JPS59171181A - 光結合装置 - Google Patents
光結合装置Info
- Publication number
- JPS59171181A JPS59171181A JP58045532A JP4553283A JPS59171181A JP S59171181 A JPS59171181 A JP S59171181A JP 58045532 A JP58045532 A JP 58045532A JP 4553283 A JP4553283 A JP 4553283A JP S59171181 A JPS59171181 A JP S59171181A
- Authority
- JP
- Japan
- Prior art keywords
- coupling device
- substrate
- electrical signal
- amorphous semiconductor
- emitting element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F55/00—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto
- H10F55/20—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto wherein the electric light source controls the radiation-sensitive semiconductor devices, e.g. optocouplers
- H10F55/25—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto wherein the electric light source controls the radiation-sensitive semiconductor devices, e.g. optocouplers wherein the radiation-sensitive devices and the electric light source are all semiconductor devices
- H10F55/255—Radiation-sensitive semiconductor devices covered by groups H10F10/00, H10F19/00 or H10F30/00 being structurally associated with electric light sources and electrically or optically coupled thereto wherein the electric light source controls the radiation-sensitive semiconductor devices, e.g. optocouplers wherein the radiation-sensitive devices and the electric light source are all semiconductor devices formed in, or on, a common substrate
Landscapes
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58045532A JPS59171181A (ja) | 1983-03-17 | 1983-03-17 | 光結合装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58045532A JPS59171181A (ja) | 1983-03-17 | 1983-03-17 | 光結合装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59171181A true JPS59171181A (ja) | 1984-09-27 |
JPH0464193B2 JPH0464193B2 (enrdf_load_stackoverflow) | 1992-10-14 |
Family
ID=12722005
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58045532A Granted JPS59171181A (ja) | 1983-03-17 | 1983-03-17 | 光結合装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59171181A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12057243B2 (en) | 2019-08-30 | 2024-08-06 | Tae Technologies, Inc. | Systems, devices, and methods for beam position monitoring and beam imaging |
US12070625B2 (en) | 2019-08-30 | 2024-08-27 | Tae Technologies, Inc. | Systems, devices, and methods for high quality ion beam formation |
US12283454B2 (en) | 2019-09-03 | 2025-04-22 | Tae Technologies, Inc. | Systems, devices, and methods for contaminant resistant insulative structures |
-
1983
- 1983-03-17 JP JP58045532A patent/JPS59171181A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12057243B2 (en) | 2019-08-30 | 2024-08-06 | Tae Technologies, Inc. | Systems, devices, and methods for beam position monitoring and beam imaging |
US12070625B2 (en) | 2019-08-30 | 2024-08-27 | Tae Technologies, Inc. | Systems, devices, and methods for high quality ion beam formation |
US12283454B2 (en) | 2019-09-03 | 2025-04-22 | Tae Technologies, Inc. | Systems, devices, and methods for contaminant resistant insulative structures |
Also Published As
Publication number | Publication date |
---|---|
JPH0464193B2 (enrdf_load_stackoverflow) | 1992-10-14 |
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