JPS59174707A - 位置検出装置 - Google Patents

位置検出装置

Info

Publication number
JPS59174707A
JPS59174707A JP58049492A JP4949283A JPS59174707A JP S59174707 A JPS59174707 A JP S59174707A JP 58049492 A JP58049492 A JP 58049492A JP 4949283 A JP4949283 A JP 4949283A JP S59174707 A JPS59174707 A JP S59174707A
Authority
JP
Japan
Prior art keywords
light
mask
scanning
wafer
light beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58049492A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0429962B2 (en, 2012
Inventor
Shoichi Tanimoto
昭一 谷元
Junji Hazama
間　潤治
Kinya Kato
欣也 加藤
Hisao Izawa
伊沢　久男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP58049492A priority Critical patent/JPS59174707A/ja
Publication of JPS59174707A publication Critical patent/JPS59174707A/ja
Publication of JPH0429962B2 publication Critical patent/JPH0429962B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP58049492A 1983-03-24 1983-03-24 位置検出装置 Granted JPS59174707A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58049492A JPS59174707A (ja) 1983-03-24 1983-03-24 位置検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58049492A JPS59174707A (ja) 1983-03-24 1983-03-24 位置検出装置

Publications (2)

Publication Number Publication Date
JPS59174707A true JPS59174707A (ja) 1984-10-03
JPH0429962B2 JPH0429962B2 (en, 2012) 1992-05-20

Family

ID=12832643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58049492A Granted JPS59174707A (ja) 1983-03-24 1983-03-24 位置検出装置

Country Status (1)

Country Link
JP (1) JPS59174707A (en, 2012)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01207602A (ja) * 1988-02-15 1989-08-21 Nikon Corp 投影露光装置
JP2010519562A (ja) * 2007-02-26 2010-06-03 コーニング インコーポレイテッド 歪測定結像システム
JP2015525883A (ja) * 2012-07-30 2015-09-07 エーエスエムエル ネザーランズ ビー．ブイ． 位置測定装置、位置測定方法、リソグラフィ装置およびデバイス製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01207602A (ja) * 1988-02-15 1989-08-21 Nikon Corp 投影露光装置
JP2010519562A (ja) * 2007-02-26 2010-06-03 コーニング インコーポレイテッド 歪測定結像システム
JP2015525883A (ja) * 2012-07-30 2015-09-07 エーエスエムエル ネザーランズ ビー．ブイ． 位置測定装置、位置測定方法、リソグラフィ装置およびデバイス製造方法
US9606442B2 (en) 2012-07-30 2017-03-28 Asml Netherlands B.V. Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
JPH0429962B2 (en, 2012) 1992-05-20

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