JPS59207608A - High permeability magnetic thin film - Google Patents

High permeability magnetic thin film

Info

Publication number
JPS59207608A
JPS59207608A JP8089083A JP8089083A JPS59207608A JP S59207608 A JPS59207608 A JP S59207608A JP 8089083 A JP8089083 A JP 8089083A JP 8089083 A JP8089083 A JP 8089083A JP S59207608 A JPS59207608 A JP S59207608A
Authority
JP
Japan
Prior art keywords
magnetic
thin film
magnetic thin
film
high permeability
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8089083A
Other languages
Japanese (ja)
Inventor
Shinji Takayama
高山 新司
Moichi Otomo
茂一 大友
Takayuki Kumasaka
登行 熊坂
Takeo Yamashita
武夫 山下
Hideo Fujiwara
英夫 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8089083A priority Critical patent/JPS59207608A/en
Publication of JPS59207608A publication Critical patent/JPS59207608A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/08Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/16Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing cobalt

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To obtain a high permeability magnetic thin film by forming a Co-Fe- Si alloy magnetic thin film by sputtering method or the like. CONSTITUTION:A Co-Fe-Si alloy magnetic thin film in an optional shape by sputtering method or evaporation method. At that time, a magnetic thin film which has low magnetostriction and high saturated magnetic flux density can be obtained by choosing the alloy composition of 13-22wt% of Co, 9-15wt% of Si and remainder of Fe. Moreover, corrosion resistance can be improved without deteriorating the magnetic characteristics by adding 1-7wt% of Cr, Ni, Mo, Rh and Ru.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は磁気コア材料に係り、特に高密度磁気記録の磁
気ヘッドに好適な、高飽和磁束密度・高透磁率の磁性体
膜に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a magnetic core material, and particularly to a magnetic film with high saturation magnetic flux density and high magnetic permeability, which is suitable for a magnetic head for high-density magnetic recording.

〔発明の背景〕[Background of the invention]

磁気記録の高密度化と共に、記録媒体では高保磁力の磁
気テープが用いられるようになり、そのためこれに記録
再生する磁気ヘッド材料としては、お 従来材の特性を凌駕した高飽和磁束密度・高透磁率の軟
磁性材料の開発が強く望まれている。これらの候補材と
して従来、センダスト、Fe6.5%Si1非晶質磁性
材料の適用がはかられているが、センダストでは飽和磁
束密度が高々10 kGLかなく、高透磁率の非晶質磁
性材料では飽和磁束密度が13kG以上になると熱安定
性が極めて悪くなる欠点があった。一方、磁歪零のF 
86.5 %Si結晶質材料はB8・、が19kGの高
い値を有するが、耐食性が極めて悪<、cr、白金属元
素等の添加により耐食性を改善すると、飽和磁束密度が
10kGまで低下してしまい、軟磁気特性も劣化してし
まう等の問題があった。
As the density of magnetic recording has increased, magnetic tapes with high coercive force have come to be used as recording media. Therefore, magnetic head materials for recording and reproducing on these tapes have to have high saturation magnetic flux density and high permeability, which surpass the characteristics of conventional materials. There is a strong desire to develop soft magnetic materials with high magnetic properties. Conventionally, Sendust and Fe6.5%Si1 amorphous magnetic materials have been considered as candidate materials, but Sendust has a saturation magnetic flux density of at most 10 kGL and is an amorphous magnetic material with high magnetic permeability. However, when the saturation magnetic flux density exceeds 13 kG, the thermal stability becomes extremely poor. On the other hand, F of zero magnetostriction
The 86.5% Si crystalline material has a high B8 value of 19 kG, but its corrosion resistance is extremely poor. When the corrosion resistance is improved by adding Cr, platinum elements, etc., the saturation magnetic flux density decreases to 10 kG. There were problems such as deterioration of the soft magnetic properties.

また、従来pe−Co−8i三元系合金において磁歪零
組成が見い出され、高い透磁率が得られることが知られ
ていた。しかし、これらの合金組成は極めて硬く脆いた
め加工が者しく困難で実用に適さなかった。これに対し
て最近、溶湯全片ロール法あるいは多ロール法により超
急冷して薄帯化することが可能となり、これら合金の薄
帯も作製されるようになったが、加工性についてはまだ
実用的には不十分である。
Furthermore, it has been known that a zero magnetostriction composition has been found in the conventional pe-Co-8i ternary alloy, and that high magnetic permeability can be obtained. However, these alloy compositions are extremely hard and brittle, making processing extremely difficult and unsuitable for practical use. Recently, however, it has become possible to ultra-rapidly cool the molten metal into a thin strip using the whole-piece roll method or multi-roll method, and thin strips of these alloys have also been produced, but the processability is still not practical. This is insufficient.

〔発明の目的〕[Purpose of the invention]

本発明の目的は高保磁力記録媒体に最適な磁気ヘッド材
料として、耐食性が良く、磁歪が極めて小さく、飽和磁
束密度が14kG以上の高透磁率磁性薄膜を提供するこ
とにある。
An object of the present invention is to provide a high permeability magnetic thin film having good corrosion resistance, extremely low magnetostriction, and a saturation magnetic flux density of 14 kG or more, as a magnetic head material optimal for high coercive force recording media.

〔発明の概要〕 上記目的を達成するための本発明の構成は、スパッタ法
、および蒸着法のいずれか一方により磁歪少のCo−F
e−Si合金磁性薄膜を任意の形状に作製し、さらには
他のCo、パーマロイ等の磁性薄膜あるいはS j(h
 + k120s等の非磁性薄膜とを交互に積層した積
層磁性薄膜をも作製することによって、これらの磁性薄
膜を磁気コアとして用いるものである。
[Summary of the Invention] The structure of the present invention for achieving the above object is to produce Co-F with low magnetostriction using either a sputtering method or a vapor deposition method.
An e-Si alloy magnetic thin film is produced in any shape, and furthermore, other magnetic thin films such as Co, permalloy, etc. or S j (h
By producing a laminated magnetic thin film in which non-magnetic thin films such as +k120s are alternately laminated, these magnetic thin films are used as a magnetic core.

ここで磁歪λB、を1λg K5X10−’、飽和磁束
密度、Bs〉14kGにするには合金組成を1葉百分率
でco13〜22チ、Si9〜15%、残部が実質的に
peにする必要があり、さらにCr1Ni、MO,Rh
s Ruff1重量巨分率で7%以下添加することによ
り、磁気特性を劣化させずにさらに耐食性を向上させ、
磁歪を小にして軟磁気特性を向上させることが出来る。
Here, in order to make the magnetostriction λB, 1λg K5X10-', and the saturation magnetic flux density, Bs>14kG, the alloy composition must be 13 to 22% CO, 9 to 15% Si, and the balance must be essentially PE. , further Cr1Ni, MO, Rh
By adding 7% or less of Ruff1 by weight, corrosion resistance is further improved without deteriorating magnetic properties.
It is possible to improve soft magnetic properties by reducing magnetostriction.

また本発明の積層磁性膜を作製することによって、高周
波数帯域の渦電流損失を小さくして、高周波帯域まで高
透磁率を得ることが出来る。
Furthermore, by producing the laminated magnetic film of the present invention, it is possible to reduce eddy current loss in a high frequency band and obtain high magnetic permeability up to a high frequency band.

以下本発明を実施例によって詳しく説明する。The present invention will be explained in detail below using examples.

〔発明の実施例〕[Embodiments of the invention]

実施例1 磁性体膜の形成はIl’スパッタリング装置を用い、所
定の合金組成のスパッタ膜作製には150陥φのpe内
円板sm+φの他元素の円板をはりつけたターゲットを
用いて、以下の条件で作製した。
Example 1 A magnetic film was formed using an Il' sputtering device, and a sputtered film with a predetermined alloy composition was prepared using a target to which a 150-diameter PE inner disk sm + φ disks of other elements were attached. It was made under the following conditions.

高周波電力密度・・・・・・2.8w/cr/lアルゴ
ン圧  ……2×1O−2TOrr基板温度   ・・
・・・・350C 電極間距離  ・・・・・・25m+ 膜厚     ・・・・・・約1.5μm基板は非磁性
のガラスあるいけセラミックス基板が選ばれた。この結
果得られた単層膜の磁気特性を第1表に示す。
High frequency power density...2.8w/cr/l argon pressure...2×1O-2TOrr substrate temperature...
...350C Distance between electrodes ...25m+ Film thickness ...about 1.5μm A non-magnetic glass or ceramic substrate was selected as the substrate. Table 1 shows the magnetic properties of the single layer film obtained as a result.

第    1    表 実施例2 積層磁性体膜の形成には中間層膜にSfOgあるいはC
o膜を厚さ30人作裂し、主磁性体膜(76%Fe 1
4%Co 10%S i )ノー4ノ膜厚を0,1μm
として15層積層し、全膜厚を約1.5μmとした。中
間層膜の作製条件を以下に示す。
Table 1 Example 2 For forming a laminated magnetic film, SfOg or C is used in the intermediate layer film.
The main magnetic material film (76% Fe 1
4%Co 10%S i ) No 4 film thickness 0.1μm
15 layers were laminated, and the total film thickness was about 1.5 μm. The conditions for producing the intermediate layer film are shown below.

高周波電力密度・・・・・・0.5W/CW1アルゴン
圧  ・・・・・・5 X 10−”f’orr基板温
度   ・・・・・・250C 電極間距離  ・・・・・・50m 膜厚     ・・・・・・30人 この結果得られた積層磁性体膜の磁気特性は5insを
中間層にした時、保磁力Hc=1.0伊O10、初期透
磁率μt (5MH2)=1800、一方Co膜を中間
層にした時、保磁力Hc=0.50.、μ目、(5MH
2)=2000であった。
High frequency power density...0.5W/CW1 Argon pressure...5 X 10-"f'orr Substrate temperature...250C Distance between electrodes...50m Membrane Thickness: 30 people The magnetic properties of the resulting laminated magnetic film are as follows: When 5ins is used as the intermediate layer, coercive force Hc = 1.0IO10, initial permeability μt (5MH2) = 1800, On the other hand, when Co film is used as the intermediate layer, coercive force Hc = 0.50., μth, (5MH
2)=2000.

実施例3 第1図は本発明を用いて形成した磁気ヘッドの斜視図で
ある。前記実施例2に記載した積層磁性体膜を非磁性フ
ェライト等の非磁性基板上に形成してから、前記第1図
に示す如く、所定の形状に加工し、ギャップ形成面が互
いに対向するように突き合せてVTR磁気ヘッドを作製
して、そのヘッド特性の評価を行なった。1はギャップ
、2はコイル巻線窓、3は積層磁性膜、4は非磁性基板
である。試作したヘッドのギャップ長は約0,3μm1
コア厚み150μm、トラック幅20μmであった。高
保磁カメタルテープと組み合わせた時、現在の酸化物テ
ープとM n −7,nフェライトヘッドの組み合せと
比較して、自己録再出力が10〜12dB以上向上した
Embodiment 3 FIG. 1 is a perspective view of a magnetic head formed using the present invention. The laminated magnetic film described in Example 2 is formed on a non-magnetic substrate such as non-magnetic ferrite, and then processed into a predetermined shape as shown in FIG. 1 so that the gap-forming surfaces face each other. A VTR magnetic head was fabricated using the same method, and its head characteristics were evaluated. 1 is a gap, 2 is a coil winding window, 3 is a laminated magnetic film, and 4 is a nonmagnetic substrate. The gap length of the prototype head was approximately 0.3 μm1
The core thickness was 150 μm and the track width was 20 μm. When combined with a high coercivity metal tape, the self-recording/reproducing output was improved by more than 10 to 12 dB compared to the current combination of oxide tape and M n -7,n ferrite head.

実施例4 上記実施例1で作製した磁性薄膜を用いて、高温加湿試
験(湿度90%、温度60C)により耐食性を検討した
。その結果、これら合金組成のスパッタ膜は200時間
の耐食試験後もほとんど酸化せず、高耐食性を示した。
Example 4 Using the magnetic thin film produced in Example 1 above, corrosion resistance was examined by a high temperature humidification test (humidity 90%, temperature 60C). As a result, sputtered films with these alloy compositions showed high corrosion resistance with almost no oxidation even after a 200 hour corrosion resistance test.

〔発明の効果〕〔Effect of the invention〕

以上の説明から明らかなように、本発明の高透磁率磁性
薄膜を用いることにより、飽和磁束密度が高く、耐食性
に優れた磁気ヘッドを提供することができ、高保磁力テ
ープの性能を十分に引き出すことが出来る。
As is clear from the above description, by using the high permeability magnetic thin film of the present invention, a magnetic head with high saturation magnetic flux density and excellent corrosion resistance can be provided, and the performance of the high coercive force tape can be fully brought out. I can do it.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の積層磁性体膜を用いて作製した磁気ヘ
ッドの説明図である。 1・・・ギャップ、2・・・コイル巻線窓、3・・・積
層磁性膜、4・・・非磁性基板。 代理人 弁理士 高橋明夫
FIG. 1 is an explanatory diagram of a magnetic head manufactured using the laminated magnetic film of the present invention. DESCRIPTION OF SYMBOLS 1... Gap, 2... Coil winding window, 3... Laminated magnetic film, 4... Nonmagnetic substrate. Agent Patent Attorney Akio Takahashi

Claims (1)

【特許請求の範囲】 1、重量百分率でC013〜22チ、Si9〜15チで
残部Feからなる組成を有し、スパッタ法、および蒸着
法のいずれか一方により作製された薄膜を有することを
特徴とする高透磁率磁性薄膜。 2、%許請求範囲第1項記載の合金組成に重量百分率で
Cr、Ni+ Mol Rh、RuO中から選ばれる少
なくとも1種以上の元素を1〜7ts添加されてなるこ
とを特徴とする高透磁率磁性薄膜。 3、特許請求範囲第1項記載の磁性体膜を他の磁性体膜
あるいは非磁性体膜を介して積層してなることを特徴と
する高透磁率磁性薄膜。 4、特許請求範囲第1項、および第2項記載の高透磁率
磁性薄膜を磁気コアとして用いることを特徴とする高透
磁率磁性薄膜。
[Claims] 1. The thin film has a composition consisting of 13 to 22 parts of CO, 9 to 15 parts of Si, and the balance is Fe in terms of weight percentage, and is produced by either a sputtering method or a vapor deposition method. High permeability magnetic thin film. 2.% High magnetic permeability characterized by adding 1 to 7 ts of at least one element selected from Cr, Ni + Mol Rh, and RuO to the alloy composition according to claim 1 in terms of weight percentage. magnetic thin film. 3. A high permeability magnetic thin film, characterized in that the magnetic film according to claim 1 is laminated with another magnetic film or a non-magnetic film interposed therebetween. 4. A high permeability magnetic thin film, characterized in that the high permeability magnetic thin film according to claims 1 and 2 is used as a magnetic core.
JP8089083A 1983-05-11 1983-05-11 High permeability magnetic thin film Pending JPS59207608A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8089083A JPS59207608A (en) 1983-05-11 1983-05-11 High permeability magnetic thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8089083A JPS59207608A (en) 1983-05-11 1983-05-11 High permeability magnetic thin film

Publications (1)

Publication Number Publication Date
JPS59207608A true JPS59207608A (en) 1984-11-24

Family

ID=13730944

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8089083A Pending JPS59207608A (en) 1983-05-11 1983-05-11 High permeability magnetic thin film

Country Status (1)

Country Link
JP (1) JPS59207608A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61224115A (en) * 1985-03-29 1986-10-04 Hitachi Ltd Thin film magnetic head
JPS61278007A (en) * 1985-06-03 1986-12-08 Hitachi Ltd Magnetic head using laminated magnetic substance film
JPS62104110A (en) * 1985-10-31 1987-05-14 Sony Corp Soft magnetic thin film
JPS62226605A (en) * 1986-03-28 1987-10-05 Hitachi Ltd Ferromagnetic thin film and magnetic head using the same
JPH03110809A (en) * 1989-09-26 1991-05-10 Matsushita Electric Ind Co Ltd Soft-magnetic thin film and magnetic head using same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61224115A (en) * 1985-03-29 1986-10-04 Hitachi Ltd Thin film magnetic head
JPS61278007A (en) * 1985-06-03 1986-12-08 Hitachi Ltd Magnetic head using laminated magnetic substance film
JPS62104110A (en) * 1985-10-31 1987-05-14 Sony Corp Soft magnetic thin film
JPS62226605A (en) * 1986-03-28 1987-10-05 Hitachi Ltd Ferromagnetic thin film and magnetic head using the same
JPH03110809A (en) * 1989-09-26 1991-05-10 Matsushita Electric Ind Co Ltd Soft-magnetic thin film and magnetic head using same

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