JPS59164632A - Manufacture of photoconductive cadmium sulfide - Google Patents
Manufacture of photoconductive cadmium sulfideInfo
- Publication number
- JPS59164632A JPS59164632A JP3981083A JP3981083A JPS59164632A JP S59164632 A JPS59164632 A JP S59164632A JP 3981083 A JP3981083 A JP 3981083A JP 3981083 A JP3981083 A JP 3981083A JP S59164632 A JPS59164632 A JP S59164632A
- Authority
- JP
- Japan
- Prior art keywords
- cds
- flux
- cadmium sulfide
- calcined
- sensitivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- Photoreceptors In Electrophotography (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、光導電性硫化カドミウムの製造方法に関する
もので、特に非常に結晶性が高く、均一、単一で、且つ
長波長に感度を有する硫化カドミウム粒子の製造方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing photoconductive cadmium sulfide, and in particular a method for producing cadmium sulfide particles that are highly crystalline, uniform, single, and sensitive to long wavelengths. It is related to.
電子写真感光材料を代表例として用いられる光導電性硫
化カドミウム(CdS )の製造の最も一般的な方法は
、硫酸カドミウム、塩化カドミウム、などのカドミウム
の水溶性塩に硫化水素を作用させて硫化カドミウム粒子
の沈澱を得、次いでこの硫化カドミウム粒子に活性剤を
ドーピングするために高温焼成して得るものである。The most common method for producing photoconductive cadmium sulfide (CdS), which is typically used in electrophotographic materials, is to react hydrogen sulfide with water-soluble salts of cadmium, such as cadmium sulfate or cadmium chloride, to produce cadmium sulfide. The cadmium sulfide particles are precipitated and then calcined at a high temperature to dope the cadmium sulfide particles with an activator.
即ち、光導電性硫化カドミウムは、硫化カドミウム粒子
に活性剤としてCuC1!、 、 Cu5O,等また、
融剤としてcacz、、 ZnC/2等のハロゲン化物
を混入して焼成を行なうことによp、Cu、C/ 等
を硫化カドミウム中にドープさせ製造するのが一般であ
る。しかしながらこのような従来の方法においては、焼
成工程を経て生成されたCdSは、沈澱生成時にCd8
0表面付近に非常に多くの欠陥を有している。That is, photoconductive cadmium sulfide is added to cadmium sulfide particles as an activator by CuC1! , , Cu5O, etc. Also,
Generally, cadmium sulfide is manufactured by doping p, Cu, C/2, etc. by mixing a halide such as cacz, ZnC/2, etc. as a flux and firing. However, in such conventional methods, the CdS produced through the calcination process becomes Cd8 during precipitate formation.
0 has many defects near the surface.
この表面欠陥は、光キャリアーのトラップ準位となるた
め、 CdSの光メモリーを増大し、即ち、光応答速度
を遅くシ、この様なCdSを用いて作成される感光体を
高速の複写機に適用すると初期コピーにおける明部と暗
部の静電コントラストが不十分となる。These surface defects become trap levels for photocarriers, increasing the optical memory of CdS, that is, slowing down the optical response speed, making photoreceptors made using such CdS suitable for use in high-speed copying machines. If applied, the electrostatic contrast between bright and dark areas in the initial copy will be insufficient.
また、上記の様な方法で製造されたCdSの粒子形状は
、粒子が互いに集合し合って形成された強い凝集体であ
る2次粒子からなっており、この2次粒子は3次元的に
集合して団塊状であったりあるいは2次元的に集合して
平板状であったり様々であるがその中には大きなものは
i。In addition, the particle shape of CdS produced by the above method consists of secondary particles, which are strong aggregates formed by particles aggregating together, and these secondary particles are three-dimensionally aggregated. There are various types, such as those that are shaped like a nodule or two-dimensionally aggregated and shaped like a plate, but some of the larger ones are i.
数ミクロンから数10ミクロンに及ぶものがある0
この様な粗大粒子を多数含むCdSを用いて作成される
感光体は、その表面状態が劣悪となり、その結果得られ
る画像はガサつきが激しく、解像力も不十分となる。ま
た、さらに絶縁層を設ける感光体の場合には、絶縁層の
CdS層へのしみ込み等がおこり、良好な感光体を得る
ことが困難となる。Photoreceptors made using CdS containing large numbers of such coarse particles have a surface condition that is poor, resulting in images that are extremely rough and have poor resolution. will also be insufficient. Furthermore, in the case of a photoreceptor further provided with an insulating layer, the insulating layer may seep into the CdS layer, making it difficult to obtain a good photoreceptor.
前記欠点については特開昭57−129825号公報に
記載されているような方法によって、克服されている。The above drawbacks have been overcome by a method as described in Japanese Patent Laid-Open No. 57-129825.
しかしながら、最近インテリジェント・複写機への関心
が高まり、%にレーザー光源を用いた複写機への要求が
現われ始めると、感光体粒子としては長波長、特にレザ
ー光の関係から750〜800nm以上での感度を有す
るものが必要となってくる。前記方法における粒子は、
長波長側には感度を有してなく、赤外領域の光に対して
の感度は十分でなく上記目的には使用出来ない。However, recently, interest in intelligent copying machines has increased, and demand for copying machines that use laser light sources has begun to appear.As photoreceptor particles have long wavelengths, especially laser light, wavelengths of 750 to 800 nm or more have become necessary. Something with sensitivity is needed. The particles in the method are:
It has no sensitivity on the long wavelength side and has insufficient sensitivity to light in the infrared region, so it cannot be used for the above purpose.
本発明者等は、硫化カドミウムは、’nの存在で長波長
に感度をのばすことが出来ることを既に確認している。The present inventors have already confirmed that the sensitivity of cadmium sulfide can be extended to long wavelengths due to the presence of 'n.
しかし、長波長に感度をのばすに必要なだけのInをド
ープさせ、なおかつ、軍手写真用として必要な暗抵抗を
持たすためには、In量に応じたCuをアクセプターと
して添加しなければならないが、これを前述の特開昭5
7−129825号公報に記されている様な方法に適用
した場合、Cu量の増加に伴い、得られる硫化カドミウ
ムを用いて作成される電子写真用感光体は、基板からの
キャリヤーの注入性が劣化する傾向にあり、特に、光導
電層の上に絶縁層を設ける3層構成の様なタイプでは、
暗部電位が下がり、感度が低下する傾向がある。However, in order to dope as much In as necessary to extend the sensitivity to long wavelengths and to have the necessary dark resistance for photographic work gloves, it is necessary to add Cu as an acceptor in accordance with the amount of In. This is the aforementioned Japanese Patent Application Publication No. 5
When a method such as that described in Publication No. 7-129825 is applied, as the amount of Cu increases, the electrophotographic photoreceptor produced using the resulting cadmium sulfide has a poor carrier injection property from the substrate. It tends to deteriorate, especially in the type with a three-layer structure in which an insulating layer is placed on the photoconductive layer.
There is a tendency for the dark potential to decrease and the sensitivity to decrease.
また%cuitのみを減少させ、In量は減少させない
場合は、長波長へ感度はのびるが、光メモリーが増加し
、暗部電位の低い非常に低抵抗な硫化カドミウムとなっ
てしまう。If only %cuit is decreased and the In amount is not decreased, the sensitivity will extend to longer wavelengths, but the optical memory will increase, resulting in cadmium sulfide having a low dark potential and a very low resistance.
而して本発明は前記方法を改良したCd8の製造方法を
提供することを目的とするものである。Therefore, an object of the present invention is to provide a method for producing Cd8 which is an improvement on the above-mentioned method.
即ち、長波長に十分な感度を有し光メモリーが小さく暗
電位がより十分にとれる高抵抗CdSが製造できる製造
方法を提供することを目的とする0
本発明の方法はインジウムを含む硫化カドミウムに対し
て20重量%以上の融剤を混ぜて、融剤の融点よりも5
0℃以上高い温度で焼成後、0、5 N〜5.ONの硫
酸中で表面処理した後、再焼成することを特徴とするも
のである。That is, the purpose of the present invention is to provide a manufacturing method capable of manufacturing high-resistance CdS that has sufficient sensitivity to long wavelengths, has a small optical memory, and has a sufficient dark potential. 20% by weight or more of a flux is mixed with the melting agent, and the melting point is 5%
After firing at a temperature higher than 0°C, 0.5 N to 5. It is characterized by surface treatment in ON sulfuric acid and then re-firing.
本発明により製造される硫化カドミウムは結晶性が高く
、−まだ、走食型電子顔微鏡による形状観察では粒子が
互いに凝集していない単粒子でありかつその表面が滑ら
かになっている。The cadmium sulfide produced according to the present invention has high crystallinity, and when its shape is observed using an erotaxis type electronic facial microscope, it is found to be a single particle with no agglomeration of particles, and its surface is smooth.
本発明により得られた硫化カドミウム粉体は粒子形状が
均一でかつ粒径がそろっているため、作成される光導電
層の塗面は、密で平滑なため、非常に良質の画像が得ら
れると共に長波長、特に800ないし35Qnrriま
で感度が伸びていることがわかった。Since the cadmium sulfide powder obtained by the present invention has a uniform particle shape and uniform particle size, the coated surface of the photoconductive layer created is dense and smooth, resulting in very high quality images. It was also found that the sensitivity was extended to long wavelengths, especially from 800 to 35 Qnrri.
本発明で焼成後、値化カドミウムの表面処理に用いる硫
酸の濃度は0.5N〜5.ONが効果的であり、この効
果は、処理時間との相関がある。In the present invention, the concentration of sulfuric acid used for surface treatment of valorized cadmium after firing is 0.5N to 5.0N. ON is effective, and this effect is correlated with processing time.
すなわち、低濃度では長時間の処理が必要となり、高濃
度では比較的短時間で効果が出る。しかし、0.5N以
下では、長時間処理を行ってもその効果が少なく製造上
の効率が悪い、まだ、5N以上の濃度の処理は、感度が
低下する傾向を示すことから不適当である。長波長側に
感度を持たすためのインジウムの最低量は生成する硫化
カドミウム1モルに対して5XlOモル必要であり最大
量は電子写真用としての暗抵抗が満足される量30×l
Oモルである。That is, at low concentrations, long-term treatment is required, whereas at high concentrations, effects are achieved in a relatively short time. However, if the concentration is 0.5N or less, even if the treatment is carried out for a long time, the effect will be small and the manufacturing efficiency will be poor.However, treatment with a concentration of 5N or more is not suitable because the sensitivity tends to decrease. The minimum amount of indium required to have sensitivity on the long wavelength side is 5XlO mol per 1 mol of cadmium sulfide produced, and the maximum amount is 30xl to satisfy the dark resistance for electrophotography.
It is O mole.
インジウムの添加は、反応溶液中に添加して共沈によっ
て硫化カドミウムに含ませることもできるし、焼成前に
硫化カドミウムと混合させても有効に含ませることもで
きる。Indium can be added to the reaction solution and incorporated into the cadmium sulfide by coprecipitation, or it can be effectively incorporated by mixing it with the cadmium sulfide before firing.
また、銅は予め、カドミウム塩水溶液中に添加して共沈
させて、硫化カドミウム中に含ませることも出来るし、
焼成前、硫化カドミウムと混合した後焼成を行うことに
より硫化カドミウム中に含ませることも出来る。CdS
に添加する銅化合物としては、銅の塩化物、硫化物、硫
酸化物などが用いられ、特に、塩化銅、研酸鋼が好まし
い。In addition, copper can be added in advance to a cadmium salt aqueous solution and co-precipitated to be included in cadmium sulfide.
It can also be included in cadmium sulfide by mixing it with cadmium sulfide before firing and then firing it. CdS
As the copper compound to be added, copper chloride, sulfide, sulfide, etc. are used, and copper chloride and abrasive steel are particularly preferred.
焼成前に銅化合物を添加する方法は銅化合物を固体のま
ま添加混合してもよいし、銅化合物が水溶性の場合はこ
れを一度水溶液にしCdSに添加後、水分を蒸発させる
湿式法のいずれも良好な結果が得られるが、均一性の面
では湿式方法がよい。The copper compound can be added before firing by adding and mixing the copper compound as a solid, or if the copper compound is water-soluble, it can be made into an aqueous solution and added to CdS, and then the water can be evaporated. Although good results can also be obtained using the wet method, the wet method is better in terms of uniformity.
銅の添加量はインジウム量によって最適量が異なるが硫
化カドミウム1モルに対して、l×10″から15X1
0’モル特にば3×10″ から10XIOモルが必要
である。The optimum amount of copper added varies depending on the amount of indium, but it is from 1 x 10" to 15 x 1 per mole of cadmium sulfide.
0' mole, especially 3×10” to 10×IO mole is required.
本発明に使用する融剤は、活性剤をCdS中に拡散する
際に一般的に用いられている融剤で、CdCt、 、
ZnC1t 、 KCI 、 NaCl 、 N1(4
CI!、 Cd50.等の1つあるいは数種類を適当な
比率に混合したものである。混合して用いる場合の好適
例として、cac72とアルカリ金属の塩化物との混合
物が挙げられる。アルカリ金属の塩化物としては、Na
C7!とKCJが代表的なものである。アルカリ金属の
塩化物の融剤全体における含有吐は、90モル%以下で
ioモル%以上が好適である。The flux used in the present invention is a flux commonly used when diffusing an activator into CdS, and includes CdCt,
ZnClt, KCI, NaCl, N1(4
CI! , Cd50. It is a mixture of one or several of these in an appropriate ratio. A preferred example of a mixture of cac72 and an alkali metal chloride is a mixture of cac72 and an alkali metal chloride. As an alkali metal chloride, Na
C7! and KCJ are representative examples. The content of the alkali metal chloride in the entire flux is preferably 90 mol % or less and io mol % or more.
本発明においては、この融剤量は、20%以上、特に好
ましくは30〜50%が好ましい。In the present invention, the amount of flux is preferably 20% or more, particularly preferably 30 to 50%.
20%以下では、製造されるCdS粒子は焼結して粗大
粒子になり、また表面形状も不均一で、電位保持性が十
分でなく、また、解像性に欠ける悪いCdSになる。塘
だ、焼成を融剤の融点よりも50℃高い温度に及ばない
温度で行なった場合には、製造されるCdS粒子は粒径
が大きく、解像性や塗工性が悪い。If it is less than 20%, the CdS particles produced will be sintered and become coarse particles, and the surface shape will be non-uniform, resulting in poor CdS that does not have sufficient potential retention and lacks resolution. However, if the firing is performed at a temperature less than 50° C. higher than the melting point of the flux, the CdS particles produced will have a large particle size and poor resolution and coating properties.
なお、本発明の製造方法において、焼成温度は、600
℃以下が好適である。また、融剤のCdSに対する添加
量は、収率の点からは65%以下が好適である。In addition, in the manufacturing method of the present invention, the firing temperature is 600
C or lower is suitable. Further, the amount of flux added to CdS is preferably 65% or less from the viewpoint of yield.
このように焼成さ扛た硫化カドミウムは本発明による硫
酸処理の後更に、再焼成を行う。この再焼成処理によっ
て、感光体に利用されたときの形成される画像の静電コ
ントラストが一層安定化する。再焼成は500℃以下特
には400〜450℃の温度で行われることが好ましい
。The cadmium sulfide thus calcined is treated with sulfuric acid according to the present invention and then further calcined. This re-baking process further stabilizes the electrostatic contrast of the formed image when used on a photoreceptor. Re-firing is preferably carried out at a temperature of 500°C or lower, particularly 400-450°C.
実施例1
硫酸カドミラA 1 mole 、硫酸銅6 X 10
mole。Example 1 Cadmilla sulfate A 1 mole, copper sulfate 6 X 10
mole.
硫酸インジウA 10 X I Q−’mo/eを含む
、3N硫酸酸性水浴g21の温度を60℃に保ち、硫化
水素を300 cc/励の流量で95分間通じた。この
反応で生じた硫化カドミウムを純水を用いて水洗し、過
剰に粒子表面に存在する不純物を除去した後、口過10
0℃の温度で1晩乾燥した。The temperature of the 3N sulfuric acid acidic water bath G21 containing indium sulfate A 10 X I Q-'mo/e was maintained at 60° C., and hydrogen sulfide was passed through the bath at a flow rate of 300 cc/excitation for 95 minutes. After washing the cadmium sulfide produced in this reaction with pure water to remove excess impurities present on the particle surface,
It was dried overnight at a temperature of 0°C.
この硫化カドミウム1oorに対しedch、を201
とN、aClを30f添加し、よく混合した上で、石英
ルツボに充填し、530℃で30分焼成した(なお、C
dC1!、とNaCl:の混合融剤の融点は、状態図か
らCdCl2−2NaCl の融点の426℃に相当す
る。)。この様にして得られたCdSを4N硫酸水溶液
中に入れ攪拌しながら5時間放置した。純水を用いて水
洗し、硫酸を除去した後口過60℃の温度で乾燥した。edch for this cadmium sulfide 1oor, 201
30f of N, aCl were added, mixed well, and then filled in a quartz crucible and fired at 530°C for 30 minutes (note that C
dC1! From the phase diagram, the melting point of the mixed flux of CdCl2-2NaCl corresponds to 426°C, which is the melting point of CdCl2-2NaCl. ). The CdS thus obtained was placed in a 4N sulfuric acid aqueous solution and left for 5 hours with stirring. After washing with pure water and removing sulfuric acid, it was dried at a temperature of 60°C.
このようにして得られた硫化カドミウムを450℃で1
時間再焼成した。再焼成後これを水洗、イオン交換樹脂
による残留イオン除去、乾燥した。このCd8を塩化ビ
ニル/酢酸ビニル共重合体中に分散させた後アルミニウ
ム基根上に40μの厚さに塗布乾燥させて得た感光体に
15μ厚のポリエステルフィルムをはシつけ三層構成の
感光体を得たところ、表面が非常に平滑であった。この
感光体に一次帯電、次いで光像露光AC除電、次いで全
曲露光の関連電子写真プロセスを適用したところ、十分
な静電コントラストと、十分な感度に基く良質の画像が
得られた。特に解像力は、6本/閣以上あり、シャープ
な画像が得られた。さらにこの感光体を温度35℃、湿
度8556’の高温・扁湿中に、24時間放置後、再び
複写機において画像出し7を行なった結果明暗部のコン
トラストの低下も認められず、良質の画像が得られた。The cadmium sulfide thus obtained was heated to 1
Refired for an hour. After re-baking, it was washed with water, residual ions were removed using an ion exchange resin, and dried. After dispersing this Cd8 in a vinyl chloride/vinyl acetate copolymer, it was coated on an aluminum base to a thickness of 40 μm and dried. A 15 μm thick polyester film was pasted onto the photoreceptor, resulting in a three-layered photoreceptor. When obtained, the surface was extremely smooth. When this photoreceptor was subjected to a related electrophotographic process of primary charging, then photoimage exposure AC static elimination, and then full exposure, a good quality image based on sufficient electrostatic contrast and sufficient sensitivity was obtained. In particular, the resolution was more than 6 lines per frame, and sharp images were obtained. Furthermore, after leaving this photoreceptor in a high temperature and humid environment with a temperature of 35°C and a humidity of 8556' for 24 hours, image generation 7 was performed again in a copying machine. As a result, no decrease in contrast between bright and dark areas was observed, and a good quality image was obtained. was gotten.
実施例2
硫酸カドミウム1 mol!eを含む3N硫酸水浴液か
ら、実施例1と同様な方法により倫化カドミウムを沈澱
生成した。該硫化カドミウム100りに銅、インジウム
が硫化カドミウム1モルに対してそれぞれ4 X I
O−4+ 10 X I O’moJe含むように1硫
酸銅、硫酸インジウムの形で添加し、湿式法により、均
−混合後、100℃の温度で乾燥した。次に、CdC/
140 ? 、 NaCe 1(lから成る混合融剤を
混入し充分混合後500℃で30分焼成した。Example 2 Cadmium sulfate 1 mol! Elytic cadmium was precipitated from a 3N sulfuric acid water bath solution containing E by the same method as in Example 1. Copper and indium per 1 mole of cadmium sulfide are each 4 X I per 100 mol of cadmium sulfide.
Copper monosulfate and indium sulfate were added so as to contain O-4+ 10 X I O'moJe, and after homogeneous mixing by a wet method, the mixture was dried at a temperature of 100°C. Next, CdC/
140? A mixed flux consisting of 1 (l) of NaCe was mixed in and thoroughly mixed, followed by firing at 500°C for 30 minutes.
この様に作成された硫化カドミウムをIN硫酸水溶液中
に添加、攪拌しながら1晩(14時間)放置した。水洗
9口過、乾燥後実施例1と同様に再焼成を行ない得られ
たCdSを感光体化して評価したところ、実施例1と同
様の良好の結果を得た。The cadmium sulfide thus prepared was added to an aqueous IN sulfuric acid solution and left overnight (14 hours) with stirring. After washing with water and passing through 9 mouths and drying, the CdS was re-fired in the same manner as in Example 1, and when the obtained CdS was made into a photoreceptor and evaluated, the same good results as in Example 1 were obtained.
比較例1
実施例】において、硫酸処理を除いて全く同様の方法で
作成された硫化カドミウム粒子について、実施例1と同
様の方法で感光体を作成した0
比較例2
実施例2において硫酸処理を除いて全く同様な方法で製
造した硫化カドミウム粒子を用いて実施例2と同様にし
て感光体を製造した。Comparative Example 1 A photoreceptor was prepared in the same manner as in Example 1 using cadmium sulfide particles prepared in exactly the same manner as in Example 1 except for the sulfuric acid treatment. A photoreceptor was manufactured in the same manner as in Example 2 using cadmium sulfide particles manufactured in exactly the same manner except for the following.
以上の実施例および比較例で製造した感光体について第
1図に示す測定装置を用いて感光体の特性を測定した。The characteristics of the photoreceptors manufactured in the above Examples and Comparative Examples were measured using the measuring apparatus shown in FIG.
即ち、感光体9の絶縁層面に透明′電極4をもつガラス
板3を押しつけた。透明電極4はリレースイッチ5を介
して高圧直流電源6に接続される。測定はリレースイッ
チ5を0.2秒間とじて旨電圧(Va )を印加し、0
,2秒間放置(オーブン)後光を02秒間照射しその時
の電圧変化(Vp)を感光体と同電圧にある金用板7と
表面電位1゛8で測定した。尚、vpは光導電層に印加
されている電圧である。That is, a glass plate 3 having a transparent electrode 4 was pressed against the insulating layer surface of the photoreceptor 9. The transparent electrode 4 is connected to a high voltage DC power source 6 via a relay switch 5. For measurement, close the relay switch 5 for 0.2 seconds and apply the desired voltage (Va) to 0.
After being left in an oven for 2 seconds, the sample was irradiated with light for 02 seconds, and the voltage change (Vp) at that time was measured with the metal plate 7 at the same voltage as the photoreceptor and a surface potential of 1.8. Note that vp is the voltage applied to the photoconductive layer.
四に前露光としてハロゲンランプ1の白色光をシャッタ
ー2により02方照射し、02111oc放置した後、
va印加し、0.2SeC放置後再び光を0.2sec
照射しその時の電圧変化vp′を測定した。4. As a pre-exposure, white light from the halogen lamp 1 was irradiated in 02 directions using the shutter 2, and after leaving it for 02111oc,
After applying va and leaving it at 0.2SeC, light was applied again for 0.2 seconds.
The voltage change vp' at that time was measured.
Va −2000V トLJ’c場合ノVp オヨU
Vp’ i fcVaを+2000 Vとした場合の
Vpの値を測定しvaミニ−2000印加時のvp−V
p′から光メモリーの大小が判断できる。Va -2000V To LJ'c Case No Vp Oyo U
Measure the value of Vp when Vp' i fcVa is +2000 V, and calculate vp-V when applying va mini-2000.
The size of the optical memory can be determined from p'.
次に同じ測定装置を用いて感光体の感度を測定した。Next, the sensitivity of the photoreceptor was measured using the same measuring device.
即ち、感光体9の絶縁層面に透明電極4をもつガラス板
3を押しつけた。透明電極4はリレースイッチ5を介し
て高圧直流軍、源6に接続される。測定は前露光として
ハロゲンランプlの白色光をシャッター2により0.2
See照射し、02式放置した後、リレースイッチ5
を0.2秒間とじて高電圧(Va)を感光体に印加し、
0.2秒間放置後十分に強い光を0.2秒間照射後、感
光体表面(即ち、絶縁層表面)における′電圧(va’
)を感光体と同電圧にある金属板7と表面電位計8で測
定した。高電圧印加時における光導電層への印加電圧(
Vp)はVa−Va’により算出できルノ−r、Vl)
カ600 VKナルVa (以下Va−60゜という)
を短めで以下の方法で感度を測定した。That is, the glass plate 3 having the transparent electrode 4 was pressed against the insulating layer surface of the photoreceptor 9. The transparent electrode 4 is connected to a high voltage direct current source 6 via a relay switch 5. The measurement was performed using white light from a halogen lamp 1 as a pre-exposure using shutter 2 at 0.2
After irradiating the See and leaving the 02 type, relay switch 5
A high voltage (Va) is applied to the photoreceptor for 0.2 seconds,
After leaving it for 0.2 seconds and irradiating it with sufficiently strong light for 0.2 seconds, the 'voltage (va') on the photoreceptor surface (i.e., the insulating layer surface)
) was measured using a metal plate 7 at the same voltage as the photoreceptor and a surface potentiometer 8. Applied voltage to the photoconductive layer when applying high voltage (
Vp) can be calculated by Va-Va' Renault-r, Vl)
Ka600 VK Null Va (hereinafter referred to as Va-60°)
Sensitivity was measured using the following method.
即ち、感光体にVa−aooを印加した状態で測定光(
8000m )を照射する。光照射後0.2秒間放置後
、上記と同様に十分に強い光を0.2秒間照射して感光
体表面における電圧(Va”)を上記と同様にして測定
する。■a、□1o印加と同時測定光照射時における光
導電層への印加電圧(Vp’)はVa、。。−■3“に
より算出できるから、vp′が300■になる必要な測
定光の露光t(E)が半減露光jt (By2)であり
、感光体の感度を表示することができる。That is, the measurement light (
8000 m). After leaving it for 0.2 seconds after irradiation with light, irradiate it with sufficiently strong light for 0.2 seconds in the same manner as above, and measure the voltage (Va'') on the surface of the photoreceptor in the same manner as above.■a, □1o applied. Since the voltage (Vp') applied to the photoconductive layer during simultaneous measurement light irradiation can be calculated from Va,...-■3'', the necessary measurement light exposure t(E) to make vp' 300■ is This is half exposure jt (By2), and the sensitivity of the photoreceptor can be displayed.
表から、硫酸処理を行った感光体についてはVp−Vp
’の差が比較例に比べて小さい。このことは前露光によ
る影響がより少ないこと、換言すれば光減衰の速さが実
施例の感光板の方が速いことを示している。また、vp
′が大きくなっている点から、比較例に比して高抵抗型
となっており、電位が取れる方向に変化している。光メ
モリ−、感度のいづれも比較例に較べて改良されている
。From the table, for the photoreceptor treated with sulfuric acid, Vp-Vp
' difference is smaller than that of the comparative example. This shows that the influence of pre-exposure is smaller, in other words, the speed of light attenuation is faster in the photosensitive plate of the example. Also, vp
′ is larger, which indicates that the resistance type is higher than that of the comparative example, and the potential is changed in the direction that can be obtained. Both optical memory and sensitivity are improved compared to the comparative example.
第1図は感光体の感度を測定するだめの装置の説明図で
ある。
4・・・透明電極、5・・・リレースイッチ、6・・・
高圧直流″厄源、7・・金属板、8・・・表面電位計、
9・・・感光体。
出願人 キャノン株式会社FIG. 1 is an explanatory diagram of an apparatus for measuring the sensitivity of a photoreceptor. 4...Transparent electrode, 5...Relay switch, 6...
High-voltage direct current "source of evil," 7. Metal plate, 8. Surface electrometer,
9...Photoreceptor. Applicant Canon Co., Ltd.
Claims (1)
む硫化カドミウムに対して20重量%以上の融剤を混ぜ
て、融剤の融点よりも50丁以上高い温度で焼成した後
、得られた硫化カドミウムを0.5 N〜5.ONの硫
酸で表面処理し、さらに再焼成することを特徴とする光
導電性硫化カドミウムの製造方法。(1) Cadmium sulfide containing 5 to 30 XIO moles of indium per mole is mixed with 20% by weight or more of a flux, and the resulting sulfide is fired at a temperature 50 or more higher than the melting point of the flux. Cadmium from 0.5N to 5. A method for producing photoconductive cadmium sulfide, which comprises surface treatment with ON sulfuric acid and further firing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3981083A JPS59164632A (en) | 1983-03-09 | 1983-03-09 | Manufacture of photoconductive cadmium sulfide |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3981083A JPS59164632A (en) | 1983-03-09 | 1983-03-09 | Manufacture of photoconductive cadmium sulfide |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59164632A true JPS59164632A (en) | 1984-09-17 |
Family
ID=12563317
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3981083A Pending JPS59164632A (en) | 1983-03-09 | 1983-03-09 | Manufacture of photoconductive cadmium sulfide |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59164632A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5324353A (en) * | 1990-11-14 | 1994-06-28 | Raytheon Company | Zinc sulfide bodies having improved optical transmittance characteristics and mechanical characteristics |
-
1983
- 1983-03-09 JP JP3981083A patent/JPS59164632A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5324353A (en) * | 1990-11-14 | 1994-06-28 | Raytheon Company | Zinc sulfide bodies having improved optical transmittance characteristics and mechanical characteristics |
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