JPS5931063B2 - フオトマスク用ブランク板の製造方法 - Google Patents
フオトマスク用ブランク板の製造方法Info
- Publication number
- JPS5931063B2 JPS5931063B2 JP49130333A JP13033374A JPS5931063B2 JP S5931063 B2 JPS5931063 B2 JP S5931063B2 JP 49130333 A JP49130333 A JP 49130333A JP 13033374 A JP13033374 A JP 13033374A JP S5931063 B2 JPS5931063 B2 JP S5931063B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- metal
- transparent substrate
- reflectance
- photomask blank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49130333A JPS5931063B2 (ja) | 1974-11-12 | 1974-11-12 | フオトマスク用ブランク板の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49130333A JPS5931063B2 (ja) | 1974-11-12 | 1974-11-12 | フオトマスク用ブランク板の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5156178A JPS5156178A (enrdf_load_stackoverflow) | 1976-05-17 |
| JPS5931063B2 true JPS5931063B2 (ja) | 1984-07-31 |
Family
ID=15031842
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49130333A Expired JPS5931063B2 (ja) | 1974-11-12 | 1974-11-12 | フオトマスク用ブランク板の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5931063B2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4426437A (en) * | 1981-06-29 | 1984-01-17 | Minnesota Mining And Manufacturing Company | Imageable material with radiation absorbing microstructured layers overcoated with photoresist layer |
| JPS5878149A (ja) * | 1981-11-04 | 1983-05-11 | Konishiroku Photo Ind Co Ltd | 金属画像形成材料 |
-
1974
- 1974-11-12 JP JP49130333A patent/JPS5931063B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5156178A (enrdf_load_stackoverflow) | 1976-05-17 |
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