JPH0425692B2 - - Google Patents
Info
- Publication number
- JPH0425692B2 JPH0425692B2 JP6595283A JP6595283A JPH0425692B2 JP H0425692 B2 JPH0425692 B2 JP H0425692B2 JP 6595283 A JP6595283 A JP 6595283A JP 6595283 A JP6595283 A JP 6595283A JP H0425692 B2 JPH0425692 B2 JP H0425692B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- ray
- membrane
- graphic
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000012528 membrane Substances 0.000 claims description 10
- 230000000903 blocking effect Effects 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58065952A JPS59191332A (ja) | 1983-04-14 | 1983-04-14 | X線マスク |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58065952A JPS59191332A (ja) | 1983-04-14 | 1983-04-14 | X線マスク |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59191332A JPS59191332A (ja) | 1984-10-30 |
JPH0425692B2 true JPH0425692B2 (enrdf_load_stackoverflow) | 1992-05-01 |
Family
ID=13301825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58065952A Granted JPS59191332A (ja) | 1983-04-14 | 1983-04-14 | X線マスク |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59191332A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0746681B2 (ja) * | 1986-10-28 | 1995-05-17 | 富士通株式会社 | X線ステッパー用マスクの製造方法 |
DE3703582C1 (de) * | 1987-02-06 | 1988-04-07 | Heidenhain Gmbh Dr Johannes | Bestrahlungsmaske zur lithographischen Erzeugung von Mustern |
-
1983
- 1983-04-14 JP JP58065952A patent/JPS59191332A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59191332A (ja) | 1984-10-30 |
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