JPS59198448A - 放射線感応性有機高分子材料 - Google Patents

放射線感応性有機高分子材料

Info

Publication number
JPS59198448A
JPS59198448A JP7290283A JP7290283A JPS59198448A JP S59198448 A JPS59198448 A JP S59198448A JP 7290283 A JP7290283 A JP 7290283A JP 7290283 A JP7290283 A JP 7290283A JP S59198448 A JPS59198448 A JP S59198448A
Authority
JP
Japan
Prior art keywords
radiation
polymer material
sensitive
sensitive organic
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7290283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0380301B2 (enrdf_load_stackoverflow
Inventor
Koichi Hatada
畑田　耕一
Yoshio Okamoto
佳男 岡本
Tatsuki Kitayama
辰樹 北山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7290283A priority Critical patent/JPS59198448A/ja
Publication of JPS59198448A publication Critical patent/JPS59198448A/ja
Publication of JPH0380301B2 publication Critical patent/JPH0380301B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP7290283A 1983-04-27 1983-04-27 放射線感応性有機高分子材料 Granted JPS59198448A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7290283A JPS59198448A (ja) 1983-04-27 1983-04-27 放射線感応性有機高分子材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7290283A JPS59198448A (ja) 1983-04-27 1983-04-27 放射線感応性有機高分子材料

Publications (2)

Publication Number Publication Date
JPS59198448A true JPS59198448A (ja) 1984-11-10
JPH0380301B2 JPH0380301B2 (enrdf_load_stackoverflow) 1991-12-24

Family

ID=13502736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7290283A Granted JPS59198448A (ja) 1983-04-27 1983-04-27 放射線感応性有機高分子材料

Country Status (1)

Country Link
JP (1) JPS59198448A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4897336A (en) * 1986-04-11 1990-01-30 Chien James C W Self-developing radiation sensitive resist with amorphous polymer having haloalkyl substitution derived from cycic ether
US4936951A (en) * 1987-10-26 1990-06-26 Matsushita Electric Industrial Co., Ltd. Method of reducing proximity effect in electron beam resists

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4897336A (en) * 1986-04-11 1990-01-30 Chien James C W Self-developing radiation sensitive resist with amorphous polymer having haloalkyl substitution derived from cycic ether
US4936951A (en) * 1987-10-26 1990-06-26 Matsushita Electric Industrial Co., Ltd. Method of reducing proximity effect in electron beam resists
US4976818A (en) * 1987-10-26 1990-12-11 Matsushita Electric Industrial Co., Ltd. Fine pattern forming method

Also Published As

Publication number Publication date
JPH0380301B2 (enrdf_load_stackoverflow) 1991-12-24

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