JPS59191332A - Ｘ線マスク - Google Patents

Ｘ線マスク

Info

Publication number
JPS59191332A
JPS59191332A JP58065952A JP6595283A JPS59191332A JP S59191332 A JPS59191332 A JP S59191332A JP 58065952 A JP58065952 A JP 58065952A JP 6595283 A JP6595283 A JP 6595283A JP S59191332 A JPS59191332 A JP S59191332A
Authority
JP
Japan
Prior art keywords
film
ray
graphic
mask
view
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58065952A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0425692B2 (enrdf_load_stackoverflow
Inventor
Seiichi Iwamatsu
誠一 岩松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP58065952A priority Critical patent/JPS59191332A/ja
Publication of JPS59191332A publication Critical patent/JPS59191332A/ja
Publication of JPH0425692B2 publication Critical patent/JPH0425692B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58065952A 1983-04-14 1983-04-14 Ｘ線マスク Granted JPS59191332A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58065952A JPS59191332A (ja) 1983-04-14 1983-04-14 Ｘ線マスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58065952A JPS59191332A (ja) 1983-04-14 1983-04-14 Ｘ線マスク

Publications (2)

Publication Number Publication Date
JPS59191332A true JPS59191332A (ja) 1984-10-30
JPH0425692B2 JPH0425692B2 (enrdf_load_stackoverflow) 1992-05-01

Family

ID=13301825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58065952A Granted JPS59191332A (ja) 1983-04-14 1983-04-14 Ｘ線マスク

Country Status (1)

Country Link
JP (1) JPS59191332A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63110634A (ja) * 1986-10-28 1988-05-16 Fujitsu Ltd Ｘ線ステツパ−用マスク
JPS63202022A (ja) * 1987-02-06 1988-08-22 ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング リゾグラフイによるパターンの形成のための露光マスク

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63110634A (ja) * 1986-10-28 1988-05-16 Fujitsu Ltd Ｘ線ステツパ−用マスク
JPS63202022A (ja) * 1987-02-06 1988-08-22 ドクトル・ヨハネス・ハイデンハイン・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング リゾグラフイによるパターンの形成のための露光マスク

Also Published As

Publication number Publication date
JPH0425692B2 (enrdf_load_stackoverflow) 1992-05-01

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