JPS59188916A - 偏向歪補正方法 - Google Patents

偏向歪補正方法

Info

Publication number
JPS59188916A
JPS59188916A JP58063359A JP6335983A JPS59188916A JP S59188916 A JPS59188916 A JP S59188916A JP 58063359 A JP58063359 A JP 58063359A JP 6335983 A JP6335983 A JP 6335983A JP S59188916 A JPS59188916 A JP S59188916A
Authority
JP
Japan
Prior art keywords
height
deflection distortion
marks
deflection
chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58063359A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0352211B2 (enrdf_load_stackoverflow
Inventor
Korehito Matsuda
松田　維人
Tsuneo Okubo
恒夫 大久保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP58063359A priority Critical patent/JPS59188916A/ja
Publication of JPS59188916A publication Critical patent/JPS59188916A/ja
Publication of JPH0352211B2 publication Critical patent/JPH0352211B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP58063359A 1983-04-11 1983-04-11 偏向歪補正方法 Granted JPS59188916A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58063359A JPS59188916A (ja) 1983-04-11 1983-04-11 偏向歪補正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58063359A JPS59188916A (ja) 1983-04-11 1983-04-11 偏向歪補正方法

Publications (2)

Publication Number Publication Date
JPS59188916A true JPS59188916A (ja) 1984-10-26
JPH0352211B2 JPH0352211B2 (enrdf_load_stackoverflow) 1991-08-09

Family

ID=13226978

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58063359A Granted JPS59188916A (ja) 1983-04-11 1983-04-11 偏向歪補正方法

Country Status (1)

Country Link
JP (1) JPS59188916A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6045022A (ja) * 1983-08-23 1985-03-11 Toshiba Corp Ｌｓｉ製造装置における高さ補正方法
JPS61129825A (ja) * 1984-11-29 1986-06-17 Toshiba Mach Co Ltd 電子ビ−ム露光装置
JPH04297016A (ja) * 1991-03-26 1992-10-21 Soltec:Kk Ｘ線マスク作成方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5367365A (en) * 1976-11-29 1978-06-15 Nippon Telegr & Teleph Corp <Ntt> Correcting method for beam position
JPS5380368U (enrdf_load_stackoverflow) * 1976-12-06 1978-07-04
JPS5498577A (en) * 1978-01-20 1979-08-03 Nippon Telegr & Teleph Corp <Ntt> Correction method for electron beam scanning position
JPS55167657U (enrdf_load_stackoverflow) * 1979-05-18 1980-12-02

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5367365A (en) * 1976-11-29 1978-06-15 Nippon Telegr & Teleph Corp <Ntt> Correcting method for beam position
JPS5380368U (enrdf_load_stackoverflow) * 1976-12-06 1978-07-04
JPS5498577A (en) * 1978-01-20 1979-08-03 Nippon Telegr & Teleph Corp <Ntt> Correction method for electron beam scanning position
JPS55167657U (enrdf_load_stackoverflow) * 1979-05-18 1980-12-02

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6045022A (ja) * 1983-08-23 1985-03-11 Toshiba Corp Ｌｓｉ製造装置における高さ補正方法
JPS61129825A (ja) * 1984-11-29 1986-06-17 Toshiba Mach Co Ltd 電子ビ−ム露光装置
JPH04297016A (ja) * 1991-03-26 1992-10-21 Soltec:Kk Ｘ線マスク作成方法

Also Published As

Publication number Publication date
JPH0352211B2 (enrdf_load_stackoverflow) 1991-08-09

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