JPS591677A - Ion plating device - Google Patents

Abstract

PURPOSE:To provide a titled device which permits removal of the fine dust, etc. stuck on the substrates, etc. in a vacuum chamber prior to ion plating, by providing gas shower nozzles which open toward an electrode for supporting the substrates provided in an ion plating device. CONSTITUTION:In the stage of mounting substrates 2 to a cathode 3, gas shower nozzles 15 are held in the down position. Watch cases made of stainless steel are adapted for the substrates 2, and Ti is provided in an evaporating source 10. In the stage of evacuating roughly the inside of a vacuum chamber 1 through an evacuation port 8, a driving part 21 for a movable cover is operated upon starting of the rough evacuation to raise a movable cover 16 to a solid line position. The nozzles 15 are moved upward to the solid line position in succession. The nozzles 15 are rotated in this stage by means of two driving screws 18 which are rotated with pulleys and belts as transmission mechanisms. The degree of vacuum detected with a vacuum gauge 11 is further converted with a conversion part 12 and a control part 13 to the open or close signal of a valve 14. The valve 14 is opened in accordance with said signal to blow out gaseous N2. At the same instant, right and left motors 22 are rotated to oscillate the nozzles 15 at a specified cycle, thereby removing the fine dust, and various powders stuck on the substrates 2.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to the structure of an ion blating device.

In recent years, thin film formation technology using the ion blating method is less polluting than conventional wet plating, and has attracted attention as a method for covering substances that cannot be plated with wet plating, and is expected to be used from all angles. It's technology.

Therefore, there are several types of ion blating equipment available today. A DC voltage of several thousand volts is applied between the cathode, which is filled with gas and supports the substrate, and the anode, which has a heating element that holds the evaporation material, to generate a glow current and evaporate the metal from the heating element during discharge. A part of the evaporated metal material is ionized and accelerated together with the evaporated metal that is not ionized to form a thin film on the substrate.

The cathode method is an improved version of the M A 'I' T OX method, in which the ionization system of the evaporated metal and the film formation system are separated.

In other words, a plurality of hot cathodes are arranged around the main cathode that holds the substrate on which the coating is to be formed, and the electrons emitted from the hot cathode promote the ionization of ionizable gas, and the voltage between the hot cathode and the anode is This method allows ionization to be controlled by

Other methods include a high frequency ion blating method in which a high frequency power source is provided between the evaporation source and the substrate to excite ionization.

Some of the methods listed above (-C) also involve removing fine dust and various fine powders floating in the atmosphere, as well as manual work when attaching the substrate to the cathode. When attaching a board, thread waste from cotton gloves may adhere to the board or cathode in the vacuum chamber, causing unnecessary scum to be generated or carbonization of the material when ion blating is not performed. This has the disadvantage that a desirable surface treatment layer cannot be obtained by ion blating.

In order to solve the above-mentioned drawbacks, the present invention aims to remove fine dust and various fine powders adhering to substrates and various attached devices in a vacuum chamber before ion blasting. The ion blating device is equipped with an evaporator, a substrate supporting electrode, an ionizing electrode, and an ionizing gas inlet, and a gas shower nozzle is provided facing the substrate supporting electrode.

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a schematic cross-sectional view of a multi-cathode ion brating apparatus according to the present invention.

1 is a vacuum chamber, 2 is a substrate to be coated, 6 is a cathode that holds the substrate, 4 is a cathode that is an ionization electrode, 5 is an anode, 6 is a power source for the anode, 7 is an ionization gas inlet, and 8 is an exhaust port , 9
is an ionization power source and a 1° evaporation source.

Furthermore, 11 is a vacuum gauge, 12 is a converting section, 16 is a control section, and 14 is a vacuum degree detected by the vacuum gauge.
6 and the control section 14.

15 is a gas shower nozzle, 16 is a movable cover that is driven in conjunction with the gas shower nozzle, and 17 is a movable body that drives the gas shower nozzle up and down. 18 is a drive screw for driving the movable body 17, and 19 is a nozzle drive motor that is a drive source for the drive screw 17.

20 is a limit switch that detects the position of the vertical movement of the gas shower nozzle 15.

21 is a drive unit that drives the movable cover 16;
22 is a nozzle oscillation motor for oscillating the gas shower nozzle, and 26 is a nozzle oscillation lever. Reference numeral 24 denotes a sequence control unit that controls the driving of the gas shower nozzle 15 and the movable cover 16 in conjunction with each other.

Furthermore, to explain the structure and operation of the present invention in detail, when the substrate 2 is attached to the cathode A, the gas shower nozzle is located at a position 15 degrees lower (can # indicated by a two-dot chain line in Fig. 1), and the substrate 2 is attached to the cathode A. A stainless steel watch case is used, the evaporation source 10 is made of titanium, and when the inside of the vacuum chamber 1 is roughly vacuumed from the exhaust port 8, the movable cover drive unit 21 operates and the movable cover 16 is activated at the same time as the start of rough vacuuming. rises to the position shown by the solid line in Figure 1.

Subsequently, the nozzle drive motor starts and the nozzle rises to the position shown by the solid line in FIG. At this time, the gas shower nozzle 15 uses the nozzle drive motor 19 as a drive source, a pulley and a belt as a transmission mechanism, and rotates the two drive screws 18.

Note that the drive ψ11 screw 18 is machined so that one side is a right-hand thread and the other is a left-hand thread, and the gas shower nozzles 15 on both sides are configured to perform two-down movements at the same time.

Furthermore, the degree of vacuum detected by the vacuum gauge 11 is determined by the converter 12.
, and converts the vacuum bat'' into an opening/closing signal for the valve 14 through the control unit 16, and opens the valve 14 to blow out nitrogen gas.At the same time, the left and right nozzle swinging motors 22 start rotating, and the nozzle swinging motors 22 start rotating. Via the lever 26, the gas shower nozzle 15 is oscillated in a constant cycle.

Next, when the vacuum chamber 1 reaches 1 to 5 T OIt R, the valve 14 is closed and the blowing of nitrogen gas is stopped.

By blowing the gas and rough vacuuming from the exhaust port, fine dust and various minute powders adhering to the watch case, which is the substrate, are removed.

Furthermore, the nozzle swinging motor 22 stops, and the swinging motion of the gas shower nozzle 15 stops.

Subsequently, the nozzle drive motor 19 is started, and the gas shower nozzle 15 descends to the position indicated by the two-dot chain line in FIG. 1, and then stops. This stop position is provided below or detected by a Mitsutwitch.

Furthermore, the movable cover drive unit 21 is driven, and the movable force bar 16
rotates to the position indicated by the two-dot chain line in FIG. 1 to cover and protect the descending gas shower nozzle 15.

Next, the inside of the vacuum chamber 1 is maintained at 3 x 10-2'l'ORR, and a DC voltage of 1500V is applied to the ionization power source 9.
．． , ion blating is applied under other appropriate conditions.

The above operation is repeated for each charge.

As a result, the desired color tone can be obtained by applying ion blating to the watch case, which is the substrate 1, without causing problems such as partial discoloration or slight color unevenness.This effect is applied not only to the watch case but also to the tie. It can also be applied to decorative articles such as pins, and the structure of the device according to the present invention can also be applied to decorative items such as pins.
It can also be applied to devices using the 1' OX method or high frequency ion brating method, and its effects are remarkable.

[Brief explanation of drawings]

FIG. 1 is a sectional view of an ion blating device showing an embodiment of the present invention. 2... Substrate to be coated, 4... Hot cathode, 11... Vacuum gauge, 15... Gas shower nozzle, 16...
- Movable cover.

Claims (1)

[Claims] An ion blating device comprising an evaporation source, a substrate supporting electrode, an ionizing electrode, and an ionizing gas inlet in a vacuum chamber, characterized in that a gas shower nozzle opening toward the substrate supporting electrode is provided. Rating device.