により、他の付加的な装置を設けることなく、同様に減
少する。本発明に係る二重面ラテラル光検出器の直線性
改良方法を使用することにより、静置または運動する物
体の位置に関する非接触分析の精度を顕著に高めること
ができる。
p-n junction 1? The portions of the resistive layer 2 adjacent to the resistive layer 2 are etched deep enough that the etched area extends beyond the p-n junction. Areas 13, 1 of the resistive layer 2, 3 located outside the ideal detection surface 8 defined by the squares described above
By preventing current from flowing through 4, improved linearity is obtained. Preferably, each etching area 15, 16, carried out in a so-called mesa type, is in the form of a closed ring, surrounding between the ends of a pair of opposing electrodes and the outside of the electrodes, but not in complete contact with the electrodes. It is preferable not to do so.
The detection surface 8 surrounded by the electrodes 4, 5 and 6, 1 is insulated from the remaining parts 13, 14 of the resistive layer by etching, so that the electric field image of the detection surface 8 differs from that of conventional techniques of this type. Significantly improved linearity is obtained compared to the detector, and the relationship between the output signal of the detector and the incident position 10 of the incident light 9 on the detection surface shows extremely good linearity. Additionally, the area of leakage current flowing through the p-n junction is reduced, resulting in a reduction in the total leakage current flowing through the detector. Edge effects at the periphery of the detector are reduced in this way as well, without the need for other additional devices. By using the method for improving the linearity of a dual-plane lateral photodetector according to the present invention, the accuracy of non-contact analysis of the position of stationary or moving objects can be significantly increased.

本発明は、先に説明しかつ図示した実施例に限定される
ものではなく、特許請求の範囲内において種々の改良が
可能である。
The invention is not limited to the embodiments described and illustrated above, but various modifications are possible within the scope of the claims.

例えば、検出面外側に位置する抵抗層2,3およびp−
n接合17の全域をエツチングすることも効果的である
。また、区画を機械的な手段、例えば、ブラスト法によ
り行うこともできる。この発明はまた、他の材料で製造
した同様な型式の検出器にも応用できることは勿論であ
る。周縁部においてエツチングされている検出器では、
漏洩電流を減少させるため、この周縁エツチングを本発
明によるエツチング区域に置換えてもよい。
For example, the resistance layers 2 and 3 located outside the detection surface and the p-
Etching the entire area of the n-junction 17 is also effective. It is also possible to carry out the partitioning by mechanical means, for example by blasting. Of course, the invention is also applicable to similar types of detectors made of other materials. For detectors that are etched at the periphery,
To reduce leakage currents, this peripheral etching may be replaced by an etched area according to the invention.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明に係るラテラル光検出器の直線性改良
方法を実施する光検出器の斜視図であつて、説明の便宜
上検出器の厚みを拡大して図示したものであり、第2図
は第1図の線−についての断面図である。 1 ・・・・・・半導体板、2,3・・・・・・抵抗層
、4,5,6,7・・・・・・電極、8・・・・・・検
出面、9・・・・・・光線、10・・・・・・入射点、
11,12,13,14・・・・・・区域、15,16
・・・・・・エツチング区域、1 ?・・・・・・p−
n接合。
FIG. 1 is a perspective view of a photodetector that implements the method for improving linearity of a lateral photodetector according to the present invention, and the thickness of the detector is enlarged for convenience of explanation. The figure is a sectional view taken along the line - in FIG. 1... Semiconductor board, 2, 3... Resistance layer, 4, 5, 6, 7... Electrode, 8... Sensing surface, 9... ...ray, 10... point of incidence,
11, 12, 13, 14... area, 15, 16
...Etching area, 1?・・・・・・p-
n-junction.

Claims (1)

【特許請求の範囲】 1 2対の電極からの電気信号を用いて光検出器の検出
面上の入射点の位置を検出するものであり、かつ半導体
板基層を形成してこの基層の各々の反対面を覆う2つの
ドーピングした抵抗層を加え、この2つのドーピングし
た抵抗層の間にp−n接合を配置し、更に2対の電極を
設け、この2対の電極の各対をドーピングした抵抗層の
各々の上に設定し、前記電極対を平行六面体の境界を画
成するように付形しかつ配置し、前記平行六面体は前記
ドーピングした各々の抵抗層の夫々の部分を囲繞し、か
つそれにより1対の電極は抵抗層表面上にある平行六面
体の正方形の対向する側にあり、他の1対の電極は他の
抵抗層の表面上にある平行六面体の正方形の対向する側
にあり、かくして2対の電極は光検出器の表面の平面中
にて互いに直角であるよう構成することからなる改良さ
れた直線性を有する半導体型の二重面ラテラル光検出器
を製造する方法において、前記電極を囲繞しかつ抵抗層
の表面上にある平行六面体の正方形を囲繞するところの
前記ドーピングした抵抗層の全部分と前記p−n接合部
とを除去することによつて平行六面体の前記正方形内に
配置したドーピングした抵抗層とp−n接合との部分を
電気的に絶縁することを特徴とする位置規定用二重面ラ
テラル光検出器の直線性改良方法。 2 除去する部分は電極と電極により画成される表面と
に隣接する正方形輪郭部に実質的に延在することを特徴
とする特許請求の範囲第1項記載の位置規定用二重面ラ
テラル光検出器の直線性改良方法。 3 除去をエッチングにより達成することを特徴とする
特許請求の範囲第1項または第2項記載の位置規定用二
重面ラテラル光検出器の直線性改良方法。 4 除去をプラスト法により達成することを特徴とする
特許請求の範囲第1項または第2項記載の位置規定用二
重面ラテラル光検出器の直線性改良方法。
[Claims] 1. The position of the incident point on the detection surface of a photodetector is detected using electrical signals from two pairs of electrodes, and a semiconductor substrate base layer is formed and each of the base layers is Two doped resistive layers covering opposite sides are added, a p-n junction is placed between the two doped resistive layers, and two pairs of electrodes are provided, each pair of the two electrodes being doped. disposed on each of the resistive layers, the electrode pair being shaped and arranged to define the boundaries of a parallelepiped, the parallelepiped surrounding a respective portion of each of the doped resistive layers; and whereby one pair of electrodes are on opposite sides of the parallelepiped square on the surface of the resistive layer and another pair of electrodes are on opposite sides of the parallelepiped square on the surface of the other resistive layer. In a method of manufacturing a semiconductor-type double-sided lateral photodetector with improved linearity, the two pairs of electrodes are arranged at right angles to each other in the plane of the surface of the photodetector. , by removing the entire portion of the doped resistive layer and the p-n junction surrounding the electrode and surrounding the parallelepiped square on the surface of the resistive layer. A method for improving the linearity of a double-sided lateral photodetector for position determination, characterized in that a portion between a doped resistive layer arranged in a square and a p-n junction is electrically insulated. 2. The position-defining double-sided lateral light according to claim 1, wherein the portion to be removed substantially extends in a square contour adjacent to the electrode and the surface defined by the electrode. Detector linearity improvement method. 3. A method for improving the linearity of a dual surface lateral photodetector for position determination according to claim 1 or 2, characterized in that the removal is achieved by etching. 4. A method for improving the linearity of a dual surface lateral photodetector for position determination according to claim 1 or 2, characterized in that the removal is achieved by a plasto method.
JP51014341A 1975-02-13 1976-02-12 Method for improving linearity of dual surface lateral photodetector for position determination Expired JPS5936218B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE7501587A SE388684B (en) 1975-02-13 1975-02-13 WAY TO IMPROVE THE LINEARITY OF A PHOTO DETECTOR

Publications (2)

Publication Number Publication Date
JPS51107180A JPS51107180A (en) 1976-09-22
JPS5936218B2 true JPS5936218B2 (en) 1984-09-03

Family

ID=20323672

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51014341A Expired JPS5936218B2 (en) 1975-02-13 1976-02-12 Method for improving linearity of dual surface lateral photodetector for position determination

Country Status (3)

Country Link
JP (1) JPS5936218B2 (en)
DE (1) DE2604558C2 (en)
SE (1) SE388684B (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3792257A (en) * 1972-03-31 1974-02-12 Us Navy Lateral photodetectors

Also Published As

Publication number Publication date
SE388684B (en) 1976-10-11
DE2604558C2 (en) 1986-01-23
SE7501587L (en) 1976-08-16
DE2604558A1 (en) 1976-08-26
JPS51107180A (en) 1976-09-22

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