JPS59232439A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS59232439A
JPS59232439A JP58107150A JP10715083A JPS59232439A JP S59232439 A JPS59232439 A JP S59232439A JP 58107150 A JP58107150 A JP 58107150A JP 10715083 A JP10715083 A JP 10715083A JP S59232439 A JPS59232439 A JP S59232439A
Authority
JP
Japan
Prior art keywords
film
groove
region
layer
shaped groove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58107150A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0464182B2 (Direct
Inventor
Yuji Furumura
雄二 古村
Takeshi Nishizawa
西沢　武志
Masayuki Takeda
正行 武田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP58107150A priority Critical patent/JPS59232439A/ja
Publication of JPS59232439A publication Critical patent/JPS59232439A/ja
Publication of JPH0464182B2 publication Critical patent/JPH0464182B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W10/041—
    • H10W10/40—

Landscapes

  • Element Separation (AREA)
JP58107150A 1983-06-15 1983-06-15 半導体装置の製造方法 Granted JPS59232439A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58107150A JPS59232439A (ja) 1983-06-15 1983-06-15 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58107150A JPS59232439A (ja) 1983-06-15 1983-06-15 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS59232439A true JPS59232439A (ja) 1984-12-27
JPH0464182B2 JPH0464182B2 (Direct) 1992-10-14

Family

ID=14451771

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58107150A Granted JPS59232439A (ja) 1983-06-15 1983-06-15 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS59232439A (Direct)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6406982B2 (en) * 2000-06-05 2002-06-18 Denso Corporation Method of improving epitaxially-filled trench by smoothing trench prior to filling
US7968970B2 (en) 2008-05-14 2011-06-28 Renesas Electronics Corporation Semiconductor device, method for manufacturing semiconductor device, and power amplifier element

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6406982B2 (en) * 2000-06-05 2002-06-18 Denso Corporation Method of improving epitaxially-filled trench by smoothing trench prior to filling
US7063751B2 (en) 2000-06-05 2006-06-20 Denso Corporation Semiconductor substrate formed by epitaxially filling a trench in a semiconductor substrate with a semiconductor material after smoothing the surface and rounding the corners
US7968970B2 (en) 2008-05-14 2011-06-28 Renesas Electronics Corporation Semiconductor device, method for manufacturing semiconductor device, and power amplifier element

Also Published As

Publication number Publication date
JPH0464182B2 (Direct) 1992-10-14

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