JPS592047A - 整合および画像形成方法 - Google Patents
整合および画像形成方法Info
- Publication number
- JPS592047A JPS592047A JP58102968A JP10296883A JPS592047A JP S592047 A JPS592047 A JP S592047A JP 58102968 A JP58102968 A JP 58102968A JP 10296883 A JP10296883 A JP 10296883A JP S592047 A JPS592047 A JP S592047A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- substrate
- photosensitive layer
- liquid
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015572 biosynthetic process Effects 0.000 title description 4
- 239000000758 substrate Substances 0.000 claims description 71
- 238000000034 method Methods 0.000 claims description 59
- 239000007788 liquid Substances 0.000 claims description 57
- 230000005855 radiation Effects 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 239000002131 composite material Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 238000006073 displacement reaction Methods 0.000 claims description 2
- 238000003825 pressing Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 70
- 238000007639 printing Methods 0.000 description 21
- 239000000203 mixture Substances 0.000 description 10
- 230000008569 process Effects 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- -1 glycol ethers Chemical class 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 229920002451 polyvinyl alcohol Polymers 0.000 description 7
- 239000004372 Polyvinyl alcohol Substances 0.000 description 6
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000003086 colorant Substances 0.000 description 5
- 239000004952 Polyamide Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000012153 distilled water Substances 0.000 description 4
- 235000019441 ethanol Nutrition 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
- 229920002647 polyamide Polymers 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000002508 contact lithography Methods 0.000 description 3
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 229910052724 xenon Inorganic materials 0.000 description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
- 235000012054 meals Nutrition 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 239000002480 mineral oil Substances 0.000 description 2
- 235000010446 mineral oil Nutrition 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 235000019396 potassium bromate Nutrition 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- XWNSFEAWWGGSKJ-UHFFFAOYSA-N 4-acetyl-4-methylheptanedinitrile Chemical compound N#CCCC(C)(C(=O)C)CCC#N XWNSFEAWWGGSKJ-UHFFFAOYSA-N 0.000 description 1
- SGHZXLIDFTYFHQ-UHFFFAOYSA-L Brilliant Blue Chemical compound [Na+].[Na+].C=1C=C(C(=C2C=CC(C=C2)=[N+](CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C=2C(=CC=CC=2)S([O-])(=O)=O)C=CC=1N(CC)CC1=CC=CC(S([O-])(=O)=O)=C1 SGHZXLIDFTYFHQ-UHFFFAOYSA-L 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000004153 Potassium bromate Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- WATVKUKXTKWHRP-UHFFFAOYSA-N [K].[Br] Chemical compound [K].[Br] WATVKUKXTKWHRP-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- JOSWYUNQBRPBDN-UHFFFAOYSA-P ammonium dichromate Chemical compound [NH4+].[NH4+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O JOSWYUNQBRPBDN-UHFFFAOYSA-P 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 239000001056 green pigment Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229940094037 potassium bromate Drugs 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 1
- 229940048086 sodium pyrophosphate Drugs 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 238000009816 wet lamination Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/387,537 US4508802A (en) | 1982-06-11 | 1982-06-11 | Multiple registration and imaging process to form a set of registered imaged elements |
| US387537 | 1982-06-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS592047A true JPS592047A (ja) | 1984-01-07 |
| JPH0322976B2 JPH0322976B2 (enExample) | 1991-03-28 |
Family
ID=23530303
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58102968A Granted JPS592047A (ja) | 1982-06-11 | 1983-06-10 | 整合および画像形成方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4508802A (enExample) |
| EP (1) | EP0096862B1 (enExample) |
| JP (1) | JPS592047A (enExample) |
| AU (1) | AU559695B2 (enExample) |
| BR (1) | BR8302993A (enExample) |
| CA (1) | CA1247446A (enExample) |
| DE (1) | DE3380190D1 (enExample) |
| HK (1) | HK10390A (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59186850U (ja) * | 1983-05-31 | 1984-12-11 | 日本メクトロン株式会社 | 感光性皮膜の露光装置 |
| JPS60158450A (ja) * | 1984-01-28 | 1985-08-19 | Hoya Corp | 密着露光方法 |
| JPS6330849A (ja) * | 1986-07-25 | 1988-02-09 | Tokyo Ohka Kogyo Co Ltd | 密着焼付け方法 |
| JPH0243556A (ja) * | 1988-08-04 | 1990-02-14 | Somar Corp | 感光性樹脂の露光方法 |
| JP2008541192A (ja) * | 2005-05-16 | 2008-11-20 | イーストマン コダック カンパニー | 除去可能なフィルムを使用したレリーフ画像の製造 |
| JP2009093027A (ja) * | 2007-10-10 | 2009-04-30 | Csun Mfg Ltd | マスクパターンフィルム圧着機の圧着構造及びその圧着方法 |
| JP2014506334A (ja) * | 2010-11-23 | 2014-03-13 | レインボー テクノロジー システムズ リミテッド | 基板をフォトイメージングするための方法及び装置 |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4690880A (en) * | 1984-07-20 | 1987-09-01 | Canon Kabushiki Kaisha | Pattern forming method |
| DE3443178A1 (de) * | 1984-11-27 | 1986-05-28 | Hoechst Ag, 6230 Frankfurt | Verfahren zum positionieren von druckformen vor dem stanzen von registerlochungen sowie anordnung zum durchfuehren des verfahrens |
| US4698284A (en) * | 1985-10-25 | 1987-10-06 | M&T Chemicals Inc. | Device for aligning a photomask onto a printed wiring board |
| US4794061A (en) * | 1985-10-25 | 1988-12-27 | M&T Chemicals Inc. | Device for aligning a photomask onto a printed wiring board |
| US4897802A (en) * | 1986-11-19 | 1990-01-30 | John Hassmann | Method and apparatus for preparing and displaying visual displays |
| GB2245374B (en) * | 1990-05-29 | 1994-11-30 | Printing Tech Equipment Ltd | Plate handling apparatus |
| US5459954A (en) * | 1993-08-31 | 1995-10-24 | Admotion Corporation | Advertising display method and apparatus |
| US5496685A (en) * | 1993-09-17 | 1996-03-05 | Chase Elastomer Corporation | Photosensitive compositions and elements for flexographic printing |
| US5513458A (en) * | 1993-11-15 | 1996-05-07 | Admotion Corporation | Advertising display apparatus with precise rotary drive |
| US5440214A (en) * | 1993-11-15 | 1995-08-08 | Admotion Corporation | Quiet drive control and interface apparatus |
| US6001893A (en) | 1996-05-17 | 1999-12-14 | Datacard Corporation | Curable topcoat composition and methods for use |
| US5701823A (en) * | 1997-01-27 | 1997-12-30 | Morris; Jerry L. | Self aligning tool for registering rotary printing plates and method of registering plates |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS502936A (enExample) * | 1973-05-08 | 1975-01-13 | ||
| JPS54114977A (en) * | 1978-02-28 | 1979-09-07 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of contact exposing positive photo resist |
| JPS58102971A (ja) * | 1981-12-16 | 1983-06-18 | Fuji Xerox Co Ltd | 電子複写機におけるクリ−ニング装置 |
| JPS58102969A (ja) * | 1981-12-16 | 1983-06-18 | Matsushita Graphic Commun Syst Inc | 閃光定着装置 |
| JPS58102972A (ja) * | 1981-12-15 | 1983-06-18 | 日本電気株式会社 | 構内網用暗号方法およびその装置 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2718181A (en) * | 1951-09-14 | 1955-09-20 | Ditto Inc | Contact printer |
| US3547730A (en) * | 1966-12-16 | 1970-12-15 | Du Pont | Machine for making resist images |
| US3573975A (en) * | 1968-07-10 | 1971-04-06 | Ibm | Photochemical fabrication process |
| BE787803A (fr) * | 1971-08-20 | 1973-02-21 | Sandoz Sa | Procede de preparation de phenylamines alkylees sur le noyau |
| US3877808A (en) * | 1973-08-30 | 1975-04-15 | Jr Carl R Jasperson | Printed circuit board exposure holding device |
| JPS5469076A (en) * | 1977-11-12 | 1979-06-02 | Toshiba Corp | Adhesion exposure device |
| US4201581A (en) * | 1978-03-13 | 1980-05-06 | Eastman Kodak Company | Method of providing close contact for contact printing |
| US4281922A (en) * | 1978-11-14 | 1981-08-04 | Fuji Photo Film Co., Ltd. | Plate feeding apparatus for printing apparatus |
| US4311381A (en) * | 1980-03-24 | 1982-01-19 | Schwaab, Inc. | Method and apparatus for producing printing patterns |
| DE3038810A1 (de) * | 1980-06-04 | 1981-12-24 | Censor Patent- und Versuchs-Anstalt, 9490 Vaduz | Verfahren zur verminderung des einflusses optischer inhomogenitaeten |
| US4334009A (en) * | 1980-09-23 | 1982-06-08 | E. I. Du Pont De Nemours And Company | Process for modifying tacky surfaces |
-
1982
- 1982-06-11 US US06/387,537 patent/US4508802A/en not_active Expired - Fee Related
-
1983
- 1983-06-07 BR BR8302993A patent/BR8302993A/pt unknown
- 1983-06-09 CA CA000430013A patent/CA1247446A/en not_active Expired
- 1983-06-10 EP EP83105705A patent/EP0096862B1/en not_active Expired
- 1983-06-10 AU AU15691/83A patent/AU559695B2/en not_active Ceased
- 1983-06-10 DE DE8383105705T patent/DE3380190D1/de not_active Expired
- 1983-06-10 JP JP58102968A patent/JPS592047A/ja active Granted
-
1990
- 1990-02-08 HK HK103/90A patent/HK10390A/xx unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS502936A (enExample) * | 1973-05-08 | 1975-01-13 | ||
| JPS54114977A (en) * | 1978-02-28 | 1979-09-07 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of contact exposing positive photo resist |
| JPS58102972A (ja) * | 1981-12-15 | 1983-06-18 | 日本電気株式会社 | 構内網用暗号方法およびその装置 |
| JPS58102971A (ja) * | 1981-12-16 | 1983-06-18 | Fuji Xerox Co Ltd | 電子複写機におけるクリ−ニング装置 |
| JPS58102969A (ja) * | 1981-12-16 | 1983-06-18 | Matsushita Graphic Commun Syst Inc | 閃光定着装置 |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59186850U (ja) * | 1983-05-31 | 1984-12-11 | 日本メクトロン株式会社 | 感光性皮膜の露光装置 |
| JPS60158450A (ja) * | 1984-01-28 | 1985-08-19 | Hoya Corp | 密着露光方法 |
| JPS6330849A (ja) * | 1986-07-25 | 1988-02-09 | Tokyo Ohka Kogyo Co Ltd | 密着焼付け方法 |
| JPH0243556A (ja) * | 1988-08-04 | 1990-02-14 | Somar Corp | 感光性樹脂の露光方法 |
| JP2008541192A (ja) * | 2005-05-16 | 2008-11-20 | イーストマン コダック カンパニー | 除去可能なフィルムを使用したレリーフ画像の製造 |
| JP2009093027A (ja) * | 2007-10-10 | 2009-04-30 | Csun Mfg Ltd | マスクパターンフィルム圧着機の圧着構造及びその圧着方法 |
| JP2014506334A (ja) * | 2010-11-23 | 2014-03-13 | レインボー テクノロジー システムズ リミテッド | 基板をフォトイメージングするための方法及び装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4508802A (en) | 1985-04-02 |
| AU559695B2 (en) | 1987-03-19 |
| BR8302993A (pt) | 1984-01-31 |
| AU1569183A (en) | 1983-12-15 |
| JPH0322976B2 (enExample) | 1991-03-28 |
| EP0096862A3 (en) | 1986-05-07 |
| HK10390A (en) | 1990-02-16 |
| CA1247446A (en) | 1988-12-28 |
| DE3380190D1 (en) | 1989-08-17 |
| EP0096862A2 (en) | 1983-12-28 |
| EP0096862B1 (en) | 1989-07-12 |
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