JPS5929053U - semiconductor equipment - Google Patents

semiconductor equipment

Info

Publication number
JPS5929053U
JPS5929053U JP12476582U JP12476582U JPS5929053U JP S5929053 U JPS5929053 U JP S5929053U JP 12476582 U JP12476582 U JP 12476582U JP 12476582 U JP12476582 U JP 12476582U JP S5929053 U JPS5929053 U JP S5929053U
Authority
JP
Japan
Prior art keywords
oxide film
constructed
layers
semiconductor equipment
well region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12476582U
Other languages
Japanese (ja)
Inventor
和夫 小笠原
Original Assignee
日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電気株式会社 filed Critical 日本電気株式会社
Priority to JP12476582U priority Critical patent/JPS5929053U/en
Publication of JPS5929053U publication Critical patent/JPS5929053U/en
Pending legal-status Critical Current

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  • Semiconductor Integrated Circuits (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図aおよびbは本考案の実施例の平面説明図、およ
び断面設面図をそれぞれ示す。 1、 1’、  9. 9’・・・・・・2層の多結晶
シリコン単位抵抗体、2.5・・・・・・引出し導体、
3.6・・・・・・コンタクト、4・・・・・・ウェル
抵抗体、7・・・・・・厚い酸化膜、8・・・・・・シ
リコン基板、10・・・・・・拡散層、11・・・・・
・相互接続導体、12・・・・・・相互接続導体および
引出し導体。
Figures 1a and 1b show an explanatory plan view and a sectional view of an embodiment of the present invention, respectively. 1, 1', 9. 9'...Two-layer polycrystalline silicon unit resistor, 2.5... Output conductor,
3.6... Contact, 4... Well resistor, 7... Thick oxide film, 8... Silicon substrate, 10... Diffusion layer, 11...
- Interconnection conductor, 12...Interconnection conductor and extraction conductor.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] シリコン基板と逆導電形不純物により形成されるウェル
領域を抵抗体となし、前記ウェル領域上に厚い酸化膜を
形成し、前記厚い酸化膜上に、少なくとも2種類以上の
単位抵抗体を2層の多結晶シリコンを用いて構成し、2
層の多結晶シリコン単位抵抗体を導体を用いて相互接続
することにより、抵抗群を構成したことを特徴とする半
導体装置。
A well region formed by impurities of conductivity type opposite to that of the silicon substrate is used as a resistor, a thick oxide film is formed on the well region, and at least two or more types of unit resistors are formed in two layers on the thick oxide film. Constructed using polycrystalline silicon, 2
1. A semiconductor device characterized in that a resistor group is constructed by interconnecting polycrystalline silicon unit resistors in layers using a conductor.
JP12476582U 1982-08-18 1982-08-18 semiconductor equipment Pending JPS5929053U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12476582U JPS5929053U (en) 1982-08-18 1982-08-18 semiconductor equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12476582U JPS5929053U (en) 1982-08-18 1982-08-18 semiconductor equipment

Publications (1)

Publication Number Publication Date
JPS5929053U true JPS5929053U (en) 1984-02-23

Family

ID=30284292

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12476582U Pending JPS5929053U (en) 1982-08-18 1982-08-18 semiconductor equipment

Country Status (1)

Country Link
JP (1) JPS5929053U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5655915A (en) * 1979-10-12 1981-05-16 Asahi Optical Co Ltd Zoom lens

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5655915A (en) * 1979-10-12 1981-05-16 Asahi Optical Co Ltd Zoom lens

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