JPS5820718A - Photo-conductive cadmium sulfide - Google Patents
Photo-conductive cadmium sulfideInfo
- Publication number
- JPS5820718A JPS5820718A JP11889181A JP11889181A JPS5820718A JP S5820718 A JPS5820718 A JP S5820718A JP 11889181 A JP11889181 A JP 11889181A JP 11889181 A JP11889181 A JP 11889181A JP S5820718 A JPS5820718 A JP S5820718A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- flux
- cadmium sulfide
- calcination
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、電子写真用の硫化カドミウムに関すく、もの
で、特に非常に結晶性か高くかつ、均一な単一粒子状態
にある硫化カドミウムに関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to cadmium sulfide for electrophotography, and particularly to cadmium sulfide that is highly crystalline and in a uniform single particle state.
−子与與感光材料を代表例として用いられる光導電性硫
化カドミウム(OaS)の鋏造の最も一般的な方法は、
硫酸力Fミウム、塩化カドミウム、などのカドミウムの
水溶性塩に硫化水素を作用さゼ゛(硫化カドミウム粒子
の沈澱を得、次いでこの硫化カドミウム粒子に活性剤を
ド・−ピングするために高温焼成して得るものである。- The most common method for making photoconductive cadmium sulfide (OaS) scissors, which is typically used as a photosensitive material, is as follows:
Hydrogen sulfide is applied to a water-soluble salt of cadmium such as sulfuric acid, cadmium chloride, etc. (to obtain a precipitate of cadmium sulfide particles, and then high-temperature calcination is performed to dope the cadmium sulfide particles with an activator. It's something you can get by doing.
卯ち、光導電性硫化カドミウムは、硫化カドミウム粒子
に活性剤として0uOtz 、Cu80a 等また融剤
として0dC1z 、+ ZrrO12等のハロゲン化
物を混入して焼成を行なうことにより、On 、 C7
等しかしなから、このような従来の方法においては、焼
成工程を経て生成されたCd8は、沈澱生成時にCd8
の表面付近に非常に多くの欠陥を有している。On the other hand, photoconductive cadmium sulfide is produced by mixing cadmium sulfide particles with halides such as OuOtz, Cu80a, etc. as activators and halides such as 0dC1z, +ZrrO12, etc. as fluxing agents, and firing them.
However, in such conventional methods, the Cd8 produced through the calcination process becomes Cd8 when the precipitate is formed.
has many defects near its surface.
この表面欠陥は、光キャリアーのトラップ準位となるた
め、Cd8の光メモリーを増大し、即ち、光応答逮曳を
遅くし、この様なCd8を用いて作成される1み光体を
尚逮の複写機に適用すると明部と暗部のt!Ipmコン
トラストが不十分となる。These surface defects become trap levels for photocarriers, thus increasing the optical memory of Cd8, i.e., slowing down the photoresponse arrest and further arresting the single-photon body created using such Cd8. When applied to a copying machine, the difference between bright and dark areas is t! Ipm contrast becomes insufficient.
また、上記の様な方法で製造されたCd8の粒子形状は
粒子が互いに集合し合って形成された漬い凝集体である
2次粒子からなっており、この2次粒子は3次元的に集
合して団塊状であったりあるいは2次元的に集合して平
板状であ−。In addition, the particle shape of Cd8 produced by the above method consists of secondary particles, which are soaked aggregates formed by aggregation of particles, and these secondary particles are three-dimensionally aggregated. They may be lump-like, or they may be two-dimensionally aggregated and plate-like.
たり様々であるかその中には大ぎなものは10数ミクロ
ンから数10ミクロンに及ぶものがある。There are various sizes, and some of them are as large as 10-odd microns to several tens of microns.
この様な粗大粒子を多数含むCd8を用いて作成される
感光体は、その表面状態が劣悪となり、その結未鉛らね
る画像はガサつきが激しく、解像力も不十分となる。ま
た、さらに絶縁層を設ける感光体の場合には、絶縁層の
Cd8層へのしみ込み等がおこり、良好な感光体を得る
ことが困蝕となる。而して、本発明は、このような従来
の欠点を解決するものであり、(1)In!if像形成
の初期から、島コントラストの画像が形成できる(2)
硫化カドミウムの粒子形状かそろっていて、また単一粒
子のため解像性か良く、また塗工性にも働れる、(a+
m度や温度の1智を受けにくく、また電動保持率や感度
も高い等の良好な特性を南する光導電性硫化カドミウム
を提供すること本発明による硫化カドミウム(Cd8
)は、硫化カドミウムにメ」シて15ムit%以上の融
剤を混ぜて、融剤の融点よりも50℃以上尚い温度で1
次焼成後、1次焼成よりも低い温度で2次焼成して得ら
れる。Otを1(10pp以下、Ouを29±16pp
m含有することを特徴とするものである。A photoreceptor made using Cd8 containing a large number of such coarse particles has a poor surface condition, and its unleaded image is extremely rough and has insufficient resolution. Furthermore, in the case of a photoconductor further provided with an insulating layer, the insulating layer may seep into the Cd8 layer, making it difficult to obtain a good photoconductor. Therefore, the present invention solves these conventional drawbacks, and includes (1) In! An image with island contrast can be formed from the early stage of image formation (2)
The particle shape of cadmium sulfide is uniform, and since it is a single particle, it has good resolution and also works on coating properties.
To provide a photoconductive cadmium sulfide which is not sensitive to temperature fluctuations and has good properties such as high electric retention rate and sensitivity.
) is mixed with cadmium sulfide and 15% or more of a flux, and heated at a temperature of 50°C or more above the melting point of the flux.
After the next firing, it is obtained by performing a second firing at a lower temperature than the first firing. Ot to 1 (10pp or less, Ou to 29±16pp
It is characterized by containing m.
本発明による硫化カドミウムは結晶性が高くまた、走査
型電子顕微鏡による形状観察では粒子が互いに凝集して
いない単粒子でありかつその表面が滑らかになってい<
)。そこで焼成工程を経て製造された硫化カドミウムは
、その表面付近の光キャリヤーのトラップ準位となりつ
る結晶欠陥が、極めて少なく、電子写真用&脂バインダ
ー中に分散させ、支持体に塗布し、光4嵐層を作成し、
更に必要に応じてその上に絶縁層を形成して感光板を作
成して高速度複写機に適用することにより、高い静電コ
ントラストが得られることが詔められる。また、本発明
により得C)れた硫化カドミウム粉体は粒子形状が均一
でかつ粒径がそろっているため、作成される光導一層の
―面は密で平滑なため、非常に良質の画像が得られるも
のである。The cadmium sulfide according to the present invention has high crystallinity, and shape observation using a scanning electron microscope shows that the particles are single particles that do not aggregate with each other and have a smooth surface.
). Therefore, cadmium sulfide produced through a firing process has extremely few crystal defects that become trap levels for optical carriers near the surface, and is dispersed in an electrophotographic & fat binder and coated on a support. Create a storm layer,
Furthermore, it is suggested that a high electrostatic contrast can be obtained by forming a photosensitive plate by forming an insulating layer thereon as required and applying it to a high-speed copying machine. In addition, since the cadmium sulfide powder obtained according to the present invention has a uniform particle shape and a uniform particle size, the surface of the light guiding layer produced is dense and smooth, resulting in very high quality images. That's what you get.
本発明に使用する融剤は、活性剤をOdS中に拡散する
際に一般的に用いられてい−る融剤で、CdC4z 、
Zn0t2 、 KOL 、 Na0t、’ N
H4Cd 、 ’0d804等の1つあるいは数種類を
適当な比率に混合したもσノである。混合して用いる場
合の好適例としてcaclgとアルカリ金属の塩化物と
の混合物か挙げられるアルカリ金属の塩化物としては、
Na0jとMCIが代表的なものである。アルカリ゛金
属の塩化物の融剤全体における含有量は90モル%以ト
で10モル%以上が好適である。The flux used in the present invention is a flux commonly used when diffusing an activator into OdS, and includes CdC4z, CdC4z,
Zn0t2, KOL, Na0t,' N
A mixture of one or several types of H4Cd, '0d804, etc. in an appropriate ratio is also σ. Preferred examples of the alkali metal chloride used in combination include a mixture of caclg and an alkali metal chloride;
Na0j and MCI are representative. The content of the alkali metal chloride in the entire flux is 90 mol% or more, preferably 10 mol% or more.
本発明にj)いては、この融剤社は、20%以J−符に
好ましくは30〜50%が好ましい。20%以上では製
造されるCd8粒子は焼結して粗大粒子にムリ、また表
面形状も不均一で、電位保持性も十分でなく、また、解
像性に欠ける悪イ(+tiS [7fる−また、焼成を
、融剤の融点よりも50℃高い温度に及ばない温度で行
った場合には、製造されるCd8粒子は粒径が大きく解
像性や塗工性か悪く、また、当初形成される画像の静電
コントラストは低くなる。なお、1次焼成温度は600
℃以下が好適である。また、融剤のCd8に対する添加
皺は、収率の点からは、65%以下が好適である。According to j) of the present invention, the flux is preferably 20% or more, preferably 30 to 50%. If it is more than 20%, the Cd8 particles produced will be sintered and become coarse particles, the surface shape will be uneven, the potential retention will not be sufficient, and the resolution will be poor (+tiS [7fru- In addition, if the firing is performed at a temperature that is less than 50°C higher than the melting point of the flux, the Cd8 particles produced will have a large particle size and have poor resolution and coatability. The electrostatic contrast of the resulting image will be low.The primary firing temperature is 600℃.
C or lower is suitable. Further, from the viewpoint of yield, the amount of addition of the flux to Cd8 is preferably 65% or less.
さらに結晶性を向上させるため得られたCd8を゛rニ
ールの目的として行う2次焼成温度は、1次焼成温度以
トで行う 一
本発明によるCd8の六方度は90%以上、時には95
%以上が好適である。また本発明によるCd8は、焼成
処理によって結晶性は非常に^くなるので原料CaS自
体の六り度は50%以上でもよい。In order to further improve the crystallinity, the secondary firing temperature for the purpose of annealing the obtained Cd8 is lower than the primary firing temperature.The hexagonal degree of Cd8 according to the present invention is 90% or more, sometimes 95%.
% or more is suitable. Further, since the crystallinity of Cd8 according to the present invention becomes extremely high due to the firing treatment, the hexity of the raw material CaS itself may be 50% or more.
また、従来のような結晶性の低いCd8ではドナー不純
物とムるC)やInを添加しなくても格子欠陥等にもと
づく1°十−か多数あり、そのままでは光減衰の遅いか
つ暗抵抗の低い状態で電子写真には適さなかった。In addition, in conventional Cd8 with low crystallinity, even without adding C) or In, which acts as a donor impurity, there are 1° or more due to lattice defects, etc., and if left as is, light attenuation is slow and dark resistance is low. It was in a low state and not suitable for electrophotography.
ぞのためアクセプター不純物であるOu又はAgを多閂
に添加しこれを電気的に補償する対策をこうじていた。Therefore, a measure has been taken to electrically compensate for this by adding Ou or Ag as an acceptor impurity in multiple bolts.
h本発明の(jd8では前述のように高い結晶性をもつ
ので、欠陥等によるドナーが極めて少く、アクセプター
不純物としてのCuの含有量は29±16 pp+nと
従来系のそれの約−桁低い皺が好ましい。特に好ましく
は16〜35 ppmであるこ第1以下の含有量は、上
記補傷が不充分なためと推測される原因によって感光体
としての繰返し、tφ用耐久性が低下する。又、これ以
上の541祉では感疫が急速に低下し8i度特性も低下
1d〕。この原因は恐らく粉体表面にpタイプ半導体で
ある硫化銅の偏析と推定される。また、ドナータイツの
不純物であるCtの飢も制御することか妃要である。こ
の場合atは積極的に活性剤として添加されることがな
くても原料Od8の生成時のコンタミ坏−ションあるい
は焼成時の融剤である塩化物から入る可能性もあり制御
が必蜀であ’oj r
本発明においては、その量は第2次焼成時において1(
loppm 以下特に好ましくは50pl・m以1であ
りそれ以上の値では光減衰速度が遅< iLり好1しく
ない。Since the present invention (jd8) has high crystallinity as mentioned above, there are extremely few donors due to defects, etc., and the content of Cu as an acceptor impurity is 29 ± 16 pp+n, which is about - orders of magnitude lower than that of the conventional system. Particularly preferably, it is 16 to 35 ppm. If the content is less than 1, the durability of the photoreceptor for repeated use and tφ will decrease due to the reason that the above-mentioned damage repair is thought to be insufficient. If the temperature exceeds 541, the infection rate rapidly decreases and the 8i degree characteristic also decreases by 1d].The cause of this is probably the segregation of copper sulfide, which is a p-type semiconductor, on the powder surface.Also, impurities in the donor tights It is also important to control certain Ct starvation.In this case, at is not actively added as an activator, but is a contamination during the production of the raw material Od8 or a flux during calcination. In the present invention, the amount of chloride is 1 (1) during the second firing.
loppm or less is particularly preferably 50 pl·m or less, and if the value is greater than that, the light attenuation rate is slow <iL, which is not preferable.
実施例1
0d804の硫m r’tr性溶液に神々の濃度に0u
804を加えてHz&ガスを通じ種々の濃度でOuを含
んだOdSを沈澱させた。このCd8に0dO4!を2
0gとN a Ctを311 g添加し、よく混合した
上で石英ルツボに次項し、530℃で30分焼成した。Example 1 0d804 sulfur m r'tr solution with divine concentration 0u
804 was added to precipitate OdS containing Ou at various concentrations through Hz & gas. 0dO4 for this Cd8! 2
0g and 311g of NaCt were added, mixed well, placed in a quartz crucible, and fired at 530°C for 30 minutes.
(なお、0dC7−2とNa01の混合融剤の融点番j
1状態図から、0dOt2 ・2NaC/−の融点の4
26に相当する)この様にして得られたCd8の六万度
をま、95〜100%であり、1万倍の電子顕微鏡写真
によれば粒子表面は非常に滑らかで、六方M1形特有の
形状を持ち、各粒子は、2〜5μの径の単一粒子となっ
ているのが認められた。CZ含有値は30ppm以−ト
であり、Cu含有量は5〜11Oppmであ一〕た。(In addition, the melting point number j of the mixed flux of 0dC7-2 and Na01
1 From the phase diagram, the melting point of 0dOt2 ・2NaC/- is 4
The temperature of the Cd8 thus obtained is 95 to 100%, and according to an electron micrograph at 10,000x magnification, the particle surface is very smooth and has the characteristic of hexagonal M1 shape. It was observed that each particle was a single particle with a diameter of 2 to 5 microns. The CZ content was 30 ppm or more, and the Cu content was 5 to 11 Oppm.
焼成1−、たCdSは、充分水洗の後、さら&:、陽及
び陰イイン交換樹脂と共に充分攪拌し脱イオン処坊iし
に俵、70”Oにて12hr乾燥した。The fired CdS was thoroughly washed with water, thoroughly stirred together with the cationic and anionic exchange resins, and dried in a deionized oven at 70"O for 12 hours.
(大に焼成したCdSを石英ルツボに充填し450℃で
1時間アニールした後水洗、脱イオン処理恢70℃12
hr乾燥した。(A quartz crucible was filled with highly calcined CdS, annealed at 450°C for 1 hour, then washed with water and deionized at 70°C.
Dry for hr.
このCd84i:環化ヒニル/酢戯ビニル共重合体中に
分散させた後アルミニウム基板上に40μの厚さに塗布
乾燥させて得た感光板に15μ厚υ)ポリエステルフィ
ルムをはりつけ三層構成の感光体を得たところ、表面が
非常に平滑であ−た。この感光体について半減該露光艦
、耐久電位保持率および吸湿電位保持率を測定した結果
、第1ド1に不すようにCu含有量によって異なる値を
小した0
なお、耐久電位保持率は元板に一次帯電、次いで光像血
光AC除電、次いで全血廁光の高速電子り輿プロセスを
適用して2001)枚のコヒーをとったときの1枚目の
コヒーのときのdark を位に対Jる2000枚目の
コピ、−のdark電位の割合であ’a’+ Cまた、
g&湿電位保持率は、感光体を温′度30℃、濃度90
%の高温・高湿中に、24時間放筒抜、貴び複写機にお
いて肉像出しを行なった結果、1枚目のコピーのdar
kII1位に対する1000枚目のdark[位の割合
である。This Cd84i was dispersed in a cyclized hynyl/vinyl acetate copolymer, then coated on an aluminum substrate to a thickness of 40μ and dried.A 15μ thick υ) polyester film was attached to the resulting photosensitive plate to form a three-layered photosensitive plate. When the body was obtained, the surface was very smooth. As a result of measuring the exposure capacity, durable potential retention rate, and moisture absorption potential retention rate of this photoconductor, the durable potential retention rate was reduced to 0, which differs depending on the Cu content, as shown in the first example. Applying a primary charge to the plate, then optical image blood light AC static neutralization, and then applying a high-speed electronic transfer process of whole blood light to the dark level of the first light when taking 2001) sheets of cohes. The 2000th copy of J, the ratio of dark potential of - is 'a' + C.
g & wet potential retention rate is when the photoreceptor is heated at 30°C and the density is 90°C.
% high temperature and high humidity for 24 hours, and as a result of exposing the flesh image in a copying machine, the first copy's dar
This is the ratio of the 1000th dark [place] to the kII 1st place.
実施例2
Cu含有量のNったCd8 10(Igに0dct24
1grN@O7−9grをよく混合し石英ルツボにつめ
実施例 1と同様の実験を行った。その結果は第
2図のようになった。Example 2 Cd8 with Cu content of 10 (0 dct24 in Ig)
1grN@O7-9gr was thoroughly mixed and packed in a quartz crucible, and the same experiment as in Example 1 was conducted. The result was as shown in Figure 2.
比較例
実施例2の条件の内1次焼成温度を530℃から450
℃に変えてct宮′44’k190ppmのCd8を作
成した(Ouは22ppu+)このCd8を用いた感光
体の光減衰時間は第2図のCd8の同じOu含有蓋のも
の(aZ含有蓋30ppm以下)にくらべ約1.5倍に
。Comparative Example Among the conditions of Example 2, the primary firing temperature was changed from 530°C to 450°C.
Cd8 with 190 ppm of ct miya'44'k was prepared (Ou is 22 ppu+). ) approximately 1.5 times as large.
なり前襄光糸の複写機での電位か糺20%低Fした。The potential of the photocopying machine was lowered by 20%.
第1図および第2図は各々CdS中のCu含有量に対す
る感光体の耐久電位保持率、g&湿電位保持重および半
減衰施光量の変化を示すグラフである。FIGS. 1 and 2 are graphs showing changes in the durable potential retention rate, g&wet potential retention weight, and half-attenuation light application amount of the photoreceptor with respect to the Cu content in CdS, respectively.
Claims (1)
を混ぜて、融剤の融点よりも50℃以上^い温度で1次
焼成後、1次焼成よりも低い温度で2次焼成して得られ
るaZを100PP 以下、Ouを29±16PPm含
有することを特徴とする光導電性硫化カドミウム。1. A product obtained by mixing cadmium sulfide with a flux of 15% by weight or more and firing at a temperature of 50°C or more higher than the melting point of the flux, followed by secondary firing at a temperature lower than the primary firing. A photoconductive cadmium sulfide characterized by containing 100 PPm or less of aZ and 29±16 PPm of Ou.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11889181A JPS5820718A (en) | 1981-07-28 | 1981-07-28 | Photo-conductive cadmium sulfide |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11889181A JPS5820718A (en) | 1981-07-28 | 1981-07-28 | Photo-conductive cadmium sulfide |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5820718A true JPS5820718A (en) | 1983-02-07 |
Family
ID=14747700
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11889181A Pending JPS5820718A (en) | 1981-07-28 | 1981-07-28 | Photo-conductive cadmium sulfide |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5820718A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007159490A (en) * | 2005-12-14 | 2007-06-28 | Sankyo Tateyama Aluminium Inc | Float |
-
1981
- 1981-07-28 JP JP11889181A patent/JPS5820718A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007159490A (en) * | 2005-12-14 | 2007-06-28 | Sankyo Tateyama Aluminium Inc | Float |
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