JPS59193266A - プラズマｃｖｄ装置 - Google Patents

プラズマｃｖｄ装置

Info

Publication number
JPS59193266A
JPS59193266A JP4063683A JP4063683A JPS59193266A JP S59193266 A JPS59193266 A JP S59193266A JP 4063683 A JP4063683 A JP 4063683A JP 4063683 A JP4063683 A JP 4063683A JP S59193266 A JPS59193266 A JP S59193266A
Authority
JP
Japan
Prior art keywords
plasma cvd
electrode
substrate
film
cvd apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4063683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6151632B2 (enrdf_load_stackoverflow
Inventor
Ko Yasui
安井　甲
Kazuaki Hokota
和晃 鉾田
Fumiyuki Suda
文之 須田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stanley Electric Co Ltd
Original Assignee
Stanley Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stanley Electric Co Ltd filed Critical Stanley Electric Co Ltd
Priority to JP4063683A priority Critical patent/JPS59193266A/ja
Publication of JPS59193266A publication Critical patent/JPS59193266A/ja
Publication of JPS6151632B2 publication Critical patent/JPS6151632B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
JP4063683A 1983-03-14 1983-03-14 プラズマｃｖｄ装置 Granted JPS59193266A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4063683A JPS59193266A (ja) 1983-03-14 1983-03-14 プラズマｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4063683A JPS59193266A (ja) 1983-03-14 1983-03-14 プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS59193266A true JPS59193266A (ja) 1984-11-01
JPS6151632B2 JPS6151632B2 (enrdf_load_stackoverflow) 1986-11-10

Family

ID=12586038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4063683A Granted JPS59193266A (ja) 1983-03-14 1983-03-14 プラズマｃｖｄ装置

Country Status (1)

Country Link
JP (1) JPS59193266A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61116763U (enrdf_load_stackoverflow) * 1984-12-06 1986-07-23
US4979467A (en) * 1988-05-06 1990-12-25 Fujitsu Limited Thin film formation apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7484231B2 (en) 2001-05-14 2009-01-27 Lg Electronics Inc. High-density disk recording medium having an asymmetrically-shaped center hole and manufacturing method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3344055A (en) * 1964-04-29 1967-09-26 Texas Instruments Inc Apparatus for polymerizing and forming thin continuous films using a glow discharge
JPS57160120A (en) * 1981-03-27 1982-10-02 Fuji Electric Corp Res & Dev Ltd Generating equipment for silicon film
JPS5858147A (ja) * 1981-09-30 1983-04-06 Shimadzu Corp プラズマ処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3344055A (en) * 1964-04-29 1967-09-26 Texas Instruments Inc Apparatus for polymerizing and forming thin continuous films using a glow discharge
JPS57160120A (en) * 1981-03-27 1982-10-02 Fuji Electric Corp Res & Dev Ltd Generating equipment for silicon film
JPS5858147A (ja) * 1981-09-30 1983-04-06 Shimadzu Corp プラズマ処理装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61116763U (enrdf_load_stackoverflow) * 1984-12-06 1986-07-23
US4979467A (en) * 1988-05-06 1990-12-25 Fujitsu Limited Thin film formation apparatus

Also Published As

Publication number Publication date
JPS6151632B2 (enrdf_load_stackoverflow) 1986-11-10

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