JPS59195654A - ホトマスクの洗浄方法および洗浄装置 - Google Patents

ホトマスクの洗浄方法および洗浄装置

Info

Publication number
JPS59195654A
JPS59195654A JP58070503A JP7050383A JPS59195654A JP S59195654 A JPS59195654 A JP S59195654A JP 58070503 A JP58070503 A JP 58070503A JP 7050383 A JP7050383 A JP 7050383A JP S59195654 A JPS59195654 A JP S59195654A
Authority
JP
Japan
Prior art keywords
photomask
tank
cleaning
ammonia
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58070503A
Other languages
English (en)
Japanese (ja)
Other versions
JPS649621B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Masataka Hisamichi
久道　正孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP58070503A priority Critical patent/JPS59195654A/ja
Publication of JPS59195654A publication Critical patent/JPS59195654A/ja
Publication of JPS649621B2 publication Critical patent/JPS649621B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58070503A 1983-04-21 1983-04-21 ホトマスクの洗浄方法および洗浄装置 Granted JPS59195654A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58070503A JPS59195654A (ja) 1983-04-21 1983-04-21 ホトマスクの洗浄方法および洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58070503A JPS59195654A (ja) 1983-04-21 1983-04-21 ホトマスクの洗浄方法および洗浄装置

Publications (2)

Publication Number Publication Date
JPS59195654A true JPS59195654A (ja) 1984-11-06
JPS649621B2 JPS649621B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-02-17

Family

ID=13433393

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58070503A Granted JPS59195654A (ja) 1983-04-21 1983-04-21 ホトマスクの洗浄方法および洗浄装置

Country Status (1)

Country Link
JP (1) JPS59195654A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6161685A (ja) * 1984-08-31 1986-03-29 佐波　二三雄 機械部品等の洗浄方法
JPH0320734A (ja) * 1989-06-16 1991-01-29 Matsushita Electron Corp 洗浄装置
JPH0580465U (ja) * 1990-12-28 1993-11-02 東京瓦斯株式会社 浴槽洗浄用ノズル
US7160396B2 (en) * 2000-01-07 2007-01-09 Minolta Co., Ltd. Washing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5712831A (en) * 1980-06-06 1982-01-22 Standard Oil Co Carbonylation of olefin unsaturated compound
JPS57141614A (en) * 1981-02-25 1982-09-02 Canon Inc Manufacture of electrooptical display device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5712831A (en) * 1980-06-06 1982-01-22 Standard Oil Co Carbonylation of olefin unsaturated compound
JPS57141614A (en) * 1981-02-25 1982-09-02 Canon Inc Manufacture of electrooptical display device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6161685A (ja) * 1984-08-31 1986-03-29 佐波　二三雄 機械部品等の洗浄方法
JPH0320734A (ja) * 1989-06-16 1991-01-29 Matsushita Electron Corp 洗浄装置
JPH0580465U (ja) * 1990-12-28 1993-11-02 東京瓦斯株式会社 浴槽洗浄用ノズル
US7160396B2 (en) * 2000-01-07 2007-01-09 Minolta Co., Ltd. Washing method

Also Published As

Publication number Publication date
JPS649621B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-02-17

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