JPS59164633A - Manufacture of photoconductive cadmium sulfide - Google Patents

Manufacture of photoconductive cadmium sulfide

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Publication number
JPS59164633A
JPS59164633A JP4020883A JP4020883A JPS59164633A JP S59164633 A JPS59164633 A JP S59164633A JP 4020883 A JP4020883 A JP 4020883A JP 4020883 A JP4020883 A JP 4020883A JP S59164633 A JPS59164633 A JP S59164633A
Authority
JP
Japan
Prior art keywords
cds
flux
cadmium sulfide
photoreceptor
sensitivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4020883A
Other languages
Japanese (ja)
Inventor
Takeshi Ikeda
武志 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP4020883A priority Critical patent/JPS59164633A/en
Publication of JPS59164633A publication Critical patent/JPS59164633A/en
Pending legal-status Critical Current

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  • Inorganic Compounds Of Heavy Metals (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE:To manufacture photoconductive CdS having sensitivity of light of longer wavelengths by calcining CdS contg. a small amount of In together with a proper amount of a flux, removing the flux by washing, carrying out calcination again, and treating the surface of the resulting CdS with sulfuric acid. CONSTITUTION:CdS contg. In by 5-30X10<-4> mole per 1 mole CdS or further contg. Cu by about 1-15X10<-4> mole is mixed with >=20wt%, preferably about 30-50% flux such as CdCl2-NaCl mixture, and the prepd. mixture is calcined at a temp. >=50 deg.C above the m.p. of the flux, preferably <= about 600 deg.C. The calcined CdS is washed with water or the like to remove the flux, and the CdS is calcined again at <= about 500 deg.C, preferably about 400-450 deg.C. The surface of the resulting CdS is then treated with 0.5-5N sulfuric acid to obtain high resistance CdS having a uniform and simple grain shape. The CdS has sufficient sensitivity to light of longer wavelengths and small optical memory, and it ensures sufficient dark potential.

Description

【発明の詳細な説明】 本発明は、光導電性硫化カドミウムの製造方法に関する
もので、特に非常に結晶性が高く、均一、単一で、且つ
長波長に感度を有する硫化カドミウム粒子の製造方法に
関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing photoconductive cadmium sulfide, and in particular a method for producing cadmium sulfide particles that are highly crystalline, uniform, single, and sensitive to long wavelengths. It is related to.

電子写真感光材料を代表例として用いられる光導電性硫
化カドミウム(Cd8 )の製造の最も一般的な方法は
、硫酸カドミウム、塩化カドミウム、などのカドミウム
の水溶性塩に硫化水素を作用させて硫化カドミウム粒子
の沈澱を得、次いでこの硫化カドミウム粒子に活性剤を
ドーピングするために高温焼成して得るものである。
The most common method for producing photoconductive cadmium sulfide (Cd8), which is typically used in electrophotographic materials, is to react hydrogen sulfide with water-soluble salts of cadmium, such as cadmium sulfate or cadmium chloride, to produce cadmium sulfide. The cadmium sulfide particles are precipitated and then calcined at a high temperature to dope the cadmium sulfide particles with an activator.

即ち、光導電性硫化カドミウムは、硫化カドミウム粒子
に活性剤としてCuC/2. Cu80.等また、融剤
としてCdC/、 、 ’1nclt等のハロゲン化物
を混入して焼成を行なうことにより、Cu、CI!等を
硫化カドミウム中にドープさせ製造するのが一般である
。しかしながらこのような従来の方法においては、焼成
工程を経て生成されたCdSは、沈澱生成時にCdSの
表面付近に非常に多くの欠陥を有している。
That is, photoconductive cadmium sulfide is produced by adding CuC/2. Cu80. etc. Also, by mixing a halide such as CdC/, '1nclt, etc. as a flux and performing firing, Cu, CI! It is generally manufactured by doping cadmium sulfide. However, in such conventional methods, the CdS produced through the calcination process has a large number of defects near the surface of the CdS at the time of precipitate formation.

この表面欠陥は、光キャリアーのトラップ準位となるた
め、CdSの光メモリーを増大し、即ち、光応答速度を
遅くシ、この様なCdSを用いて作成される感光体を高
速の複写機に適用すると初期コピーにおける明部と暗部
の静電コントラストが不十分となる。
These surface defects become trap levels for photocarriers, increasing the optical memory of CdS, that is, slowing down the optical response speed, making photoreceptors made using such CdS suitable for high-speed copying machines. If applied, the electrostatic contrast between bright and dark areas in the initial copy will be insufficient.

また、上記の様な方法で製造されたCdSの粒子形状は
、粒子が互いに集合し合って形成された強い凝集体であ
る2次粒子からなっており、この2次粒子は3次元的に
集合して団塊状であったりあるいは2次元的に集合して
平板状であったり様々であるがその中には大きなものは
lO数ミクロンから数10ミクロンに及ぶものがあるO この様な粗大粒子を多数含むCdSを用いて作成される
感光体は、その表面状態が劣悪となり、その結果得られ
る画像はガサつきが激しく、解像力も不十分と々る。ま
た、さらに絶縁層を設ける感光体の場合には、絶縁層の
CdS層へのしみ込み等がおこり、良好な感光体を得る
ことが困難となる。
In addition, the particle shape of CdS produced by the above method consists of secondary particles, which are strong aggregates formed by particles aggregating together, and these secondary particles are three-dimensionally aggregated. There are various types of particles, such as those that are shaped like nodules, or those that are two-dimensionally aggregated and are tabular, and some of them are large, ranging in size from several microns to several tens of microns. A photoreceptor made using a large amount of CdS has a poor surface condition, resulting in images that are extremely rough and have insufficient resolution. Furthermore, in the case of a photoreceptor further provided with an insulating layer, the insulating layer may seep into the CdS layer, making it difficult to obtain a good photoreceptor.

前記欠点については特開昭57−129825号公報に
記載されているような方法によって、克服されている。
The above drawbacks have been overcome by a method as described in Japanese Patent Laid-Open No. 57-129825.

しかしながら、最近インテリジェント・複写機の関心が
高まり、特にレーザー光源を用いた複写機への要求が現
われ始めると、感光体粒子としては長波長、特にレザー
光の関係から750〜800nm以上での感度を有する
ものが必要となってくる。前記方法における粒子は、長
波長側には感度を有して々く、赤外領域の光に対しての
感度は十分でなく上記目的には使用出来ない0 本発明者等は、電子写真用硫化カドミウムは、Inの存
在で長波長に感度をのばすことが出来ることを既に確認
している。しかし、長波長に感度をのばすに必要なだけ
のInをドープさせ、なお 秦かつ、電子写真用として必要な暗抵抗を持たすために
は、In量に応じたCuをアクセプターとして添加しな
ければならないが、これを前述の公開公報に記されてい
る様な方法に適用した場合、Cu iの増加に伴い、得
られる硫化カドミウムを用いて作成される電子写真用感
光体は、基板からのキャリヤーの注入性が劣化する傾向
にあり、特に、光導電層の上に絶縁層を設ける3層構成
の様なタイプでは、暗部電位が下がり、感度が低下する
傾向がある。
However, recently, interest in intelligent copying machines has increased, and in particular, demand has begun to appear for copying machines using laser light sources.As a result, photoreceptor particles need to be sensitive to longer wavelengths, especially 750 to 800 nm or more due to laser light. You will need what you have. The particles used in the above method are sensitive to long wavelengths, but are not sufficiently sensitive to light in the infrared region and cannot be used for the above purpose. It has already been confirmed that the sensitivity of cadmium sulfide can be extended to longer wavelengths due to the presence of In. However, in order to dope the amount of In necessary to extend the sensitivity to long wavelengths, and still have the necessary dark resistance for electrophotography, it is necessary to add Cu as an acceptor in accordance with the amount of In. However, when this method is applied to the method described in the above-mentioned publication, as the Cu i increases, an electrophotographic photoreceptor made using the resulting cadmium sulfide is reduced in the amount of carrier from the substrate. Injection properties tend to deteriorate, and in particular, in a type such as a three-layer structure in which an insulating layer is provided on a photoconductive layer, the dark potential tends to decrease and the sensitivity tends to decrease.

また、Cu量のみを減少させ、  In量は減少させな
い場合は、長波長へ感度はのびるが、光メモリーが増加
し、暗部電位の低い非常に低抵抗な値化カドミウムとな
ってしまう。
If only the amount of Cu is reduced and the amount of In is not reduced, the sensitivity will extend to longer wavelengths, but the optical memory will increase, resulting in cadmium with a very low resistance and a low dark potential.

而して本発明は前記方法を改良したCdSの製造方法を
提供することを目的とするものである。
Therefore, an object of the present invention is to provide a method for producing CdS that is an improvement on the above-mentioned method.

即ち、長波長に対して十分な感度を持ちながら光メモリ
ーが小さく暗電位がより十分にとれる高抵抗CdSが製
造できる製造方法を提供することを目的とする。
That is, the object is to provide a manufacturing method capable of manufacturing high-resistance CdS that has sufficient sensitivity to long wavelengths, has a small optical memory, and has a more sufficient dark potential.

本発明の方法はインジウムを含む硫化カドミウムに対し
て20重量%以上の融剤を混ぜて、融剤の融点よりも5
0℃以上高い温度で焼成後、洗浄工程を経てさらに再焼
成された硫化カドミウムを0.5 N〜5.ONの硫酸
中で表面処理した後、再焼成することを特徴とするもの
である。
The method of the present invention involves mixing 20% by weight or more of a flux with cadmium sulfide containing indium, and
After firing at a temperature higher than 0°C, the cadmium sulfide was re-fired through a cleaning process and heated to a temperature of 0.5 N to 5. It is characterized by surface treatment in ON sulfuric acid and then re-firing.

本発明により製造される硫化カドミウムは結晶性が商り
、また、走査型電子顕微鏡による形状観察では粒子が互
いに凝集していない単粒子でありかつその表面が滑らか
になっている。
Cadmium sulfide produced according to the present invention has good crystallinity, and when observed using a scanning electron microscope, it is found to be a single particle with no agglomeration of particles, and its surface is smooth.

本発明により得られた硫化カドミウム粉体は粒子形状が
均一でかつ粒径がそろっているため、作成される光導電
層の塗面は、密で平滑なため、非常に良質の画像が得ら
れると共に長波長、特に800ないし850nmまで感
度が伸びていることがわかった。
Since the cadmium sulfide powder obtained by the present invention has a uniform particle shape and uniform particle size, the coated surface of the photoconductive layer created is dense and smooth, resulting in very high quality images. It was also found that the sensitivity was extended to long wavelengths, particularly 800 to 850 nm.

本発明で再焼成後、硫化カドミウムの表面処理に用いる
硫酸の濃度は0.5 N〜5. ONが効果的であり、
この効果は、処理時間との相関がある。すなわち、低濃
度では長時間の処理が必要となり、高濃度では短時間で
効果が出る。しかし、0.5N以下では、処理の効果が
少ないことおよび処理時間を長くすることが必要で、製
造上の効率が悪いこと、また、5N以上の濃度の処理は
、感度が低下する傾向を示すことから不適当である。長
波長側に感度を持たすだめのインジウムの最低量は生成
する硫化カドミウム1モルに対して5X10 モル必要
であり最大量は電子写真用としての暗抵抗が満足される
量30×lOモルである。
In the present invention, the concentration of sulfuric acid used for surface treatment of cadmium sulfide after re-firing is 0.5 N to 5. ON is effective,
This effect is correlated with processing time. That is, at low concentrations, long-term treatment is required, while at high concentrations, effects can be obtained in a short time. However, if the concentration is 0.5N or less, the processing effect is small and the processing time needs to be lengthened, resulting in poor manufacturing efficiency.Additionally, if the concentration is 5N or more, the sensitivity tends to decrease. Therefore, it is inappropriate. The minimum amount of indium required to provide sensitivity on the long wavelength side is 5×10 mol per mol of cadmium sulfide produced, and the maximum amount is 30×10 mol, which satisfies the dark resistance for electrophotography.

インジウムの添加は、反応溶液中に添加して共沈によっ
て硫化カドミウムに含ませることもできるし、焼成前に
硫化カドミウムと混合させても有効に含ませることもで
きる。
Indium can be added to the reaction solution and incorporated into the cadmium sulfide by coprecipitation, or it can be effectively incorporated by mixing it with the cadmium sulfide before firing.

また、銅は予め、カドミウム塩水溶液中に添加して共沈
させて、硫化カドミウム中に含ませることも出来るし、
焼成前、硫化カドミウムと混合した後焼成を行うことに
より硫化カドミウム中に含ませることも出来る。Cd8
に添加する銅化合物としては、銅の塩化物、硫化物、硫
酸化物などが用、いられ、特に、塩化銅、硫酸銅が好ま
しい。
In addition, copper can be added in advance to a cadmium salt aqueous solution and co-precipitated to be included in cadmium sulfide.
It can also be included in cadmium sulfide by mixing it with cadmium sulfide before firing and then firing it. Cd8
As the copper compound to be added, copper chloride, sulfide, sulfate, etc. can be used, and copper chloride and copper sulfate are particularly preferred.

焼成前に銅化合物を添加する方法は銅化合物を固体のま
ま添加混合してもよいし、銅化合物が水溶性の場合はこ
れを一度水溶液にしCdSに添加後、水分を蒸発させる
湿式法のいずれも良好な結果が得られるが、均一性の面
では湿式方法がよい。
The copper compound can be added before firing by adding and mixing the copper compound as a solid, or if the copper compound is water-soluble, it can be made into an aqueous solution and added to CdS, and then the water can be evaporated. Although good results can also be obtained using the wet method, the wet method is better in terms of uniformity.

銅の添加量はインジウム量によって最適量が異なるが硫
化カドミウム1モルに対して、1×10  から15X
lOモル特には3×10 から1OxlOモルが必要で
ある。
The optimum amount of copper added varies depending on the amount of indium, but it is from 1x10 to 15x per mole of cadmium sulfide.
10 mol, in particular 3×10 5 to 10×10 8 mol, is required.

本発明に使用する融剤は、活性剤をCdS中に拡散する
際に一般的に用いられている融剤で、CdC/2 、 
ZnC/2. KC1!、 NaCl 、 NH4C/
! 、 CdSO4等の1つあるいは数種類を適当な比
率に混合したものである。混合して用いる場合の好適例
として、CdC/、とアルカリ金属の塩化物との混合物
が挙げられる。アルカリ金属の塩化物としては、NaC
1とKCtが代表的なものである。アルカリ金属の塩化
物の融剤全体における含有量は、90モル%以下で10
モル%以上が好適である。
The flux used in the present invention is a flux generally used when diffusing an activator into CdS, and includes CdC/2,
ZnC/2. KC1! , NaCl, NH4C/
! , CdSO4, etc., or a mixture of them in an appropriate ratio. A preferred example of a mixture of CdC and an alkali metal chloride is a mixture of CdC and an alkali metal chloride. As an alkali metal chloride, NaC
1 and KCt are representative. The content of alkali metal chloride in the entire flux is 90 mol% or less and 10
A mole % or more is preferable.

本発明においては、この融剤量は、20%以上、特に好
ましくは30〜50%が好ましい。
In the present invention, the amount of flux is preferably 20% or more, particularly preferably 30 to 50%.

20%以下では、製造されるCdS粒子は焼結して粗大
粒子になり、また表面形状も不均一で、電位保持性が十
分でなく、また、解像性に欠ける悪いCdSになる。ま
た、焼成を融剤の融点よりも50℃高い温度に及ばない
温度で行なった場合には、製造されるCdS粒子は粒径
が大きく、解像性や塗工性が悪い。
If it is less than 20%, the CdS particles produced will be sintered and become coarse particles, and the surface shape will be non-uniform, resulting in poor CdS that does not have sufficient potential retention and lacks resolution. Furthermore, if the firing is performed at a temperature lower than 50° C. higher than the melting point of the flux, the CdS particles produced will have a large particle size and poor resolution and coating properties.

なお、本発明の製造方法において、焼成温度は、600
℃以下が好適である。また、融剤のCdSに対する添加
量は、収率の点からは65cX以下が好適である。
In addition, in the manufacturing method of the present invention, the firing temperature is 600
C or lower is suitable. Further, the amount of fluxing agent added to CdS is preferably 65 cX or less from the viewpoint of yield.

このように焼成された硫化カドミウムは本発明による硫
酸処理の前に再焼成を行う。この再焼成処理によって、
感光体に利用されたときの形成される画像の静電コント
ラストが一層安定化する。再焼成は500℃以下特には
400〜450℃の温度で行われることが好ましい。
The cadmium sulfide thus calcined is recalcined before being treated with sulfuric acid according to the present invention. Through this re-firing process,
When used on a photoreceptor, the electrostatic contrast of the image formed becomes more stable. Re-firing is preferably carried out at a temperature of 500°C or lower, particularly 400-450°C.

実施例1 硫酸カドミラA 1 mog 、硫酸銅10 X 10
 mode1硫酸インジウA30X10  moleを
含む、3N硫酸酸性水溶液21の温度を60℃に保ち硫
化水素を300cc/minの流量で95分間通じた。
Example 1 Cadmilla sulfate A 1 mog, copper sulfate 10 X 10
The temperature of the 3N sulfuric acid acidic aqueous solution 21 containing 30×10 moles of model 1 indium sulfate A was kept at 60° C., and hydrogen sulfide was passed through the solution at a flow rate of 300 cc/min for 95 minutes.

この反応で生じた硫化カドミウムを純水を用いて水洗し
、過剰に粒子表面に存在する不純物を除去した後、口過
、100℃の温度で1晩乾燥した。
The cadmium sulfide produced in this reaction was washed with pure water to remove excessive impurities present on the particle surface, and then filtered through the mouth and dried overnight at 100°C.

この硫化カドミウム100fK対しCdCl!tを20
1とNaClを302添加し、よく混合した上で、石英
ルツボに充填し、530℃で30分焼成した(なお、c
ctcz、とNaClの混合融剤の融点は、状態図から
CdC1!、 −2NaClの融点の426℃に相当す
る)。この様にして得られたCdSを水洗、イオン交換
樹脂による残留イオン除去後乾燥し加攪拌しながら4時
間放置した。このCdSを水洗、イオン交換樹脂による
残留イオン除去、乾燥した。このCdSを塩化ビニル/
酢酸ビニル共重合体中に分散させた後アルミニウム基板
上に40μの厚さに塗布乾燥させて得た感光体に15μ
厚のポリエステルフィルムをはりつけ三層構成の感光体
を得たところ、表面が非常に平滑であった。この感光体
に一次帯電、次いで光像露光AC除電、次いで全面露光
の萬速電子写真プロセスを適用したところ、十分な静電
コントラストと、十分な感度に基く良質の画像が得られ
た。特に解像力は、6本/闘以上あり、シャ−プな画像
が得られた。さらにこの感光体を温度35℃、湿度85
%の高温・高湿中に、24時間放置後、再び複写機にお
いて画像出しを行なった結果明暗部のコントラストの低
下も認められず、良質の画像が得られた。
For this cadmium sulfide 100fK, CdCl! t to 20
1 and NaCl were added, mixed well, and then filled in a quartz crucible and fired at 530°C for 30 minutes (note that c
From the phase diagram, the melting point of the mixed flux of ctcz and NaCl is CdC1! , corresponds to the melting point of -2NaCl of 426°C). The CdS thus obtained was washed with water, residual ions were removed using an ion exchange resin, and then dried and left for 4 hours with stirring. This CdS was washed with water, residual ions were removed using an ion exchange resin, and dried. This CdS can be converted into vinyl chloride/
The resulting photoreceptor was dispersed in vinyl acetate copolymer, coated on an aluminum substrate to a thickness of 40μ, and dried.
When a thick polyester film was attached to obtain a three-layered photoreceptor, the surface was extremely smooth. When this photoreceptor was subjected to a multi-speed electrophotographic process consisting of primary charging, photoimage exposure, AC static elimination, and then full-surface exposure, a high-quality image with sufficient electrostatic contrast and sufficient sensitivity was obtained. In particular, the resolution was more than 6 lines per shot, and sharp images were obtained. Furthermore, this photoreceptor was heated at a temperature of 35°C and a humidity of 85°C.
After being left in a high temperature and high humidity environment for 24 hours, the image was produced again using a copying machine. As a result, no decrease in contrast between bright and dark areas was observed, and a good quality image was obtained.

実施例2 硫酸カドミウム1 modeを含む3N硫酸水溶液から
、実施例1と同様な方法によシ硫化カドミウムを沈澱生
成した0該硫化カドミウム1009に銅、インジウムが
硫化カドミウム1モルに対してそれぞれ4X 10’ 
、 12X 10−4mole含むように、硫酸鋼、硫
酸インジウムの形で添加し、湿式法により、均−混合後
、100℃の温度で乾燥した。 cctcz、 40 
f s NaCl  10 ?  から成柄 る混合融β混入し、充分混合後500℃で30分焼成し
た。
Example 2 Cadmium sulfide was precipitated from a 3N sulfuric acid aqueous solution containing 1 mode of cadmium sulfide in the same manner as in Example 1. Copper and indium were added to the cadmium sulfide 1009 at a concentration of 4X 10, respectively, per mole of cadmium sulfide. '
Sulfuric acid steel and indium sulfate were added so as to contain 12×10 −4 moles, and after homogeneous mixing by a wet method, the mixture was dried at a temperature of 100° C. cctcz, 40
f s NaCl 10 ? A mixture of molten β consisting of 100% molten carbonate was added, and after thorough mixing, it was fired at 500°C for 30 minutes.

この様に作成された硫化カドミウムを0.5N硫酸水浴
液中に添加、攪拌しながら20時間放置した。水洗9口
過、乾燥後実施例1と同様に再焼成を行ない得られたC
dSを感光体化して評価したところ、実施例1と同様の
良好の結果を得た。
The cadmium sulfide thus prepared was added to a 0.5N sulfuric acid water bath and left to stand for 20 hours with stirring. Washed with water, filtered through 9 mouths, dried, and then refired in the same manner as in Example 1.
When dS was made into a photoreceptor and evaluated, good results similar to those of Example 1 were obtained.

比較例1 実施例1において、硫酸処理を除いて全く同様の方法で
作成された硫化カドミウム粒子について、実施例1と同
様の方法で感光体を作成した0 比較例2 実施例2において硫酸処理を除いて全く同様な方法で製
造した硫化カドミウム粒子を用いて実施例2と同様にし
て感光体を製造した。
Comparative Example 1 A photoreceptor was produced in the same manner as in Example 1 using cadmium sulfide particles produced in exactly the same manner as in Example 1 except for the sulfuric acid treatment. Comparative Example 2 A photoreceptor was manufactured in the same manner as in Example 2 using cadmium sulfide particles manufactured in exactly the same manner except for the following.

以上の実施例および比較例で製造した感光体について第
1図に示す測定装置を用いて感光体の特性を測定した。
The characteristics of the photoreceptors manufactured in the above Examples and Comparative Examples were measured using the measuring apparatus shown in FIG.

第1図の測定装置を用いて感光体の感光特性を測定した
The photosensitive characteristics of the photoreceptor were measured using the measuring apparatus shown in FIG.

即ち、感光体9の絶縁層面に透明電極4をもつガラス板
3を押しつけた。透明電極4はリレースイッチ5を介し
て高圧直流電源6に接続される。測定はリレースイッチ
5を0.2秒間とじて高電圧(Va)を印加し、0,2
秒間放置(オープン)後、光を0.2秒間照射しその時
の電圧変化(Vp)を感光体と同電圧にある金属板7と
表面電位計8で測定した0尚、Vpは光導電層に印加さ
れている電圧である。
That is, the glass plate 3 having the transparent electrode 4 was pressed against the insulating layer surface of the photoreceptor 9. The transparent electrode 4 is connected to a high voltage DC power source 6 via a relay switch 5. For measurement, close the relay switch 5 for 0.2 seconds and apply a high voltage (Va) to 0.2 seconds.
After being left open for a second, light was irradiated for 0.2 seconds and the voltage change (Vp) at that time was measured using a metal plate 7 at the same voltage as the photoreceptor and a surface potentiometer 8. This is the voltage being applied.

更に前露光としてハロゲンランプlの白色光をシャッタ
ー2によ、90.2sec照射し、0,2(8)放置し
た後、va印加し、0.2sec放置後再び光を0.2
式照射しその時の電圧変化■p′を測定した。
Furthermore, as a pre-exposure, white light from a halogen lamp 1 was irradiated for 90.2 seconds through the shutter 2, and after being left for 0.2 (8), va was applied, and after being left for 0.2 seconds, light was applied again for 0.2 seconds.
The voltage change (p') at that time was measured.

Va−2000V とした場合のVpおよびVp’また
Vaを+2000Vとした場合のVpO値を測定しVa
 : −2QOOV印加時のVp−Vp’から光メモリ
ーの大小が判断できる。
Measure the Vp and Vp' when Va is set to -2000V and the VpO value when Va is set to +2000V.
: The size of the optical memory can be determined from Vp-Vp' when -2QOOV is applied.

次に同じ測定装置を用いて感光体の感度を測定した。Next, the sensitivity of the photoreceptor was measured using the same measuring device.

即ち、感光体9の絶縁層面に透明電極4をもつガラス板
3を押しつけた。透明電極4はリレースイッチ5を介し
て高圧直流電源6に接続される。測定は前露光としてノ
10ゲンランブ1の白色光をシャッター2により0.2
1iet1!照射し、0,2(8)放置した後、リレー
スイッチ5を0.2秒間と表面(即ち、絶縁層表面)に
おける電圧(Va’)を感光体と同電圧にある金属板7
と表面電位計8で測定した。高電圧印加時における光導
電層への印加電圧(Vp)はVa−Va’によシ算出で
きるので、Vpが600VになるVa (以下Va−,
66という)を定めて以下の方法で感度を測定した。即
ち、感光体にVa −aooを印加した状態で測定光(
800℃m)を照射する。光照射後0.2秒間放置後、
上記と同様に十分に強い光を0.2秒間照射して感光体
表面における電圧(Va” )を上記と同様にして測定
する。Va−0゜0印加と同時測定光照射時における光
導電層への印加電圧(Vp″)は” −aoo −Va
”により算出できるから、v、j/ カ300■になる
必要な測定光の露光量(E)が半減露光量(E%)であ
り、感光体の感度を表示することができる。
That is, the glass plate 3 having the transparent electrode 4 was pressed against the insulating layer surface of the photoreceptor 9. The transparent electrode 4 is connected to a high voltage DC power source 6 via a relay switch 5. The measurement was performed using white light of 10 gen lamp 1 as pre-exposure with shutter 2 of 0.2
1iet1! After irradiating and leaving it for 0.2 (8), the relay switch 5 is turned on for 0.2 seconds and the voltage (Va') on the surface (i.e., the surface of the insulating layer) is set to the metal plate 7 at the same voltage as the photoreceptor.
was measured using a surface electrometer 8. The voltage (Vp) applied to the photoconductive layer when applying a high voltage can be calculated as Va-Va', so Va (hereinafter Va-,
66) was determined and the sensitivity was measured using the following method. That is, the measurement light (
800℃m). After leaving it for 0.2 seconds after light irradiation,
Irradiate sufficiently strong light for 0.2 seconds in the same manner as above, and measure the voltage (Va'') on the surface of the photoreceptor in the same manner as above. Photoconductive layer during Va-0°0 application and simultaneous measurement light irradiation. The applied voltage (Vp″) to “−aoo −Va
Since it can be calculated by ``, the exposure amount (E) of the measurement light required to obtain v, j/ f 300 sq. is the half-reduced exposure amount (E%), and the sensitivity of the photoreceptor can be displayed.

下表にそれら特性を示す。The characteristics are shown in the table below.

表から、硫酸処理を行った感光体についてはvp−vp
’の差が比較例に比べて小さい。このことことを示して
いる。また、vp′が大きくなっている点から、比較例
に比して、高抵抗型となっており、電位が取れる方向に
変化している。又、感度も十分使用可能な範囲に入って
おり、光メモリーは比較例に較べて、改良されている。
From the table, for photoreceptors treated with sulfuric acid, vp-vp
' difference is smaller than that of the comparative example. This shows that. In addition, since vp' is larger, it is a higher resistance type than the comparative example, and the potential is changed in the direction that it can be obtained. Furthermore, the sensitivity is within a usable range, and the optical memory is improved compared to the comparative example.

【図面の簡単な説明】 第1図は感光体の感度を測定するだめの装置の説明図で
ある。 4・・・透明電極、5・・・リレースイッチ、6・・・
高圧直流電源、7・・・金槙板、8・・・表面電位計、
9・・・感光体。 出願人  キャノン株式会社
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is an explanatory diagram of an apparatus for measuring the sensitivity of a photoreceptor. 4...Transparent electrode, 5...Relay switch, 6...
High-voltage DC power supply, 7... Gold plate, 8... Surface electrometer,
9...Photoreceptor. Applicant Canon Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] (1)1モルあたりインジウムを5〜30X10’モル
含む硫化カドミウムに対して、20重量%以上の融剤を
混ぜ、融剤の融点よりも50℃以上高い温度で焼成し、
洗浄工程を経て融剤を取り除いた後さらに再焼成して得
られた硫化カドミウムを0.5 N〜5Nの硫酸で表面
処理することを特徴とする光導電性硫化カドミウムの製
造方法。
(1) Cadmium sulfide containing 5 to 30 x 10' moles of indium per mole is mixed with 20% by weight or more of a flux and fired at a temperature 50°C or more higher than the melting point of the flux,
A method for producing photoconductive cadmium sulfide, which comprises surface-treating the cadmium sulfide obtained by removing the flux through a washing step and then re-firing with 0.5N to 5N sulfuric acid.
JP4020883A 1983-03-10 1983-03-10 Manufacture of photoconductive cadmium sulfide Pending JPS59164633A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4020883A JPS59164633A (en) 1983-03-10 1983-03-10 Manufacture of photoconductive cadmium sulfide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4020883A JPS59164633A (en) 1983-03-10 1983-03-10 Manufacture of photoconductive cadmium sulfide

Publications (1)

Publication Number Publication Date
JPS59164633A true JPS59164633A (en) 1984-09-17

Family

ID=12574359

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4020883A Pending JPS59164633A (en) 1983-03-10 1983-03-10 Manufacture of photoconductive cadmium sulfide

Country Status (1)

Country Link
JP (1) JPS59164633A (en)

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