JPS5931071A - 電界効果トランジスタ - Google Patents
電界効果トランジスタInfo
- Publication number
- JPS5931071A JPS5931071A JP57139686A JP13968682A JPS5931071A JP S5931071 A JPS5931071 A JP S5931071A JP 57139686 A JP57139686 A JP 57139686A JP 13968682 A JP13968682 A JP 13968682A JP S5931071 A JPS5931071 A JP S5931071A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- quasi
- gaas
- electrons
- approx
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005669 field effect Effects 0.000 title claims description 11
- 239000003574 free electron Substances 0.000 claims description 3
- 230000004888 barrier function Effects 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract description 20
- 239000012535 impurity Substances 0.000 abstract description 6
- 239000000969 carrier Substances 0.000 abstract description 5
- 230000005684 electric field Effects 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 abstract description 2
- 238000009413 insulation Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000001803 electron scattering Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004969 ion scattering spectroscopy Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000002165 photosensitisation Effects 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/43—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 1D charge carrier gas channels, e.g. quantum wire FETs or transistors having 1D quantum-confined channels
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Bipolar Transistors (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57139686A JPS5931071A (ja) | 1982-08-13 | 1982-08-13 | 電界効果トランジスタ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57139686A JPS5931071A (ja) | 1982-08-13 | 1982-08-13 | 電界効果トランジスタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5931071A true JPS5931071A (ja) | 1984-02-18 |
| JPS6255314B2 JPS6255314B2 (enExample) | 1987-11-19 |
Family
ID=15251063
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57139686A Granted JPS5931071A (ja) | 1982-08-13 | 1982-08-13 | 電界効果トランジスタ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5931071A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4575924A (en) * | 1984-07-02 | 1986-03-18 | Texas Instruments Incorporated | Process for fabricating quantum-well devices utilizing etch and refill techniques |
| JPS61239267A (ja) * | 1985-04-17 | 1986-10-24 | Fuji Xerox Co Ltd | カラ−複写機の現像装置 |
| JPS6230380A (ja) * | 1985-03-11 | 1987-02-09 | Nippon Telegr & Teleph Corp <Ntt> | 電界効果型トランジスタ |
| EP0283276A3 (en) * | 1987-03-20 | 1988-11-09 | Fujitsu Limited | Semiconductor device having heterojunction and method for producing same |
| EP0262610A3 (en) * | 1986-09-29 | 1989-02-15 | Siemens Aktiengesellschaft | Two-dimensional electron gas switching device |
-
1982
- 1982-08-13 JP JP57139686A patent/JPS5931071A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4575924A (en) * | 1984-07-02 | 1986-03-18 | Texas Instruments Incorporated | Process for fabricating quantum-well devices utilizing etch and refill techniques |
| JPS6230380A (ja) * | 1985-03-11 | 1987-02-09 | Nippon Telegr & Teleph Corp <Ntt> | 電界効果型トランジスタ |
| JPS61239267A (ja) * | 1985-04-17 | 1986-10-24 | Fuji Xerox Co Ltd | カラ−複写機の現像装置 |
| EP0262610A3 (en) * | 1986-09-29 | 1989-02-15 | Siemens Aktiengesellschaft | Two-dimensional electron gas switching device |
| EP0283276A3 (en) * | 1987-03-20 | 1988-11-09 | Fujitsu Limited | Semiconductor device having heterojunction and method for producing same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6255314B2 (enExample) | 1987-11-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4236166A (en) | Vertical field effect transistor | |
| US5640022A (en) | Quantum effect device | |
| CA1253632A (en) | Heterojunction field effect transistor | |
| EP0033037A2 (en) | Heterojunction semiconductor devices | |
| US4704622A (en) | Negative transconductance device | |
| JPH024140B2 (enExample) | ||
| JPS59207667A (ja) | 半導体装置 | |
| JPS5931071A (ja) | 電界効果トランジスタ | |
| US5227644A (en) | Heterojunction field effect transistor with improve carrier density and mobility | |
| US4636824A (en) | Voltage-controlled type semiconductor switching device | |
| US4689646A (en) | Depletion mode two-dimensional electron gas field effect transistor and the method for manufacturing the same | |
| JPH0239543A (ja) | 多層半導体装置 | |
| JPH0359579B2 (enExample) | ||
| JPS59184573A (ja) | 電界効果トランジスタ | |
| JPS6123364A (ja) | 電界効果トランジスタ | |
| JP3484005B2 (ja) | 半導体装置 | |
| JPH035059B2 (enExample) | ||
| JPH03155169A (ja) | 半導体装置 | |
| JPS6230380A (ja) | 電界効果型トランジスタ | |
| JPH05102198A (ja) | 擬1次元電界効果トランジスタとその製造方法 | |
| JPS6312394B2 (enExample) | ||
| JPS59149063A (ja) | 半導体装置 | |
| Cao | Design Optimization of AlGaN Channel Fin-HEMTs | |
| JPS61280674A (ja) | 半導体装置 | |
| JPH0714056B2 (ja) | 半導体装置 |