JPS5917192B2 - Vacuum processing equipment - Google Patents

Vacuum processing equipment

Info

Publication number
JPS5917192B2
JPS5917192B2 JP10677180A JP10677180A JPS5917192B2 JP S5917192 B2 JPS5917192 B2 JP S5917192B2 JP 10677180 A JP10677180 A JP 10677180A JP 10677180 A JP10677180 A JP 10677180A JP S5917192 B2 JPS5917192 B2 JP S5917192B2
Authority
JP
Japan
Prior art keywords
tank
machine frame
vacuum processing
vacuum
bottom plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10677180A
Other languages
Japanese (ja)
Other versions
JPS5732368A (en
Inventor
清次 宮川
邦彦 松森
宏真 武井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP10677180A priority Critical patent/JPS5917192B2/en
Publication of JPS5732368A publication Critical patent/JPS5732368A/en
Publication of JPS5917192B2 publication Critical patent/JPS5917192B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】 本発明は真空蒸着その他の真空処理装置に関する。[Detailed description of the invention] The present invention relates to vacuum processing equipment for vacuum evaporation and other vacuum processing.

従来この種装置として例えば第1図示のように真空タン
クa内にサブストレートを巻取走行する 。
Conventionally, in this type of apparatus, for example, as shown in FIG. 1, a substrate is wound and run in a vacuum tank a.

巻取機構その他の作動部材bを出入自在に設ける式のも
のは知られるが、この場合該タンクaは同図示のように
前面を開放する型式から成り、その前方に該前面との重
合によればこれを閉じる前面板cを備え、該作動部材b
をこれに支承させて設 。ける式を一般としたもので、
かゝるものでは該作動部材bは該前面板cに対し片持支
持となるため、充分に強固な支持を得難くかくて例えば
巻取機構の場合、ロール径或はロール回転数等の増大に
よればこれに振動を生じ勝ちとなる不都合を伴う。従来
かゝる不都合を無くすべく、ブラケットその5 他の支
持部材を大型化することは行われたが、これによれば該
タンク内の容積が減少し、かくて全体を大型化する必要
がある等の不都合を伴う。尚図示のものでは該タンクa
を床面d土に固定とし、該前面板cは台車eに取付けて
走行自在と0 した。本発明はかゝる不都合のない装置
を得ることをその目的としたもので、真空タンク内に巻
取機構その他の作動部材を出入自在に設ける式のものに
おいて、該タンクを前面と下面とが開放するフー5 ド
状の枠筐型に構成させると共に、その前方に該前面との
重合によればこれを閉じる前面板と、該下面との重合に
よればこれを閉じる底面板とから成る機枠を備えて該作
動部材を該機枠上に設けることを特徴とする。
A type in which the winding mechanism and other operating members b are provided in a manner that allows them to be moved in and out is known, but in this case, the tank a is of the type with an open front as shown in the figure, and a a front plate c for closing the actuating member b;
was established in support of this. This is a general formula for
In such a device, the actuating member b is supported in a cantilever manner with respect to the front plate c, so it is difficult to obtain a sufficiently strong support. According to , this has the disadvantage of causing vibration. Conventionally, in order to eliminate such inconveniences, it has been attempted to increase the size of the bracket and other supporting members, but this reduces the volume inside the tank, thus requiring the overall size to be increased. This is accompanied by other inconveniences. In the illustrated case, the tank a
was fixed to the floor d, and the front plate c was attached to a trolley e so that it could move freely. The object of the present invention is to obtain a device free from such inconveniences, and in which a winding mechanism and other operating members are provided in a vacuum tank so that they can be freely entered and exited, the tank has a front surface and a bottom surface. The hood is configured in the form of a door-like frame housing that opens, and has a front plate that closes the front plate when it overlaps with the front surface, and a bottom plate that closes it when it overlaps with the lower surface. The machine is characterized in that it includes a frame and the actuating member is provided on the machine frame.

o 本発明実施の1例を別紙図面に付説明する。o An example of implementing the present invention will be explained with reference to the attached drawings.

第2図はその1例を示すもので、1は真空タンク、2は
作動部材を示し、該部材2は合成樹脂フィルムその他の
サブストレートを巻取走行する巻取機構から成るものと
する。5 該タンク1は同図に明示するように前面3と
下面4とが開放するフード状の枠筐型に構成されるもの
とし、その前方に該前面3との重合によればこれを閉じ
る前面板5と、該下面4との重合によればこれを閉じる
底面板6とから成る断面L型の0 機枠Tを用意し、か
くて該タンク1は該機枠、?との結着によればその内部
を気密に閉じられるようにし、更に前記した作動部材2
はこれを該機枠1上に支承させて設けるようにした。
FIG. 2 shows one example, in which 1 is a vacuum tank, 2 is an operating member, and the member 2 is comprised of a winding mechanism for winding and running a synthetic resin film or other substrate. 5. As clearly shown in the figure, the tank 1 is constructed in the form of a hood-like frame case with an open front surface 3 and a lower surface 4, and there is a wall in front of the tank 1 that overlaps with the front surface 3 before closing. A machine frame T with an L-shaped cross section is prepared, consisting of a face plate 5 and a bottom plate 6 which closes the bottom plate 6 by overlapping with the lower surface 4, and thus the tank 1 is formed by the machine frame, ? By connecting it to the operating member 2, the interior thereof can be closed airtight, and furthermore, the above-mentioned operating member 2
This is supported on the machine frame 1.

尚図示のものでは該機枠7を床面8上に固定と5 し、
かくてこれを台車型とする従来式のものに比し該部材2
による振動を一層減少させ得るようにし、該タンク1は
これを下面の台車9の車輪9a’りにおいて該床面8上
のレール8a上を走行自在とした。
In the illustrated example, the machine frame 7 is fixed on the floor 8,
Thus, compared to the conventional type which is a trolley type, the member 2
The tank 1 is made to be able to run freely on the rails 8a on the floor surface 8 on the wheels 9a' of the truck 9 on the lower surface.

尚該タンク1は前記したように該機枠7との結着によれ
ば気密に閉じるもので、該タンク1と該機枠7との重合
面の少くとも一方にはゴムその他のシール部材10が予
め施されるものとする。図面で11は該作動部材2の外
端を支承する支持部材を示し、該部材11は該底面板6
上に植立される。図面で12は該前面板5から外方にの
びる排気口を示す。その作動を説明するに、真空タンク
1と機枠7とが図示のように互に開いた状態から、次で
互に閉じれば該タンク1内は気密となると共に作動部材
2はその内部に収容されるもので、かくて該タンタ1内
を排気すると共に該作動部材2を作動させてサブストレ
ートの真空蒸着その他の真空処理を行うことが出来、次
で図示のように互に開いてサブストレートの交換その他
の作業に備えられる。
As described above, the tank 1 is hermetically closed when connected to the machine frame 7, and at least one of the overlapping surfaces of the tank 1 and the machine frame 7 is provided with a sealing member 10 such as rubber. shall be applied in advance. In the drawings, reference numeral 11 indicates a support member that supports the outer end of the operating member 2, and the member 11 is attached to the bottom plate 6.
planted on top. In the drawings, reference numeral 12 indicates an exhaust port extending outward from the front plate 5. To explain its operation, when the vacuum tank 1 and the machine frame 7 are opened to each other as shown in the figure, and then closed to each other, the inside of the tank 1 becomes airtight and the operating member 2 is housed inside. In this way, the inside of the tantalum 1 can be evacuated and the actuating member 2 can be operated to perform vacuum evaporation or other vacuum processing of the substrate. be prepared for replacement and other work.

尚か\る作動に際し、作動部材2は前面板5と底面板6
とから成る機枠7上に支承されるもので、従来の片持支
持の場合に比しその支承が安定且堅牢であり、振動等の
不都合を生じない。更に図示のものでは、該タンク1を
前記した台車9上に左右各側の前後1対のリンク13,
13を介して連結すると共に、その後方にこれを押圧す
る作動シリンダ14を備え、かくて該シリンダ14の作
動によれば該タンク1は前下方に押され、前記・した機
枠7との間の閉じを簡単且確実に得られるようにした。
このように本発明によるときは真空タンクを前面と下面
とが開く型式とし、これと協動する機枠を前面板と底面
板とで構成してこれに作動部材を支承させるもので、該
部材が片持支持となる従来のものの前記した不都合を無
くし得られる効果を有する。
In addition, during such operation, the operating member 2 has a front plate 5 and a bottom plate 6.
The support is more stable and robust than conventional cantilever support, and does not cause problems such as vibration. Furthermore, in the illustrated example, a pair of front and rear links 13 on each side of the tank 1 are mounted on the cart 9 on which the tank 1 is mounted.
13, and is provided with an actuating cylinder 14 at its rear that presses the tank 1. Accordingly, when the cylinder 14 operates, the tank 1 is pushed forward and downward, and the space between the tank 1 and the machine frame 7 mentioned above is pushed. The closure can be easily and reliably obtained.
As described above, according to the present invention, the vacuum tank is of a type in which the front and bottom surfaces are open, and the machine frame that cooperates with the tank is composed of a front plate and a bottom plate, on which the operating member is supported. This has the effect of eliminating the above-mentioned disadvantages of the conventional structure in which the structure is cantilevered.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来例の側面図、第2図は本発明装置の1例の
斜面図である。 1・・・・・・真空タンク、2・・・・・・作動部材、
3・・・・・・前面、4・・・・・・下面、5・・・・
・・前面板、6・・・・・・底面板、7・・・・・・機
枠。
FIG. 1 is a side view of a conventional example, and FIG. 2 is a perspective view of an example of the apparatus of the present invention. 1... Vacuum tank, 2... Operating member,
3...Front surface, 4...Bottom surface, 5...
...Front plate, 6...Bottom plate, 7...Machine frame.

Claims (1)

【特許請求の範囲】[Claims] 1 真空タンク内に巻取機構その他の作動部材を出入自
在に設ける式のものにおいて、該タンクを前面と下面と
が開放するフード状の枠筐型に構成させると共に、その
前方に該前面との重合によればこれを閉じる前面板と、
該下面との重合によればこれを閉じる底面板とから成る
機枠を備えて該作動部材を該機枠上に設けることを特徴
とする真空処理装置。
1. In a type in which a winding mechanism and other operating members are installed in a vacuum tank so that they can be freely accessed and removed, the tank is structured into a hood-like frame with an open front and bottom surface, and a A front plate that closes this according to polymerization,
A vacuum processing apparatus comprising a machine frame comprising a bottom plate that closes the bottom plate by overlapping with the lower surface, and the operating member is provided on the machine frame.
JP10677180A 1980-08-05 1980-08-05 Vacuum processing equipment Expired JPS5917192B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10677180A JPS5917192B2 (en) 1980-08-05 1980-08-05 Vacuum processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10677180A JPS5917192B2 (en) 1980-08-05 1980-08-05 Vacuum processing equipment

Publications (2)

Publication Number Publication Date
JPS5732368A JPS5732368A (en) 1982-02-22
JPS5917192B2 true JPS5917192B2 (en) 1984-04-19

Family

ID=14442163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10677180A Expired JPS5917192B2 (en) 1980-08-05 1980-08-05 Vacuum processing equipment

Country Status (1)

Country Link
JP (1) JPS5917192B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06240443A (en) * 1992-12-26 1994-08-30 Sony Corp Device for producing thin film in vacuum and production of magnetic recording medium using the same

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6016755U (en) * 1982-12-12 1985-02-04 白木金属工業株式会社 Film deposition equipment
JPS5991361U (en) * 1982-12-12 1984-06-21 日東工器株式会社 Film deposition equipment
JPS5991360U (en) * 1982-12-12 1984-06-21 シロキ工業株式会社 Reactive vapor deposition film forming equipment
JPS59107071A (en) * 1982-12-12 1984-06-21 Nitto Kohki Co Ltd Device for forming reactive vapor deposited film on outside surface of object to be treated

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06240443A (en) * 1992-12-26 1994-08-30 Sony Corp Device for producing thin film in vacuum and production of magnetic recording medium using the same

Also Published As

Publication number Publication date
JPS5732368A (en) 1982-02-22

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