JPS59198749A - 相補形電界効果トランジスタ - Google Patents
相補形電界効果トランジスタInfo
- Publication number
- JPS59198749A JPS59198749A JP58074274A JP7427483A JPS59198749A JP S59198749 A JPS59198749 A JP S59198749A JP 58074274 A JP58074274 A JP 58074274A JP 7427483 A JP7427483 A JP 7427483A JP S59198749 A JPS59198749 A JP S59198749A
- Authority
- JP
- Japan
- Prior art keywords
- type
- diffusion region
- diffused region
- substrate
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/149—Source or drain regions of field-effect devices
- H10D62/151—Source or drain regions of field-effect devices of IGFETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/854—Complementary IGFETs, e.g. CMOS comprising arrangements for preventing bipolar actions between the different IGFET regions, e.g. arrangements for latchup prevention
-
- H10W20/021—
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58074274A JPS59198749A (ja) | 1983-04-25 | 1983-04-25 | 相補形電界効果トランジスタ |
| DE19843414772 DE3414772A1 (de) | 1983-04-25 | 1984-04-18 | Komplementaerer feldeffekttransistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58074274A JPS59198749A (ja) | 1983-04-25 | 1983-04-25 | 相補形電界効果トランジスタ |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59198749A true JPS59198749A (ja) | 1984-11-10 |
Family
ID=13542371
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58074274A Pending JPS59198749A (ja) | 1983-04-25 | 1983-04-25 | 相補形電界効果トランジスタ |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS59198749A (cg-RX-API-DMAC10.html) |
| DE (1) | DE3414772A1 (cg-RX-API-DMAC10.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3743930A1 (de) * | 1987-12-23 | 1989-07-06 | Siemens Ag | Integrierte schaltung mit "latch-up"-schutzschaltung in komplementaerer mos-schaltungstechnik |
| JP3307481B2 (ja) * | 1993-11-05 | 2002-07-24 | 三菱電機株式会社 | 半導体装置 |
| DE4405631C1 (de) * | 1994-02-22 | 1995-07-20 | Bosch Gmbh Robert | Integriertes Bauelement |
| CN110534512B (zh) * | 2019-09-07 | 2023-02-07 | 电子科技大学 | 一种抗闩锁版图结构 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5387181A (en) * | 1977-01-11 | 1978-08-01 | Sanyo Electric Co Ltd | Complementary type mos transistor |
| JPS5843559A (ja) * | 1981-09-08 | 1983-03-14 | Mitsubishi Electric Corp | 相補型半導体装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4035826A (en) * | 1976-02-23 | 1977-07-12 | Rca Corporation | Reduction of parasitic bipolar effects in integrated circuits employing insulated gate field effect transistors via the use of low resistance substrate contacts extending through source region |
-
1983
- 1983-04-25 JP JP58074274A patent/JPS59198749A/ja active Pending
-
1984
- 1984-04-18 DE DE19843414772 patent/DE3414772A1/de active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5387181A (en) * | 1977-01-11 | 1978-08-01 | Sanyo Electric Co Ltd | Complementary type mos transistor |
| JPS5843559A (ja) * | 1981-09-08 | 1983-03-14 | Mitsubishi Electric Corp | 相補型半導体装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3414772C2 (cg-RX-API-DMAC10.html) | 1987-10-08 |
| DE3414772A1 (de) | 1984-10-25 |
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